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    • 2. 发明专利
    • Pattern forming method and optical element
    • 图案形成方法和光学元件
    • JP2005122047A
    • 2005-05-12
    • JP2003359473
    • 2003-10-20
    • Tetsuya HamaguchiMasayuki NakaoSharp Corpシャープ株式会社政之 中尾哲也 濱口
    • HATANO AKITSUGUNAKAO MASAYUKIHAMAGUCHI TETSUYA
    • G02B5/18
    • PROBLEM TO BE SOLVED: To provide a method of forming a pattern having higher dimensional precision than heretofore by using photosetting resin.
      SOLUTION: The pattern forming method includes steps: of preparing a mold 31 having a first principal plane on which recesses 31r arranged in a prescribed pattern are formed; a process of preparing a base plate 32 having light transparency; of forming a thin film 33 of photosetting resin on the first surface of the base plate; of pressing the first principal plane of the mold 31 against the thin film 33; of irradiating the thin film 33 from the base plate 32 side with light and curing the photosetting resin; and of separating the mold 31 and the base plate 32. The recesses 31r of the mold 31 have side surfaces 31s with high wettability by the photosetting resin and bottom surfaces 31b with lower wettability by the photosetting resin than the wettability of the side surfaces. The thin film 33 of the photosetting resin may be formed on the first principal plane side of the mold 31.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种通过使用光固化树脂形成具有比以前更高的尺寸精度的图案的方法。 解决方案:图案形成方法包括以下步骤:制备具有第一主平面的模具31,其上形成有以规定图案布置的凹部31r; 准备具有透光性的基板32的工序; 在基板的第一表面上形成光固化树脂的薄膜33; 将模具31的第一主平面压在薄膜33上; 用光从基板32侧照射薄膜33,固化光固化树脂; 并且分离模具31和基板32.模具31的凹部31r具有通过光固化树脂和底面31b具有高润湿性的侧表面31s,其通过光固化树脂具有较低润湿性,而不是侧表面的润湿性。 光固化树脂的薄膜33可以形成在模具31的第一主平面侧上。版权所有(C)2005,JPO&NCIPI
    • 3. 发明专利
    • Pattern forming method and pattern forming equipment
    • 图案形成方法和图案形成设备
    • JP2005135957A
    • 2005-05-26
    • JP2003367147
    • 2003-10-28
    • Tetsuya HamaguchiMasayuki NakaoSharp Corpシャープ株式会社政之 中尾哲也 濱口
    • HATANO AKITSUGUNAKAO MASAYUKIHAMAGUCHI TETSUYA
    • G03F7/38B29C43/18B29D7/00B82B3/00H01L21/027
    • PROBLEM TO BE SOLVED: To provide a pattern forming method with which a pattern of a large area can be formed with high dimensional accuracy by using photocurable resin. SOLUTION: The method includes a process for preparing a mold having a first main face where recessed parts arranged by the prescribed pattern are formed, a process for forming a thin film of photocurable resin on the first surface of a substrate, a process for bringing the first main face of the mold into close contact with the first surface of the substrate under a pressure atmosphere lower than atmospheric pressure, a process for holding the substrate and the mold under a pressurized atmosphere in a state where the first main face of the mold is closely brought into contact with the first surface of the substrate, a process for irradiating the thin film with light and hardening photocurable resin, and a process for separating the mold and the substrate. The thin film of photocurable resin can be formed on a first main face-side of the mold. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种图案形成方法,通过使用光固化树脂,可以以高尺寸精度形成大面积的图案。 解决方案:该方法包括一种用于制备具有第一主面的模具的方法,其中形成了通过规定图案排列的凹部,在基板的第一表面上形成光固化树脂薄膜的工艺, 用于使模具的第一主面在低于大气压的压力氛围下与基板的第一表面紧密接触;将基板和模具保持在加压气氛的状态下,在第一主面 模具紧密地与基板的第一表面接触,用光和硬化光固化树脂照射薄膜的方法,以及分离模具和基板的工艺。 可光固化树脂的薄膜可以形成在模具的第一主面侧上。 版权所有(C)2005,JPO&NCIPI