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1. 发明授权

US08603727B2 Active light ray sensitive or radioactive ray sensitive resin composition, and active light ray sensitive or radioactive ray sensitive film and pattern forming method using the same 失效
标题翻译：主动光线敏感或放射线敏感树脂组合物，以及主动光线敏感或放射线敏感膜和使用其的图案形成方法
公开(公告)号：US08603727B2
公开(公告)日：2013-12-10
申请号：US13252657
申请日：2011-10-04
申请人： Takeshi Kawabata , Hidenori Takahashi , Tomotaka Tsuchimura , Shuji Hirano , Hideaki Tsubaki
发明人： Takeshi Kawabata , Hidenori Takahashi , Tomotaka Tsuchimura , Shuji Hirano , Hideaki Tsubaki
IPC分类号： G03F7/00 , G03F7/004 , G03F7/26
CPC分类号： C08F220/38 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided.The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.
摘要翻译：一种主动光线敏感或放射线敏感性树脂组合物，同时在很大程度上满足高灵敏度，高分辨率，良好的图案构造和良好的线边缘粗糙度，同时在曝光期间具有足够好的除气性能，以及活性光提供通过使用该组合物形成的射线敏感或放射线敏感膜和图案形成方法。根据本发明的活性光线敏感或放射线敏感性树脂组合物包括含有通过用活性光线照射或放射线分解以产生酸的重复单元（A）的树脂（P）和重复单元（ C）含有伯或仲羟基。

2. 发明授权

US08962233B2 Actinic-ray—or radiation-sensitive resin composition and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法
公开(公告)号：US08962233B2
公开(公告)日：2015-02-24
申请号：US13015874
申请日：2011-01-28
申请人： Takeshi Kawabata , Tomotaka Tsuchimura , Takayuki Ito
发明人： Takeshi Kawabata , Tomotaka Tsuchimura , Takayuki Ito
IPC分类号： G03F7/004 , G03F7/039 , G03F7/038 , G03F7/20 , G03F7/30
CPC分类号： C07C309/31 , C07D327/08 , C07D333/76 , G03F7/004 , G03F7/20
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated upon exposure to actinic rays or radiation having a volume of 240 Å3 or greater.
摘要翻译：根据一个实施方案，光化射线或辐射敏感性树脂组合物包括芳基锍盐，其当暴露于光化射线或辐射时产生酸，所述芳基锍盐含有至少一个芳基环，其上总共有一个或更多的给电子基团，暴露于光化射线时产生的酸或体积为240埃或更大的辐射。

3. 发明授权

US08808961B2 Composition, resist film, pattern forming method, and inkjet recording method 有权
标题翻译：组合物，抗蚀剂膜，图案形成方法和喷墨记录方法
公开(公告)号：US08808961B2
公开(公告)日：2014-08-19
申请号：US12914762
申请日：2010-10-28
申请人： Tomotaka Tsuchimura , Takeshi Kawabata , Takayuki Ito
发明人： Tomotaka Tsuchimura , Takeshi Kawabata , Takayuki Ito
IPC分类号： G03F7/00 , C07C311/48 , C07C311/51 , C07C233/00 , B41J2/01 , C07D317/14 , G03F7/038 , C07D405/12 , C07D317/72 , G03F7/039 , G03F7/004 , C07D317/58 , C07D319/06 , G03F7/20
CPC分类号： C07D317/14 , C07C311/48 , C07D317/58 , C07D317/72 , C07D319/06 , C07D405/12 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： An embodiment of the composition contains any of compounds of the formula A-LG in which A represents any of residues of general formula (A-1) below and LG represents any of groups that are cleaved to generate acids of the formula A-H when acted on by an acid. The composition further contains at least one of a compound that generates an acid when exposed to actinic rays or radiation and a compound that generates an acid when heated.
摘要翻译：组合物的一个实施方案包含式A-LG的任何化合物，其中A表示下述通式（A-1）中的任何残基，LG表示当作用时被切割以产生式AH的酸的任何基团通过酸。组合物还含有当暴露于光化射线或辐射时产生酸的化合物和加热时产生酸的化合物中的至少一种。

