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1. 发明专利

JP2008013801A Plating method and method for producing microdevice 有权
标题翻译：制造微型器件的制造方法和方法
公开(公告)号：JP2008013801A
公开(公告)日：2008-01-24
申请号：JP2006184786
申请日：2006-07-04
申请人： Tdk Corp , Tdk株式会社
发明人： UEJIMA SATOSHI , YAMAGUCHI ATSUSHI , SAITO MASAHIRO , MIYATA SHINGO , OTSUBO YUJI , HORIUCHI SOHEI
IPC分类号： C25D5/10 , C25D5/02 , C25D7/12
CPC分类号： H05K3/243 , C25D5/022 , C25D5/10 , H05K3/241 , H05K2203/0574
摘要： PROBLEM TO BE SOLVED: To provide a plating method for forming plating patterns of a plurality of layers without complicating an operation so that each layer has almost the same composition.
SOLUTION: Since the total area of a resist pattern 13, the total area of a resist pattern 17 and the total area of a resist pattern 18 are all made equal, the areas of plating regions R13, R17 and R18 in plating each plating pattern A to C can be made always uniform. Thus, plating current density can be uniformly held with ease without changing current value, and the plating patterns A to C having almost equal compositions each other can consequently be extremely efficiently formed.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于形成多层的电镀图案的电镀方法，而不会使操作复杂化，使得每层具有几乎相同的组成。解决方案：由于抗蚀剂图案13的总面积，抗蚀剂图案17的总面积和抗蚀剂图案18的总面积全部相等，因此电镀区域R13，R17和R18的面积分别为电镀图案A至C可以总是均匀。因此，可以容易地均匀地保持电镀电流密度而不改变电流值，因此可以非常有效地形成具有几乎相同组成的电镀图案A至C. 版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2007279373A Forming method for resist pattern and manufacturing method for perpendicular magnetic recording head 有权
标题翻译：用于电磁记录头的电阻图案和制造方法的形成方法
公开(公告)号：JP2007279373A
公开(公告)日：2007-10-25
申请号：JP2006105343
申请日：2006-04-06
申请人： Tdk Corp , Tdk株式会社
发明人： UEJIMA SATOSHI
IPC分类号： G03F7/20 , G03F1/00 , G03F1/70 , G03F7/40 , G11B5/31
CPC分类号： G11B5/3163 , G03F7/40 , G11B5/1278 , G11B5/3116
摘要： PROBLEM TO BE SOLVED: To provide a forming method for a resist pattern in which a three dimensional shape of the resist pattern can sufficiently be controlled. SOLUTION: After a preparatory resist pattern 63 having a projection part 63T at a position P3 corresponding to a flare point is formed by selectively exposing and developing a resist film, the preparatory resist pattern 63 is heated to form a resist pattern for forming a main magnetic pole layer. In the heating process, an influence of thermal contraction is reduced because the projection part 63T is formed on the preparatory resist pattern 63, so the preparatory resist pattern 63 is not apt to become round at the position P3. Further, the preparatory resist pattern 63 has thermal flow and thermal contraction in the heating process and then while an internal wall of an opening part 63K tilts, the projection part 63T moves back. Consequently, a photoresist pattern is nearly in a desired three dimensional shape. