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1. 发明授权

US5518860A Positive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compound 失效
标题翻译：含有羟基烷基取代的吡啶化合物的正性醌二叠氮化物光致抗蚀剂组合物
公开(公告)号：US5518860A
公开(公告)日：1996-05-21
申请号：US463887
申请日：1995-06-05
申请人： Satoshi Niikura , Jun Koshiyama , Tetsuya Kato , Kouichi Takahashi , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Satoshi Niikura , Jun Koshiyama , Tetsuya Kato , Kouichi Takahashi , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7/022 , G03F7/085 , H01L21/027 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226
摘要： A positive-working photoresist composition comprising a cresol novolac resin as the film-forming agent and a quinonediazido group-containing compound as the photosensitizing agent is admixed with a limited amount of a hydroxyalkyl-substituted pyridine compound so that great improvements can be obtained in the adhesive bonding of the resist layer to the substrate surface and in the stability of the composition by storage still without the problem due to the sublimed material from the resist layer during the patterning process.
摘要翻译：将包含作为成膜剂的甲酚酚醛清漆树脂和含有醌二叠氮基的化合物作为光敏剂的正性光致抗蚀剂组合物与有限量的羟烷基取代的吡啶化合物混合，从而可以在通过存储，抗蚀剂层与基材表面的粘合粘合和组合物的稳定性，在图案化工艺期间由于来自抗蚀剂层的升华材料而没有问题。

2. 发明授权

US5401617A Method for forming positive patterned resist layer on tantalum substrate utilizing quinone diazide composition with aromatic hydroxy additive 失效
标题翻译：使用具有芳族羟基添加剂的醌二氮化物组合物在钽基板上形成阳图案化抗蚀剂层的方法
公开(公告)号：US5401617A
公开(公告)日：1995-03-28
申请号：US230883
申请日：1994-04-20
申请人： Tetsuya Kato , Kouichi Takahashi , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Tetsuya Kato , Kouichi Takahashi , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7/022 , G03F7/023 , G03F7/085 , H01L21/027 , H01L21/30 , H01L21/302 , H01L21/3065 , G03F7/30
CPC分类号： G03F7/0226
摘要： Proposed is an alkali-soluble, positive-working photosensitive resin composition which can be used as a material for forming a finely patterned resist layer on the surface of a metallic substrate such as tantalum to exhibit excellent adhesion of the patterned resist layer to the substrate surface. The composition comprises, in addition to a novolac resin as a film-forming agent and a naphthoquinone diazide group-containing compound as a photosensitizer, an aromatic compound having two benzene rings and at least five phenolic hydroxy groups in a molecule such as pentahydroxy and hexahydroxy benzophenone compounds as an adhesion improver.
摘要翻译：提出了一种碱溶性正性感光性树脂组合物，其可以用作在诸如钽的金属基材的表面上形成精细图案化的抗蚀剂层的材料，以显示出图案化的抗蚀剂层与基材表面的极好的粘附性。该组合物除了作为成膜剂的酚醛清漆树脂和含有萘醌二叠氮基的化合物作为光敏剂之外，还包括分子中具有两个苯环和至少五个酚羟基的芳族化合物，例如五羟基和六羟基二苯甲酮化合物作为粘合改进剂。

3. 发明授权

US5552255A Article utilizing quinone diazide resist layer on tantalum substrate surface 失效
标题翻译：文章在钽基板表面上使用醌二叠氮化物抗蚀剂层
公开(公告)号：US5552255A
公开(公告)日：1996-09-03
申请号：US344342
申请日：1994-11-22
申请人： Tetsuya Kato , Kouichi Takahashi , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Tetsuya Kato , Kouichi Takahashi , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7/022 , G03F7/023 , G03F7/085 , H01L21/027 , H01L21/30 , H01L21/302 , H01L21/3065 , G03F7/09
CPC分类号： G03F7/0226
摘要： Proposed is an alkali-soluble, positive-working photo-sensitive resin composition which can be used as a material for forming a finely patterned resist layer on the surface of a metallic substrate such as tantalum to exhibit excellent adhesion of the patterned resist layer to the substrate surface. The composition comprises, in addition to a novolac resin as a film-forming agent and a naphthoquinone diazide group-containing compound as a photosensitizer, an aromatic compound having two benzene rings and at least five phenolic hydroxy groups in a molecule such as pentahydroxy and hexahydroxy benzophenone compounds as an adhesion improver.
摘要翻译：提出了一种碱溶性正性光敏树脂组合物，其可以用作在诸如钽的金属基材的表面上形成精细图案化的抗蚀剂层的材料，以显示图案化的抗蚀剂层对于基材表面。该组合物除了作为成膜剂的酚醛清漆树脂和含有萘醌二叠氮基的化合物作为光敏剂之外，还包括分子中具有两个苯环和至少五个酚羟基的芳族化合物，例如五羟基和六羟基二苯甲酮化合物作为粘合改进剂。

