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1. 发明申请

US20070062557A1 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus 失效
标题翻译：光刻设备包括放电发生器和用于清洁光刻设备元件的方法
公开(公告)号：US20070062557A1
公开(公告)日：2007-03-22
申请号：US11367693
申请日：2006-03-06
申请人： Tatyana Rakhimova , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Johannes Moors , Aleksander Kovalev , Dmitriy Lopaev
发明人： Tatyana Rakhimova , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Johannes Moors , Aleksander Kovalev , Dmitriy Lopaev
IPC分类号： B08B6/00 , C25F5/00 , C25F3/30 , C25F1/00
CPC分类号： G03F7/70925 , G03F7/70933 , G21K2201/06
摘要： A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.
摘要翻译：用于清洁光刻设备的元件的方法，例如诸如集光镜的光学元件，包括提供含氮的气体; 从至少部分气体产生氮自由基，从而形成含有自由基的气体; 以及将至少部分含自由基的气体提供给所述装置的一个或多个元件。光刻设备包括源和光学元件，以及布置成产生射频放电的放电发生器。

2. 发明申请

US20070152175A1 Radiation source 失效
标题翻译：辐射源
公开(公告)号：US20070152175A1
公开(公告)日：2007-07-05
申请号：US11319770
申请日：2005-12-29
申请人： Johannes Moors , Vadim Banine , Johannes Christiaan Franken , Vladimir Ivanov , Konstantin Koshelev , Alexander Struycken
发明人： Johannes Moors , Vadim Banine , Johannes Christiaan Franken , Vladimir Ivanov , Konstantin Koshelev , Alexander Struycken
IPC分类号： G21G4/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.
摘要翻译：辐射源产生用于光刻的短波长辐射，例如极紫外辐射。提供旋转电极，其浸入液体金属例如锡的各个浴中。在电极之间产生放电以产生辐射。在电极周围设置孔和/或在电极周围的金属屏蔽板中，以便在排出附近更好地向下降低压力以提高源的转换效率。电极中的孔通过搅拌液态金属而改善电极的冷却，并改善电极和液态金属之间的热和电接触。改善的电接触也降低了放电电路的时间常数，从而进一步提高了源的转换效率。

3. 发明申请

US20060219950A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060219950A1
公开(公告)日：2006-10-05
申请号：US11094490
申请日：2005-03-31
申请人： Levinus Bakker , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Bastiaan Mertens , Johannes Moors , Frank Schuurmans , Givi Zukavishvili , Bastiaan Wolschrijn , Marc Van Der Velden
发明人： Levinus Bakker , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Bastiaan Mertens , Johannes Moors , Frank Schuurmans , Givi Zukavishvili , Bastiaan Wolschrijn , Marc Van Der Velden
IPC分类号： G03F7/20 , G21K5/00
CPC分类号： G03F7/70933 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.
摘要翻译：光刻设备被布置成将来自辐射源的光束投影到基底上。该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合到用于供应气体的气体入口。气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

4. 发明申请

US20050122491A1 Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby 失效
标题翻译：具有污染抑制的光刻设备，器件制造方法以及由此制造的器件
公开(公告)号：US20050122491A1
公开(公告)日：2005-06-09
申请号：US10985037
申请日：2004-11-10
申请人： Levinus Bakker , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Vladimir Krivtsun
发明人： Levinus Bakker , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Vladimir Krivtsun
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70908 , G03F7/70916
摘要： A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.
摘要翻译：提供光刻投影装置。该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。图案形成装置用于根据期望的图案对辐射束进行图案化。该装置还包括用于保持基板的基板台，用于将图案化的辐射束投影到基板的目标部分上的投影系统，以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元，以用作吸收剂用于辐射束中的污染颗粒。吸气剂颗粒具有至少约1nm的直径。

5. 发明申请

US20070001126A1 Lithographic apparatus, radiation system and device manufacturing method 失效
标题翻译：光刻设备，辐射系统和器件制造方法
公开(公告)号：US20070001126A1
公开(公告)日：2007-01-04
申请号：US11170788
申请日：2005-06-30
申请人： Robert Gayazov , Vadim Banine , Vladimir Ivanov , Evgenii Korob , Konstantin Koshelev , Givi Zukavishvili , Yurii Sidelnikov
发明人： Robert Gayazov , Vadim Banine , Vladimir Ivanov , Evgenii Korob , Konstantin Koshelev , Givi Zukavishvili , Yurii Sidelnikov
IPC分类号： A61N5/00
CPC分类号： G03F7/70916
摘要： A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.
摘要翻译：箔陷阱位于辐射束的路径中。箔阱包括导电条的阵列。电压施加电路耦合到条带以在相邻条带之间施加电压差。电压施加电路包括限流电路，其被布置为将电流限制到条带以下的值到低于阈值的值，在该阈值以上可能在箔阱中产生自持电弧放电。

