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1. 发明授权

US08243256B2 Measurement apparatus for measuring an aberration of an optical system, measurement method, exposure apparatus, and device fabrication method 有权
标题翻译：用于测量光学系统的像差的测量装置，测量方法，曝光装置和装置制造方法
公开(公告)号：US08243256B2
公开(公告)日：2012-08-14
申请号：US12469586
申请日：2009-05-20
申请人： Takeshi Suzuki , Yoshiyuki Kuramoto
发明人： Takeshi Suzuki , Yoshiyuki Kuramoto
IPC分类号： G03B27/68 , G03B27/52 , G03B27/32
CPC分类号： G03B27/54 , G01J9/00 , G01M11/0271 , G03F7/706
摘要： The present invention provides a measurement apparatus which measures a wavefront aberration of a measurement target optical system, the apparatus including a fringe scanning unit configured to perform fringe scanning by changing a phase difference between test light and reference light, a determination unit configured to determine a nonlinear error representing a nonlinear change in feature amount, which is derived from an interference pattern between the test light and the reference light, with respect to predetermined control data by performing fringe scanning by the fringe scanning unit in accordance with the control data in a plurality of phase states, and a correction unit configured to correct, based on the nonlinear error determined by the determination unit, a wavefront aberration of the measurement target optical system calculated from the interference pattern between the test light and the reference light.
摘要翻译：本发明提供了一种测量测量目标光学系统的波前像差的测量装置，该装置包括：配置成通过改变测试光与参考光之间的相位差进行条纹扫描的条纹扫描单元;确定单元，根据多个控制数据，通过边缘扫描单元进行条纹扫描，表示相对于预定控制数据，表示由测试光和参考光之间的干涉图形导出的特征量的非线性变化的非线性误差以及校正单元，被配置为基于由确定单元确定的非线性误差来校正由测试光和参考光之间的干涉图形计算的测量目标光学系统的波前像差。

2. 发明申请

US20100068634A1 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：测量装置，曝光装置和装置制造方法
公开(公告)号：US20100068634A1
公开(公告)日：2010-03-18
申请号：US12560024
申请日：2009-09-15
申请人： Takeshi Suzuki , Yoshiyuki Kuramoto
发明人： Takeshi Suzuki , Yoshiyuki Kuramoto
IPC分类号： G03F7/20 , G01B9/02 , G03B27/54
CPC分类号： G01M11/0257 , G03B27/54 , G03F7/70591
摘要： A measurement apparatus comprises a mirror configured to reflect test light which passes through an optical system, an interferometer unit which includes an image sensor and is configured to form an interference fringe on an image sensing plane of the image sensor by reference light and the test light reflected by the mirror, and a controller configured to control the interferometer unit, and to compute a numerical aperture of the optical system based on the interference fringe captured by the image sensor, wherein the controller is configured to compute a numerical aperture NA of the optical system by multiplying a quotient ΔNA/ΔR, describing a change ΔNA in numerical aperture NA of the optical system with respect to a change ΔR in pupil radius R of the optical system in the image sensing plane, by the pupil radius R of the optical system in the image sensing plane.
摘要翻译：测量装置包括：反射镜，被配置为反射通过光学系统的测试光;干涉仪单元，其包括图像传感器，并且被配置为通过参考光和测试光在图像传感器的图像感测平面上形成干涉条纹由反射镜反射，以及控制器，被配置为控制干涉仪单元，并且基于由图像传感器捕获的干涉条纹计算光学系统的数值孔径，其中控制器被配置为计算光学系统的数值孔径NA 系统通过乘以商＆Dgr; NA /＆Dgr; R，描述光学系统相对于图像感测平面中的光学系统的光瞳半径R中的变化＆Dgr; R的数值孔径NA中的变化＆Dgr; NA，由光学系统的光瞳半径R在图像感测平面中。

