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1. 发明申请

US20120006788A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME 有权
标题翻译：化学放大抗蚀剂组合物，以及使用其的模具制备方法和耐蚀膜
公开(公告)号：US20120006788A1
公开(公告)日：2012-01-12
申请号：US13256397
申请日：2010-06-23
申请人： Toru Fujimori , Koji Shirakawa , Toshihiro USA , Kenji Sugiyama , Takayuki Ito , Hideaki Tsubaki , Katsuhiro Nishimaki , Shuji Hirano , Hidenori Takahashi
发明人： Toru Fujimori , Koji Shirakawa , Toshihiro USA , Kenji Sugiyama , Takayuki Ito , Hideaki Tsubaki , Katsuhiro Nishimaki , Shuji Hirano , Hidenori Takahashi
IPC分类号： C23F1/02 , G03F7/004 , C08F228/02 , C08F216/02
CPC分类号： C08F20/50 , B29C33/38 , B29C2033/426 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.
摘要翻译：提供了用于制备模具的化学增幅抗蚀剂组合物，以及使用该组合物的模具制备方法和抗蚀剂膜。

2. 发明申请

US20100237262A1 ELECTRON BEAM WRITING METHOD AND APPARATUS 审中-公开
标题翻译：电子束写入方法和装置
公开(公告)号：US20100237262A1
公开(公告)日：2010-09-23
申请号：US12724856
申请日：2010-03-16
申请人： Toshihiro USA , Kenji SUGIYAMA
发明人： Toshihiro USA , Kenji SUGIYAMA
IPC分类号： G21K5/00
CPC分类号： G11B5/855 , B82Y10/00 , B82Y40/00 , H01J37/3023 , H01J37/3174
摘要： When performing pattern writing by emitting an electron beam, a fixed frequency component, which is a component of a variation in an encoder signal from the encoder in one rotation of the rotation stage that commonly appears in a plurality of different rotational speeds of the rotation stage, is compensated for by deflection correcting the electron beam in a circumferential direction, and a variable frequency component, which is a component of the variation in the encoder signal other than the fixed frequency component, is compensated for by changing the clock frequency of a write clock.
摘要翻译：当通过发射电子束执行图案写入时，固定频率分量是作为编码器信号的变化的一部分的编码器信号的一部分，所述编码器信号来自编码器，所述编码器信号在所述旋转平台的一次旋转中，所述编码器信号通常以旋转台通过在圆周方向校正电子束的偏转进行补偿，并且通过改变写入的时钟频率来补偿作为除了固定频率分量之外的编码器信号的变化的分量的可变频率分量时钟。

3. 发明申请

US20090230328A1 ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM 有权
标题翻译：电子束写入方法，精细图案写入系统，制造未加载图案的基板的方法以及制造磁盘介质的方法
公开(公告)号：US20090230328A1
公开(公告)日：2009-09-17
申请号：US12401775
申请日：2009-03-11
申请人： Kazunori KOMATSU , Toshihiro USA
发明人： Kazunori KOMATSU , Toshihiro USA
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： When writing element shapes of a fine pattern on a substrate applied with a resist by scanning an electron beam thereon, ON/OFF control is performed for emitting the electron beam at a predetermined rotational position of the substrate by a blanking-OFF signal, performing writing in a rotational direction of the substrate along with the rotation of the substrate, and terminating the writing by a blanking-ON signal based on write data to perform writing for one round, and repeating the writing based on the ON/OFF control by moving the electron beam or substrate in a radial direction of the substrate and rotation control is performed for controlling the rotation speed of the rotation stage so as to be increased for inner track writing and decreased for outer track writing inversely proportional to the radius of the writing position.
摘要翻译：当通过扫描电子束在其上施加抗蚀剂的基板上写入精细图案的元件形状时，执行ON / OFF控制，以通过消隐OFF信号在基板的预定旋转位置处发射电子束，执行写入沿着基板的旋转沿着基板的旋转方向，并且基于写入数据通过消隐导通信号终止写入，以执行一周的写入，并且基于ON / OFF控制重复写入，通过移动执行基板的径向的电子束或基板，并进行旋转控制，以控制旋转台的旋转速度，以便增加内部磁迹的写入，并减小与记录位置的半径成反比的外部磁迹的写入。

