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1. 发明授权

US08618568B2 Method for manufacturing light-emitting device and film formation substrate 有权
标题翻译：制造发光元件及成膜基板的方法
公开(公告)号：US08618568B2
公开(公告)日：2013-12-31
申请号：US13259378
申请日：2010-04-08
申请人： Tomoya Aoyama , Kohei Yokoyama , Rena Tsuruoka , Hideki Uchida , Toru Sonoda , Satoshi Inoue
发明人： Tomoya Aoyama , Kohei Yokoyama , Rena Tsuruoka , Hideki Uchida , Toru Sonoda , Satoshi Inoue
IPC分类号： H01L33/00
CPC分类号： H01L51/0013 , C23C14/048 , H01L51/56
摘要： In a method for manufacturing a light-emitting device according to an embodiment of the present invention, one surface of a first substrate including a reflective layer including an opening, a light absorption layer formed over the reflective layer to cover the opening in the reflective layer, a protective layer formed over the light absorption layer and including a groove at a position overlapped with the opening in the reflective layer, and a material layer formed over the protective layer and a deposition surface of a second substrate are disposed to face each other and light irradiation is performed from the other surface side of the first substrate, so that an EL layer is formed in a region on the deposition surface of the second substrate, which is overlapped with the opening in the reflective layer.
摘要翻译：在本发明的实施方式的发光装置的制造方法中，具有包括开口部的反射层的第一基板的一个面，形成在反射层上的光吸收层覆盖反射层的开口部形成在所述光吸收层上并且在与所述反射层中的所述开口重叠的位置处的凹槽以及形成在所述保护层上方的材料层和所述第二基板的沉积表面上的保护层设置成彼此面对，从第一基板的另一表面侧进行光照射，从而在第二基板的沉积表面上与反射层中的开口重叠的区域中形成EL层。

2. 发明申请

US20120012883A1 METHOD FOR MANUFACTURING LIGHT-EMITTING DEVICE AND FILM FORMATION SUBSTRATE 有权
标题翻译：用于制造发光器件和膜形成衬底的方法
公开(公告)号：US20120012883A1
公开(公告)日：2012-01-19
申请号：US13259378
申请日：2010-04-08
申请人： Tomoya Aoyama , Kohei Yakoyama , Rena Tsuruoka , Hideki Uchida , Toru Sonoda , Satoshi Inoue
发明人： Tomoya Aoyama , Kohei Yakoyama , Rena Tsuruoka , Hideki Uchida , Toru Sonoda , Satoshi Inoue
IPC分类号： H01L33/46 , H01L33/60
CPC分类号： H01L51/0013 , C23C14/048 , H01L51/56
摘要： In a method for manufacturing a light-emitting device according to an embodiment of the present invention, one surface of a first substrate including a reflective layer including an opening, a light absorption layer formed over the reflective layer to cover the opening in the reflective layer, a protective layer formed over the light absorption layer and including a groove at a position overlapped with the opening in the reflective layer, and a material layer formed over the protective layer and a deposition surface of a second substrate are disposed to face each other and light irradiation is performed from the other surface side of the first substrate, so that an EL layer is formed in a region on the deposition surface of the second substrate, which is overlapped with the opening in the reflective layer.
摘要翻译：在本发明的实施方式的发光装置的制造方法中，具有包括开口部的反射层的第一基板的一个面，形成在反射层上的光吸收层覆盖反射层的开口部形成在所述光吸收层上并且在与所述反射层中的所述开口重叠的位置处的凹槽以及形成在所述保护层上方的材料层和所述第二基板的沉积表面上的保护层设置成彼此面对，从第一基板的另一表面侧进行光照射，从而在第二基板的沉积表面上与反射层中的开口重叠的区域中形成EL层。

3. 发明授权

US08900675B2 Deposition method and method for manufacturing deposition substrate 有权
标题翻译：用于制造沉积基板的沉积方法和方法
公开(公告)号：US08900675B2
公开(公告)日：2014-12-02
申请号：US13635227
申请日：2011-02-28
申请人： Takahiro Ibe , Tomoya Aoyama , Rena Tsuruoka , Satoshi Inoue , Tohru Sonoda
发明人： Takahiro Ibe , Tomoya Aoyama , Rena Tsuruoka , Satoshi Inoue , Tohru Sonoda
IPC分类号： B05D3/06 , H01L51/56 , C23C14/12 , C23C14/28 , H05B33/10 , H01L51/00 , C23C14/56 , H01L51/50
CPC分类号： H05B33/10 , C23C14/048 , C23C14/12 , C23C14/28 , C23C14/564 , H01L51/0027 , H01L51/5012 , H01L51/56
摘要： One embodiment of the present invention is a deposition method for forming a layer 13a containing a deposition material on a deposition target surface of a second substrate, comprising the steps of forming an absorbing layer 12 over one surface of a first substrate 11; forming a material layer 13 containing the deposition material over the absorbing layer; performing first heat treatment on the material layer from the other surface of the first substrate to a temperature lower than the sublimation temperature of the deposition material so as to remove an impurity 14 in the material layer 13; disposing the one surface of the first substrate and the deposition target surface of the second substrate to face each other; and performing second heat treatment on the material layer from the other surface of the first substrate.
摘要翻译：本发明的一个实施方案是用于在第二基底的沉积靶表面上形成含有沉积材料的层13a的沉积方法，包括以下步骤：在第一基底11的一个表面上形成吸收层12; 在吸收层上形成含有沉积材料的材料层13; 在所述材料层上从所述第一基板的另一表面进行第一热处理至低于所述沉积材料的升华温度的温度，以除去所述材料层13中的杂质14; 将第一基板的一个表面和第二基板的沉积目标表面布置成彼此面对; 以及从所述第一基板的另一表面对所述材料层进行第二热处理。

