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1. 发明授权

US07786495B2 Light-emitting element array and image forming apparatus 有权
标题翻译：发光元件阵列和图像形成装置
公开(公告)号：US07786495B2
公开(公告)日：2010-08-31
申请号：US12259420
申请日：2008-10-28
申请人： Tetsuya Takeuchi , Makoto Koto , Kenji Yamagata , Yoshinobu Sekiguchi , Takao Yonehara
发明人： Tetsuya Takeuchi , Makoto Koto , Kenji Yamagata , Yoshinobu Sekiguchi , Takao Yonehara
IPC分类号： H01L33/00
CPC分类号： H01L27/153 , B41J2/45
摘要： A light-emitting element array can be manufactured without the separation of a metal reflection layer. The light-emitting element array includes a plurality of light-emitting element portions provided on a substrate, at least one space of the spaces between adjacent light-emitting element portions being electrically separated from each other, wherein the metal reflection layer is provided on the substrate and under the plurality of light-emitting element portions, and a resistive layer for electrical separation between the light-emitting element portions is provided between the plurality of light-emitting element portions and the metal reflection layer. The plurality of light-emitting element portions are divided into a plurality of blocks. Each of the blocks includes a plurality of light-emitting portions. The electrical separation between the light-emitting portions can be made as electrical separation between adjacent light-emitting element portions in adjacent and different blocks.
摘要翻译：可以在不分离金属反射层的情况下制造发光元件阵列。发光元件阵列包括设置在基板上的多个发光元件部，相邻的发光元件部之间的空间的至少一个空间彼此电分离，其中金属反射层设置在基板和多个发光元件部分之下，并且在多个发光元件部分和金属反射层之间设置用于在发光元件部分之间进行电气分离的电阻层。多个发光元件部分被分成多个块。每个块包括多个发光部分。发光部之间的电气分离可以在相邻的和不同的块之间的相邻的发光元件部分之间进行电分离。

2. 发明申请

US20090057693A1 LIGHT-EMITTING ELEMENT ARRAY AND IMAGE FORMING APPARATUS 有权
标题翻译：发光元件阵列和图像形成装置
公开(公告)号：US20090057693A1
公开(公告)日：2009-03-05
申请号：US12259420
申请日：2008-10-28
申请人： Tetsuya Takeuchi , Makoto Koto , Kenji Yamagata , Yoshinobu Sekiguchi , Takao Yonehara
发明人： Tetsuya Takeuchi , Makoto Koto , Kenji Yamagata , Yoshinobu Sekiguchi , Takao Yonehara
IPC分类号： H01L33/00
CPC分类号： H01L27/153 , B41J2/45
摘要： A light-emitting element array can be manufactured without the separation of a metal reflection layer. The light-emitting element array includes a plurality of light-emitting element portions provided on a substrate, at least one space of the spaces between adjacent light-emitting element portions being electrically separated from each other, wherein the metal reflection layer is provided on the substrate and under the plurality of light-emitting element portions, and a resistive layer for electrical separation between the light-emitting element portions is provided between the plurality of light-emitting element portions and the metal reflection layer. The plurality of light-emitting element portions are divided into a plurality of blocks. Each of the blocks includes a plurality of light-emitting portions. The electrical separation between the light-emitting portions can be made as electrical separation between adjacent light-emitting element portions in adjacent and different blocks.
摘要翻译：可以在不分离金属反射层的情况下制造发光元件阵列。发光元件阵列包括设置在基板上的多个发光元件部，相邻的发光元件部之间的空间的至少一个空间彼此电分离，其中金属反射层设置在基板和多个发光元件部分之下，并且在多个发光元件部分和金属反射层之间设置用于在发光元件部分之间进行电气分离的电阻层。多个发光元件部分被分成多个块。每个块包括多个发光部分。发光部之间的电气分离可以在相邻的和不同的块之间的相邻的发光元件部分之间进行电分离。