4. 发明申请

US20100149673A1 METHOD FOR TESTNG MOLD STRUCTURE, MOLD STRUCTURE, AND MAGNETIC RECORDING MEDIUM 审中-公开
标题翻译：测试模具结构，模具结构和磁记录介质的方法
公开(公告)号：US20100149673A1
公开(公告)日：2010-06-17
申请号：US12636145
申请日：2009-12-11
申请人： Kenji ICHIKAWA , Atsushi TATSUGAWA , Toshihiro USA
发明人： Kenji ICHIKAWA , Atsushi TATSUGAWA , Toshihiro USA
IPC分类号： G11B27/36
CPC分类号： G11B27/36 , G11B5/855 , G11B2220/2516
摘要： A method for testing a mold structure including magnetically transferring a magnetic signal according to a concavo-convex pattern for a servo area in a mold structure to a perpendicular magnetic recording medium; electrically reproducing ≧50 tracks of the magnetic signal of servo data transferred onto the perpendicular magnetic recording medium using a magnetic head to obtain a reproduction signal; and calculating a pattern drawing accuracy radially from the reproduction signal to evaluate a performance of the mold structure including a disc-shaped base material; and the concavo-convex pattern for the servo area and a concavo-convex pattern for a data area formed on a base material surface following a desired design pattern. The concavo-convex patterns for the servo area are aligned in the radial direction of the base material, and the concavo-convex pattern for the data area are aligned in the circumferential direction between the concavo-convex patterns for the servo area.
摘要翻译：一种用于测试模具结构的方法，包括根据用于模具结构中的伺服区域的垂直磁记录介质的凹凸图案磁转移磁信号; 使用磁头电磁再现传送到垂直磁记录介质上的伺服数据的磁信号的50个磁道，以获得再现信号; 并从再现信号径向计算图形绘制精度，以评估包括盘形基材的模具结构的性能; 以及用于伺服区域的凹凸图案和在所需设计图案之后形成在基材表面上的数据区域的凹凸图案。伺服区域的凹凸图案在基材的径向上排列，数据区域的凹凸图案在伺服区域的凹凸图案之间的圆周方向上排列。

5. 发明申请

US20090194711A1 ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM 失效
标题翻译：电子束写入方法，精细图案写入系统，制造未加载图案的基板的方法以及制造磁盘介质的方法
公开(公告)号：US20090194711A1
公开(公告)日：2009-08-06
申请号：US12364838
申请日：2009-02-03
申请人： Toshihiro USA , Kazunori Komatsu
发明人： Toshihiro USA , Kazunori Komatsu
IPC分类号： A61N5/00 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/20214 , H01J2237/24578 , H01J2237/30 , H01J2237/3045
摘要： When writing a hard disk pattern on a substrate applied with a resist by scanning an electron beam on the substrate while rotating a rotation stage, writing is started with respect to each radial direction position of each area based on a predetermined encoder pulse for each radial direction position among those generated according to the rotational angle of the rotation stage that occurs after a predefined encoder pulse that occurs ahead in a rotational direction of a radial direction position whose write start position in a circumferential direction in each area arrives first at the writing position as the rotation stage rotates and ahead of the write start position in the circumferential direction with respect to each radial direction position, and after a predetermined time from the predetermined encoder pulse.
摘要翻译：当通过在转动旋转台的同时扫描基板上的电子束来在施加有抗蚀剂的基板上写入硬盘图案时，基于每个半径方向的预定的编码器脉冲相对于每个区域的每个径向位置开始写入在根据旋转台的旋转角度产生的位置之间发生的位置之间发生的预定的编码器脉冲之后发生的预定的编码器脉冲，其沿着在每个区域的圆周方向上的写入开始位置首先到达写入位置的径向位置的旋转方向的旋转方向上发生，旋转台相对于每个径向位置在周向方向上旋转并在写入开始位置之前，并且在从预定编码器脉冲起的预定时间之后旋转。