4. 发明申请

US20130011943A1 Film Forming Method 有权
标题翻译：成膜方法
公开(公告)号：US20130011943A1
公开(公告)日：2013-01-10
申请号：US13635201
申请日：2011-02-28
申请人： Rena Tsuruoka , Hisao Ikeda , Takuya Tsurume , Tohru Sonoda , Satoshi Inoue
发明人： Rena Tsuruoka , Hisao Ikeda , Takuya Tsurume , Tohru Sonoda , Satoshi Inoue
IPC分类号： H01L33/02
CPC分类号： H01L51/0013 , C23C14/04 , C23C14/048 , H01L51/56
摘要： One embodiment of the present invention is a film forming method comprising: arranging a surface of a film formation substrate 10 including an absorption layer 12 on a first substrate 11 and a material layer 13 containing a film formation material and a surface of a film-formation target substrate 20 including a first layer 23 over a second substrate 22, so as to face each other; forming a second layer 13a containing the film formation material over the first layer 23 by performing first heat treatment on the material layer 13; and forming a third layer 13b containing the film formation material over the second layer 13a by performing second heat treatment on the material layer 13. In the second heat treatment, energy with a density higher than that in the first heat treatment is applied to the material layer.
摘要翻译：本发明的一个实施方案是一种成膜方法，其包括：将包含吸收层12的成膜基板10的表面布置在第一基板11和包含成膜材料的材料层13和膜形成表面目标基板20包括第二基板22上的第一层23，以便彼此面对; 通过对材料层13进行第一次热处理，在第一层23上形成含有成膜材料的第二层13a; 并在第二层13a上形成含有成膜材料的第三层13b，在材料层13上进行第二热处理。在第二热处理中，将密度高于第一热处理的能量施加到材料层。

5. 发明授权

US08951816B2 Film forming method 有权
标题翻译：成膜方法
公开(公告)号：US08951816B2
公开(公告)日：2015-02-10
申请号：US13635201
申请日：2011-02-28
申请人： Rena Tsuruoka , Hisao Ikeda , Takuya Tsurume , Tohru Sonoda , Satoshi Inoue
发明人： Rena Tsuruoka , Hisao Ikeda , Takuya Tsurume , Tohru Sonoda , Satoshi Inoue
IPC分类号： H01L21/00 , H01L51/00 , C23C14/04 , H01L51/56
CPC分类号： H01L51/0013 , C23C14/04 , C23C14/048 , H01L51/56
摘要： One embodiment of the present invention is a film forming method comprising: arranging a surface of a film formation substrate 10 including an absorption layer 12 on a first substrate 11 and a material layer 13 containing a film formation material and a surface of a film-formation target substrate 20 including a first layer 23 over a second substrate 22, so as to face each other; forming a second layer 13a containing the film formation material over the first layer 23 by performing first heat treatment on the material layer 13; and forming a third layer 13b containing the film formation material over the second layer 13a by performing second heat treatment on the material layer 13. In the second heat treatment, energy with a density higher than that in the first heat treatment is applied to the material layer.
摘要翻译：本发明的一个实施方案是一种成膜方法，其包括：将包含吸收层12的成膜基板10的表面布置在第一基板11和包含成膜材料的材料层13和膜形成表面目标基板20包括第二基板22上的第一层23，以便彼此面对; 通过对材料层13进行第一次热处理，在第一层23上形成含有成膜材料的第二层13a; 并在第二层13a上形成含有成膜材料的第三层13b，在材料层13上进行第二热处理。在第二热处理中，将密度高于第一热处理的能量施加到材料层。

6. 发明授权

US08486716B2 Method for detection of basic peptide and reagent for detection of basic peptide 有权
标题翻译：碱性肽检测方法及碱性肽检测试剂
公开(公告)号：US08486716B2
公开(公告)日：2013-07-16
申请号：US13491296
申请日：2012-06-07
申请人： Hiroyuki Kabata , Hideki Takahashi , Ikuro Maruyama , Rena Tsuruoka
发明人： Hiroyuki Kabata , Hideki Takahashi , Ikuro Maruyama , Rena Tsuruoka
IPC分类号： G01N33/52 , G01N33/53 , C07K14/77
CPC分类号： G01N33/74 , G01N21/82 , G01N33/536 , G01N33/6827 , G01N33/6872 , G01N33/86
摘要： The present invention provides a method for detection of a basic peptide by mixing a sample suspected to contain the basic peptide and a reagent containing denatured albumin and detecting turbidness due to a complex of the basic peptide and denatured albumin.
摘要翻译：本发明提供一种通过混合疑似含有碱性肽的样品和含有变性白蛋白的试剂并检测由于碱性肽和变性白蛋白的复合物而引起的混浊的检测碱性肽的方法。

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