3. 发明授权

US07491976B2 Light-emitting element array and image forming apparatus 失效
标题翻译：发光元件阵列和图像形成装置
公开(公告)号：US07491976B2
公开(公告)日：2009-02-17
申请号：US11782935
申请日：2007-07-25
申请人： Tetsuya Takeuchi , Makoto Koto , Kenji Yamagata , Yoshinobu Sekiguchi , Takao Yonehara
发明人： Tetsuya Takeuchi , Makoto Koto , Kenji Yamagata , Yoshinobu Sekiguchi , Takao Yonehara
IPC分类号： H01L33/00
CPC分类号： B21D43/09 , B21D43/021 , B41J2/45 , B65H23/1884 , H01L27/153 , Y10T83/0481 , Y10T83/148 , Y10T83/159
摘要： A light-emitting element array can be manufactured without the separation of a metal reflection layer. The light-emitting element array includes a plurality of light-emitting element portions provided on a substrate, at least one space of the spaces between adjacent light-emitting element portions being electrically separated from each other, wherein the metal reflection layer is provided on the substrate and under the plurality of light-emitting element portions, and a resistive layer for electrical separation between the light-emitting element portions is provided between the plurality of light-emitting element portions and the metal reflection layer. The plurality of light-emitting element portions are divided into a plurality of blocks. Each of the blocks includes a plurality of light-emitting portions. The electrical separation between the light-emitting portions can be made as electrical separation between adjacent light-emitting element portions in adjacent and different blocks.
摘要翻译：可以在不分离金属反射层的情况下制造发光元件阵列。发光元件阵列包括设置在基板上的多个发光元件部，相邻的发光元件部之间的空间的至少一个空间彼此电分离，其中金属反射层设置在基板和多个发光元件部分之下，并且在多个发光元件部分和金属反射层之间设置用于在发光元件部分之间进行电气分离的电阻层。多个发光元件部分被分成多个块。每个块包括多个发光部分。发光部之间的电气分离可以在相邻的和不同的块之间的相邻的发光元件部分之间进行电分离。

4. 发明申请

US20070262333A1 LIGHT-EMITTING ELEMENT ARRAY AND IMAGE FORMING APPARATUS 失效
标题翻译：发光元件阵列和图像形成装置
公开(公告)号：US20070262333A1
公开(公告)日：2007-11-15
申请号：US11782935
申请日：2007-07-25
申请人： Tetsuya TAKEUCHI , Makoto Koto , Kenji Yamagata , Yoshinobu Sekiguchi , Takao Yonehara
发明人： Tetsuya TAKEUCHI , Makoto Koto , Kenji Yamagata , Yoshinobu Sekiguchi , Takao Yonehara
IPC分类号： H01L33/00
CPC分类号： B21D43/09 , B21D43/021 , B41J2/45 , B65H23/1884 , H01L27/153 , Y10T83/0481 , Y10T83/148 , Y10T83/159
摘要： A light-emitting element array can be manufactured without the separation of a metal reflection layer. The light-emitting element array includes a plurality of light-emitting element portions provided on a substrate, at least one space of the spaces between adjacent light-emitting element portions being electrically separated from each other, wherein the metal reflection layer is provided on the substrate and under the plurality of light-emitting element portions, and a resistive layer for electrical separation between the light-emitting element portions is provided between the plurality of light-emitting element portions and the metal reflection layer. The plurality of light-emitting element portions are divided into a plurality of blocks. Each of the blocks includes a plurality of light-emitting portions. The electrical separation between the light-emitting portions can be made as electrical separation between adjacent light-emitting element portions in adjacent and different blocks.
摘要翻译：可以在不分离金属反射层的情况下制造发光元件阵列。发光元件阵列包括设置在基板上的多个发光元件部，相邻的发光元件部之间的空间的至少一个空间彼此电分离，其中金属反射层设置在基板和多个发光元件部分之下，并且在多个发光元件部分和金属反射层之间设置用于在发光元件部分之间进行电气分离的电阻层。多个发光元件部分被分成多个块。每个块包括多个发光部分。发光部之间的电气分离可以在相邻的和不同的块之间的相邻的发光元件部分之间进行电分离。