6. 发明申请

US20090123870A1 METHOD OF AND SYSTEM FOR ELECTON BEAM LITHOGRAPHY OF MICRO-PATTERN AND DISC SUBSTRATE HAVING MICRO-PATTERN TO BE TRANSFERRED 审中-公开
标题翻译：具有要转移的微图案的微图案和盘基底的电子束光刻方法和系统
公开(公告)号：US20090123870A1
公开(公告)日：2009-05-14
申请号：US12269912
申请日：2008-11-13
申请人： Toshihiro USA , Kazunori Komatsu
发明人： Toshihiro USA , Kazunori Komatsu
IPC分类号： G03F7/20 , G11B5/82 , G21K5/04
CPC分类号： G11B5/82 , B82Y10/00 , B82Y40/00 , G11B5/5965 , G11B5/59688 , G11B5/743 , G11B9/10 , H01J37/3174 , H01J2237/20
摘要： An electron beam lithographic method and system for forming a micro-pattern, including servo patterns each of which comprises a plurality of recessed servo elements in a track and groove patterns each of which comprises an inter-track groove extending along the track and to be formed on a discrete track medium, on the a resist coated disc substrate by scanning the resist-coated surface with an electron beam during rotation of the disc substrate. A sequential process of the electron beam lithography comprises the steps of forming the servo elements as an latent image in the resist-coated surface with an electron beam having an irradiation spot diameter smaller than a width of the servo element during rotation of the disc substrate and, subsequently, forming the inter-track grooves in a latent image in the resist-coated surface by intermittently scanning the resist-coated surface in a direction perpendicular to a track direction at regular intervals during rotation of the disc substrate so as thereby to form a continuous row of groove elements into which the inter-track groove is divided.
摘要翻译：一种用于形成微图案的电子束光刻方法和系统，包括伺服图案，每个伺服图案包括轨道和凹槽图案中的多个凹陷的伺服元件，每个凹槽的伺服元件包括沿着轨道延伸并形成的轨道间槽在离散的轨道介质上，通过在盘基片旋转期间用电子束扫描抗蚀剂涂覆的表面，在抗蚀剂涂覆的盘基片上。电子束光刻的顺序过程包括以下步骤：在光刻胶涂覆表面中形成具有照射光点直径小于光盘基片旋转期间的光阑直径的电子束的潜像的伺服元件，以及随后，通过在盘基板的旋转期间以规则的间隔在垂直于轨道方向的方向间歇地扫描抗蚀剂涂覆表面，在抗蚀剂涂覆的表面中形成潜像中的轨道间凹槽，从而形成连续排的槽元件，分隔槽间槽。

7. 发明申请

US20080054188A1 ELECTRON BEAM LITHOGRAPHY APPARATUS AND METHOD FOR COMPENSATING FOR ELECTRON BEAM MISALIGNMENT 有权
标题翻译：电子束光刻设备和电子束误差补偿方法
公开(公告)号：US20080054188A1
公开(公告)日：2008-03-06
申请号：US11851188
申请日：2007-09-06
申请人： Toshihiro USA , Kazunori Komatsu
发明人： Toshihiro USA , Kazunori Komatsu
IPC分类号： H01J3/14
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/1472 , H01J37/3045 , H01J37/3174 , H01J2237/30461 , Y10S430/143
摘要： Linear movement direction of the stage and the actual deflection direction of the electron beam deflected by the first command signal for deflecting the electron beam in the linear movement direction of the stage do not necessarily align with each other for reasons such as the disposition precision of the stage driving device, a lens system, and the deflecting device. Therefore, the first command signal output from the first command device is processed based on the angle between the linear movement direction of the stage driven by the stage driving device and the deflection direction of the electron beam deflected by the first command signal so that the deflection direction of the electron beam aligns with the linear movement direction of the stage. With this processed first command signal, the deflection direction of the electron beam can be changed (rotated) to align with the linear movement direction of the stage.
摘要翻译：由于第一命令信号偏转的电子束的线性运动方向和用于使电子束沿着平台的线性移动方向偏转的实际偏转方向，不一定对准，原因如舞台驱动装置，透镜系统和偏转装置。因此，从第一指令装置输出的第一命令信号基于由载物台驱动装置驱动的载物台的线性移动方向与由第一命令信号偏转的电子束的偏转方向之间的角度被处理，使得偏转电子束的方向与载物台的线性运动方向对齐。利用该处理的第一命令信号，可以改变（旋转）电子束的偏转方向以与平台的线性移动方向对齐。