4. 发明授权

US5401605A Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound 失效
标题翻译：含有三苯甲烷化合物的1,2-萘醌二叠氮化物酯化产物的正性感光性树脂组合物
公开(公告)号：US5401605A
公开(公告)日：1995-03-28
申请号：US282772
申请日：1994-07-29
申请人： Kousuke Doi , Hiroshi Hosoda , Kouichi Takahashi , Nobuo Tokutake , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Kousuke Doi , Hiroshi Hosoda , Kouichi Takahashi , Nobuo Tokutake , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/022
摘要： Proposed is a positive-working photosensitive resin composition suitable as a photoresist in the photolithographic patterning work for the manufacture of, for example, semiconductor devices having excellent storage stability and capable of giving a patterned resist layer having excellent contrast of the images, orthogonality of the cross sectional profile of line patterns and heat resistance along with a satisfactorily high photosensitivity and large focusing latitude. The composition comprises, in admixture with an alkali-soluble novolac resin as a film-forming agent, a photosensitizing agent which is an esterification product of a specific tris(hydroxyphenyl) methane compound of which two of the hydroxyphenyl groups each have a cyclohexyl group bonded thereto at a specified position with at least one naphthoquinone-1,2-diazide sulfonyl group as the esterifying group.
摘要翻译：提出了在光刻图案工作中适合作为光致抗蚀剂的正性感光性树脂组合物，用于制造例如具有优异的储存稳定性的半导体器件，并且能够给出具有优异的图像对比度的图案化抗蚀剂层，线图形的横截面轮廓和耐热性以及令人满意的高光敏性和大的聚焦纬度。该组合物与作为成膜剂的碱溶性酚醛清漆树脂的混合物包含作为其中两个羟基苯基各自具有环己基基团的特定三（羟基苯基）甲烷化合物的酯化产物的光敏剂在指定位置与至少一个萘醌-1,2-二叠氮基磺酰基作为酯化基。

5. 发明申请

US20120035159A1 SUBSTITUTED ISOQUINOLINE DERIVATIVE 有权
标题翻译：取代的异喹啉衍生物
公开(公告)号：US20120035159A1
公开(公告)日：2012-02-09
申请号：US13265246
申请日：2010-06-18
申请人： Hiroyoshi Hidaka , Kouichi Takahashi , Yoshihiro Inoue , Kengo Sumi , Ryohei Nakamura
发明人： Hiroyoshi Hidaka , Kouichi Takahashi , Yoshihiro Inoue , Kengo Sumi , Ryohei Nakamura
IPC分类号： A61K31/551 , C07D217/04 , A61K31/4709 , C07D245/02 , C07D413/12 , A61P25/28 , C07D401/12 , A61K31/497 , C07D255/00 , A61P27/06 , A61P9/00 , C07D243/08 , A61K31/5377
CPC分类号： A61K31/407 , A61K31/4725 , A61K31/496 , A61K31/5377 , A61K31/551 , C07D217/02 , C07D401/12 , C07D487/08
摘要： The present invention provides an isoquinoline-6-sulfonamide derivative that is useful as a novel pharmaceutical agent. The present invention provides an isoquinoline-6-sulfonamide derivative represented by Formula (1), a salt thereof, or a solvate of the derivative or the salt: wherein X and Y each independently represent a direct bond, NH, CH═CH, O, or S; R1 and R2 each independently represent a hydrogen atom, a halogen atom, a cyano group, an alkyl group, or the like; R3 and R4 each independently represent a hydrogen atom, an alkyl group, or the like, or R3 and R4 together form an alkylene group or an alkenylene group, which may be bridged between two carbon atoms to an arbitrary position; and l, m, and n represent an integer number of 1 to 4.
摘要翻译：本发明提供可用作新型药剂的异喹啉-6-磺酰胺衍生物。本发明提供由式（1）表示的异喹啉-6-磺酰胺衍生物，其盐或其衍生物或盐的溶剂合物：其中X和Y各自独立地表示直接键，NH，CH = CH，O ，或S; R 1和R 2各自独立地表示氢原子，卤素原子，氰基，烷基等; R 3和R 4各自独立地表示氢原子，烷基等，或者R 3和R 4一起形成可以在两个碳原子之间桥接到任意位置的亚烷基或亚烯基; l，m和n表示1〜4的整数。

