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    • 5. 发明授权
    • Coating solution for forming flat-surface insulating film, flat-surface insulating film-coated substrate, and production method of a flat-surface insulating film-coated substrate
    • 用于形成平面绝缘膜,平面绝缘膜涂覆基板的涂布溶液和平面绝缘膜涂覆基板的制造方法
    • US07951458B2
    • 2011-05-31
    • US12450646
    • 2008-03-25
    • Toyoshi OguraNoriko YamadaYuji Kubo
    • Toyoshi OguraNoriko YamadaYuji Kubo
    • B32B9/04C09D183/06
    • H01L21/3122C09D183/04H01B3/46H01L21/02126H01L21/02216H01L21/02282Y10T428/31663C08K3/22
    • A coating solution for forming a flat-surface insulating film, which is a coating solution obtained by dissolving a poly(diorgano)siloxane A having a mass average molecular weight of 900 to 10,000 and a metal alkoxide B in an organic solvent C and further adding water, wherein the molar ratio A/B of the poly(diorgano)siloxane A to 1 mol of the metal alkoxide B is from 0.05 to 1.5, the organic solvent C has a hydroxyl group, the solubility of water in 100 g of the organic solvent C is from 3 to 20 g, and the molar ratio C/A of the organic solvent C to 1 mol of the poly(diorgano)siloxane A is from 0.05 to 100. This coating solution for forming a flat-surface insulating film ensures that an organic modified silicate composed of a poly(diorgano)siloxane and a metal alkoxide can be formed as a thick film having 1 μm or more and can be an organic modified silicate insulating film causing no irregularities due to phase separation and having a low Young's modulus and flexibility high enough to follow the deformation of a substrate board, as well as high film surface flatness allowing for mounting of microcomponents of an electronic device or the like.
    • 一种用于形成平面绝缘膜的涂布溶液,其是通过将质均分子量为900〜10,000的聚(二有机基)硅氧烷A和金属醇盐B溶解在有机溶剂C中而得到的涂布溶液,并进一步添加 水,其中聚(二有机基)硅氧烷A与1mol金属醇盐B的摩尔比A / B为0.05至1.5,有机溶剂C具有羟基,水在100g有机溶剂中的溶解度 溶剂C为3〜20g,有机溶剂C与1mol聚(二有机基)硅氧烷A的摩尔比C / A为0.05〜100。这种用于形成平面绝缘膜的涂布液确保 可以形成由聚(二有机基)硅氧烷和金属醇盐构成的有机改性硅酸盐作为1μm以上的厚膜,并且可以是由于相分离而不引起由于相分离引起的不规则性并且具有低杨氏值的有机改性硅酸盐绝缘膜 模量和柔度足够高t o遵循基板的变形,以及允许安装电子设备等的微元件的高膜表面平坦度。
    • 6. 发明申请
    • INORGANIC--ORGANIC HYBRID-FILM-COATED STAINLESS-STEEL FOIL
    • 无机 - 有机混合涂膜不锈钢箔
    • US20100272957A1
    • 2010-10-28
    • US12831027
    • 2010-07-06
    • Keiko KawakamiNoriko YamadaTakeshi HamadaYuji Kubo
    • Keiko KawakamiNoriko YamadaTakeshi HamadaYuji Kubo
    • B32B15/04B32B7/02B32B3/10
    • C23C18/1254C23C26/00C23C30/00Y10T428/24355Y10T428/2495Y10T428/265Y10T428/31663
    • An inorganic-organic hybrid film-coated stainless steel foil comprising a stainless steel foil substrate having coated on one surface or both surfaces thereof an inorganic-organic hybrid film, wherein the inorganic-organic hybrid film comprises a skeleton formed of an inorganic three-dimensional network structure mainly comprising a siloxane bond, with at least one crosslinked oxygen of the skeleton being replaced by an organic group and/or a hydrogen atom; and an inorganic-organic hybrid film-coated stainless steel foil comprising a stainless steel foil having coated thereon a plurality of inorganic-organic hybrid films each mainly comprising a siloxane bond, wherein at least a part of Si constituting each inorganic-organic hybrid film is chemically bonded to one or both of an organic group and hydrogen, provided that the uppermost layer out of the plurality of inorganic-organic hybrid films may be an inorganic SiO2 film, and adjacent films of the plurality of inorganic-organic hybrid films (including the inorganic SiO2 film) differ in the composition from each other.