6. 发明申请

US20050253092A1 Radiation source, lithographic apparatus, and device manufacturing method 审中-公开
公开(公告)号：US20050253092A1
公开(公告)日：2005-11-17
申请号：US11187860
申请日：2005-07-25
申请人： Givi Zukavishvili , Vladimir Ivanov , Konstantin Koshelev , Evgenil Korob , Vadim Banine , Pavel Antsiferov
发明人： Givi Zukavishvili , Vladimir Ivanov , Konstantin Koshelev , Evgenil Korob , Vadim Banine , Pavel Antsiferov
IPC分类号： G21K5/00 , F28D15/02 , G03F7/20 , G21K5/02 , G21K5/08 , H01L21/027 , H05G2/00 , H05H1/24 , G03C5/00
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.

7. 发明申请

US20050121624A1 Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation 有权
标题翻译：光刻设备，照明系统和提供EUV辐射投影光束的方法
公开(公告)号：US20050121624A1
公开(公告)日：2005-06-09
申请号：US10727035
申请日：2003-12-04
申请人： Vladimir Ivanov , Vadim Banine , Konstantin Koshelev
发明人： Vladimir Ivanov , Vadim Banine , Konstantin Koshelev
IPC分类号： G21K5/02 , G03F7/20 , H01L21/027 , H05G2/00 , G03C5/16
CPC分类号： G03F7/70858 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation, and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is arranged to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.
摘要翻译：公开了一种光刻设备。光刻设备包括提供辐射束的照明系统和支撑图形结构的支撑结构。图案形成结构被配置为在其横截面中赋予辐射束图案。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。照明系统包括产生极紫外辐射的辐射生产系统和收集极紫外辐射的辐射收集系统。作为极紫外线辐射产物的副产物产生的颗粒基本上沿颗粒移动方向移动。辐射采集系统被布置成收集与收集方向辐射的极微紫外辐射，其与颗粒运动方向基本上不同。

8. 发明申请

US20070069159A1 Electromagnetic radiation source, lithographic apparatus, device manufacturing method and device manufactured thereby 失效
标题翻译：电磁辐射源，光刻设备，器件制造方法和由此制造的器件
公开(公告)号：US20070069159A1
公开(公告)日：2007-03-29
申请号：US11525224
申请日：2006-09-22
申请人： Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Robert Gayazov , Vladimir Krivtsun
发明人： Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Robert Gayazov , Vladimir Krivtsun
IPC分类号： G21G4/00
CPC分类号： H05G2/003 , H05G2/005
摘要： A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.
摘要翻译：基于放电产生辐射源的装置包括阴极和阳极。在包含两种或更多种物质的合金的材料中产生放电。

9. 发明申请

US20060268246A1 Lithographic device, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷装置，装置制造方法和由此制造的装置
公开(公告)号：US20060268246A1
公开(公告)日：2006-11-30
申请号：US11391731
申请日：2006-03-29
申请人： Johannes Jacobs , Vadim Banine , Barrie Brewster , Vladimir Ivanov , Bastiaan Mertens , Johannes Moors , Robert Livesey , Baastiaan Wolschrijn
发明人： Johannes Jacobs , Vadim Banine , Barrie Brewster , Vladimir Ivanov , Bastiaan Mertens , Johannes Moors , Robert Livesey , Baastiaan Wolschrijn
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
摘要翻译：光刻设备被配置为将图案从图案形成装置投影到基板上。该装置包括在装置的至少两个不同区域之间延伸的气体净化密封孔，以及构造成为密封孔提供一种或多种选自包括氢，氘，重氢，氘代氢和氩和氢的混合物。

10. 发明申请

US20050139785A1 Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus 有权
标题翻译：光刻设备和辐射源包括用于减轻光刻设备中的碎屑颗粒的碎片减轻系统和方法
公开(公告)号：US20050139785A1
公开(公告)日：2005-06-30
申请号：US10747613
申请日：2003-12-30
申请人： Vadim Banine , Johannes De Kuster , Johannes Moors , Frank Schuurmans , Lucas Stevens
发明人： Vadim Banine , Johannes De Kuster , Johannes Moors , Frank Schuurmans , Lucas Stevens
IPC分类号： G03F7/20
CPC分类号： G03F7/70908 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.
摘要翻译：公开了一种光刻设备。光刻设备包括产生EUV辐射的辐射源，提供由辐射源产生的EUV辐射束的照明系统和支持图案形成结构的支撑结构。图案形成结构被配置为在其横截面中赋予辐射束图案。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。辐射源包括减轻在生成EUV辐射期间形成的碎片颗粒的碎片减轻系统。碎片减轻系统被配置为提供用于与碎屑颗粒相互作用的附加颗粒。

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