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1. 发明授权

US07060324B2 Method of creating a dispersion of a liquid on a substrate 有权
标题翻译：在衬底上产生液体分散体的方法
公开(公告)号：US07060324B2
公开(公告)日：2006-06-13
申请号：US10755918
申请日：2004-01-13
申请人： Todd Bailey , Byung J. Choi , Matthew Colburn , Sidlgata V. Sreenivasan , C. Grant Willson , John Ekerdt
发明人： Todd Bailey , Byung J. Choi , Matthew Colburn , Sidlgata V. Sreenivasan , C. Grant Willson , John Ekerdt
IPC分类号： B05D1/32
CPC分类号： G11B5/855 , B29C35/0888 , B29C37/0053 , B29C43/003 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S977/887
摘要： The present invention includes a method of moving a liquid between a substrate extending in a first plane and a template extending in a second plane. More specifically, the method may include forming an oblique angle between the first plane and the second plane, reducing a distance between the substrate and the template such that the template is in contact with a portion of the liquid at a desired location, and creating a dispersion of the liquid away from the desired location.
摘要翻译：本发明包括一种在第一平面中延伸的基板和在第二平面中延伸的模板之间移动液体的方法。更具体地，该方法可以包括在第一平面和第二平面之间形成倾斜角度，减小基板和模板之间的距离，使得模板在期望位置与液体的一部分接触，并且产生液体离开所需位置分散。

2. 发明授权

US06954275B2 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography 失效
标题翻译：用于印刷光刻的透明模板和基板之间的高精度间隙和取向感测方法
公开(公告)号：US06954275B2
公开(公告)日：2005-10-11
申请号：US09920341
申请日：2001-08-01
申请人： Byung J. Choi , Matthew Colburn , S. V. Sreenivasan , C. Grant Willson , Todd Bailey , John Ekerdt
发明人： Byung J. Choi , Matthew Colburn , S. V. Sreenivasan , C. Grant Willson , Todd Bailey , John Ekerdt
IPC分类号： G01B11/14 , B29C31/04 , B29C35/08 , B29C43/02 , B29C59/02 , G03F7/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： B29C43/021 , B29C31/045 , B29C31/047 , B29C35/0888 , B29C43/003 , B29C59/022 , B29C2035/0827 , B29C2037/90 , B29C2043/025 , B29D11/0023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00
摘要： Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.
摘要翻译：描述了在压印光刻工艺中使用的模板和衬底之间的高精度间隙和取向测量方法。这里介绍的差距和方向测量方法包括使用宽带光基测量技术。

3. 发明授权

US06696220B2 Template for room temperature, low pressure micro-and nano-imprint lithography 有权
标题翻译：模板用于室温，低压微型和纳米压印光刻
公开(公告)号：US06696220B2
公开(公告)日：2004-02-24
申请号：US09976681
申请日：2001-10-12
申请人： Todd Bailey , Byung J. Choi , Matthew Colburn , S. V. Sreenivasan , C. Grant Willson , John Ekerdt
发明人： Todd Bailey , Byung J. Choi , Matthew Colburn , S. V. Sreenivasan , C. Grant Willson , John Ekerdt
IPC分类号： G03C176
CPC分类号： G11B5/855 , B29C35/0888 , B29C37/0053 , B29C43/003 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S977/887
摘要： Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder. The template holder may include a body with an opening configured to receive the template, a support plate, and at least one piezo actuator coupled to the body. The piezo actuator may be configured to alter a physical dimension of the template during use.
摘要翻译：描述了压印光刻模板，形成和使用模板的方法以及模板保持装置。压印光刻模板可以包括在主体的表面上具有多个凹部的主体。身体可以是对于激活光是基本上透明的材料。多个凹部的至少一部分可以限定具有小于约250nm的特征尺寸的特征。可以通过获得对于激活光而基本上透明并在模板的表面上形成多个或多个凹陷的材料来形成模板。在一些实施例中，模板还可以包括至少一个对准标记。在一些实施例中，模板还可以包括间隙感测区域。可以使用压印光刻模板来在设置在基板上的可光固化液体中形成印刷层。在使用期间，模板可以设置在模板保持器内。模板保持器可以包括具有构造成接收模板的开口的主体，支撑板和耦合到主体的至少一个压电致动器。压电致动器可以被配置为在使用期间改变模板的物理尺寸。