5. 发明授权

US07399693B2 Semiconductor film manufacturing method and substrate manufacturing method 有权
标题翻译：半导体薄膜的制造方法和基板的制造方法
公开(公告)号：US07399693B2
公开(公告)日：2008-07-15
申请号：US10566170
申请日：2005-06-15
申请人： Yoshinobu Sekiguchi , Takao Yonehara , Makoto Koto , Masahiro Okuda , Tetsuya Shimada
发明人： Yoshinobu Sekiguchi , Takao Yonehara , Makoto Koto , Masahiro Okuda , Tetsuya Shimada
IPC分类号： H01L21/44
CPC分类号： H01L21/76251 , H01L21/0237 , H01L21/02381 , H01L21/02395 , H01L21/0242 , H01L21/02455 , H01L21/02458 , H01L21/02461 , H01L21/02463 , H01L21/02538 , H01L21/02546 , H01L21/02573 , H01L21/0262 , H01L33/0079 , H01S5/0213 , H01S5/0217 , H01S5/32341
摘要： This invention provides a semiconductor film manufacturing method using a new separation technique and applications thereof. The semiconductor film manufacturing method of this invention includes a separation layer forming a step of hetero-epitaxially growing a separation layer (2) on a seed substrate (1), a semiconductor film forming step of forming a semiconductor film (3) on the separation layer (2), and a separation step of separating, by using the separation layer (2), the semiconductor film (3) from a composite member (Ia) formed in the semiconductor film forming step.
摘要翻译：本发明提供一种使用新的分离技术及其应用的半导体膜制造方法。本发明的半导体膜制造方法包括形成在种子基板（1）上异质生长分离层（2）的步骤的分离层，在分离时形成半导体膜（3）的半导体膜形成步骤层（2）和通过使用分离层（2）将半导体膜（3）从形成在半导体膜形成步骤中的复合构件（Ia）分离的分离步骤。

6. 发明申请

US20060246688A1 Semiconductor film manufacturing method and substrate manufacturing method 有权
标题翻译：半导体薄膜的制造方法和基板的制造方法
公开(公告)号：US20060246688A1
公开(公告)日：2006-11-02
申请号：US10566170
申请日：2005-06-15
申请人： Yoshinobu Sekiguchi , Takao Yonehara , Makoto Koto , Masahiro Okuda , Tetsuya Shimada
发明人： Yoshinobu Sekiguchi , Takao Yonehara , Makoto Koto , Masahiro Okuda , Tetsuya Shimada
IPC分类号： H01L21/30 , H01L21/46 , H01L21/20 , H01L21/36 , H01L31/20
CPC分类号： H01L21/76251 , H01L21/0237 , H01L21/02381 , H01L21/02395 , H01L21/0242 , H01L21/02455 , H01L21/02458 , H01L21/02461 , H01L21/02463 , H01L21/02538 , H01L21/02546 , H01L21/02573 , H01L21/0262 , H01L33/0079 , H01S5/0213 , H01S5/0217 , H01S5/32341
摘要： This invention provides a semiconductor film manufacturing method using a new separation technique and applications thereof. The semiconductor film manufacturing method of this invention includes a separation layer forming a step of hetero-epitaxially growing a separation layer (2) on a seed substrate (1), a semiconductor film forming step of forming a semiconductor film (3) on the separation layer (2), and a separation step of separating, by using the separation layer (2), the semiconductor film (3) from a composite member (Ia) formed in the semiconductor film forming step.
摘要翻译：本发明提供一种使用新的分离技术及其应用的半导体膜制造方法。本发明的半导体膜制造方法包括形成在种子基板（1）上异质生长分离层（2）的步骤的分离层，在分离时形成半导体膜（3）的半导体膜形成步骤层（2）和通过使用分离层（2）将半导体膜（3）从形成在半导体膜形成步骤中的复合构件（Ia）分离的分离步骤。

