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    • 5. 发明申请
    • Oscillator device and method for manufacturing the device
    • 振荡器装置及其制造方法
    • US20070188045A1
    • 2007-08-16
    • US10593542
    • 2005-02-23
    • Tomoo IkedaIsao AraiHiroshi Miyauchi
    • Tomoo IkedaIsao AraiHiroshi Miyauchi
    • H01L41/00
    • H03H9/21G01C19/5607H03H9/0547H03H9/1021H03H2003/026
    • An object of the present invention is to provide a compact and highly reliable oscillator device having stable vibration characteristics, the object being achieved by constructing the oscillator device by bonding an oscillator in place by accurately positioning it, in a prescribed position and at a prescribed angle, inside a package. The oscillator device according to the present invention includes an oscillator having a vibrating prong and a base portion with a first reference portion, a package, a mounting base with a second reference portion provided inside the package, and a bonding material for fixing the oscillator to the mounting base by aligning the first reference portion with the second reference portion by utilizing a self-alignment effect occurring due to surface tension.
    • 本发明的目的是提供一种具有稳定振动特性的紧凑且高可靠性的振荡器装置,该目的通过构造振荡器装置来实现,该振荡器装置通过将振荡器精确地定位在规定位置并以规定角度 ,一个包里面 根据本发明的振荡器件包括具有振动尖头的振荡器和具有第一参考部分的基座部分,封装件,设置在封装内部的具有第二参考部分的安装基座,以及用于将振荡器固定到 通过利用由于表面张力产生的自对准效应将第一参考部分与第二参考部分对准来安装基座。
    • 7. 发明授权
    • Meeting support apparatus, method and program
    • 会议支持设备,方法和程序
    • US08676578B2
    • 2014-03-18
    • US13071548
    • 2011-03-25
    • Tomoo IkedaNobuhiro ShimogoriKouji Ueno
    • Tomoo IkedaNobuhiro ShimogoriKouji Ueno
    • G10L15/26
    • G10L15/1807G10L15/04
    • According to one embodiment, a meeting support apparatus includes a storage unit, a determination unit, a generation unit. The storage unit is configured to store storage information for each of words, the storage information indicating a word of the words, pronunciation information on the word, and pronunciation recognition frequency. The determination unit is configured to generate emphasis determination information including an emphasis level that represents whether a first word should be highlighted and represents a degree of highlighting determined in accordance with a pronunciation recognition frequency of a second word when the first word is highlighted, based on whether the storage information includes second set corresponding to first set and based on the pronunciation recognition frequency of the second word when the second set is included. The generation unit is configured to generate an emphasis character string based on the emphasis determination information when the first word is highlighted.
    • 根据一个实施例,会议支持装置包括存储单元,确定单元,生成单元。 存储单元被配置为存储每个单词的存储信息,指示单词的存储信息,单词上的发音信息和发音识别频率。 所述确定单元被配置为产生强调确定信息,所述强调确定信息包括强调级别,所述强调级别表示当所述第一单词被突出显示时,所述强调级别是否应突出显示第一单词,并且表示根据第一单词的发音识别频率确定的高亮度, 存储信息是否包括对应于第一集合的第二集合以及当包括第二集合时基于第二字的发音识别频率。 生成单元被配置为当第一个单词被突出显示时,基于强调确定信息生成强调字符串。
    • 8. 发明授权
    • Crystal device and method for manufacturing crystal device
    • 晶体装置及其制造方法
    • US08258676B2
    • 2012-09-04
    • US12801020
    • 2010-05-17
    • Tomoo Ikeda
    • Tomoo Ikeda
    • H01L41/00H02N2/00
    • H03H9/21H03H3/02Y10T29/42
    • A crystal device that has stable vibration characteristics and that offers high reliability and high accuracy. The crystal device includes a first major face, which contains a portion of a base and a portion of a vibrating prong within a single plane, formed on the crystal plate, and a second major face, which contains another portion of the base and another portion of the vibrating prong within a single plane, formed on a crystal plate, wherein the first major face and the second major face have different outer shapes. The shapes of the first and second major faces can be produced by first forming mask layer patterns on a crystal substrate by exposure through different mask patterns and then etching the crystal substrate using the thus formed mask layer patterns.
    • 具有稳定振动特性,提供高可靠性,高精度的晶体元件。 晶体装置包括第一主面,其包含形成在晶体板上的单个平面内的基部的一部分和振动尖端的一部分,以及第二主面,其包含基部的另一部分和另一部分 形成在晶体板上的单个平面内的振动尖头,其中第一主面和第二主面具有不同的外形。 可以通过首先通过不同掩模图案的曝光在晶体衬底上形成掩模层图案,然后使用如此形成的掩模层图案来蚀刻晶体衬底来产生第一和第二主面的形状。