会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明申请
    • METHOD AND SERVER FOR ESTABLISHING A COMMUNICATION LINK BETWEEN COMMUNICATION TERMINALS IN A PRESELECTED GROUP
    • 方法和服务器建立通信终端之间的通信链接在一个预定的组
    • US20090270048A1
    • 2009-10-29
    • US12160687
    • 2006-12-15
    • Thomas Wolff
    • Thomas Wolff
    • H04B1/38
    • H04L65/4061H04L65/1006H04L65/1016H04L65/403
    • The invention relates to a method for establishing a communication link between communication terminals (KEB1, KEG2, KEG3) which are associated with a preselected group (G) of communication terminals. According to said method, a start message 1 is captured by a server (S1, S2) of a communication link (KN1, KN2), which is sent by the communication terminal (KEG3), the preselected group is determined by the server using information transferred in the start message via the communication terminal (KEG3) and is associated with the communication terminal (KEG3). Also, a link message (2) is transferred by the server (S1, S2) to the communication terminal (KEG3). The server (S1, S2) captures a link confirmation message (3) which is sent by the communication terminal, whereby the communication link between the communication terminal (KEG3) and additional communication-ready communication terminals (KEG1, KEG2) of the group, is produced. The invention also relates to a server.
    • 本发明涉及一种用于在通信终端(KEB1,KEG2,KEG3)之间建立通信链路的方法,该通信链路与通信终端的预选组(G)相关联。 根据所述方法,由通信终端(KEG3)发送的通信链路(KN1,KN2)的服务器(S1,S2)捕获开始消息1,预先选择的组由服务器使用信息确定 通过通信终端(KEG3)在起始消息中传送并与通信终端(KEG3)相关联。 此外,链接消息(2)由服务器(S1,S2)传送到通信终端(KEG3)。 服务器(S1,S2)捕获由通信终端发送的链路确认消息(3),由此,通信终端(KEG3)和组的附加通信就绪通信终端(KEG1,KEG2)之间的通信链路, 生产。 本发明还涉及一种服务器。
    • 9. 发明申请
    • System and method for interrogating a saw via direct physical connection
    • 通过直接物理连接询问锯的系统和方法
    • US20070279188A1
    • 2007-12-06
    • US11436918
    • 2006-05-18
    • Jack ThiesenThomas WolffMonika Brogle
    • Jack ThiesenThomas WolffMonika Brogle
    • H04Q5/22
    • B60C23/0408
    • Methods for determining the resonant frequency for interrogation of a resonant device include steps for generating and coupling interrogation pulses of various bandwidths to energize one or more SAW resonator elements. Initial interrogation pulses have a relatively wide bandwidth, such that the general location of a resonant device's resonant frequency can be expediently determined. Then, interrogation pulses having smaller bandwidth pulses can be coupled to the resonant device at frequencies near the determined general location of resonance to further narrow the location of resonance. In some embodiments, one or more initial interrogation pulses are coupled to the resonant device at a frequency in the center of or at an expected value within an expected range of operation of a resonant device. If the resonant frequency is not located at this initial location, then the range of operation is divided into halves (or other number of generally equal frequency range segments) and one or more interrogation pulses are coupled to the resonant device at the center of each of the new search frequency range segments. This process of partitioning the search frequency range continues until the resonant frequency is located.
    • 用于确定用于询问谐振装置的谐振频率的方法包括用于产生和耦合各种带宽的询问脉冲以激励一个或多个SAW谐振器元件的步骤。 初始询问脉冲具有相对宽的带宽,使得可以方便地确定谐振装置的谐振频率的一般位置。 然后,具有较小带宽脉冲的询问脉冲可以以接近确定的共振位置的频率耦合到谐振装置,以进一步缩小谐振位置。 在一些实施例中,一个或多个初始询问脉冲以谐振装置的预期操作范围内的中心频率处或预期值的频率耦合到谐振装置。 如果谐振频率不在这个初始位置,则操作范围被分成两半(或其他数量的大致相等的频率范围段),并且一个或多个询问脉冲耦合到谐振装置的每一个的中心 新的搜索频段范围。 分割搜索频率范围的这个过程继续进行,直到找到谐振频率。
    • 10. 发明授权
    • Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride
    • 用于光电化学蚀刻半导体样品,尤其是氮化镓的方法和装置
    • US07026255B2
    • 2006-04-11
    • US10693771
    • 2003-10-24
    • Thomas Wolff
    • Thomas Wolff
    • H01L21/302
    • H01L21/67253C25F3/12H01L21/30612H01L21/6708
    • In a method for photo-electrochemical etching of a semiconductor sample, the semiconductor sample is brought in contact with an electrolyte liquid. The contact area formed thereby is illuminated through the electrolyte liquid with UV light. The photo-current created by UV light irradiation at the contact area is measured. To increase the etching quality, a jet of fresh electrolyte liquid is repeatedly applied to the contact area. A device for carrying out the method includes a container to be filled with an electrolyte liquid, a UV source for illuminating the semiconductor sample with UV light through the electrolyte liquid, and a measuring instrument for measuring the photo-current created during UV light irradiation of the contact area. Further provided are an inlet for supplying fresh electrolyte liquid, directed towards the semiconductor sample, and a device attached to the inlet for repeated production of electrolyte fluid jets, directed towards the semiconductor sample.
    • 在半导体样品的光电化学蚀刻的方法中,半导体样品与电解液接触。 由此形成的接触区域通过具有UV光的电解液照射。 测量在接触区域由UV光照射产生的光电流。 为了提高蚀刻质量,将新鲜的电解质液体喷射反复地施加到接触区域。 用于实施该方法的装置包括:填充有电解液的容器,用于通过电解质液体用紫外光照射半导体样品的UV源;以及用于测量在UV光照射期间产生的光电流的测量仪器 接触面积。 还提供了用于供应朝向半导体样品的新鲜电解质液体的入口,以及连接到入口的用于反复生产电解质流体射流的装置,引导到半导体样品。