4. 发明申请

US20110189609A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权
标题翻译：丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法
公开(公告)号：US20110189609A1
公开(公告)日：2011-08-04
申请号：US13015874
申请日：2011-01-28
申请人： Takeshi Kawabata , Tomotaka Tsuchimura , Takayuki Ito
发明人： Takeshi Kawabata , Tomotaka Tsuchimura , Takayuki Ito
IPC分类号： G03F7/004 , G03F7/20 , C07C309/31 , C07D327/08 , C07D333/76
CPC分类号： C07C309/31 , C07D327/08 , C07D333/76 , G03F7/004 , G03F7/20
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated upon exposure to actinic rays or radiation having a volume of 240 Å3 or greater.
摘要翻译：根据一个实施方案，光化射线或辐射敏感性树脂组合物包括芳基锍盐，其当暴露于光化射线或辐射时产生酸，所述芳基锍盐含有至少一个芳基环，其上总共有一个或更多的给电子基团，暴露于光化射线时产生的酸或体积为240埃或更大的辐射。

5. 发明申请

US20110102528A1 COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND INKJET RECORDING METHOD 有权
标题翻译：组合物，电阻膜，图案形成方法和喷墨记录方法
公开(公告)号：US20110102528A1
公开(公告)日：2011-05-05
申请号：US12914762
申请日：2010-10-28
申请人： Tomotaka TSUCHIMURA , Takeshi Kawabata , Takayuki Ito
发明人： Tomotaka TSUCHIMURA , Takeshi Kawabata , Takayuki Ito
IPC分类号： B41J2/01 , G03F7/004 , G03F7/20 , C07D317/14 , C07D405/12 , C07D317/72 , C07C311/09 , C07D319/06 , C07D317/58
CPC分类号： C07D317/14 , C07C311/48 , C07D317/58 , C07D317/72 , C07D319/06 , C07D405/12 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： An embodiment of the composition contains any of compounds of the formula A-LG in which A represents any of residues of general formula (A-1) below and LG represents any of groups that are cleaved to generate acids of the formula A-H when acted on by an acid. The composition further contains at least one of a compound that generates an acid when exposed to actinic rays or radiation and a compound that generates an acid when heated.
摘要翻译：组合物的一个实施方案包含式A-LG的任何化合物，其中A表示下述通式（A-1）中的任何残基，LG表示当作用时被切割以产生式AH的酸的任何基团通过酸。组合物还含有当暴露于光化射线或辐射时产生酸的化合物和加热时产生酸的化合物中的至少一种。

6. 发明申请

US20120100481A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 审中-公开
标题翻译：化学敏感性或辐射敏感性组合物和使用其的图案形成方法
公开(公告)号：US20120100481A1
公开(公告)日：2012-04-26
申请号：US13381683
申请日：2010-07-28
申请人： Takayuki Ito , Tomotaka Tsuchimura , Takeshi Kawabata
发明人： Takayuki Ito , Tomotaka Tsuchimura , Takeshi Kawabata
IPC分类号： G03F7/20 , G03F7/027 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： An actinic ray-sensitive or radiation-sensitive composition, including: (1) a low molecular compound having a molecular weight of 500 to 5,000 and containing (G) an acid-decomposable group; and (2) a compound capable of generating an acid of 305 Å3 or more in volume upon irradiation with an actinic ray or radiation, an actinic ray-sensitive or radiation-sensitive composition, including: a solvent; and (1A) a compound which is a low molecular compound having a molecular weight of 500 to 5,000 and containing (Z) one or more groups capable of decomposing upon irradiation with an actinic ray or radiation to produce an acid, (G) one or more acid-decomposable groups and (S) one or more dissolution auxiliary groups, wherein assuming that the number of the functional groups in one molecule of (Z), (G) and (S) is z, q and s, respectively, q/z≧2 and s/z≧2, and a pattern forming method using the composition are provided.
摘要翻译：一种光化射线敏感或辐射敏感性组合物，包括：（1）分子量为500〜5000的低分子化合物，含有（G）酸分解基团; 和（2）能够在用光化射线或辐射照射时能够产生体积为305或更大的酸的化合物，光化射线敏感或辐射敏感组合物，包括：溶剂; 和（1A）分子量为500〜5000的低分子化合物的化合物，含有（Z）一种或多种能够在用光化学射线或辐射照射时分解产生酸的基团，（G）一种或多种更多的酸可分解基团和（S）一种或多种溶解辅助基团，其中假定（Z），（G）和（S）的一个分子中的官能团数分别为z，q和s，q /z≥2且s /z≥2，并且提供使用该组合物的图案形成方法。