7. 发明授权

US07550305B2 Method of forming light-emitting element 失效
标题翻译：形成发光元件的方法
公开(公告)号：US07550305B2
公开(公告)日：2009-06-23
申请号：US11874452
申请日：2007-10-18
申请人： Kenji Yamagata , Takao Yonehara , Yoshinobu Sekiguchi , Kojiro Nishi
发明人： Kenji Yamagata , Takao Yonehara , Yoshinobu Sekiguchi , Kojiro Nishi
IPC分类号： H01L21/00 , H01L21/30 , H01L21/46
CPC分类号： H01L33/0079 , H01L33/08 , H01L33/20
摘要： An object of the present invention is to provide a method of forming a light-emitting element at a lower cost than a conventional cost with suppressing the deterioration of the substrate due to thermal distortion in comparison with a conventional method of recycling a substrate and further having an effect equal to that of the method of recycling a substrate. The method of forming a light-emitting element by growing a separation layer and a light-emitting layer in this order on a first substrate, bonding the light-emitting layer onto a second substrate, and removing the separation layer to form the light-emitting layer on the second substrate, includes growing a plurality of groups each containing the separation layer and light-emitting layer on the first substrate; patterning the light-emitting layer existing as a uppermost layer into an island shape, and then bonding the light-emitting layer onto the second substrate, and etching the separation layer adjacent to the light-emitting layer patterned into the island shape to form the light-emitting layer patterned into the island shape on the second substrate.
摘要翻译：本发明的目的是提供一种以比常规成本低的成本形成发光元件的方法，与常规的基板再循环方法相比，可以抑制由于热变形引起的基板的劣化，并且还具有其效果与回收基材的方法相同。通过在第一基板上依次生长分离层和发光层来形成发光元件的方法，将发光层接合到第二基板上，并且去除分离层以形成发光包括在第一基板上生长各自包含分离层和发光层的多个基团; 将作为最上层存在的发光层图案化为岛状，然后将发光层接合到第二基板上，并且蚀刻与图案化为岛状的发光层相邻的分离层，以形成光在第二基板上图案化成岛状的发光层。

8. 发明申请

US20120282716A1 SEMICONDUCTOR MEMBER, SEMICONDUCTOR ARTICLE MANUFACTURING METHOD, AND LED ARRAY USING THE MANUFACTURING METHOD 失效
标题翻译：半导体器件，半导体器件制造方法和使用制造方法的LED阵列
公开(公告)号：US20120282716A1
公开(公告)日：2012-11-08
申请号：US13550512
申请日：2012-07-16
申请人： Takao Yonehara , Kenji Yamagata , Yoshinobu Sekiguchi , Kojiro Nishi
发明人： Takao Yonehara , Kenji Yamagata , Yoshinobu Sekiguchi , Kojiro Nishi
IPC分类号： H01L33/60
CPC分类号： H01L27/153 , B41J2/45 , H01L21/7806 , H01L21/784 , H01L33/0079 , H01L33/0095 , H01L2924/0002 , H01L2924/00
摘要： A novel semiconductor article manufacturing method and the like are provided. A method of manufacturing a semiconductor article having a compound semiconductor multilayer film formed on a semiconductor substrate includes: preparing a member including an etching sacrificial layer (1010), a compound semiconductor multilayer film (1020), an insulating film (2010), and a semiconductor substrate (2000) on a compound semiconductor substrate (1000), and having a first groove (2005) which passes through the semiconductor substrate and the insulating film, and a semiconductor substrate groove (1025) which is a second groove provided in the compound semiconductor multilayer film so as to be connected to the first groove, and bringing an etchant into contact with the etching sacrificial layer through the first groove and then the second groove and etching the etching sacrificial layer to separate the compound semiconductor substrate from the member.
摘要翻译：提供了一种新颖的半导体制品制造方法等。制造具有形成在半导体衬底上的化合物半导体多层膜的半导体产品的方法包括：制备包括蚀刻牺牲层（1010），化合物半导体多层膜（1020），绝缘膜（2010）和半导体衬底（2000），并且具有通过半导体衬底和绝缘膜的第一沟槽（2005）以及设置在该化合物半导体衬底（1000）中的第二沟槽的半导体衬底沟槽（1025）半导体多层膜，以便连接到第一沟槽，并使蚀刻剂通过第一沟槽和第二沟槽与蚀刻牺牲层接触，然后蚀刻蚀刻牺牲层，以将化合物半导体衬底与构件分离。

