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1. 发明授权

US5577171A Figure pattern generating apparatus for detecting pattern defects 失效
标题翻译：用于检测图案缺陷的图形生成装置
公开(公告)号：US5577171A
公开(公告)日：1996-11-19
申请号：US25317
申请日：1993-03-02
申请人： Tooru Arai , Toshiyuki Watanabe , Hideo Tsuchiya
发明人： Tooru Arai , Toshiyuki Watanabe , Hideo Tsuchiya
IPC分类号： G01N21/956 , G06K15/00
CPC分类号： G01N21/95607
摘要： There is provided a pattern generating apparatus in which a figure analyzer analyzes cell data relating to an input figure, figure unfolding sections unfold each basic figure into a figure pattern, the figure unfolding sections are connected in series with pattern memories, the figure unfolding sections and pattern memories are connected in a parallel form to a distribution controller which effects the control operation to cause the figure unfolding sections to effect the unfolding processes for each basic figure unit or each unit obtained by dividing an excessively large figure exceeding a preset threshold value into preset areas, and a readout section having a logical sum circuit for combining partial figure patterns of respective areas from the pattern memories into a single figure pattern outputs the pattern as an output in synchronism with scanning of the input figure.
摘要翻译：提供了一种图形生成装置，其中图形分析器分析与输入图形相关的单元数据，图形展开部分将每个基本图形展开成图形图案，图形展开部分与图案存储器串联连接，图形展开部分和图案存储器以并行形式连接到分配控制器，分配控制器执行控制操作以使图形展开部分对每个基本图形单元或通过将超过预设阈值的过大的图划分为预设的单位获得的每个单位进行展开处理区域和具有逻辑和电路的读出部分，用于将来自图案存储器的各个区域的部分图形图案组合为单个图形模式，与输入图形的扫描同步地输出该图案作为输出。

2. 发明申请

US20080166054A1 PATTERN INSPECTION APPARATUS 有权
标题翻译：图案检查装置
公开(公告)号：US20080166054A1
公开(公告)日：2008-07-10
申请号：US12040541
申请日：2008-02-29
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/46
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译：图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合，芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域，对比方法。

3. 发明授权

US5960106A Sample inspection apparatus and sample inspection method 失效
标题翻译：样品检验仪器和样品检验方法
公开(公告)号：US5960106A
公开(公告)日：1999-09-28
申请号：US413704
申请日：1995-03-30
申请人： Hideo Tsuchiya , Toru Tojo , Mitsuo Tabata , Toshiyuki Watanabe , Eiichi Kobayashi
发明人： Hideo Tsuchiya , Toru Tojo , Mitsuo Tabata , Toshiyuki Watanabe , Eiichi Kobayashi
IPC分类号： G01N21/88 , G01N21/93 , G01N21/956 , G03F1/84 , G06T1/00 , G06T7/00 , H01L21/027 , G06K9/00
CPC分类号： G06T7/0006 , G06T2207/30148
摘要： In a method of inspecting a sample on which a pattern relating to fabrication of a semiconductor device is formed, there are provided a light radiation unit, an acquiring unit, a storage unit, a template, a calculation unit, a correction unit, a defect detection unit and an output unit. Pinhole shape data to be detected of the pattern is stored in the template. The calculation unit calculates the degree of coincidence between the pinhole shape data stored in the template and the measured image data stored in the storage unit in units of a predetermined amount of data. The correction unit corrects a portion of the measured image data corresponding to a value of the degree of coincidence exceeding a second predetermined value in units of the predetermined amount of data, when the degree of coincidence obtained by the calculation unit has exceeded a first predetermined value, thereby correcting the portion of the measured image data including the detected pinhole. The defect detection unit detects a defect in the pattern on the basis of the corrected measured image data portion including the pinhole, which is obtained by the correcting unit, and the measured image data.
摘要翻译：在形成有与半导体器件的制造有关的图案的样品的检查方法中，设置有光照单元，获取单元，存储单元，模板，计算单元，校正单元，缺陷检测单元和输出单元。要检测的图案的针孔形状数据存储在模板中。计算单元以预定量的数据为单位计算存储在模板中的针孔形状数据与存储在存储单元中的测量图像数据之间的一致度。当由计算单元获得的一致度已经超过第一预定值时，校正单元以与预定数据量为单位对应的符合度超过第二预定值的值的部分测量图像数据进行校正从而校正包括检测到的针孔的测量图像数据的部分。缺陷检测单元基于由校正单元获得的包括针孔的校正的测量图像数据部分和测量的图像数据来检测图案中的缺陷。

