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    • 6. 发明申请
    • Nickel-based brazing foil and process for brazing
    • 镍基钎焊箔和钎焊工艺
    • US20090110955A1
    • 2009-04-30
    • US12285754
    • 2008-10-14
    • Thomas HartmannDieter Nuetzel
    • Thomas HartmannDieter Nuetzel
    • B32B15/01C22C45/00C22F3/00B23K1/20B23K31/02C22C45/04
    • B23K1/0012B23K1/19B23K35/0233B23K35/3033B23K35/304C22C1/002C22C19/05C22C19/058C22C45/04C22F1/002C22F1/10C22F3/00F02M26/29F28F21/083F28F21/089Y10T428/12944Y10T428/12972
    • Disclosed is an amorphous, ductile brazing foil with a composition consisting essentially of NirestCraBbPcSid with 2 atomic percent ≦a≦30 atomic percent; 0.5 atomic percent ≦b≦14 atomic percent; 2 atomic percent ≦c≦20 atomic percent; 0 atomic percent ≦d≦14 atomic percent; incidental impurities ≦0.5 atomic percent; rest Ni, where c>b>c/15 and 10 atomic percent ≦b+c+d≦25 atomic percent. Also disclosed is amorphous, ductile Ni-based brazing foil having a composition consisting essentially of NirestCraBbPcSidCeXfYg wherein a, b, c, d, e, f, and g are numbers such that 2 atomic percent ≦a≦30 atomic percent; 0.5 atomic percent ≦b≦14 atomic percent; 2 atomic percent ≦c≦20 atomic percent; 0 atomic percent ≦d≦14 atomic percent; 0 atomic percent ≦e≦5 atomic percent; 0 atomic percent ≦f≦5 atomic percent; 0 atomic percent ≦g≦20 atomic percent; wherein incidental impurities are present, if at all, in amounts ≦0.5 atomic percent; wherein rest indicates that the balance of the composition is Ni; wherein c>b>c/15; wherein 10 atomic percent ≦b+c+d≦25 atomic percent, wherein X is one or more of the elements Mo, Nb, Ta, W and Cu; and wherein Y is one or both of the elements Fe and Co. Also disclosed are methods for making and using these brazing foils, and brazed objects produced therefrom.
    • 公开了一种无定形的延性钎焊箔,其组成基本上由2原子%<= a <= 30原子%的NirestCraBbPcSid组成; 0.5原子%<= b <= 14原子% 2原子%<= c <= 20原子% 0原子%<= d <= 14原子% 杂质<= 0.5原子% 其中c> b> c / 15和10原子百分比<= b + c + d <= 25原子%。 还公开了具有组成基本上由NirestCraBbPcSidCeXfYg组成的无定形的延性Ni基钎焊箔,其中a,b,c,d,e,f和g是2原子百分数<= a <= 30原子百分数的数字; 0.5原子%<= b <= 14原子% 2原子%<= c <= 20原子% 0原子%<= d <= 14原子% 0原子百分比<= e <= 5原子% 0原子%<= f <= 5原子% 0原子%<= g <= 20原子% 其中存在偶然杂质,如果有的话,以<= 0.5原子%的量; 其中休息表示组合物的余量为Ni; 其中c> b> c / 15; 其中10原子百分比<= b + c + d <= 25原子%,其中X是元素Mo,Nb,Ta,W和Cu中的一种或多种; 并且其中Y是元素Fe和Co中的一种或两种。还公开了制造和使用这些钎焊箔以及由其制备的钎焊物体的方法。