8. 发明申请

US20110053088A1 ELECTRON BEAM LITHOGRAPHY METHOD AND METHOD FOR PRODUCING A MOLD 审中-公开
标题翻译：电子束光刻方法及其制造方法
公开(公告)号：US20110053088A1
公开(公告)日：2011-03-03
申请号：US12868215
申请日：2010-08-25
申请人： Toshihiro USA , Satoshi CHAI , Ikuo TAKANO
发明人： Toshihiro USA , Satoshi CHAI , Ikuo TAKANO
IPC分类号： G03F7/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017 , H01J2237/30477 , H01J2237/3175
摘要： Fine patterns to be formed on recording media such as DTM or BPM are drawn onto a mold original plate, on which resist is coated, by scanning an electron beam with an electron beam lithography apparatus. At this time, at least two types of patterns from among a group of: first patterns of protrusions and recesses constituted by media servo patterns and group patterns among data tracks; second patterns of protrusions and recesses constituted by annular positioning marks formed along the circumference of the mold as annular patterns and product identifying marks for tracing products; and third patterns of protrusions and recesses constituted by point like orientation marks used during transfer from the mold to the recording media are continuously drawn onto a single mold original plate within a single vacuum chamber by electron beam lithography.
摘要翻译：在诸如DTM或BPM的记录介质上形成的精细图案通过用电子束光刻设备扫描电子束被绘制在其上涂覆抗蚀剂的模具原版上。此时，由一组由介质伺服模式构成的突起和凹槽的第一图案和数据轨道中的组图案之间的至少两种图案; 由沿着模具圆周形成的环形定位标记构成的突出和凹陷的第二图案为环形图案和用于跟踪产品的产品识别标记; 并且通过电子束光刻在单个真空室内将单个模具原版板连续地拉伸到在从模具转移到记录介质期间使用的点状取向标记构成的突起和凹槽的第三图案。

9. 发明申请

US20090212230A1 ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM 失效
标题翻译：电子束写入方法，精细图案写入系统，制造未加载图案的基板的方法以及制造磁盘介质的方法
公开(公告)号：US20090212230A1
公开(公告)日：2009-08-27
申请号：US12393117
申请日：2009-02-26
申请人： Toshihiro USA , Kazunori Komatsu
发明人： Toshihiro USA , Kazunori Komatsu
IPC分类号： H01J3/14 , G12B21/00
CPC分类号： G11B5/855 , B82Y10/00 , B82Y25/00 , B82Y30/00 , G11B5/743 , G11B5/82 , G11B5/865 , G11B9/10 , Y10S430/143
摘要： When performing writing on a substrate applied with a resist by rapidly vibrating electron beam in a direction orthogonal to a radial direction of the substrate and X-Y deflecting the electron beam while rotating the substrate in one direction, a long element is written by scanning the electron beam with the middle position of a 2-bit signal length as the center position of the electron beam so as to completely fill the area of the writing length reduced by a predetermined ratio and an unwritten portion of predetermined width remaining on each side of the long element with respect to a final 2-bit signal length on a magnetic disk medium.
摘要翻译：当通过在与基板的径向正交的方向上快速振动电子束在施加有抗蚀剂的基板上进行写入时，并且在使基板沿一个方向旋转的同时XY偏转电子束，通过扫描电子束来写入长元件以2位信号长度的中间位置作为电子束的中心位置，以便完全填充以预定比率减小的写入长度的区域，并且在长元件的每一侧残留预定宽度的未写入部分相对于磁盘介质上最后的2位信号长度。

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