4. 发明授权

US5744381A Method of inspecting a pattern formed on a sample for a defect, and an apparatus thereof 失效
标题翻译：检查形成在缺陷的样品上的图案的方法及其装置
公开(公告)号：US5744381A
公开(公告)日：1998-04-28
申请号：US614063
申请日：1996-03-12
申请人： Mitsuo Tabata , Toru Tojo , Toshiyuki Watanabe , Hideo Tsuchiya
发明人： Mitsuo Tabata , Toru Tojo , Toshiyuki Watanabe , Hideo Tsuchiya
IPC分类号： G01N21/956 , G03F1/84 , H01L21/66 , G01R31/26 , G01N21/00 , G03F9/00
CPC分类号： G03F1/84 , G01N21/95607 , H01L22/12
摘要： A pattern defect inspection apparatus comprises a light irradiating portion, a light receive element, a light receive element amplifier, a preparation portion for preparing multi-valued design pattern image data, an offset adjusting portion, a gain adjusting portion, and an inspecting portion. The offset adjusting portion adjusts the offset of the light receive element amplifier such that measurement data of a translucent portion of a pattern on a sample surface corresponds to design pattern image data corresponding to the translucent portion, regarding the translucent portion as a non-transparent portion. The gain adjusting portion adjusts the gain of the light receive element amplifier such that measurement data of a transparent portion of the pattern on the sample surface corresponds to design pattern image data corresponding to the transparent portion.
摘要翻译：图案缺陷检查装置包括光照射部分，光接收元件，光接收元件放大器，用于制备多值设计图案图像数据的准备部分，偏移调整部分，增益调节部分和检查部分。偏移调整部分调节光接收元件放大器的偏移，使得样本表面上的图案的透光部分的测量数据对应于与半透明部分对应的设计图案图像数据，关于作为不透明部分的半透明部分。增益调整部分调节光接收元件放大器的增益，使得样品表面上的图案的透明部分的测量数据对应于对应于透明部分的设计图案图像数据。

5. 发明授权

US07551767B2 Pattern inspection apparatus 有权
标题翻译：图案检验仪
公开(公告)号：US07551767B2
公开(公告)日：2009-06-23
申请号：US12040541
申请日：2008-02-29
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译：图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合，芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动地取出模具数据的检查区域，对比方法。

6. 发明授权

US07209584B2 Pattern inspection apparatus 失效
标题翻译：图案检验仪
公开(公告)号：US07209584B2
公开(公告)日：2007-04-24
申请号：US11079338
申请日：2005-03-15
申请人： Hideo Tsuchiya , Shinji Sugihara , Kyoji Yamashita , Toshiyuki Watanabe , Kazuhiro Nakashima
发明人： Hideo Tsuchiya , Shinji Sugihara , Kyoji Yamashita , Toshiyuki Watanabe , Kazuhiro Nakashima
IPC分类号： G06F17/50 , G06F9/00
CPC分类号： G03F1/26 , G03F1/84 , G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus determines a difference of the measured dislocation of respective alignment marks of an opaque pattern and a phase shifting pattern (measurement difference), in addition to a difference between the both alignment mark positions in design (design difference). A difference between the measurement difference and the design difference is set as a difference in alignment mark position between the opaque pattern and the phase shifting pattern in a reference pattern which is later used in inspection. In this manner, by correcting one pattern data with respect to the other pattern data in the reference pattern, the displacement generated in the both patterns can be reflected, and the reference pattern data regarding an image of a sample which is actually observed can be created.
摘要翻译：除了设计中的两个对准标记位置（设计差异）之外，图案检查装置还确定不透明图案的各个对准标记的测量位错与相移图案（测量差异）之间的差异。测量差异和设计差异之间的差异被设置为稍后在检查中使用的参考图案中的不透明图案和相移图案之间的对准标记位置的差异。以这种方式，通过相对于参考图案中的其他图案数据校正一个图案数据，可以反映两种图案中产生的位移，并且可以创建关于实际观察到的样本的图像的参考图案数据。

