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    • 1. 发明申请
    • FILM THICKNESS MEASURING DEVICE AND FILM THICKNESS MEASURING METHOD
    • 薄膜厚度测量装置和薄膜厚度测量方法
    • US20110032541A1
    • 2011-02-10
    • US12904494
    • 2010-10-14
    • Takeo YAMADATakeshi YAMAMOTOTakahiro YAMAKURAShinji HAYASHIShingo KAWAI
    • Takeo YAMADATakeshi YAMAMOTOTakahiro YAMAKURAShinji HAYASHIShingo KAWAI
    • G01B11/28
    • G01N21/55G01B11/0625
    • A film thickness measuring device is provided with a light source, a spectroscopic sensor, a processor, and a storage unit, and configured in such a manner that light from the light source vertically enters a plane to be measured provided with a film and the light reflected by the plane to be measured enters the spectroscopic sensor. The storage unit stores theoretical values of reflectivity distributions of respective film thicknesses and theoretical values of color characteristic variables of the respective film thicknesses. The processor finds the thickness of the film of the plane to be measured from the reflectivity distribution measured by the spectroscopic sensor by using the theoretical values of the reflectivity distributions of the respective film thicknesses or the theoretical values of the color characteristic variables of the respective film thicknesses stored in the storage unit.
    • 膜厚测量装置设置有光源,光谱传感器,处理器和存储单元,并且被配置为使得来自光源的光垂直进入设置有被膜的待测平面,并且光 由待测平面反射的光进入光谱传感器。 存储单元存储各个膜厚度的各个膜厚度的反射率分布和各个膜厚度的色彩特性变量的理论值的理论值。 处理器通过使用各个膜厚度的反射率分布的理论值或各个膜的颜色特性变量的理论值,从由光谱传感器测量的反射率分布来求出要测量的平面的膜的厚度 存储在存储单元中的厚度。