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1. 发明授权

US06479209B1 Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06479209B1
公开(公告)日：2002-11-12
申请号：US09075246
申请日：1998-05-11
申请人： Toshiaki Aoai , Kenichiro Sato , Morio Yagihara
发明人： Toshiaki Aoai , Kenichiro Sato , Morio Yagihara
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Disclosed is a positive photosensitive composition capable of giving good sensitivity, resolution and resist pattern and exhibiting sufficiently high dry etching resistance on use of an exposure light source of 250 nm or less, particularly 220 nm or less, which composition comprises (A) a compound generating an acid on irradiation of an active light ray or radiation and (B) a resin having (i) at least one polycyclic-type alicyclic group, (ii) at least one ester group which decomposes by the action of an acid and increases the solubility in an alkali developer and (iii) at least one acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer, or comprises (A) a compound generating an acid on irradiation of an active light ray or radiation, (C) a resin having a polycyclic-type alicyclic group and an ester group which decomposes by the action of an acid and increases the solubility in an alkali developer, and (D) a resin having a polycyclic-type alicyclic group and an acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer.
摘要翻译：公开了一种能够提供良好的灵敏度，分辨率和抗蚀剂图案并且在使用250nm或更小，特别是220nm或更小的曝光光源时表现出足够高的耐干蚀刻性的正性光敏组合物，该组合物包含（A）化合物在活性光线或辐射照射时产生酸，和（B）具有（i）至少一种多环式脂环族基团的树脂，（ii）至少一种通过酸的作用分解并增加酸的酯基在碱性显影剂中的溶解度和（iii）至少一种通过酸的作用分解并提高其在碱性显影剂中的溶解度的缩醛基，或包含（A）在活性光线或辐射照射时产生酸的化合物，（C）具有多环型脂环族基团和酯基的树脂，其通过酸的作用而分解并增加在碱性显影剂中的溶解度，（D）具有多环基的树脂 ype脂环族基团和通过酸的作用而分解并增加在碱性显影剂中的溶解度的缩醛基。

2. 发明授权

US06670095B2 Positive-working resist composition 有权
公开(公告)号：US06670095B2
公开(公告)日：2003-12-30
申请号：US10022363
申请日：2001-12-20
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： The present invention provides a high sensitivity chemically amplified positive-working resist composition which eliminates edge roughness on pattern and provides an excellent resist pattern profile. A novel positive-working resist composition is provided comprising (A) a resin containing an alkali-soluble group protected by at least one of moieties containing alicyclic hydrocarbon represented by general formulae (pI) to (pVI) and having a monomer component content of 5% or less of the total pattern area as determined by gel permeation chromatography (GPC), which increases in its solution velocity with respect to an alkaline developer by the action of an acid and (B) a compound which is capable of generating an acid by irradiation with an active ray or radiation.

3. 发明授权

US06632586B1 Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US06632586B1
公开(公告)日：2003-10-14
申请号：US09392588
申请日：1999-09-09
申请人： Toshiaki Aoai , Kenichiro Sato
发明人： Toshiaki Aoai , Kenichiro Sato
IPC分类号： G03C172
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B) a resin which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and contains repeating units represented by formulae (I) and (V):
摘要翻译：一种正型抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物，和（B）通过酸的作用分解以增加在碱性显影液中的溶解度的树脂，并且包含重复由式（I）和（V）表示的单元：

4. 发明授权

US06416925B1 Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06416925B1
公开(公告)日：2002-07-09
申请号：US09497281
申请日：2000-02-02
申请人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
发明人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.
摘要翻译：适用于使用波长为250nm或更短，特别是220nm或更短的光源的曝光的正性工作光敏组合物; 包括（A）能够在光化射线或辐射照射时能够产生酸的化合物和（B）包含具有特定结构的脂环族基团的重复单元的树脂，包括金刚烷基，并且具有能够由于作用而分解的基团的酸以增加在碱性显影剂中的溶解度。