7. 发明授权

US06883160B2 Pattern inspection apparatus 失效
标题翻译：图案检验仪
公开(公告)号：US06883160B2
公开(公告)日：2005-04-19
申请号：US10252718
申请日：2002-09-24
申请人： Hideo Tsuchiya , Shinji Sugihara , Kyoji Yamashita , Toshiyuki Watanabe , Kazuhiro Nakashima
发明人： Hideo Tsuchiya , Shinji Sugihara , Kyoji Yamashita , Toshiyuki Watanabe , Kazuhiro Nakashima
IPC分类号： G01B11/00 , G01B11/24 , G01N21/956 , G03F1/84 , G06T7/00 , G06F17/50
CPC分类号： G03F1/26 , G03F1/84 , G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus determines a difference of the measured dislocation of respective alignment marks of an opaque pattern and a phase shifting pattern (measurement difference), in addition to a difference between the both alignment mark positions in design (design difference). A difference between the measurement difference and the design difference is set as a difference in alignment mark position between the opaque pattern and the phase shifting pattern in a reference pattern which is later used in inspection. In this manner, by correcting one pattern data with respect to the other pattern data in the reference pattern, the displacement generated in the both patterns can be reflected, and the reference pattern data regarding an image of a sample which is actually observed can be created.
摘要翻译：除了设计中的两个对准标记位置（设计差异）之外，图案检查装置还确定不透明图案的各个对准标记的测量位错与相移图案（测量差异）之间的差异。测量差异和设计差异之间的差异被设置为稍后在检查中使用的参考图案中的不透明图案和相移图案之间的对准标记位置的差异。以这种方式，通过相对于参考图案中的其他图案数据校正一个图案数据，可以反映两种图案中产生的位移，并且可以创建关于实际观察到的样本的图像的参考图案数据。

8. 发明授权

US5475766A Pattern inspection apparatus with corner rounding of reference pattern data 失效
标题翻译：带有参考图形数据的四舍五入的图案检查装置
公开(公告)号：US5475766A
公开(公告)日：1995-12-12
申请号：US941197
申请日：1992-09-04
申请人： Hideo Tsuchiya , Toshiyuki Watanabe , Masao Takanashi , Masayuki Hideshima
发明人： Hideo Tsuchiya , Toshiyuki Watanabe , Masao Takanashi , Masayuki Hideshima
IPC分类号： G01N21/88 , G01N21/956 , G06T7/00 , G06K9/00 , G06T5/00
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/95607 , G06T2207/30121 , G06T2207/30148
摘要： A pattern inspection apparatus for comparing/collating a test target pattern with a corresponding design pattern to detect the presence/absence of a defect which is present in the test target pattern includes a bit pattern generating circuit for developing the data of the design pattern into bits, a corner pattern detector for scanning a corner pattern detection window having a predetermined range with respect to reference pattern data as a reference of a pattern obtained by bit development performed by the bit pattern generating circuit to extract a contour pattern, and detecting a corner pattern to be subjected to corner rounding processing on the basis of the extracted contour pattern, a memory for storing predetermined change information corresponding to the corner detected by the corner pattern detector, a graphic pattern synthesizing circuit for changing a graphic pattern in accordance with the information in the memory, and a comparing circuit for comparing reference pattern data, obtained by rounding processing performed on the basis of the reference pattern data and the feature of the corresponding pattern, with test pattern data obtained from the test target pattern, and further includes a pattern correcting circuit constituted by an excessive rounding detector for detecting and correcting an inadequate excessive rounding operation, and a pattern changing circuit for changing the pattern data in accordance with the excessive rounding detection result.
摘要翻译：用于将测试目标图案与相应的设计模式进行比较/整理以检测存在于测试目标图案中的缺陷的存在/不存在的图案检查装置包括位图形生成电路，用于将设计图案的数据显影为位，用于扫描具有相对于参考图案数据的预定范围的角图案检测窗口的拐角图案检测器，作为通过位图案生成电路进行的位展开而获得的图案的参考，以提取轮廓图案，以及检测拐角图案基于所提取的轮廓图案进行转角加工处理;存储器，用于存储与由拐角图案检测器检测到的拐角对应的预定变化信息;图形图形合成电路，用于根据所述轮廓图案中的信息改变图形; 存储器和用于比较参考图案数据的比较电路 a，通过根据参考图案数据和相应图案的特征进行舍入处理获得的测试图案数据从测试对象图案获得，并且还包括图案校正电路，其由过度舍入检测器构成，用于检测和校正不适当的过度舍入操作，以及用于根据过度舍入检测结果改变模式数据的模式改变电路。