3. 发明授权

US08542345B2 Measurement apparatus, exposure apparatus, and device manufacturing method to measure numerical aperture of the optical system using interference fringe 有权
标题翻译：使用干涉条纹测量光学系统的数值孔径的测量装置，曝光装置和装置制造方法
公开(公告)号：US08542345B2
公开(公告)日：2013-09-24
申请号：US12560024
申请日：2009-09-15
申请人： Takeshi Suzuki , Yoshiyuki Kuramoto
发明人： Takeshi Suzuki , Yoshiyuki Kuramoto
IPC分类号： G03B27/54
CPC分类号： G01M11/0257 , G03B27/54 , G03F7/70591
摘要： A measurement apparatus comprises a mirror configured to reflect test light which passes through an optical system, an interferometer unit which includes an image sensor and is configured to form an interference fringe on an image sensing plane of the image sensor by reference light and the test light reflected by the mirror, and a controller configured to control the interferometer unit, and to compute a numerical aperture of the optical system based on the interference fringe captured by the image sensor, wherein the controller is configured to compute a numerical aperture NA of the optical system by multiplying a quotient ΔNA/ΔR, describing a change ΔNA in numerical aperture NA of the optical system with respect to a change ΔR in pupil radius R of the optical system in the image sensing plane, by the pupil radius R of the optical system in the image sensing plane.
摘要翻译：测量装置包括：反射镜，被配置为反射通过光学系统的测试光;干涉仪单元，其包括图像传感器，并且被配置为通过参考光和测试光在图像传感器的图像感测平面上形成干涉条纹由反射镜反射，以及控制器，被配置为控制干涉仪单元，并且基于由图像传感器捕获的干涉条纹计算光学系统的数值孔径，其中控制器被配置为计算光学系统的数值孔径NA 系统，通过乘以商ΔNA/ΔR，描述光学系统的数值孔径NA相对于光学系统在图像感测平面中的光瞳半径R中的变化ΔR与光学系统的光瞳半径R之间的变化DeltaNA 在图像传感平面。

4. 发明申请

US20090296059A1 MEASUREMENT APPARATUS, MEASUREMENT METHOD, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD 有权
标题翻译：测量装置，测量方法，曝光装置和装置制造方法
公开(公告)号：US20090296059A1
公开(公告)日：2009-12-03
申请号：US12469586
申请日：2009-05-20
申请人： Takeshi Suzuki , Yoshiyuki Kuramoto
发明人： Takeshi Suzuki , Yoshiyuki Kuramoto
IPC分类号： G03B27/54 , G01B9/02 , G03B27/72
CPC分类号： G03B27/54 , G01J9/00 , G01M11/0271 , G03F7/706
摘要： The present invention provides a measurement apparatus which measures a wavefront aberration of a measurement target optical system, the apparatus including a fringe scanning unit configured to perform fringe scanning by changing a phase difference between test light and reference light, a determination unit configured to determine a nonlinear error representing a nonlinear change in feature amount, which is derived from an interference pattern between the test light and the reference light, with respect to predetermined control data by performing fringe scanning by the fringe scanning unit in accordance with the control data in a plurality of phase states, and a correction unit configured to correct, based on the nonlinear error determined by the determination unit, a wavefront aberration of the measurement target optical system calculated from the interference pattern between the test light and the reference light.
摘要翻译：本发明提供了一种测量测量目标光学系统的波前像差的测量装置，该装置包括：配置成通过改变测试光与参考光之间的相位差进行条纹扫描的条纹扫描单元;确定单元，根据多个控制数据，通过边缘扫描单元进行条纹扫描，表示相对于预定控制数据，表示由测试光和参考光之间的干涉图形导出的特征量的非线性变化的非线性误差以及校正单元，被配置为基于由确定单元确定的非线性误差来校正由测试光和参考光之间的干涉图形计算的测量目标光学系统的波前像差。

5. 发明授权

US08174675B2 Measuring apparatus, optical system manufacturing method, exposure apparatus, device manufacturing method, and processing apparatus 有权
标题翻译：测量装置，光学系统制造方法，曝光装置，装置制造方法和处理装置
公开(公告)号：US08174675B2
公开(公告)日：2012-05-08
申请号：US12840951
申请日：2010-07-21
申请人： Takeshi Suzuki , Yoshiyuki Kuramoto
发明人： Takeshi Suzuki , Yoshiyuki Kuramoto
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03B27/54 , G01M11/0257 , G01M11/0271 , G03F7/70508 , G03F7/706
摘要： The present invention provides a processing apparatus which executes sampling of data and represents the sampled data by linear combination of orthogonal functions, the apparatus including a device configured to execute the sampling, and a processor configured to process the data sampled by the device, wherein the processor is configured, if the data sampled by the device includes an invalid sampling point, to obtain a degree of break of orthogonality of an orthogonal function system caused by the invalid sampling point, and to evaluate reliability of the sampling based on the obtained degree.
摘要翻译：本发明提供了一种执行数据采样并通过正交函数的线性组合表示采样数据的处理装置，该装置包括被配置为执行采样的装置，以及被配置为处理由该装置采样的数据的处理器，其中，如果由设备采样的数据包含无效采样点，则获得由无效采样点引起的正交功能系统的正交性的中断程度，并根据获得的程度评估采样的可靠性。