9. 发明申请

US20100026779A1 SEMICONDUCTOR MEMBER, SEMICONDUCTOR ARTICLE MANUFACTURING METHOD, AND LED ARRAY USING THE MANUFACTURING METHOD 有权
标题翻译：半导体器件，半导体器件制造方法和使用制造方法的LED阵列
公开(公告)号：US20100026779A1
公开(公告)日：2010-02-04
申请号：US12442902
申请日：2007-10-25
申请人： Takao Yonehara , Kenji Yamagata , Yoshinobu Sekiguchi , Kojiro Nishi
发明人： Takao Yonehara , Kenji Yamagata , Yoshinobu Sekiguchi , Kojiro Nishi
IPC分类号： B41J2/45 , H01L21/18 , H01L29/06 , H01L21/306 , H01L33/00 , H01L21/762
CPC分类号： H01L27/153 , B41J2/45 , H01L21/7806 , H01L21/784 , H01L33/0079 , H01L33/0095 , H01L2924/0002 , H01L2924/00
摘要： A novel semiconductor article manufacturing method and the like are provided. A method of manufacturing a semiconductor article having a compound semiconductor multilayer film formed on a semiconductor substrate includes: preparing a member including an etching sacrificial layer (1010), a compound semiconductor multilayer film (1020), an insulating film (2010), and a semiconductor substrate (2000) on a compound semiconductor substrate (1000), and having a first groove (2005) which passes through the semiconductor substrate and the insulating film, and a semiconductor substrate groove (1025) which is a second groove provided in the compound semiconductor multilayer film so as to be connected to the first groove, and bringing an etchant into contact with the etching sacrificial layer through the first groove and then the second groove and etching the etching sacrificial layer to separate the compound semiconductor substrate from the member.
摘要翻译：提供了一种新颖的半导体制品制造方法等。制造具有形成在半导体衬底上的化合物半导体多层膜的半导体产品的方法包括：制备包括蚀刻牺牲层（1010），化合物半导体多层膜（1020），绝缘膜（2010）和半导体衬底（2000），并且具有通过半导体衬底和绝缘膜的第一沟槽（2005）以及设置在该化合物半导体衬底（1000）中的第二沟槽的半导体衬底沟槽（1025）半导体多层膜，以便连接到第一沟槽，并使蚀刻剂通过第一沟槽和第二沟槽与蚀刻牺牲层接触，然后蚀刻蚀刻牺牲层，以将化合物半导体衬底与构件分离。

10. 发明授权

US08237761B2 Semiconductor member, semiconductor article manufacturing method, and LED array using the manufacturing method 有权
标题翻译：半导体元件，半导体制品制造方法和使用该制造方法的LED阵列
公开(公告)号：US08237761B2
公开(公告)日：2012-08-07
申请号：US12442902
申请日：2007-10-25
申请人： Takao Yonehara , Kenji Yamagata , Yoshinobu Sekiguchi , Kojiro Nishi
发明人： Takao Yonehara , Kenji Yamagata , Yoshinobu Sekiguchi , Kojiro Nishi
IPC分类号： B41J2/45 , H01L21/30 , H01L21/46
CPC分类号： H01L27/153 , B41J2/45 , H01L21/7806 , H01L21/784 , H01L33/0079 , H01L33/0095 , H01L2924/0002 , H01L2924/00
摘要： A novel semiconductor article manufacturing method and the like are provided. A method of manufacturing a semiconductor article having a compound semiconductor multilayer film formed on a semiconductor substrate includes: preparing a member including an etching sacrificial layer (1010), a compound semiconductor multilayer film (1020), an insulating film (2010), and a semiconductor substrate (2000) on a compound semiconductor substrate (1000), and having a first groove (2005) which passes through the semiconductor substrate and the insulating film, and a semiconductor substrate groove (1025) which is a second groove provided in the compound semiconductor multilayer film so as to be connected to the first groove, and bringing an etchant into contact with the etching sacrificial layer through the first groove and then the second groove and etching the etching sacrificial layer to separate the compound semiconductor substrate from the member.
摘要翻译：提供了一种新颖的半导体制品制造方法等。制造具有形成在半导体衬底上的化合物半导体多层膜的半导体产品的方法包括：制备包括蚀刻牺牲层（1010），化合物半导体多层膜（1020），绝缘膜（2010）和半导体衬底（2000），并且具有通过半导体衬底和绝缘膜的第一沟槽（2005）以及设置在该化合物半导体衬底（1000）中的第二沟槽的半导体衬底沟槽（1025）半导体多层膜，以便连接到第一沟槽，并使蚀刻剂通过第一沟槽和第二沟槽与蚀刻牺牲层接触，然后蚀刻蚀刻牺牲层，以将化合物半导体衬底与构件分离。

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