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1. 发明授权

US06813301B2 Structure of reflux fan for excimer laser apparatus 失效
标题翻译：准分子激光装置回流风机结构
公开(公告)号：US06813301B2
公开(公告)日：2004-11-02
申请号：US09955309
申请日：2001-09-19
申请人： Takayoshi Ozaki , Yuuji Yada , Hironori Tokunaga , Koji Yamada
发明人： Takayoshi Ozaki , Yuuji Yada , Hironori Tokunaga , Koji Yamada
IPC分类号： H01S322
CPC分类号： F04D29/058 , F16C32/0459 , F16C32/0465 , F16C32/047 , F16C37/005 , F16C2360/44
摘要： First and second radial magnetic bearings are provided at opposing ends of a rotary shaft, first and second protective bearings are arranged in the vicinity thereof, a third radial magnetic bearing is arranged on a side of a fan near a motor, and by the third radial magnetic bearing, negative spring element of the motor is corrected.
摘要翻译：第一和第二径向磁轴承设置在旋转轴的相对端处，第一和第二保护轴承布置在其附近，第三径向磁轴承布置在马达附近的风扇侧，并且通过第三径向磁性轴承，马达的负弹簧元件被校正。

2. 发明授权

US07335457B2 Positive-tone radiation-sensitive resin composition 有权
标题翻译：正色辐射敏感树脂组合物
公开(公告)号：US07335457B2
公开(公告)日：2008-02-26
申请号：US11235101
申请日：2005-09-27
申请人： Daisuke Shimizu , Tomoki Nagai , Yuuji Yada , Kentarou Gotou
发明人： Daisuke Shimizu , Tomoki Nagai , Yuuji Yada , Kentarou Gotou
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/091 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiation transmittance as a chemically amplified positive-tone resist effectively responding to active radiation, particularly to deep ultraviolet rays, effectively controlling line width variation in resist patterns due to fluctuation in the resist film thickness on a highly refractive substrate, and exhibiting excellent focal depth allowance.The composition comprises (A) an anthracene derivative of the following formula (1), (B) a photoacid generator comprising a sulfonimide compound, and, (C) a resin containing an acid-dissociable group, wherein R1 is a hydrogen atom or a monovalent organic group, R2 is a monovalent organic group, e is an integer of 0-3, and f is an integer of 0-8. The metal impurity content in the component (A), in terms of the total ion content, is preferably 5,000 ppb or less.
摘要翻译：提供了含有具有低升华性和与其它成分的良好相容性的蒽类羧酸成分的正色散辐射敏感性树脂组合物。该组合物作为化学扩增的正色调抗蚀剂具有最佳的辐射透射性可控性，其有效地响应于有源辐射，特别是对深紫外线，有效地控制由于高折射性基底上的抗蚀剂膜厚度的波动导致的抗蚀剂图案的线宽度变化，并表现出优异的焦深度补偿。该组合物包含（A）下式（1）的蒽衍生物，（B）包含磺酰亚胺化合物的光酸产生剂，和（C）含有酸解离基团的树脂，其中R 1， SUP>是氢原子或一价有机基团，R 2是一价有机基团，e是0-3的整数，f是0-8的整数。组分（A）中的金属杂质含量相对于总离子含量优选为5,000ppb以下。

3. 发明申请

US20060078821A1 Positive-tone radiation-sensitive resin composition 有权
标题翻译：正色辐射敏感树脂组合物
公开(公告)号：US20060078821A1
公开(公告)日：2006-04-13
申请号：US11235101
申请日：2005-09-27
申请人： Daisuke Shimizu , Tomoki Nagai , Yuuji Yada , Kentarou Gotou
发明人： Daisuke Shimizu , Tomoki Nagai , Yuuji Yada , Kentarou Gotou
IPC分类号： G03C1/76
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/091 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiation transmittance as a chemically amplified positive-tone resist effectively responding to active radiation, particularly to deep ultraviolet rays, effectively controlling line width variation in resist patterns due to fluctuation in the resist film thickness on a highly refractive substrate, and exhibiting excellent focal depth allowance. The composition comprises (A) an anthracene derivative of the following formula (1), (B) a photoacid generator comprising a sulfonimide compound, and, (C) a resin containing an acid-dissociable group, wherein R1 is a hydrogen atom or a monovalent organic group, R2 is a monovalent organic group, e is an integer of 0-3, and f is an integer of 0-8. The metal impurity content in the component (A), in terms of the total ion content, is preferably 5,000 ppb or less.
摘要翻译：提供了含有具有低升华性和与其它成分的良好相容性的蒽类羧酸成分的正色散辐射敏感性树脂组合物。该组合物作为化学扩增的正色调抗蚀剂具有最佳的辐射透射性可控性，其有效地响应于主动辐射，特别是对深紫外线，有效地控制由于高折射性基底上的抗蚀剂膜厚度的波动导致的抗蚀剂图案的线宽变化，并表现出优异的焦深度补偿。该组合物包含（A）下式（1）的蒽衍生物，（B）包含磺酰亚胺化合物的光酸产生剂，和（C）含有酸解离基团的树脂，其中R 1， SUP>是氢原子或一价有机基团，R 2是一价有机基团，e是0-3的整数，f是0-8的整数。组分（A）中的金属杂质含量相对于总离子含量优选为5,000ppb以下。