6. 发明申请

US20110027723A1 MEASURING APPARATUS, OPTICAL SYSTEM MANUFACTURING METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND PROCESSING APPARATUS 有权
标题翻译：测量装置，光学系统制造方法，曝光装置，装置制造方法和处理装置
公开(公告)号：US20110027723A1
公开(公告)日：2011-02-03
申请号：US12840951
申请日：2010-07-21
申请人： Takeshi Suzuki , Yoshiyuki Kuramoto
发明人： Takeshi Suzuki , Yoshiyuki Kuramoto
IPC分类号： G03F7/20 , G01B9/02 , G03B27/54 , G06F15/00
CPC分类号： G03B27/54 , G01M11/0257 , G01M11/0271 , G03F7/70508 , G03F7/706
摘要： The present invention provides a processing apparatus which executes sampling of data and represents the sampled data by linear combination of orthogonal functions, the apparatus including a device configured to execute the sampling, and a processor configured to process the data sampled by the device, wherein the processor is configured, if the data sampled by the device includes an invalid sampling point, to obtain a degree of break of orthogonality of an orthogonal function system caused by the invalid sampling point, and to evaluate reliability of the sampling based on the obtained degree.
摘要翻译：本发明提供了一种执行数据采样并通过正交函数的线性组合表示采样数据的处理装置，该装置包括被配置为执行采样的装置，以及被配置为处理由该装置采样的数据的处理器，其中，如果由设备采样的数据包含无效采样点，则获得由无效采样点引起的正交功能系统的正交性的中断程度，并根据获得的程度评估采样的可靠性。

7. 发明授权

US09856582B2 SiC single crystal and production method thereof 有权
公开(公告)号：US09856582B2
公开(公告)日：2018-01-02
申请号：US13428395
申请日：2012-03-23
申请人： Mina Ryo , Yoshiyuki Yonezawa , Takeshi Suzuki
发明人： Mina Ryo , Yoshiyuki Yonezawa , Takeshi Suzuki
IPC分类号： C30B17/00 , C30B29/36 , C30B9/10
CPC分类号： C30B29/36 , C30B9/10 , C30B17/00
摘要： A method is disclosed with provides stable growth of SiC single crystals, particularly 4H—SiC single crystals, with an effective crystal growth rate for a prolonged time even at a low temperature range of 2000° C. or lower. A raw material containing Si, Ti and Ni is charged into a crucible made of graphite and heat-melted to obtain a solvent. At the same time, C is dissolved out from the crucible into the solvent to obtain a melt. A SiC seed crystal substrate is then brought into contact with the melt such that SiC is supersaturated in the melt in the vicinity of the surface of the SiC seed crystal substrate, thereby allowing growth and production of an SiC single crystal on the SiC seed crystal substrate.

8. 发明授权

US09637826B2 Steel sheet for containers and manufacturing method for same 有权
公开(公告)号：US09637826B2
公开(公告)日：2017-05-02
申请号：US13823409
申请日：2011-09-14
申请人： Takeshi Suzuki , Norihiko Nakamura , Yuka Miyamoto , Yoichi Tobiyama
发明人： Takeshi Suzuki , Norihiko Nakamura , Yuka Miyamoto , Yoichi Tobiyama
IPC分类号： C23C22/05 , C23C28/00 , C25D11/00 , C23C22/34 , C23C22/00 , C23C30/00 , B32B1/08 , B32B15/09 , B32B15/18 , C25D5/12 , C25D5/50 , C23C22/36 , C23C22/83 , C25D9/08 , C25D11/36
CPC分类号： C23C28/00 , B32B1/08 , B32B15/09 , B32B15/18 , B32B2250/03 , B32B2250/40 , B32B2255/06 , B32B2255/205 , B32B2255/26 , B32B2255/28 , B32B2439/66 , C23C22/00 , C23C22/05 , C23C22/34 , C23C22/36 , C23C22/83 , C23C28/32 , C23C28/321 , C23C28/322 , C23C28/34 , C23C28/3455 , C23C30/00 , C23C30/005 , C25D5/12 , C25D5/505 , C25D9/08 , C25D11/00 , C25D11/36 , Y10T428/12535 , Y10T428/12556 , Y10T428/12569 , Y10T428/12597 , Y10T428/12604 , Y10T428/12611 , Y10T428/12618 , Y10T428/12708 , Y10T428/12722 , Y10T428/12944 , Y10T428/12958 , Y10T428/12972 , Y10T428/12979 , Y10T428/2495 , Y10T428/24967 , Y10T428/263 , Y10T428/264 , Y10T428/265 , Y10T428/27 , Y10T428/31678
摘要： A steel sheet for containers that has excellent film adhesion qualities, and has; a chemical conversion coating formed by immersing or subjecting to electrolytic treatment a steel sheet in a solution containing Zr ions, F ions, with adhesion amount of 0.1 to 100 mg/m2 for metal Zr and no more than 0.1 mg/m2 for F; and a hydroxyl acid treatment layer formed on the chemical conversion coating, the layer having a C adhesion amount of 0.05 to 50 mg/m2.