    • 一种无机 - 有机杂化薄膜包衣的不锈钢箔,其包括在一个表面或两个表面上涂覆无机 - 有机杂化膜的不锈钢箔基材,其中所述无机 - 有机杂化膜包括由无机 - 三维 主要包含硅氧烷键的网状结构,其中骨架的至少一个交联氧被有机基团和/或氢原子代替; 以及包含不锈钢箔的无机 - 有机复合薄膜包衣不锈钢箔,其上涂覆有主要包含硅氧烷键的多个无机 - 有机杂化膜,其中构成每个无机 - 有机杂化膜的Si的至少一部分为 化学键合到有机基团和氢气中的一个或两个,条件是多个无机 - 有机杂化膜中的最上层可以是无机SiO 2膜,并且多个无机 - 有机杂化膜的相邻膜(包括 无机SiO 2膜)的组成不同。
    • 7. 发明授权
    • Inorganic—organic hybrid-film-coated stainless-steel foil
    • 无机 - 有机复合薄膜涂层不锈钢箔
    • US08586190B2
    • 2013-11-19
    • US12831027
    • 2010-07-06
    • Keiko KawakamiNoriko YamadaTakeshi HamadaYuji Kubo
    • Keiko KawakamiNoriko YamadaTakeshi HamadaYuji Kubo
    • B32B15/04
    • C23C18/1254C23C26/00C23C30/00Y10T428/24355Y10T428/2495Y10T428/265Y10T428/31663
    • An inorganic-organic hybrid film-coated stainless steel foil comprising a stainless steel foil substrate having coated on one surface or both surfaces thereof an inorganic-organic hybrid film, wherein the inorganic-organic hybrid film comprises a skeleton formed of an inorganic three-dimensional network structure mainly comprising a siloxane bond, with at least one crosslinked oxygen of the skeleton being replaced by an organic group and/or a hydrogen atom; and an inorganic-organic hybrid film-coated stainless steel foil comprising a stainless steel foil having coated thereon a plurality of inorganic-organic hybrid films each mainly comprising a siloxane bond, wherein at least a part of Si constituting each inorganic-organic hybrid film is chemically bonded to one or both of an organic group and hydrogen, provided that the uppermost layer out of the plurality of inorganic-organic hybrid films may be an inorganic SiO2 film, and adjacent films of the plurality of inorganic-organic hybrid films (including the inorganic SiO2 film) differ in the composition from each other.
    • 一种无机 - 有机复合薄膜包衣的不锈钢箔,其包括在一个表面或其两个表面上涂覆无机 - 有机杂化膜的不锈钢箔基材,其中所述无机 - 有机杂化膜包括由无机 - 三维 主要包含硅氧烷键的网状结构,骨架的至少一个交联氧被有机基团和/或氢原子代替; 以及包含多个无机 - 有机杂化膜的不锈钢箔的无机 - 有机复合薄膜包衣的不锈钢箔,其各自主要包含硅氧烷键,其中构成每个无机 - 有机混合薄膜的Si的至少一部分为 化学键合到有机基团和氢中的一个或两个,条件是多个无机 - 有机杂化膜中的最上层可以是无机SiO 2膜,并且多个无机 - 有机杂化膜的相邻膜(包括 无机SiO 2膜)的组成不同。
    • 8. 发明申请
    • COATING SOLUTION FOR FORMING FLAT-SURFACE INSULATING FILM, FLAT-SURFACE INSULATING FILM-COATED SUBSTRATE, AND PRODUCTION METHOD OF A FLAT-SURFACE INSULATING FILM-COATED SUBSTRATE
    • 用于形成平坦表面绝缘膜,平坦表面绝缘膜包覆基材的涂料溶液和平面表面绝缘膜包覆基材的生产方法
    • US20100048788A1
    • 2010-02-25
    • US12450646
    • 2008-03-25
    • Toyoshi OguraNoriko YamadaYuji Kubo
    • Toyoshi OguraNoriko YamadaYuji Kubo
    • C08K5/057B05D3/02
    • H01L21/3122C09D183/04H01B3/46H01L21/02126H01L21/02216H01L21/02282Y10T428/31663C08K3/22
    • A coating solution for forming a flat-surface insulating film, which is a coating solution obtained by dissolving a poly(diorgano)siloxane A having a mass average molecular weight of 900 to 10,000 and a metal alkoxide B in an organic solvent C and further adding water, wherein the molar ratio A/B of the poly(diorgano)siloxane A to 1 mol of the metal alkoxide B is from 0.05 to 1.5, the organic solvent C has a hydroxyl group, the solubility of water in 100 g of the organic solvent C is from 3 to 20 g, and the molar ratio C/A of the organic solvent C to 1 mol of the poly(diorgano)siloxane A is from 0.05 to 100. This coating solution for forming a flat-surface insulating film ensures that an organic modified silicate composed of a poly(diorgano)siloxane and a metal alkoxide can be formed as a thick film having 1 μm or more and can be an organic modified silicate insulating film causing no irregularities due to phase separation and having a low Young's modulus and flexibility high enough to follow the deformation of a substrate board, as well as high film surface flatness allowing for mounting of microcomponents of an electronic device or the like.
    • 一种用于形成平面绝缘膜的涂布溶液,其是通过将质均分子量为900〜10,000的聚(二有机基)硅氧烷A和金属醇盐B溶解在有机溶剂C中而得到的涂布溶液,并进一步添加 水,其中聚(二有机基)硅氧烷A与1mol金属醇盐B的摩尔比A / B为0.05至1.5,有机溶剂C具有羟基,水在100g有机溶剂中的溶解度 溶剂C为3〜20g,有机溶剂C与1mol聚(二有机基)硅氧烷A的摩尔比C / A为0.05〜100。这种用于形成平面绝缘膜的涂布液确保 可以形成由聚(二有机基)硅氧烷和金属醇盐构成的有机改性硅酸盐作为1μm以上的厚膜,并且可以是由于相分离而不引起由于相分离引起的不规则性并且具有低杨氏值的有机改性硅酸盐绝缘膜 模量和柔度足够高t o遵循基板的变形,以及允许安装电子设备等的微元件的高膜表面平坦度。