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1. 发明授权

US07085827B2 Integrated service management system for remote customer support 失效
标题翻译：综合服务管理系统，用于远程客户支持
公开(公告)号：US07085827B2
公开(公告)日：2006-08-01
申请号：US09956635
申请日：2001-09-20
申请人： Takeshi Ishizaki , Shigeru Miyake , Hideyuki Yamamoto , Koichiro Otani
发明人： Takeshi Ishizaki , Shigeru Miyake , Hideyuki Yamamoto , Koichiro Otani
IPC分类号： G06F15/173 , G06F7/00 , G06F15/16 , G06F17/30
CPC分类号： H04L63/0272 , G06Q10/06 , H04L29/06 , H04L67/1097 , H04L67/327 , H04L69/329
摘要： Techniques for creation, operation, management, and access control of network-based storage services are described. Specific embodiments provide improved efficiency of the service management tasks used for designing, operating and accounting the robust and profitable network services, for example. In representative embodiments, techniques for constructing integrated network and storage services are provided. In a specific embodiment, the service comprises of three major service components: virtual private networks (VPN), applications servers and storage area networks (SAN). Each of these service components has its own customer identification information, such as VPN identifier for VPN services, process identifier for application servers and logical unit number (LUN) for storage devices.
摘要翻译：描述了基于网络的存储服务的创建，操作，管理和访问控制的技术。具体实施例例如提供了用于设计，操作和计算稳健且有利可图的网络服务的服务管理任务的改进效率。在代表性的实施例中，提供了用于构建集成网络和存储服务的技术。在具体实施例中，该服务包括三个主要服务组件：虚拟专用网（VPN），应用服务器和存储区域网络（SAN）。这些服务组件中的每一个都有自己的客户识别信息，如VPN服务的VPN标识符，应用服务器的进程标识符和存储设备的逻辑单元号（LUN）。

2. 发明授权

US07464152B2 Integrated service management system for remote customer support 有权
标题翻译：综合服务管理系统，用于远程客户支持
公开(公告)号：US07464152B2
公开(公告)日：2008-12-09
申请号：US11449438
申请日：2006-06-07
申请人： Takeshi Ishizaki , Shigeru Miyake , Hideyuki Yamamoto , Koichiro Otani
发明人： Takeshi Ishizaki , Shigeru Miyake , Hideyuki Yamamoto , Koichiro Otani
IPC分类号： G06F15/173 , H04L12/28 , G06F13/28
CPC分类号： H04L63/0272 , G06Q10/06 , H04L29/06 , H04L67/1097 , H04L67/327 , H04L69/329
摘要： The present invention provides techniques for creation, operation, management, and access control of network-based storage services. Specific embodiments provide improved efficiency of the service management tasks used for designing, operating and accounting the robust and profitable network services, for example. In representative embodiments, techniques for constructing integrated network and storage services are provided. In a specific embodiment, the service comprises of three major service components: virtual private networks (VPN), application servers and storage area networks (SAN). Each of these service components has its own customer identification information, such as VPN identifier for VPN services, process identifier for application servers and logical unit number (LUN) for storage devices.
摘要翻译：本发明提供了用于基于网络的存储服务的创建，操作，管理和访问控制的技术。具体实施例例如提供了用于设计，操作和计算稳健且有利可图的网络服务的服务管理任务的改进效率。在代表性的实施例中，提供了用于构建集成网络和存储服务的技术。在具体实施例中，服务包括三个主要服务组件：虚拟专用网络（VPN），应用服务器和存储区域网络（SAN）。这些服务组件中的每一个都有自己的客户识别信息，如VPN服务的VPN标识符，应用服务器的进程标识符和存储设备的逻辑单元号（LUN）。

3. 发明申请

US20060242290A1 Integrated service management system for remote customer support 有权
公开(公告)号：US20060242290A1
公开(公告)日：2006-10-26
申请号：US11449438
申请日：2006-06-07
申请人： Takeshi Ishizaki , Shigeru Miyake , Hideyuki Yamamoto , Koichiro Otani
发明人： Takeshi Ishizaki , Shigeru Miyake , Hideyuki Yamamoto , Koichiro Otani
IPC分类号： G06F15/173
CPC分类号： H04L63/0272 , G06Q10/06 , H04L29/06 , H04L67/1097 , H04L67/327 , H04L69/329
摘要： The present invention provides techniques for creation, operation, management, and access control of network-based storage services. Specific embodiments provide improved efficiency of the service management tasks used for designing, operating and accounting the robust and profitable network services, for example. In representative embodiments, techniques for constructing integrated network and storage services are provided. In a specific embodiment, the service comprises of three major service components: virtual private networks (VPN), application servers and storage area networks (SAN). Each of these service components has its own customer identification information, such as VPN identifier for VPN services, process identifier for application servers and logical unit number (LUN) for storage devices.