7. 发明授权

US08940471B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法
公开(公告)号：US08940471B2
公开(公告)日：2015-01-27
申请号：US12895300
申请日：2010-09-30
申请人： Takeshi Kawabata , Tomotaka Tsuchimura , Takayuki Ito
发明人： Takeshi Kawabata , Tomotaka Tsuchimura , Takayuki Ito
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/028 , G03F7/0397 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below, in which W1 represents an optionally substituted alkylene group, W2 represents a bivalent connecting group, W3 represents an optionally substituted organic group having 15 or more carbon atoms, and Z represents a hydroxyl group or a fluoroalkylsulfonamido group having at least one fluorine atom introduced therein as a substituent.
摘要翻译：根据一个实施方案，光化射线或辐射敏感性树脂组合物包括当暴露于光化射线或辐射时产生下列通式（I）的任何酸的化合物，其中W 1表示任选取代的亚烷基， W2表示二价连接基团，W3表示具有15个或更多个碳原子的任选取代的有机基团，Z表示其中引入有至少一个氟原子的羟基或氟烷基亚磺酰氨基作为取代基。

8. 发明授权

US09116741B2 Computer program product, and information processing apparatus and method 有权
标题翻译：计算机程序产品，信息处理设备和方法
公开(公告)号：US09116741B2
公开(公告)日：2015-08-25
申请号：US13585941
申请日：2012-08-15
申请人： Hiroyoshi Haruki , Mikio Hashimoto , Fukutomo Nakanishi , Ryotaro Hayashi , Yurie Fujimatsu , Tomohide Jokan , Takeshi Kawabata
发明人： Hiroyoshi Haruki , Mikio Hashimoto , Fukutomo Nakanishi , Ryotaro Hayashi , Yurie Fujimatsu , Tomohide Jokan , Takeshi Kawabata
IPC分类号： H04L9/00 , G06F11/00 , G06F9/46 , G06F21/52
CPC分类号： G06F9/461 , G06F21/52
摘要： According to an embodiment, a computer program product includes a computer-readable medium including program, when executed by a computer, to have a plurality of modules run by the computer. The computer includes a memory having a shared area, which is an area accessible to only those modules which run cooperatively and storing therein execution module identifiers. Each of the modules includes a first operation configured to store, just prior to a switchover of operations to an other module that runs cooperatively, an identifier of the other module as the execution module identifier in the shared area; and a second operation configured to execute, when the execution module identifier stored in the shared area matches with an identifier of own module immediately after a switchover of operations from the other module, a function inside the own module.
摘要翻译：根据实施例，计算机程序产品包括计算机可读介质，其包括由计算机执行时具有由计算机运行的多个模块的程序。计算机包括具有共享区域的存储器，该共享区域是只能协作运行并在其中存储执行模块标识符的那些模块可访问的区域。每个模块包括第一操作，其被配置为在操作切换到协同运行的其他模块之前存储另一模块的标识符作为共享区域中的执行模块标识符; 以及第二操作，被配置为当存储在所述共享区域中的执行模块标识符与来自所述另一模块的操作的切换之后立即匹配自身模块的标识符时，执行所述自身模块内的功能。