5. 发明授权

US06245485B1 Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US06245485B1
公开(公告)日：2001-06-12
申请号：US09075818
申请日：1998-05-12
申请人： Toshiaki Aoai , Shunichi Kondo , Tsuguo Yamaoka , Kenichiro Sato
发明人： Toshiaki Aoai , Shunichi Kondo , Tsuguo Yamaoka , Kenichiro Sato
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/107 , Y10S430/111
摘要： Disclosed is a positive resist composition which ensures, on use of an exposure light source of 220 nm or less, high sensitivity, good resolution, sufficiently high resistance against dry etching, satisfactory adhesion to the substrate, and superior developability even with a developer conventionally used for resists (for example, a 2.38% aqueous tetramethylammonium hydroxide solution), the positive resist composition comprising a compound generating an acid on irradiation of an active light ray or radiation, a resin having a polycyclic-type alicyclic group and a carboxyl group, and a compound having at least two groups having a specific structure.
摘要翻译：公开了一种正型抗蚀剂组合物，其使用220nm或更小的曝光光源，高灵敏度，高分辨率，足够高的抗干蚀刻性，对基材的良好粘附性以及即使使用常规使用的显影剂也具有优异的显影性对于抗蚀剂（例如，2.38％的四甲基氢氧化铵水溶液），正型抗蚀剂组合物包含在活性光线或辐射的照射下产生酸的化合物，具有多环型脂环族基团和羧基的树脂，以及具有至少两个具有特定结构的基团的化合物。

6. 发明授权

US5523396A Process for synthesizing quinonediazide ester utilizing base catalyst 失效
标题翻译：使用碱催化剂合成醌二叠氮化物的方法
公开(公告)号：US5523396A
公开(公告)日：1996-06-04
申请号：US531861
申请日：1995-09-21
申请人： Kenichiro Sato , Yasumasa Kawabe , Toshiaki Aoai
发明人： Kenichiro Sato , Yasumasa Kawabe , Toshiaki Aoai
IPC分类号： B01J31/02 , C07C303/28 , C07C309/47 , C07C309/69 , C07C309/71 , C07C309/76 , G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： C07C303/28 , G03F7/022 , C07C2101/14
摘要： A process for synthesizing a quinonediazide ester is disclosed in which the esterification reaction of a polyhydroxy compound with 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonyl chloride is carried out in the presence of a base catalyst comprising a basic compound represented by formula (I) or (II): ##STR1## wherein R.sub.1 to R.sub.15 are defined in the disclosure. A positive working photoresist containing the ester is also disclosed. The process is capable of highly selectively yielding the desired photosensitive material containing specific unreacted hydroxyl group(s). The photoresist has high resolving power with reduced film thickness dependence of the resolving power, is less apt to leave a development residue, and has excellent storage stability for prolonged period of time.
摘要翻译：公开了一种用于合成醌二叠氮化物酯的方法，其中多羟基化合物与1,2-萘醌二叠氮化物-5-（和/或-4-）磺酰氯的酯化反应在含有碱式（I）或（II）表示的化合物：其中R 1至R 15在本公开内容中定义。还公开了含有酯的正性工作光致抗蚀剂。该方法能够高选择性地产生含有特定未反应羟基的所需光敏材料。光致抗蚀剂具有高的分辨能力，降低膜分离能力的依赖性，更不容易留下显影残留物，并且在长时间内具有优异的储存稳定性。

7. 发明授权

US07223516B2 Positive type photoresist composition 有权
标题翻译：正型光致抗蚀剂组合物
公开(公告)号：US07223516B2
公开(公告)日：2007-05-29
申请号：US09729953
申请日：2000-12-06
申请人： Kenichiro Sato , Toshiaki Aoai
发明人： Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7/004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A positive type photoresist composition suitable for light in the wavelength region of 170 nm to 220 nm, high in sensitivity, excellent in adhesion and giving a good resist pattern profile, which comprises a resin having an ester group represented by the following general formula [I] in its molecule and a compound generating an acid by irradiation of an active light ray or radiation: wherein R1 represents a hydrogen atom, an alkyl group or a cycloalkyl group; and R2 and R3, which may be the same or different, each represents a hydrogen atom, an alkyl group, a cycloalkyl group or -A-R4, and R2 and R3 may combine together to form a ring, wherein R4 represents a hydrogen atom, an alkyl group or a cycloalkyl group, R4 and R2 or R3 may combine together to form a ring, and A represents an oxygen atom or a sulfur atom.
摘要翻译：一种适用于170nm至220nm波长区域的光的正型光致抗蚀剂组合物，其灵敏度高，粘附性优异，并且具有良好的抗蚀剂图案轮廓，其包含具有由以下通式[I ]和通过活性光线或辐射的照射产生酸的化合物：其中R 1表示氢原子，烷基或环烷基; 和R 2和R 3可以相同或不同，分别表示氢原子，烷基，环烷基或-AR 4， / SUB，R 2和R 3可以结合在一起形成环，其中R 4代表氢原子，烷基或环烷基，R 4和R 2或R 3可以结合在一起形成环，A表示氧原子或硫原子。