4. 发明授权

US07601240B2 Disturbance-free, recipe-controlled plasma processing system and method 有权
标题翻译：无干扰，配方控制等离子体处理系统和方法
公开(公告)号：US07601240B2
公开(公告)日：2009-10-13
申请号：US11346298
申请日：2006-02-03
申请人： Akira Kagoshima , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda , Hiroyuki Kitsunai , Junichi Tanaka , Natsuyo Morioka , Kenji Tamaki
发明人： Akira Kagoshima , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda , Hiroyuki Kitsunai , Junichi Tanaka , Natsuyo Morioka , Kenji Tamaki
IPC分类号： H01L21/00 , C23C16/00 , C23C14/00
CPC分类号： H01L22/20 , G05B19/41875 , G05B2219/45031 , H01J37/32935 , H01L22/26 , Y02P90/20 , Y02P90/22
摘要： A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first unit. A next sample is plasma processed in the first unit based on the modified recipe.
摘要翻译：等离子体处理系统包括：基于等离子体处理的配方对样品进行等离子体处理的第一单元;以及用于根据在第一单元中的样品的等离子体处理期间获得的监视值修改配方的第二单元。基于改进的配方，下一个样品在第一单元中进行等离子体处理。

5. 发明申请

US20090139656A1 Substrate processing apparatus 失效
标题翻译：基板加工装置
公开(公告)号：US20090139656A1
公开(公告)日：2009-06-04
申请号：US12292947
申请日：2008-12-01
申请人： Koukichi Hiroshiro , Hideyuki Yamamoto , Kazuhiro Takeshita , Takayuki Toshima
发明人： Koukichi Hiroshiro , Hideyuki Yamamoto , Kazuhiro Takeshita , Takayuki Toshima
IPC分类号： H01L21/306
CPC分类号： H01L21/67057
摘要： The present invention provides a substrate processing apparatus for processing substrates by immersing the substrates in a processing liquid. This substrate processing apparatus includes a processing tank having a pair of side walls arranged to be opposed to each other; and a pair of processing-liquid supply mechanisms provided respectively corresponding to the pair of side walls. The pair of processing-liquid supply mechanisms are respectively configured for supplying the processing liquid toward a central portion of the processing tank in the width direction connecting the pair of side walls, thereby to create a rising flow of the processing liquid in a central area in the width direction of the processing tank. Each inner wall face of the pair of side walls includes a main body, a projecting portion located above the main body, and a discharge guide portion located uppermost and providing a discharge port configured for allowing the processing liquid to overflow. The discharge guide portion is inclined upward, opposite to the central portion in the width direction. The projecting portion includes an inner end portion located nearer to the central portion in the width direction, as compared with the main body and discharge guide portion.
摘要翻译：本发明提供一种基板处理装置，用于通过将基板浸入处理液中来处理基板。该基板处理装置具备：处理槽，具有配置成彼此相对的一对侧壁; 以及分别对应于一对侧壁设置的一对处理液供给机构。一对处理液供给机构分别构成为将处理液朝向连接该一对侧壁的宽度方向的处理槽的中央部供给，从而在处理液的中央区域产生上升的流动处理槽的宽度方向。一对侧壁的每个内壁面包括主体，位于主体上方的突出部分和位于最上方的排出引导部分，并且设置用于允许处理液体溢出的排出口。排出引导部分在宽度方向上与中心部分相反地向上倾斜。与主体和排出引导部相比，突出部包括位于宽度方向上更接近中央部的内端部。