4. 发明申请

US20100173033A1 Device for Holding a Template for Use in Imprint Lithography 有权
标题翻译：用于压印光刻的模板的设备
公开(公告)号：US20100173033A1
公开(公告)日：2010-07-08
申请号：US12715915
申请日：2010-03-02
申请人： Todd Bailey , Byung J. Choi , Matthew Colburn , S. V. Sreenivasan , C. Grant Willson , John Ekerdt
发明人： Todd Bailey , Byung J. Choi , Matthew Colburn , S. V. Sreenivasan , C. Grant Willson , John Ekerdt
IPC分类号： B29C59/02 , B29C35/08
CPC分类号： G11B5/855 , B29C35/0888 , B29C37/0053 , B29C43/003 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S977/887
摘要： An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder. The template holder may include a body with an opening configured to receive the template, a support plate, and an actuator system coupled to the body. The actuator system may be configured to alter a physical dimension of the template during use.
摘要翻译：可以使用压印光刻模板来在设置在基板上的可光固化液体中形成印刷层。在使用期间，模板可以设置在模板保持器内。模板保持器可以包括具有构造成接收模板的开口的主体，支撑板和联接到主体的致动器系统。致动器系统可以被配置为在使用期间改变模板的物理尺寸。

5. 发明申请

US20080199816A1 Method of Automatic Fluid Dispensing for Imprint Lithography Processes 审中-公开
标题翻译：自动流体分配方法用于压印光刻工艺
公开(公告)号：US20080199816A1
公开(公告)日：2008-08-21
申请号：US11774710
申请日：2007-07-09
申请人： Byung J. Choi , S. V. Sreenivasan , C. Grant Willson , Matthew Colburn , Todd Bailey , John Ekerdt
发明人： Byung J. Choi , S. V. Sreenivasan , C. Grant Willson , Matthew Colburn , Todd Bailey , John Ekerdt
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/16 , G03F7/164 , H01L2224/29012 , H01L2224/3003 , H01L2224/3016 , H01L2924/01067 , H01L2924/1461 , H01L2924/00
摘要： Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.
摘要翻译：本文公开了一种用于在板状材料或基板的表面上分配流体的自动流体分配方法和系统，其包括用于压印光刻工艺的半导体晶片。分配方法使用流体分配器和可在流体分配器尖端基底之间产生相对侧向运动的基底台。本文还描述了使用基本上未图案化的平面模板在衬底上创建平面表面的方法和装置。

6. 发明授权

US06980282B2 Method for modulating shapes of substrates 有权
标题翻译：调制基板形状的方法
公开(公告)号：US06980282B2
公开(公告)日：2005-12-27
申请号：US10316963
申请日：2002-12-11
申请人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , C. Grant Willson , Norman E. Schumaker , Mario J. Meissl
发明人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , C. Grant Willson , Norman E. Schumaker , Mario J. Meissl
IPC分类号： G03F7/20 , G03B27/58 , G03B27/60 , G03B27/62 , H01L21/302
CPC分类号： G03F7/707 , G03F7/70875
摘要： The present invention is directed to a method for modulating shapes of a substrate, having first and second opposed surfaces. This is achieved by creating a pressure differential between differing regions of the first opposed surface to attenuate structural distortions in the second opposed surface that results from external forces bearing on the substrate.
摘要翻译：本发明涉及一种用于调制具有第一和第二相对表面的基底的形状的方法。这是通过在第一相对表面的不同区域之间产生压差来减少第二相对表面中由轴承在基底上的外力产生的结构变形来实现的。

7. 发明授权

US09120947B2 Surface treatments for alignment of block copolymers 有权
标题翻译：用于嵌段共聚物取向的表面处理
公开(公告)号：US09120947B2
公开(公告)日：2015-09-01
申请号：US13583518
申请日：2011-03-17
申请人： C. Grant Willson , Christopher M. Bates , Jeffrey Strahan , Christopher John Ellison
发明人： C. Grant Willson , Christopher M. Bates , Jeffrey Strahan , Christopher John Ellison
IPC分类号： B05D3/12 , C09D153/00 , B81C1/00 , G03F7/00 , G03F7/26 , B05D1/00
CPC分类号： C09D153/00 , B05D1/005 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , G03F7/265 , Y10T428/24355 , Y10T428/265 , Y10T428/31935 , Y10T428/31938
摘要： The present invention relates to a method the synthesis and utilization of random, cross-linked, substituted polystyrene copolymers as polymeric cross-linked surface treatments (PXSTs) to control the orientation of physical features of a block copolymer deposited over the first copolymer. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.
摘要翻译：本发明涉及合成和利用随机交联的取代的聚苯乙烯共聚物作为聚合交联表面处理（PXST）的方法，以控制沉积在第一共聚物上的嵌段共聚物的物理特征的取向。这种方法具有许多用途，包括半导体工业中的多种应用，包括生产纳米压印光刻用模板。