8. 发明授权

US06962766B2 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06962766B2
公开(公告)日：2005-11-08
申请号：US10109872
申请日：2002-04-01
申请人： Kazuya Uenishi , Toshiaki Aoai , Kenichiro Sato
发明人： Kazuya Uenishi , Toshiaki Aoai , Kenichiro Sato
IPC分类号： C08K5/00 , C08L101/00 , G03F7/004 , G03F7/039 , G03F7/20 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0397
摘要： A positive photoresist composition comprises: an acid-decomposable resin containing a specified repeating unit; an acid-generator; and a specified dissolution-inhibiting compound.
摘要翻译：正性光致抗蚀剂组合物包含：含有特定重复单元的酸分解树脂; 酸发生器; 和特定的溶解抑制化合物。

9. 发明授权

US06602646B1 Positive-working resist composition 有权
标题翻译：正面抗蚀剂组成
公开(公告)号：US06602646B1
公开(公告)日：2003-08-05
申请号：US09684888
申请日：2000-10-06
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： The present invention provides a high sensitivity chemically amplified positive-working resist composition which eliminates edge roughness on pattern and provides an excellent resist pattern profile. A novel positive-working resist composition is provided comprising (A) a resin containing an alkali-soluble group protected by at least one of moieties containing alicyclic hydrocarbon represented by general formulae (pI) to (pVI) and having a monomer component content of 5% or less of the total pattern area as determined by gel permeation chromatography (GPC), which increases in its solution velocity with respect to an alkaline developer by the action of an acid and (B) a compound which is capable of generating an acid by irradiation with an active ray or radiation.
摘要翻译：本发明提供一种消除图案上的边缘粗糙度并提供优异的抗蚀剂图案轮廓的高灵敏度化学放大正性抗蚀剂组合物。提供了一种新型的正性抗蚀剂组合物，其包含（A）含有由至少一个含有由通式（pI）至（pVI）表示的脂环族烃部分并且单体组分含量为5的部分保护的碱溶性基团的树脂通过凝胶渗透色谱法（GPC）确定的总图案面积的百分比或更少，其通过酸的作用相对于碱性显影剂的溶液速度增加，和（B）能够产生酸的化合物用活性射线或辐射照射。

10. 发明授权

US06576392B1 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06576392B1
公开(公告)日：2003-06-10
申请号：US09456827
申请日：1999-12-06
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Hidekazu Ohashi
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Hidekazu Ohashi
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive photoresist composition comprising a photo-acid gererator and a specific resin. The resin contains repeating units each having a group represented by formula (I): —SO2—O—R wherein R represents an optionally substituted alkyl, cycloalkyl, or alkenyl group and comes to have an increased rate of dissolution in an alkaline developing solution by the action of an acid, or contains alkali-soluble groups protected by partial structures containing an alicyclic hydrocarbon and represented by at least one of formulae (pI) to (pVI) defined in the specification and which decomposes by the action of an acid to have enhanced solubility in an alkali. The latter is used in combination with a compound which decomposes by the action of an acid to generate a sulfonic acid.
摘要翻译：一种正型光致抗蚀剂组合物，其包含光酸注射器和特定树脂。树脂含有各自具有由式（I）表示的基团的重复单元：其中R表示任选取代的烷基，环烷基或烯基，并且通过酸的作用使碱显影溶液的溶解速率增加，或含有由说明书中定义的至少一种式（pI）至（pVI）表示的含有脂环族烃的部分结构保护的碱溶性基团，其通过酸的作用而分解，从而具有增强的在碱中的溶解度。后者与通过酸的作用分解以产生磺酸的化合物组合使用。

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