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可以充分地控制抗蚀剂图案的三维形状的抗蚀剂图案的形成方法。解决方案：在通过选择性地曝光和显影抗蚀剂膜形成具有突起部分63T在与扩张点相对应的位置P3处的预备抗蚀剂图案63之后，加热预备抗蚀剂图案63以形成抗蚀剂图案以形成主磁极层。在加热过程中，由于突起部63T形成在预备抗蚀图案63上，因此预备抗蚀剂图案63在位置P3处不易变圆，所以热收缩的影响减小。此外，准备抗蚀剂图案63在加热过程中具有热流和热收缩，然后在开口部63K的内壁倾斜的同时，突出部63T向后移动。因此，光致抗蚀剂图案几乎处于所需的三维形状。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2007154244A Method for forming thin-film pattern, method for producing magneto-resistive effect element and method for manufacturing thin-film magnetic head 有权
标题翻译：形成薄膜图案的方法，用于制造磁阻效应元件的方法和制造薄膜磁头的方法
公开(公告)号：JP2007154244A
公开(公告)日：2007-06-21
申请号：JP2005349534
申请日：2005-12-02
申请人： Tdk Corp , Tdk株式会社
发明人： HADATE HITOSHI , UEJIMA SATOSHI
IPC分类号： C23F4/00 , G11B5/39 , H01L21/3065 , H01L43/08
摘要： PROBLEM TO BE SOLVED: To provide a method for forming a thin-film pattern having a fine pattern width with high accuracy without depending on the resolution limit of an aligner. SOLUTION: This pattern-forming method comprises the steps of: forming a preliminary thin-film pattern (top face 2A and side face 2B) by selectively etching the thin film with the use of a mask pattern having an undercut part; forming an etching protection film so as to cover the top face 2A and side face 2B of the preliminary thin-film pattern; and forming the thin film pattern 7 (side face 2C) by selectively etching the preliminary thin-film pattern by using the etching protection film as a mask. A pattern width of the thin-film pattern 7 is determined on the basis of two side faces 2B and 2C which are formed through the two-step etching process. Besides, the pattern width of the thin-film pattern 7 is controlled on the basis of the width of the top face 2A and a tilted angle of the side faces 2B and 2C, with high precision. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于形成具有高精度的精细图案宽度的薄膜图案的方法，而不依赖于对准器的分辨率极限。解决方案：该图案形成方法包括以下步骤：通过使用具有底切部分的掩模图案选择性地蚀刻薄膜来形成预备薄膜图案（顶面2A和侧面2B）形成蚀刻保护膜以覆盖预备薄膜图案的顶面2A和侧面2B; 并通过使用蚀刻保护膜作为掩模来选择性地蚀刻预备薄膜图案来形成薄膜图案7（侧面2C）。基于通过两步蚀刻工艺形成的两个侧面2B和2C来确定薄膜图案7的图案宽度。此外，基于顶面2A的宽度和侧面2B和2C的倾斜角度，以高精度控制薄膜图案7的图案宽度。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2006201227A Method for forming pattern membrane and method for manufacturing thin membrane magnetic head 审中-公开
标题翻译：形成图案膜的方法及制造薄膜磁头的方法
公开(公告)号：JP2006201227A
公开(公告)日：2006-08-03
申请号：JP2005010002
申请日：2005-01-18
申请人： Tdk Corp , Tdk株式会社
发明人： UEJIMA SATOSHI
IPC分类号： G03F7/26 , G03F7/40 , G11B5/31
摘要： PROBLEM TO BE SOLVED: To provide a method for forming a pattern membrane by which the pattern membrane having a quadrangular cross-sectional shape in which two cross-sectional angles specified at both ends of long sides among mutually facing long sides and shot sides are mutually different is formed with high accuracy as much as possible.