6. 发明申请

US20090120580A1 Disturbance-Free, Recipe-Controlled Plasma Processing System And Method 审中-公开
标题翻译：无干扰，配方控制的等离子体处理系统和方法
公开(公告)号：US20090120580A1
公开(公告)日：2009-05-14
申请号：US12351159
申请日：2009-01-09
申请人： Akira Kagoshima , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda , Hiroyuki Kitsunai , Junichi Tanaka , Natsuyo Morioka , Kenji Tamaki
发明人： Akira Kagoshima , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda , Hiroyuki Kitsunai , Junichi Tanaka , Natsuyo Morioka , Kenji Tamaki
IPC分类号： C23F1/08
CPC分类号： H01L22/20 , G05B19/41875 , G05B2219/45031 , H01J37/32935 , H01L22/26 , Y02P90/20 , Y02P90/22
摘要： A plasma processing apparatus includes a vacuum processing apparatus for performing a multi-step processing operation for a sample, a sensor for monitoring process parameters during at least a first step of the processing operation, a signal compression unit for compressing a signal from the sensor to generate an apparatus state signal, a worked result estimate model unit which estimates a processed result on the basis of the apparatus state signal and a set processed-result estimation equation, an optimum recipe calculation model unit which calculates corrections to processing conditions so that the processed result becomes a target value, a usable recipe selecting unit which judges validity of an optimum recipe. At a next step of the processing operation, sample processing is performed under optimum conditions on the basis of the usable recipe selected by the selected usable recipe.
摘要翻译：等离子体处理装置包括用于对样品进行多步骤处理操作的真空处理装置，用于在处理操作的至少第一步骤中监视处理参数的传感器，用于将来自传感器的信号压缩到生成装置状态信号，工作结果估计模型单元，其基于装置状态信号和设定的处理结果估计方程估计处理结果;最佳配方计算模型单元，其计算对处理条件的校正，使得处理结果成为目标值，判定最佳配方的有效性的可用配方选择单元。在处理操作的下一步骤中，基于由所选择的可用食谱选择的可用食谱，在最佳条件下进行样品处理。

7. 发明授权

US07343217B2 System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation 有权
标题翻译：使用预测模型方程式监测和控制半导体制造装置的系统
公开(公告)号：US07343217B2
公开(公告)日：2008-03-11
申请号：US11439265
申请日：2006-05-24
申请人： Junichi Tanaka , Hiroyuki Kitsunai , Akira Kagoshima , Daisuke Shiraishi , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda
发明人： Junichi Tanaka , Hiroyuki Kitsunai , Akira Kagoshima , Daisuke Shiraishi , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda
IPC分类号： G06F19/00
CPC分类号： H01L22/20 , G05B13/048 , G05B19/41865 , G05B23/024 , G05B2219/31357 , G05B2219/32058 , H01L21/67276 , H01L2924/0002 , Y02P90/12 , Y02P90/14 , Y02P90/18 , Y02P90/20 , H01L2924/00
摘要： A semiconductor processing apparatus for processing a semiconductor wafer includes a plurality of sensors for monitoring a processing state, a processing result input unit, a model equation generation unit to generate a model equation for predicting a processing result, a processing result prediction unit which predicts a processing result, and a process recipe control unit. Further, a system is provided which comprises the model equation generation unit is provided at a remote location, and transmits the generated prediction model equation to the semiconductor processing apparatus through a network to control the processing condition of the semiconductor processing apparatus by the process recipe control unit.
摘要翻译：用于处理半导体晶片的半导体处理装置包括用于监视处理状态的多个传感器，处理结果输入单元，用于生成用于预测处理结果的模型方程式的模型方程生成单元，预测处理结果预测单元处理结果，以及处理配方控制单元。此外，提供了一种系统，其包括在远程位置处提供模型方程生成单元，并且通过网络将生成的预测模型方程发送到半导体处理装置，以通过处理配方控制来控制半导体处理装置的处理状态单元。

8. 发明授权

US07330346B2 Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus 失效
标题翻译：蚀刻装置，自偏压测定方法以及蚀刻装置的监视方法
公开(公告)号：US07330346B2
公开(公告)日：2008-02-12
申请号：US11506791
申请日：2006-08-21
申请人： Shoji Ikuhara , Hideyuki Yamamoto , Daisuke Shiraishi , Akira Kagoshima
发明人： Shoji Ikuhara , Hideyuki Yamamoto , Daisuke Shiraishi , Akira Kagoshima
IPC分类号： H02N13/00
CPC分类号： H01L21/6833 , H02N13/00
摘要： The invention provides a means for estimating a self-bias voltage under arbitrary etching conditions via a simple procedure. The present invention provides a method for measuring self-bias voltage of an etching apparatus comprising an electrostatic chuck mechanism 1 and 10 for chucking a sample 2, a mechanism 13 and 14 for supplying cooling gas 12 to a rear surface of the sample 2 and controlling the pressure thereof, and a means for measuring the relative force of electrostatic chuck of the sample based on the rear surface pressure control status of the sample 2 being processed, wherein the relative force of electrostatic chuck of the sample and the electrostatic chuck voltage corresponding to the force of electrostatic chuck are acquired based on the rear surface pressure control of the sample 2 when high-frequency bias power is applied to the sample 2 being processed, and the relative force of electrostatic chuck of the sample and the electrostatic chuck voltage corresponding to the force of electrostatic chuck are acquired based on the rear surface pressure control status of the sample when high-frequency bias power is not applied to the sample being processed, and the self-bias voltage is estimated using the acquired forces of electrostatic chuck and the electrostatic chuck voltages corresponding to the two statuses.
摘要翻译：本发明提供了一种用于通过简单的过程在任意蚀刻条件下估计自偏压的装置。本发明提供了一种用于测量蚀刻装置的自偏压的方法，该蚀刻装置包括用于夹持样品2的静电卡盘机构1和10，用于将冷却气体12供应到样品2的后表面的机构13和14，并且控制其压力，以及用于根据正在处理的样品2的背面压力控制状态来测量样品的静电卡盘的相对力的装置，其中样品的静电卡盘的相对力和对应于当对待处理的样品2施加高频偏置功率时，基于样品2的背面压力控制获取静电卡盘的力，并且将样品的静电卡盘与静电卡盘电压的相对力对应于当高频时，基于样品的背面压力控制状态获取静电卡盘的力 cy偏压功率不会被施加到正在处理的样品，并且使用所获取的静电卡盘的力和对应于两种状态的静电卡盘电压来估计自偏压。

