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    • 7. 发明授权
    • Structure having pores, device using the same, and manufacturing methods therefor
    • 具有孔的结构,使用其的装置及其制造方法
    • US07319069B2
    • 2008-01-15
    • US11354813
    • 2006-02-16
    • Tohru DenTatsuya Iwasaki
    • Tohru DenTatsuya Iwasaki
    • H01L21/44
    • B81C1/00031B81B1/002B81B2201/0214H01L43/12Y10S977/781Y10S977/893
    • A minute structure is provided in which electroconductive paths are only formed in nanoholes, and a material is filled in the nanoholes, which are disposed in a specific area, by using the electroconductive paths. The minute structure comprising pores comprises a) a substrate, b) a plurality of electroconductive layers formed on a surface of the substrate, c) a layer primarily composed of aluminum oxide covering the plurality of electroconductive layers and a surface of the substrate where no electroconductive layer is formed, and d) a plurality of pores formed in the layer primarily composed of aluminum oxide, in which the pores are disposed above the electroconductive layers and the surface of the substrate where no electroconductive layers is formed, with a part of the layer primarily composed of aluminum oxide provided under the bottoms of the pores, and in which the layer primarily composed of aluminum oxide provided between the electroconductive layer and the bottoms of the pores disposed above the electroconductive layer comprises a material forming the electroconductive layer.
    • 提供了一种微结构,其中导电路径仅形成在纳米孔中,并且通过使用导电路径将材料填充在设置在特定区域中的纳米孔中。 包括孔的微小结构包括a)基底,b)形成在基底表面上的多个导电层,c)主要由覆盖多个导电层的氧化铝组成的层和不具有导电性的基底的表面 层,以及d)主要由氧化铝构成的层中形成的多个孔,其中孔设置在导电层上方和不形成导电层的基板的表面上,其中一部分层 主要由设置在孔底部的氧化铝组成,其中主要由设置在导电层和设置在导电层上方的孔的底部之间的氧化铝组成的层包括形成导电层的材料。