SOLUTION: After forming a covering membrane 105 so that inner walls 105WR, 105WL for demarcating a pattern formation area 105P in an opening 102K incline at mutually different angles (inclination angles βR, βL) by forming a basic membrane 102 provided with the opening 102K and succeedingly performing filming processing (at a filming angle ω) in the slant direction using filming technique (for example, an inclination spattering method) having anisotropy in the filming direction, the pattern membrane is formed in the pattern formation area 105P. When the pattern membrane is formed so that it has the quadrangular cross-sectional shape in which the two cross-sectional shapes are mutually different, setting accuracy of the two cross-sectional angles is enhanced.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决问题的方案：提供一种形成图案膜的方法，通过该方法形成具有四边形横截面形状的图案膜，其中在相互面对的长边中的长边两端所规定的两个横截面角和拍摄侧面是相互不同的，尽可能高精度地形成。解决方案：在形成覆盖膜105之后，使用于限定开口102K中的图案形成区域105P的内壁105WR，105WL以相互不同的角度倾斜（倾斜角度βR，βL），通过形成设置有开口102K，并且使用在成膜方向上具有各向异性的成像技术（例如，倾斜溅射法）在倾斜方向上进行成像处理（成像角度ω），在图案形成区域105P中形成图案膜。当图案膜形成为具有两个横截面形状相互不同的四边形横截面形状时，两个横截面角的设定精度提高。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2006147147A Manufacturing method of thin film magnetic head 审中-公开
标题翻译：薄膜磁头的制造方法
公开(公告)号：JP2006147147A
公开(公告)日：2006-06-08
申请号：JP2006054572
申请日：2006-03-01
申请人： Tdk Corp , Tdk株式会社
发明人： UEJIMA SATOSHI
IPC分类号： G11B5/31
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin film magnetic head in which narrowing track width and improving an overwrite property can be achieved simultaneously.
SOLUTION: This method is a manufacturing method of a thin film magnetic head in which after a layer for lower part magnetic pole is laminated, a layer for recording gap is laminated, a coil is formed on a layer for recording gap, while an upper magnetic pole 60 is formed, a shape of the upper part magnetic pole 60 seen from an ABS direction is formed so that width to a position being separated from a first end of a recording gap side by at least the prescribed distance is equal and the width is increased continuously to a second end being an end of an opposite side of the recording gap from the position being separated by the prescribed distance, and the width of the second end is wider than the width of the first end by controlling a focal position of a exposure of a resist in a frame plating method.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：提供可以同时实现窄轨道宽度和提高覆盖性能的薄膜磁头的制造方法。解决方案：该方法是一种薄膜磁头的制造方法，其中在层叠用于下部磁极的层之后，层压用于记录间隙的层，在用于记录间隙的层上形成线圈，同时形成上磁极60，形成从ABS方向看去的上部磁极60的形状，使得到与记录间隙侧的第一端分开至少规定距离的位置的宽度相等，宽度连续增加到作为记录间隙的相对侧的距离被隔开规定距离的位置的第二端，并且通过控制焦点，第二端的宽度比第一端的宽度宽抗蚀剂在框架电镀法中曝光的位置。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2005322332A Manufacturing method of thin film magnetic head and forming method of magnetic layer pattern 审中-公开
标题翻译：薄膜磁头的制造方法和磁层图案的形成方法
公开(公告)号：JP2005322332A
公开(公告)日：2005-11-17
申请号：JP2004139958
申请日：2004-05-10
申请人： Tdk Corp , Tdk株式会社
发明人： KAJI RINA , UEJIMA SATOSHI , AOKI SUSUMU , TAKEO KENJI
IPC分类号： G11B5/31
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin film magnetic head capable of both suppressing generation of side erase and securing overwriting characteristics. SOLUTION: A photoresist pattern 35 is formed so that an aperture width of an aperture 35K is gradually narrowed as the aperture approaches a seed layer 12 by exposing a photoresist film to light while a reflection suppressing layer 31 is formed in an area F1 to perform patterning and then a precursor magnetic pole partial layer 13AZ is formed in the aperture 35K of the photoresist pattern 35. Since relative difference in the exposure range of the photoresist film is generated based on existence of the reflection suppressing layer 31 between the area F1 and an area F2, a tilt angle ωR of a defined surface 35RM of the photoresist pattern 35 is made larger than a tilt angle ωL of a defined surface 35LM. Thereby, the precursor magnetic pole partial layer 13AZ is formed so that its sectional shape is asymmetrical reversed trapezoidal shape reflecting size relation between tilt angles ωR and ωL. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供能够抑制副边擦除的产生并确保覆盖特性的薄膜磁头的制造方法。解决方案：形成光致抗蚀剂图案35，使得孔径35K的孔径宽度随着孔径接近种子层12而逐渐变窄，通过将光致抗蚀剂膜曝光，同时在区域F1中形成反射抑制层31 进行图案化，然后在光致抗蚀剂图案35的孔35K中形成前体磁极部分层13AZ。由于基于区域F1之间的反射抑制层31的存在而产生光致抗蚀剂膜的曝光范围的相对差异并且区域F2，使光致抗蚀剂图案35的限定表面35RM的倾斜角ωR大于限定表面35LM的倾斜角度ωL。因此，前体磁极部分层13AZ形成为反映了倾斜角ωR和ωL之间的尺寸关系的不对称的反向梯形形状。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2005158192A Method for manufacturing thin-film magnetic head, and method for forming magnetic layer pattern 审中-公开
标题翻译：制造薄膜磁头的方法和形成磁层图案的方法
公开(公告)号：JP2005158192A
公开(公告)日：2005-06-16
申请号：JP2003398006
申请日：2003-11-27
申请人： Tdk Corp , Tdk株式会社
发明人： UEJIMA SATOSHI
IPC分类号： G11B5/31 , B05D5/12 , G11B5/855
CPC分类号： G11B5/855 , Y10T29/49021 , Y10T29/49025 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin-film magnetic head that can both suppress side erasure and secure overwriting characteristics. SOLUTION: When a magnetic pole part layer is formed as a discharge part for magnetic flux, a photoresist pattern 33 is formed so that two frame parts 33R and 33L sectioning an opening 33K have different width from each other, and heated to deform the frame parts 33R and 33L, and thus the width of the opening 33K is made gradually narrower toward a seed layer 12; and then a pre-drive magnetic pole part layer 13AZ is formed in the opening 33K of the photoresist pattern 33 and polished to form an air bearing face, thereby forming the magnetic pole part layer so that an exposure surface exposed in the air bearing surface is in a right-left asymmetrical inverted trapezoid shape. Based upon the shape feature of the exposure surface, suppression of side erasure and securing of overwriting characteristics are both realized. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够抑制侧面擦除和安全覆盖特性的薄膜磁头的制造方法。解决方案：当磁极部分层被形成为用于磁通量的放电部分时，形成光致抗蚀剂图案33，使得分隔开口33K的两个框架部分33R和33L彼此具有不同的宽度，并被加热变形框架部件33R和33L以及开口33K的宽度朝向种子层12逐渐变窄; 然后将预驱动磁极部分层13AZ形成在光致抗蚀剂图案33的开口33K中并被抛光以形成空气轴承面，从而形成磁极部分层，使得暴露在空气轴承表面中的暴露表面为在左右不对称倒梯形。基于曝光表面的形状特征，实现了侧面擦除的抑制和覆盖特性的确保。版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2004103809A Magnetoresistive effect element, thin film magnetic head, magnetic head equipment, magnetic recording and reproducing device and manufacturing method of the element or the head 审中-公开
公开(公告)号：JP2004103809A
公开(公告)日：2004-04-02
申请号：JP2002263259
申请日：2002-09-09
申请人： Tdk Corp , Tdk株式会社
发明人： UEJIMA SATOSHI , KUWAJIMA TETSUYA
IPC分类号： G11B5/39 , H01L43/08 , H01L43/12
摘要： PROBLEM TO BE SOLVED: To provide a magnetoresistive effect element, a thin film magnetic head, a magnetic head equipment and a magnetic recording and reproducing device, which surely prevent the leakage of sense current and which are capable of easily coping with the narrowing of a track. SOLUTION: A GMR film 30 comprises a free layer 301 and provided with stepped parts 96, 97, which fall at both ends of widthwise direction on at least one surface side of both sides in the direction of thickness of the film. Respective electrode films 25, 26 are neighbored to both surfaces of the GMR film 30. Magnetic domain control