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1. 发明申请

US20110217148A1 VACUUM PROCESSING APPARATUS AND PROGRAM 有权
标题翻译：真空加工设备和程序
公开(公告)号：US20110217148A1
公开(公告)日：2011-09-08
申请号：US13021898
申请日：2011-02-07
申请人： Teruo NAKATA , Hideaki Kondo , Susumu Tauchi , Keita Nogi
发明人： Teruo NAKATA , Hideaki Kondo , Susumu Tauchi , Keita Nogi
IPC分类号： H01L21/677
CPC分类号： H01L21/677 , Y02P90/02 , Y10T29/41
摘要： The present invention provides an efficient transferring control method in a vacuum processing apparatus of a linear tool in which plural vacuum robots are arranged in transferring mechanical units to which process chambers are connected and processing-target members are passed and received among the plural vacuum robots. In addition, the present invention provides a vacuum processing apparatus in which there are provided plural controlling methods, and a unit which determines whether rates of the transferring robots are to be controlled or rates of the process chambers are to be controlled on the basis of processing time of each processing-target member and switches the controlling method in accordance with a site whose rate is controlled.
摘要翻译：本发明提供了一种线性工具的真空处理装置中的有效的传送控制方法，其中多个真空机器人被布置成传送处理室连接的机械单元，并且处理对象构件在多个真空机器人之间通过和接收。此外，本发明提供一种真空处理装置，其中提供多种控制方法，以及一个单元，其确定是否要控制转移机器人的速率或者基于处理来控制处理室的速率每个处理目标成员的时间，并且根据控制速率的站点来切换控制方法。

2. 发明申请

US20120303158A1 VACUUM PROCESS DEVICE AND VACUUM PROCESS METHOD 有权
标题翻译：真空过程装置和真空过程方法
公开(公告)号：US20120303158A1
公开(公告)日：2012-11-29
申请号：US13479518
申请日：2012-05-24
申请人： Teruo NAKATA , Keita Nogi , Satomi Inoue , Michinori Kawaguchi
发明人： Teruo NAKATA , Keita Nogi , Satomi Inoue , Michinori Kawaguchi
IPC分类号： H01L21/677 , G06F7/00
CPC分类号： G05B19/41865 , G05B2219/45032 , H01L21/67276 , Y02P90/18 , Y02P90/20
摘要： An efficient method of controlling transportation in a linear tool type vacuum process device in a state that a length of time required for a process is not stable. For each process chamber, the number of unprocessed wafers that are in process or are being transported to the process chamber is counted, and in deciding a transport destination of a wafer, when the number of unprocessed wafers is equal to or larger than a charge limit amount, a transport destination of a wafer is decided excluding the process chamber. Also, a wafer holding mechanism on a transport path to a process chamber is reserved, and a transport destination of a processed member to be transported next is decided according to a status of reservation.
摘要翻译：一种在线性工具式真空处理装置中控制运输的有效方法，其处理过程所需的时间长度不稳定。对于每个处理室，计数正在处理或正在运送到处理室的未处理晶片的数量，并且在确定晶片的传送目的地时，当未处理的晶片的数量等于或大于充电极限除了处理室之外，决定晶片的传送目的地。此外，保留了到处理室的传送路径上的晶片保持机构，并且根据预约状态来决定随后要传送的被处理部件的传送目的地。

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