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    • 3. 发明授权
    • Solar cell
    • 太阳能电池
    • US4029518A
    • 1977-06-14
    • US633978
    • 1975-11-20
    • Toshinobu MatsutaniKeiichi Nishida
    • Toshinobu MatsutaniKeiichi Nishida
    • H01L31/04H01L31/068H01L31/06
    • H01L31/068Y02E10/547
    • A P-type diffusion layer is formed on an N-type silicon semiconductor wafer to establish a P-N junction in a solar cell, the diffusion layer being exposed to radiation. A pair of electrodes are formed on the surfaces of the diffusion layer and the semiconductor wafer in a desired configuration in order to provide output of electric energy generated by the solar cell. The diffusion layer is formed in such a manner that the layer has a thickness of around 3 .mu.m at areas where the electrode is formed and has a thickness of around or below 0.5 .mu.m at regions on which the electrode is not formed. With such an arrangement, radiation having a wavelength of about or shorter than 400 m.mu.m can be used for performing optoelectric generation.
    • 在N型硅半导体晶片上形成P型扩散层,以在太阳能电池中建立P-N结,扩散层暴露于辐射。 为了提供由太阳能电池产生的电能的输出,在所需的结构中,在扩散层和半导体晶片的表面上形成一对电极。 扩散层形成为在形成电极的区域具有约3μm的厚度,并且在不形成电极的区域具有大约或小于0.5μm的厚度。 通过这样的配置,可以使用波长约为400μm以下的辐射进行光电发电。