6. 发明授权

US5592546A Memory dialing control system having improved telephone number retrieval function by using history information 失效
标题翻译：通过使用历史信息具有改进的电话号码检索功能的存储拨号控制系统
公开(公告)号：US5592546A
公开(公告)日：1997-01-07
申请号：US594384
申请日：1996-01-31
申请人： Kouichi Takahashi
发明人： Kouichi Takahashi
IPC分类号： H04M1/274 , H04M1/2745 , H04M1/56 , H04M11/00
CPC分类号： H04M1/274558 , H04M1/274583 , H04M2250/60
摘要： A memory dialing system includes a first memory in which registered names and registered identification numbers respectively relevant to a plurality of telephone numbers are registered so that the plurality of telephone numbers may be respectively retrieved by specifying the corresponding respective names. A sort table is used for storing the identification numbers in a predetermined order with respect to the first letters in the spellings of the names. A history telephone-number table is provided for storing the used telephone numbers in a order in which the used telephone numbers have been used. A history identification-number table is also used for storing used identification numbers among the registered identification numbers respectively relevant to the used telephone numbers in an order in which the used telephone numbers have been used. A frequency table is used for storing the used identification numbers in an order with respect to the frequencies which the used telephone numbers have been used.
摘要翻译：存储拨号系统包括：第一存储器，其中登记分别与多个电话号码相关的登记名和登记的识别号码，以便可以通过指定相应的各个名称来分别检索多个电话号码。排序表用于按照名称拼写中的第一个字母以预定顺序存储标识号。提供历史电话号码表，用于按照使用的电话号码的顺序来存储所使用的电话号码。历史识别号表还用于按照使用的电话号码的使用顺序，分别与使用的电话号码相关的登记识别号码中存储使用的识别号码。频率表用于以使用已使用的电话号码的频率的顺序存储所使用的识别号码。

7. 发明授权

US4263067A Fabrication of transistors having specifically paired dopants 失效
标题翻译：具有特定配对掺杂剂的晶体管的制造
公开(公告)号：US4263067A
公开(公告)日：1981-04-21
申请号：US123276
申请日：1980-02-21
申请人： Kouichi Takahashi , Hidekuni Ishida , Toshio Yonezawa
发明人： Kouichi Takahashi , Hidekuni Ishida , Toshio Yonezawa
IPC分类号： H01L29/73 , H01L21/22 , H01L21/331 , H01L29/08 , H01L29/10 , H01L29/167 , H01L29/732 , H01L21/225 , H01L29/36
CPC分类号： H01L29/167 , H01L21/22 , H01L29/0804 , H01L29/1004 , H01L29/7322 , Y10S438/965
摘要： A semiconductor device comprising an N type collector layer formed in an N type semiconductor wafer, a P type base layer which is in contact with the N type collector layer at a PN junction that extends to the surface and which contains an N type impurity material of which the energy of combination with vacancies is great and boron is a P type impurity material, and an N type emitter layer which is so formed as to be surrounded by this P type base layer and forms a transistor together with the N type collector layer and the P type base layer and which contains the N type impurity materials phosphorus and arsenic. Arsenic or antimony or the like, which are N type impurity materials of which the energy of combination with vacancies is great are diffused in the P type base layer.
摘要翻译：一种半导体器件，包括形成在N型半导体晶片中的N型集电极层，P型基极层，其在PN结处与所述N型集电极层接触，所述PN结延伸到所述表面并且包含N型杂质材料其与空位结合的能量大，硼是P型杂质材料，N型发射极层被形成为被该P型基极层包围并与N型集电体层一起形成晶体管， P型基层并含有N型杂质物质的磷和砷。作为与空位结合的能量大的N型杂质材料的砷或锑等扩散到P型基底层中。