films 21, 22 are arranged at both side parts in the widthwise direction of the GMR film 30 with spaces ▵W11, ▵W12 to control the magnetic domains on the free layer 301. Insulating layers 23, 24 fill spaces between the magnetic domain control films 21, 22 and electrode films 25, 26, and other space between the electrode films 25, 26 and th GMR film 30. The spaces ▵W11, ▵W12, which are generated between the magnetic domain control films 21, 22 and the GMR film 30, are formed so as to be filled and, further, the stepped parts 96, 97 are formed so as to be filled. COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2004103244A Thin film coil and manufacturing method therefor, and thin film magnetic head and manufacturing method therefor 审中-公开
标题翻译：薄膜线圈及其制造方法及薄膜磁头及其制造方法
公开(公告)号：JP2004103244A
公开(公告)日：2004-04-02
申请号：JP2003380620
申请日：2003-11-11
申请人： Tdk Corp , Tdk株式会社
发明人： UEJIMA SATOSHI
IPC分类号： G11B5/31
摘要： PROBLEM TO BE SOLVED: To realize an easy-to-manufacture thin film coil having a small coil pitch and a large cross section.
SOLUTION: The thin film magnetic head is provided with a reproducing head and a recording head. The recording head has a lower magnetic pole layer 8 and an upper magnetic pole layer (a magnetic pole layer 41, a magnetic layer 42, and a yoke layer 43), a recording gap layer 12 provided between each magnetic pole part of these two magnetic layers, and a thin film coil a part of which is at least placed between these two magnetic poles and is insulated from them. The thin film coil has 1st layer part 31 and 2nd layer part 34 arranged across the recording gap layer 12. Each one end part of the 1st layer part 31 and the 2nd layer part 34 is connected to each other via connection parts 31a, 34a, respectively, and each other end of the 1st layer parts 31 and the 2nd layer part 34 is connected to each other via connection parts 31b, 34b, respectively.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：实现具有小线圈间距和大横截面的易于制造的薄膜线圈。
解决方案：薄膜磁头设置有再现头和记录头。记录头具有下磁极层8和上磁极层（磁极层41，磁性层42和磁轭层43），设置在这两个磁性层的每个磁极部分之间的记录间隙层12 层和薄膜线圈，其一部分至少放置在这两个磁极之间并与它们绝缘。薄膜线圈具有跨越记录间隙层12布置的第一层部分31和第二层部分34.第一层部分31和第二层部分34的每一个端部经由连接部分31a，34a彼此连接，并且第一层部分31和第二层部分34的彼此的端部分别通过连接部分31b，34b相互连接。版权所有（C）2004，JPO

10. 发明专利

JP2004102093A Water soluble resin mixture and method for forming patterned resist layer 审中-公开
公开(公告)号：JP2004102093A
公开(公告)日：2004-04-02
申请号：JP2002266308
申请日：2002-09-12
申请人： Tdk Corp , Tdk株式会社
发明人： UEJIMA SATOSHI
IPC分类号： G03F7/038 , G03F7/26 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a water soluble resin mixture which is suitable as a material of a separate layer arranged between adjacent resist layers in a patterned resist layer formed by using a plurality of laminated resist layers and a method for forming the patterned resist layer which uses the same.
SOLUTION: The patterned resist layer 110 has a first resist layer 102A and a second resist layer 105A which are laminated and the separate layer 104 arranged between them. The separate layer 104 is formed by using the water soluble resin mixture. The water soluble resin mixture contains one kind of water soluble resin, a mixture of two or more kinds of water soluble resins, a mixture of a copolymer of two or more kinds of water soluble resins and one kind of water soluble crosslinking agent or two or more kinds of water soluble crosslinkinging agents, or a mixture of one kind of acid producing agent which produces acid by being exposed or heated or two or more kinds of acid producing agents.
COPYRIGHT: (C)2004,JPO

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