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    • 3. 发明申请
    • METHOD FOR MANUFACTURING A COMPOUND FILM
    • 制造化合物膜的方法
    • US20100247745A1
    • 2010-09-30
    • US12677665
    • 2007-09-12
    • Dominik RudmannMarc KaelinThomas StuderFelix Budde
    • Dominik RudmannMarc KaelinThomas StuderFelix Budde
    • C23C14/54
    • H01L31/18C23C14/0623C23C14/545C23C14/548H01L31/0322H01L31/1844Y02E10/541Y02E10/544Y02P70/521
    • A method for manufacturing a compound film comprising a substrate and at least one additional layer is disclosed. The method comprising the steps of depositing at least two chemical elements on the substrate and/or on the at least one additional layer using depositions sources, maintaining depositing of the at least two chemical elements while the substrate and the deposition sources are being moved relative to each other, measuring the compound film properties, particularly being compound film thickness, compound-film overall composition, and compound-film composition in one or several positions of the compound film, comparing the predefined values for the compound film properties to the measured compound film properties, and adjusting the deposition of the at least two chemical elements in case the measured compound film properties do not match the predefined compound film properties.
    • 公开了一种制造包含基底和至少一个附加层的化合物膜的方法。 该方法包括以下步骤:使用沉积源在衬底和/或至少一个附加层上沉积至少两个化学元素,保持沉积所述至少两种化学元素,同时衬底和沉积源相对于 在化合物膜的一个或多个位置测定化合物膜特性,特别是复合膜厚度,复合膜整体组成和化合物膜组成,将化合物膜性质的预定值与测定的化合物膜进行比较 性质,并且在测量的化合物膜性质与预定化合物膜性质不匹配的情况下调节至少两种化学元素的沉积。