8. 发明授权

US08883792B2 Substituted isoquinoline derivative 有权
标题翻译：取代的异喹啉衍生物
公开(公告)号：US08883792B2
公开(公告)日：2014-11-11
申请号：US13995300
申请日：2011-12-21
申请人： Hiroyoshi Hidaka , Kengo Sumi , Kouichi Takahashi , Yoshihiro Inoue
发明人： Hiroyoshi Hidaka , Kengo Sumi , Kouichi Takahashi , Yoshihiro Inoue
IPC分类号： C07D401/12 , C07D217/04 , A61K31/4725 , C07D217/02 , C07D417/12 , C07D405/12 , C07D409/12 , C07D217/22
CPC分类号： C07D217/04 , C07D217/02 , C07D217/22 , C07D401/12 , C07D405/12 , C07D409/12 , C07D417/12
摘要： The present invention provides a novel isoquinoline-6-sulfonamide derivative that is useful as a medicine. The present invention provides an isoquinoline-6-sulfonamide derivative represented by Formula (1), a salt thereof, or a solvate of the derivative or the salt, wherein R1 and R2 each independently represent a hydrogen atom, or the like; R3 and R4 each independently represent a hydrogen atom, an alkyl group, or the like; R5 represents a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted alkynyl group, an optionally substituted cycloalkyl group, an optionally substituted alkanoyl group, or the like; and A represents a linear or branched alkylene group having 2 to 6 carbon atoms.
摘要翻译：本发明提供了可用作药物的新型异喹啉-6-磺酰胺衍生物。本发明提供由式（1）表示的异喹啉-6-磺酰胺衍生物，其盐或衍生物或其盐的溶剂合物，其中R1和R2各自独立地表示氢原子等; R3和R4各自独立地表示氢原子，烷基等; R5表示氢原子，任选取代的烷基，任选取代的烯基，任选取代的炔基，任选取代的环烷基，任选取代的烷酰基等; A表示碳原子数2〜6的直链或支链亚烷基。

9. 发明授权

US5586713A Method for wire bonding 失效
标题翻译：引线接合方法
公开(公告)号：US5586713A
公开(公告)日：1996-12-24
申请号：US298148
申请日：1994-08-30
申请人： Kiyoshi Arita , Kouichi Takahashi
发明人： Kiyoshi Arita , Kouichi Takahashi
IPC分类号： B23K20/00 , B23K20/10 , B23K31/02
CPC分类号： H01L24/85 , B23K20/007 , H01L24/78 , H01L2224/451 , H01L2224/48091 , H01L2224/48463 , H01L2224/78268 , H01L2224/78301 , H01L2224/786 , H01L2224/85045 , H01L2224/851 , H01L2224/85205 , H01L24/45 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01019 , H01L2924/01023 , H01L2924/01033 , H01L2924/01039 , H01L2924/01079 , H01L2924/01082 , H01L2924/10329 , H01L2924/14 , H01L2924/3011
摘要： A wire bonding method includes the steps of a lowering a capillary tool supplying a wire, restraining the lowering of the capillary tool, and wire bonding the wire to a bonding face. The inertial force of the capillary tool is reduced to almost zero by restraining the lowering of the capillary tool. As a result, wire bonding is performed under proper bonding force since no bonding force is applied to a ball on the tip of wire from the inertial force of the capillary tool. The bonding force is provided using torque control from an electric motor which lowers the capillary tool.
摘要翻译：引线接合方法包括以下步骤：降低供应线的毛细管工具，抑制毛细管工具的下降，以及将导线接合到接合面。通过抑制毛细管工具的下降，毛细管工具的惯性力减小到几乎为零。结果，在适当的接合力下进行引线接合，因为从毛细管工具的惯性力不会对焊丝末端的球施加结合力。使用来自降低毛细管工具的电动机的转矩控制来提供结合力。

10. 发明授权

US5522263A Apparatus and method for inspecting soldering condition of electronic component by using ultrasonic oscillation 失效
标题翻译：使用超声波振荡检测电子元件的焊接状态的装置和方法
公开(公告)号：US5522263A
公开(公告)日：1996-06-04
申请号：US426786
申请日：1995-04-21
申请人： Kiyoshi Arita , Kouichi Takahashi
发明人： Kiyoshi Arita , Kouichi Takahashi
IPC分类号： G01R31/02 , G01N29/00 , G01N29/04 , G01N29/11 , G01N29/12 , G01N29/30 , H01L21/66 , G01B17/00
CPC分类号： G01N29/12 , G01N29/11 , G01N29/30 , G01N2291/044 , G01N2291/2672
摘要： A measuring device 40 measures an ultrasonic waveform provided to an inspection tool 1. A target energy memory section 45 memorizes a target energy consumed by the inspection tool 1 when the inspection tool 1 is depressed on the soldered portion of an electronic component which is properly soldered on a substrate. A reference waveform memory section 44 memorizes a reference waveform corresponding to an ultrasonic waveform measured in a no load condition of the inspection tool 1. A CPU 43 makes a judgement on whether the soldering condition of the soldered portion of the electronic component is acceptable or not based on a difference between the reference waveform and the waveform measured by the measuring device 40.
摘要翻译：测量装置40测量提供给检查工具1的超声波。目标能量存储部分45当检查工具1被按压在正确焊接的电子部件的焊接部分上时，存储由检查工具1消耗的目标能量在基板上。参考波形存储部分44存储与在检查工具1的空载条件下测量的超声波形相对应的参考波形.CPU43判断电子部件的焊接部分的焊接状态是否可接受基于由测量装置40测量的参考波形和波形之间的差异。

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