9. 发明授权

US5379348A Pattern defects inspection system 失效
标题翻译：图案缺陷检查系统
公开(公告)号：US5379348A
公开(公告)日：1995-01-03
申请号：US40852
申请日：1993-03-31
申请人： Toshiyuki Watanabe , Hideo Tsuchiya , Toru Tojo , Tomohide Watanabe
发明人： Toshiyuki Watanabe , Hideo Tsuchiya , Toru Tojo , Tomohide Watanabe
IPC分类号： G01B11/24 , G01N21/88 , G01N21/93 , G01N21/956 , G03F1/26 , G03F1/29 , G03F1/30 , G03F1/32 , G03F1/34 , G03F1/84 , G06T7/00 , H01L21/027 , H01L21/66 , G06K9/00 , G01N21/00 , H04N7/00
CPC分类号： G06T7/001 , G01N21/956 , G06T2207/10056 , G06T2207/30148 , H01L22/12 , H01L2924/0002
摘要： A pattern defects inspection system inspects the presence/absence of pattern defects in a photomask as an object to be inspected in which a chromium pattern and a phase shift pattern are formed together. Measurement data output from a sensor circuit for generating measurement pattern data by inspecting measurement patterns corresponding to two types of patterns formed on the object by radiating light on the object, and two identifiable design data stored in a magnetic disk unit in advance, i.e., chromium pattern design data used to form a chromium pattern and phase shift pattern design data used to form a phase shift pattern, are read out by a bit pattern generator for performing development processing. The two types of bit data obtained by the bit pattern generator are synthesized according to the same coordinate definition. The synthesized design data is compared with the measurement data by a comparator. As a result, the presence/absence of pattern defects in the object can be determined.
摘要翻译：图案缺陷检查系统检查作为要检查的对象的光掩模中是否存在图案缺陷，其中形成铬图案和相移图案。从传感器电路输出的测量数据，用于通过在物体上照射光来检查与形成在物体上的两种图案相对应的测量图案，以及预先存储在磁盘单元中的两个可识别的设计数据来产生测量图案数据，即铬用于形成铬图案的图案设计数据和用于形成相移图案的相移图案设计数据由用于进行显影处理的位图发生器读出。根据相同的坐标定义来合成由位图生成器获得的两种位数据。将合成的设计数据与比较器的测量数据进行比较。结果，可以确定对象中的图案缺陷的存在/不存在。

10. 发明授权

US08355044B2 Reticle defect inspection apparatus and reticle defect inspection method 有权
标题翻译：光罩缺陷检查装置和掩模版缺陷检查方法
公开(公告)号：US08355044B2
公开(公告)日：2013-01-15
申请号：US12432182
申请日：2009-04-29
申请人： Hideo Tsuchiya , Toshiyuki Watanabe
发明人： Hideo Tsuchiya , Toshiyuki Watanabe
IPC分类号： H04N9/47
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676
摘要： The present invention provides a reticle defect inspection method and a reticle defect inspection apparatus capable of calibrating the offset and gain of a sensor amplifier using a product reticle even though black and white regions each sufficiently wider than a TDI sensor imaging area do not exist in the product reticle. An output of each pixel of the TDI sensor is amplified by the sensor amplifier. A bottom value of the amplified amount-of-light signal of each pixel is stored by bottom value storing means of offset/gain calibrating means, and a peak value thereof is stored by peak value storing means. The offset of each pixel is calculated by offset calculating means based on the bottom value of each pixel. The gain of each pixel is calculated by gain calculating means based on the offset of each pixel and the peak value of each pixel. The calculated offset and gain of each pixel are stored in a register and thereby the offset and gain of the sensor amplifier are calibrated.
摘要翻译：本发明提供了一种掩模版缺陷检查方法和掩模版缺陷检查装置，其能够使用产品掩模版来校准传感器放大器的偏移和增益，即使在TDI传感器成像区域中的每个都足够宽的黑色和白色区域不存在于产品掩模版。 TDI传感器的每个像素的输出由传感器放大器放大。每个像素的放大光量信号的底值由偏移/增益校准装置的底值存储装置存储，其峰值由峰值存储装置存储。通过基于每个像素的底部值的偏移计算装置来计算每个像素的偏移。基于每个像素的偏移和每个像素的峰值的增益计算装置计算每个像素的增益。每个像素的计算偏移和增益都存储在寄存器中，从而校准传感器放大器的偏移和增益。

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