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1. 发明授权

US08958049B2 Liquid crystal display panel and repair method thereof 有权
标题翻译：液晶显示面板及其修理方法
公开(公告)号：US08958049B2
公开(公告)日：2015-02-17
申请号：US13700714
申请日：2012-08-02
申请人： Tao Liu , Dong Ye , Liang Xu , Peijian Yan , Xiangdeng Que
发明人： Tao Liu , Dong Ye , Liang Xu , Peijian Yan , Xiangdeng Que
IPC分类号： G02F1/13 , H01L21/70 , H01L27/15 , G02F1/00
CPC分类号： H01L21/707 , G02F1/00 , G02F1/136259 , G02F2001/136268 , H01L27/156
摘要： The present invention provides a LCD panel and a method for repairing the LCD panel. The LCD panel includes a plurality of data lines and a plurality of subpixel areas. Each subpixel area includes a corresponding pixel electrode and thin film transistor. The subpixel area including a spot defect is electrically connected to a neighboring subpixel area having the same color and in normal operation. The connection between the thin film transistor in the subpixel area including the spot defect and the corresponding data line and the connection between the thin film transistor and the corresponding pixel electrode are cut. Consequently, the subpixel area including the bright spot defect is repaired and able to display normally. The display quality of the LCD panel display is improved. Moreover, the present invention repair method is suitable for the repairing of LCD panels without storage capacitors.
摘要翻译：本发明提供一种LCD面板及其修理方法。 LCD面板包括多条数据线和多个子像素区域。每个子像素区域包括相应的像素电极和薄膜晶体管。包括斑点缺陷的子像素区域电连接到具有相同颜色的相邻子像素区域并且在正常操作中。切断包括点缺陷的子像素区域中的薄膜晶体管与对应的数据线之间的连接以及薄膜晶体管和相应的像素电极之间的连接。因此，包括亮点缺陷的子像素区域被修复并且能够正常显示。提高了LCD面板显示的显示质量。此外，本发明的修补方法适用于没有存储电容器的LCD面板的修理。

2. 发明申请

US20140014982A1 Liquid Crystal Display Panel and Repair Method Thereof 有权
标题翻译：液晶显示面板及其修复方法
公开(公告)号：US20140014982A1
公开(公告)日：2014-01-16
申请号：US13700714
申请日：2012-08-02
申请人： Tao Liu , Dong Ye , Liang Xu , Peijian Yan , Xiangdeng Que
发明人： Tao Liu , Dong Ye , Liang Xu , Peijian Yan , Xiangdeng Que
IPC分类号： H01L21/70 , H01L27/15
CPC分类号： H01L21/707 , G02F1/00 , G02F1/136259 , G02F2001/136268 , H01L27/156
摘要： The present invention provides a LCD panel and a method for repairing the LCD panel. The LCD panel includes a plurality of data lines and a plurality of subpixel areas. Each subpixel area includes a corresponding pixel electrode and thin film transistor. The subpixel area including a spot defect is electrically connected to a neighboring subpixel area having the same color and in normal operation. The connection between the thin film transistor in the subpixel area including the spot defect and the corresponding data line and the connection between the thin film transistor and the corresponding pixel electrode are cut. Consequently, the subpixel area including the bright spot defect is repaired and able to display normally. The display quality of the LCD panel display is improved. Moreover, the present invention repair method is suitable for the repairing of LCD panels without storage capacitors.
摘要翻译：本发明提供一种LCD面板及其修理方法。 LCD面板包括多条数据线和多个子像素区域。每个子像素区域包括相应的像素电极和薄膜晶体管。包括斑点缺陷的子像素区域电连接到具有相同颜色的相邻子像素区域并且在正常操作中。切断包括点缺陷的子像素区域中的薄膜晶体管与对应的数据线之间的连接以及薄膜晶体管和相应的像素电极之间的连接。因此，包括亮点缺陷的子像素区域被修复并且能够正常显示。提高了LCD面板显示的显示质量。此外，本发明的修补方法适用于没有存储电容器的LCD面板的修理。

3. 发明授权

US08822105B2 Photomask and method for manufacturing the same 有权
标题翻译：光掩模及其制造方法
公开(公告)号：US08822105B2
公开(公告)日：2014-09-02
申请号：US13636699
申请日：2012-06-08
申请人： Dong Ye , Liang Xu
发明人： Dong Ye , Liang Xu
IPC分类号： G03F1/24
CPC分类号： G03F1/00 , G03F1/46
摘要： The present invention provides a photo-mask and a method for manufacturing the same. The method for manufacturing the photo-mask comprising: forming a shading pattern layer on a substrate; forming a protecting layer covering the shading pattern layer and the substrate; and; forming a reduced reflection layer on the protecting layer, wherein a refractive index of the protecting layer is greater than a refractive index of the reduced reflection layer. The present invention can mitigate a light reflection problem of a substrate of the conventional photo-mask.
摘要翻译：本发明提供一种光掩模及其制造方法。一种用于制造光掩模的方法，包括：在衬底上形成阴影图案层; 形成覆盖所述遮光图案层和所述基板的保护层; 和; 在所述保护层上形成减少的反射层，其中所述保护层的折射率大于所述减少反射层的折射率。本发明可以减轻常规光掩模的衬底的光反射问题。

4. 发明申请

US20130316269A1 PHOTOMASK AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：照相机及其制造方法
公开(公告)号：US20130316269A1
公开(公告)日：2013-11-28
申请号：US13636699
申请日：2012-06-08
申请人： Dong Ye , Liang Xu
发明人： Dong Ye , Liang Xu
IPC分类号： G03F1/00
CPC分类号： G03F1/00 , G03F1/46
摘要： The present invention provides a photo-mask and a method for manufacturing the same. The method for manufacturing the photo-mask comprising: forming a shading pattern layer on a substrate; forming a protecting layer covering the shading pattern layer and the substrate; and; forming a reduced reflection layer on the protecting layer, wherein a refractive index of the protecting layer is greater than a refractive index of the reduced reflection layer. The present invention can mitigate a light reflection problem of a substrate of the conventional photo-mask.
摘要翻译：本发明提供一种光掩模及其制造方法。一种用于制造光掩模的方法，包括：在衬底上形成阴影图案层; 形成覆盖所述遮光图案层和所述基板的保护层; 和; 在所述保护层上形成减少的反射层，其中所述保护层的折射率大于所述还原反射层的折射率。本发明可以减轻常规光掩模的衬底的光反射问题。

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