9. 发明授权

US09580816B2 Apparatus for continuous electrolytic treatment of steel sheet and method for producing surface-treated steel sheet using the same 有权
标题翻译：钢板的连续电解处理装置及使用该钢板的表面处理钢板的制造方法
公开(公告)号：US09580816B2
公开(公告)日：2017-02-28
申请号：US13819500
申请日：2011-09-14
申请人： Yuka Miyamoto , Takeshi Suzuki , Hisato Noro , Masao Inose , Hiroki Iwasa , Norihiko Nakamura , Yoichi Tobiyama
发明人： Yuka Miyamoto , Takeshi Suzuki , Hisato Noro , Masao Inose , Hiroki Iwasa , Norihiko Nakamura , Yoichi Tobiyama
IPC分类号： C23C28/02 , C25D17/12 , C25D7/06 , C25D9/10
CPC分类号： C23C28/02 , C25D7/0614 , C25D7/0642 , C25D9/10 , C25D17/12
摘要： Provided are an apparatus for continuous electrolytic treatment of a steel sheet that is suitable for producing a surface-treated steel sheet and a method for producing the surface-treated steel sheet using the apparatus for continuous electrolytic treatment of a steel sheet. The apparatus includes N pairs of tabular electrodes having a length L and being arranged to respectively face two surfaces of a steel sheet. Each electrode includes n sections arranged in the longitudinal direction of the electrode and disposed on the surface of the electrode facing the steel sheet surface. Each section is constituted by a conductive portion including an electrode portion having a length T1 and a nonconductive portion made by making an electrode portion having a length T2 nonconductive, where n×N≧10, 0.96≧T2/(T1+T2)≧0.05, and 0.9≧T1/L≧0.1.
摘要翻译：提供一种适用于生产表面处理钢板的钢板的连续电解处理装置以及使用钢板的连续电解处理装置的表面处理钢板的制造方法。该装置包括N对长度为L的平板状电极，并分别面对钢板的两个表面。每个电极包括沿着电极的纵向布置的n个部分，并且设置在面对钢板表面的电极的表面上。每个部分由包括具有长度T1的电极部分和通过制造具有长度T2不导电的电极部分制成的非导电部分的导电部分构成，其中n×N≥10,0.96≥T2/（T1 + T2）≥0.05 ，0.9≥T1/L≥0.1。

10. 发明授权

US09435034B2 Manufacturing method for steel sheets for containers 有权
标题翻译：容器钢板的制造方法
公开(公告)号：US09435034B2
公开(公告)日：2016-09-06
申请号：US13823379
申请日：2011-09-14
申请人： Takeshi Suzuki , Norihiko Nakamura , Yuka Miyamoto , Yoichi Tobiyama
发明人： Takeshi Suzuki , Norihiko Nakamura , Yuka Miyamoto , Yoichi Tobiyama
IPC分类号： C23C22/36 , C23C22/82 , C23C22/05 , B32B1/08 , B32B15/09 , B32B15/18 , C23C22/83 , C25D9/04 , C25D9/10 , C21D8/02 , C25D11/34 , C22C38/08 , C25D11/00 , C23C22/34 , C23C22/73 , C25D5/12 , C25D5/48 , C23C28/00 , C23C10/28 , B32B15/01 , C23C22/50
CPC分类号： C23C22/05 , B32B1/08 , B32B15/013 , B32B15/015 , B32B15/09 , B32B15/18 , B32B2250/03 , B32B2250/40 , B32B2255/06 , B32B2255/205 , B32B2255/26 , B32B2255/28 , B32B2439/66 , C21D8/0278 , C22C38/08 , C23C10/28 , C23C22/34 , C23C22/361 , C23C22/73 , C23C22/83 , C23C28/321 , C23C28/322 , C23C28/34 , C25D5/12 , C25D5/48 , C25D9/04 , C25D9/10 , C25D11/00 , C25D11/34
摘要： A manufacturing method for steel sheets for containers produces steel sheets with excellent film adhesion qualities. In a method for manufacturing steel sheets upon which is formed a chemical conversion coating having a metal Zr content of 1-100 mg/m2 and F content of no more than 0.1 mg/m2, the chemical conversion coating is formed on the steel sheet by subjecting the steel sheet to immersion in or electrolytic treatment with a treatment solution containing Zr ions and F ions, and subsequently, the steel sheet upon which the chemical conversion coating has been formed is washed with water having a temperature of at least 80° C. and dried.
摘要翻译：用于容器的钢板的制造方法产生具有优异的膜粘附性质的钢板。在其中形成金属Zr含量为1-100mg / m 2，F含量不大于0.1mg / m 2的化学转化涂层的钢板的制造方法中，化学转化涂层通过用含有Zr离子和F离子的处理溶液浸渍或电解处理钢板，然后用温度至少为80℃的水洗涤形成有化学转化膜的钢板。并干燥。

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