9. 发明授权

US08732480B2 Memory management device and memory management method 有权
标题翻译：内存管理设备和内存管理方法
公开(公告)号：US08732480B2
公开(公告)日：2014-05-20
申请号：US13223753
申请日：2011-09-01
申请人： Mikio Hashimoto , Hiroyoshi Haruki , Takeshi Kawabata , Tomohide Jokan , Yurie Fujimatsu , Ryotaro Hayashi , Fukutomo Nakanishi
发明人： Mikio Hashimoto , Hiroyoshi Haruki , Takeshi Kawabata , Tomohide Jokan , Yurie Fujimatsu , Ryotaro Hayashi , Fukutomo Nakanishi
IPC分类号： G06F17/30
CPC分类号： G06F12/1425 , G06F21/52 , G06F21/64
摘要： According to an embodiment, a memory management device increments a lower value of a first counter, updates the counter by incrementing an upper value and resetting the lower value when the lower value overflows, increments to update the lower counter value when the upper value is incremented as a result of writing a second data piece having the upper value in common to a memory, recalculates a first secret value calculated using the first counter values and a root secret value in response to the first counter update, writes a first data piece and the first secret value to the memory, and at reading of the first data piece and the first secret value, calculates a second secret value using the updated first counter values and the root secret value, and compares the first secret value with the second secret value to verify the first data piece.
摘要翻译：根据实施例，存储器管理装置增加第一计数器的较低值，通过递增上限值来更新计数器，并且当较低值溢出时重新设置较低值，当增加上限值时递增以更新下计数器值作为将具有上述值的第二数据片共同写入存储器的结果，重新计算响应于第一计数器更新使用第一计数器值和根秘密值计算的第一秘密值，写入第一数据片和并且在读取第一数据段和第一秘密值时，使用更新的第一计数器值和根秘密值计算第二秘密值，并将第一秘密值与第二秘密值比较，验证第一个数据。

10. 发明授权

US08724804B2 Encryption processing apparatus 有权
标题翻译：加密处理装置
公开(公告)号：US08724804B2
公开(公告)日：2014-05-13
申请号：US13611885
申请日：2012-09-12
申请人： Takeshi Kawabata
发明人： Takeshi Kawabata
IPC分类号： H04L29/06
CPC分类号： H04L9/003 , H04L9/0631 , H04L2209/04 , H04L2209/08 , H04L2209/122
摘要： According to an embodiment, a first linear transformation unit performs a linear transformation from mask data to first mask data. A second linear transformation unit performs a linear transformation from mask data to second mask data. A first calculator calculates first data based upon data to be processed and the first mask data. A selecting unit selects the first data or the second mask data. A non-linear transformation unit performs a non-linear transformation on the selected first data or second mask data. A second calculator calculates second data based upon the first data after the non-linear transformation and the mask data. A third linear transformation unit performs a linear transformation on the second data. The second data after the linear transformation by the third linear transformation unit is retained as new data to be processed, and the second mask data after the non-linear transformation is retained as new mask data.
摘要翻译：根据实施例，第一线性变换单元执行从掩模数据到第一掩模数据的线性变换。第二线性变换单元执行从掩模数据到第二掩模数据的线性变换。第一计算器基于要处理的数据和第一掩码数据来计算第一数据。选择单元选择第一数据或第二掩模数据。非线性变换单元对所选择的第一数据或第二掩模数据执行非线性变换。第二计算器基于非线性变换之后的第一数据和掩码数据来计算第二数据。第三线性变换单元对第二数据进行线性变换。由第三线性变换单元进行线性变换后的第二数据被保留为要处理的新数据，并且将非线性变换之后的第二掩模数据保留为新的掩模数据。

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