8. 发明授权

US07691275B2 Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing 失效
标题翻译：使用步进和闪光压印光刻技术直接刻印用于双镶嵌加工的介质材料
公开(公告)号：US07691275B2
公开(公告)日：2010-04-06
申请号：US11363071
申请日：2006-02-27
申请人： C. Grant Willson , Frank Palmieri , Yukio Nishimura , Stephen C. Johnson , Michael D. Stewart
发明人： C. Grant Willson , Frank Palmieri , Yukio Nishimura , Stephen C. Johnson , Michael D. Stewart
IPC分类号： H01L21/302
CPC分类号： H01L21/76817 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/76807 , H01L21/76828
摘要： In some embodiments, the present invention is directed to methods that involve the combination of step-and-flash imprint lithography (SFIL) with a multi-tier template to simultaneously pattern multiple levels of, for example, an integrated circuit device. In such embodiments, the imprinted material generally does not serve or act as a simple etch mask or photoresist, but rather serves as the insulation between levels and lines, i.e., as a functional dielectric material. After imprinting and a multiple step curing process, the imprinted pattern is filled with metal, as in dual damascene processing. Typically, the two printed levels will comprise a “via level,” which is used to make electrical contact with the previously patterned under-level, and a “wiring level.” The present invention provides for the direct patterning of functional materials, which represents a significant departure from the traditional approach to microelectronics manufacturing.
摘要翻译：在一些实施例中，本发明涉及涉及步进和快速压印光刻（SFIL）与多层模板的组合以同时对例如集成电路器件的多个级别进行图案化的方法。在这样的实施例中，压印材料通常不起到或用作简单的蚀刻掩模或光致抗蚀剂的作用，而是用作层和线之间的绝缘，即功能介电材料。在印迹和多步固化过程之后，印刷图案充满金属，如在双镶嵌加工中。通常，两个印刷层将包括用于与先前图案化的底层电接触的“通孔层”和“布线层”。本发明提供了功能材料的直接图案化，其代表显着地偏离了传统的微电子制造方法。

9. 发明授权

US07365103B2 Compositions for dark-field polymerization and method of using the same for imprint lithography processes 有权
标题翻译：用于暗场聚合的组合物及其用于压印光刻工艺的方法
公开(公告)号：US07365103B2
公开(公告)日：2008-04-29
申请号：US10318273
申请日：2002-12-12
申请人： C. Grant Willson , Nicholas A. Stacey
发明人： C. Grant Willson , Nicholas A. Stacey
IPC分类号： C08F220/18 , C08F230/08 , C08F2/48
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0045 , G03F7/0757
摘要： A composition is provided and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization is disclosed. The composition includes a polymerizable bisvinylether and an initiator that produces an acid in response to radiation.
摘要翻译：提供了一种组合物，并且公开了使用其使用使用暗视野聚合的压印光刻在基板上形成图案的方法。组合物包括可聚合的双乙烯基醚和引发剂，其响应于辐射而产生酸。

10. 发明申请

US20130045361A1 SURFACE TREATMENTS FOR ALIGNMENT OF BLOCK COPOLYMERS 有权
标题翻译：表面处理嵌段共聚物的配位
公开(公告)号：US20130045361A1
公开(公告)日：2013-02-21
申请号：US13583518
申请日：2011-03-17
申请人： C. Grant Willson , Christopher M. Bates , Jeffrey Strahan , Christopher John Ellison
发明人： C. Grant Willson , Christopher M. Bates , Jeffrey Strahan , Christopher John Ellison
IPC分类号： B32B27/32 , B32B33/00 , B05D1/38 , B05D3/12 , B82Y30/00 , B82Y40/00
CPC分类号： C09D153/00 , B05D1/005 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , G03F7/265 , Y10T428/24355 , Y10T428/265 , Y10T428/31935 , Y10T428/31938
摘要： The present invention relates to a method the synthesis and utilization of random, cross-linked, substituted polystyrene copolymers as polymeric cross-linked surface treatments (PXSTs) to control the orientation of physical features of a block copolymer deposited over the first copolymer. Such methods have many uses including multiple applications in the semi-conductor industry including production of templates for nanoimprint lithography.
摘要翻译：本发明涉及合成和利用随机交联的取代的聚苯乙烯共聚物作为聚合交联表面处理（PXST）的方法，以控制沉积在第一共聚物上的嵌段共聚物的物理特征的取向。这种方法具有许多用途，包括半导体工业中的多种应用，包括生产纳米压印光刻的模板。

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