9. 发明授权

US07277237B2 AF control apparatus for zoom lens system 失效
标题翻译：用于变焦镜头系统的AF控制装置
公开(公告)号：US07277237B2
公开(公告)日：2007-10-02
申请号：US11121014
申请日：2005-05-04
申请人： Noboru Saito , Takamitsu Sasaki , Hideyuki Yamamoto
发明人： Noboru Saito , Takamitsu Sasaki , Hideyuki Yamamoto
IPC分类号： G02B15/14 , G03B17/00
CPC分类号： G02B7/36 , G02B7/102 , G02B7/282
摘要： An AF control apparatus for a zoom lens system includes a movable lens group serving as a zooming lens group and a focusing lens group in the zoom lens system; a focusing table which stores focusing data for the movable lens group; a zooming table which stores zooming data for the movable lens group, the zooming table having different data from the focusing table; and a driving device for moving the movable lens group in an optical axis direction of the zoom lens system according to data stored in the focusing table and the zooming table.
摘要翻译：用于变焦透镜系统的AF控制装置包括在变焦透镜系统中用作变焦透镜组和聚焦透镜组的可移动透镜组; 存储可移动透镜组的聚焦数据的聚焦表; 存储用于可移动透镜组的缩放数据的变焦表，该缩放表具有与聚焦表不同的数据; 以及驱动装置，用于根据存储在聚焦表和变焦表中的数据，使可变透镜组沿变焦透镜系统的光轴方向移动。

10. 发明申请

US20070193687A1 Disturbance-free, recipe-controlled plasma processing system and method 审中-公开
标题翻译：无干扰，配方控制等离子体处理系统和方法
公开(公告)号：US20070193687A1
公开(公告)日：2007-08-23
申请号：US11783653
申请日：2007-04-11
申请人： Akira Kagoshima , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda , Hiroyuki Kitsunai , Junichi Tanaka , Natsuyo Morioka , Kenji Tamaki
发明人： Akira Kagoshima , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda , Hiroyuki Kitsunai , Junichi Tanaka , Natsuyo Morioka , Kenji Tamaki
IPC分类号： H01L21/306
CPC分类号： H01L22/20 , G05B19/41875 , G05B2219/45031 , H01J37/32935 , H01L22/26 , Y02P90/20 , Y02P90/22
摘要： A plasma processing control system includes a plasma processing apparatus for generating plasma within a vacuum processing chamber and performing a processing operation over a sample accommodated within the vacuum processing chamber using radicals and ions within the plasma, a pre-measuring instrument which measures a shape of the sample before processing, a post-measuring instrument which measures a shape of the sample after the processing, a parameter changer provided with at least one optimum recipe model for calculating a target process parameter, and a model changer for modifying the optimum recipe model, thereby updating a recipe parameter for each etching.
摘要翻译：一种等离子体处理控制系统包括：等离子体处理装置，用于在真空处理室内产生等离子体，并使用等离子体内的自由基和离子对容纳在真空处理室内的样品进行处理操作;测量仪器，其测量形状处理前的样品，测量处理后的样品的形状的后测量仪器，设置有至少一个用于计算目标过程参数的最佳配方模型的参数改变器，以及用于修改最佳配方模型的模型变换器，从而更新每个蚀刻的配方参数。

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