4. 发明授权

US08206888B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US08206888B2
公开(公告)日：2012-06-26
申请号：US12094820
申请日：2006-11-21
申请人： Yuuji Yada , Tomoki Nagai
发明人： Yuuji Yada , Tomoki Nagai
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106 , Y10S430/122 , Y10S430/123
摘要： It is intended to provide a radiation-sensitive resin composition, which comprises a radiation-sensitive acid generator excellent in resolution performance, heat stability, and storage stability, suppresses fluctuations in line width and deterioration in pattern profile attributed to standing waves, and produces a resist pattern improved in nano edge roughness and LEF. The radiation-sensitive resin composition is characterized by (A) a radiation-sensitive acid generator comprising: a sulfonium salt compound typified by 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate, or the like; and a sulfonimide compound. It is preferred that the composition should further comprise (B) a resin typified by a 4-hydroxystyrene/4-t-butoxystyrene copolymer, a 4-hydroxystyrene/t-butyl (meth)acrylate, or the like.
摘要翻译：旨在提供一种辐射敏感性树脂组合物，其包含分辨率性能，热稳定性和储存稳定性优异的辐射敏感性酸发生剂，抑制线宽的波动和归因于驻波的图案轮廓的劣化，并产生抗蚀剂图案改善了纳米边缘粗糙度和LEF。辐射敏感性树脂组合物的特征在于：（A）辐射敏感性酸产生剂，其包含：以2,4,6-三甲基苯基二苯基锍2,4-二氟苯磺酸为代表的锍盐化合物，4-三氟甲基苯磺酸2,4,6-三甲基苯基二苯基锍，或类似物; 和磺酰亚胺化合物。优选组合物还应包含（B）以4-羟基苯乙烯/ 4-叔丁氧基苯乙烯共聚物为代表的树脂，（甲基）丙烯酸4-羟基苯乙烯/叔丁酯等。

5. 发明申请

US20100028800A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20100028800A1
公开(公告)日：2010-02-04
申请号：US12094820
申请日：2006-11-21
申请人： Yuuji Yada , Tomoki Nagai
发明人： Yuuji Yada , Tomoki Nagai
IPC分类号： G03F7/039 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106 , Y10S430/122 , Y10S430/123
摘要： It is intended to provide a radiation-sensitive resin composition, which comprises a radiation-sensitive acid generator excellent in resolution performance, heat stability, and storage stability, suppresses fluctuations in line width and deterioration in pattern profile attributed to standing waves, and produces a resist pattern improved in nano edge roughness and LEF. The radiation-sensitive resin composition is characterized by (A) a radiation-sensitive acid generator comprising: a sulfonium salt compound typified by 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate, or the like; and a sulfonimide compound. It is preferred that the composition should further comprise (B) a resin typified by a 4-hydroxystyrene/4-t-butoxystyrene copolymer, a 4-hydroxystyrene/t-butyl (meth)acrylate, or the like.
摘要翻译：旨在提供一种辐射敏感性树脂组合物，其包含分辨率性能，热稳定性和储存稳定性优异的辐射敏感性酸发生剂，抑制线宽的波动和归因于驻波的图案轮廓的劣化，并产生抗蚀剂图案改善了纳米边缘粗糙度和LEF。辐射敏感性树脂组合物的特征在于：（A）辐射敏感性酸产生剂，其包含：以2,4,6-三甲基苯基二苯基锍2,4-二氟苯磺酸为代表的锍盐化合物，4-三氟甲基苯磺酸2,4,6-三甲基苯基二苯基锍，或类似物; 和磺酰亚胺化合物。优选组合物还应包含（B）以4-羟基苯乙烯/ 4-叔丁氧基苯乙烯共聚物为代表的树脂，（甲基）丙烯酸4-羟基苯乙烯/叔丁酯等。

6. 发明授权

US06898229B2 Gas circulation fan for excimer laser apparatus 失效
标题翻译：准分子激光装置气体循环风机
公开(公告)号：US06898229B2
公开(公告)日：2005-05-24
申请号：US10222999
申请日：2002-08-19
申请人： Yuuji Yada
发明人： Yuuji Yada
IPC分类号： F04D29/056 , F04D29/00 , F04D29/04 , F04D29/05 , F04D29/058 , F16C32/04 , F16C39/06 , H01S3/036 , H01S3/225 , H01S2/22
CPC分类号： F16C32/0444 , F16C2360/44 , H01S3/036 , H01S3/225
摘要： In a gas circulation fan, a main shaft is supported in a non-contact manner, by magnetic bearings. Between each of the magnetic bearings and a controller, a relay is provided. Each relay includes a position detection sensor circuit, an offset adjuster, a feedback gain adjuster and a filter circuit. Thus, compatibility between a mechanical body unit and the controller is attained.
摘要翻译：在气体循环风扇中，主轴通过磁性轴承以非接触的方式支撑。在每个磁性轴承和控制器之间，提供继电器。每个继电器包括位置检测传感器电路，偏移调整器，反馈增益调节器和滤波器电路。因此，实现机械主体单元与控制器之间的兼容性。

7. 发明授权

US06490304B1 Excimer laser device 失效
标题翻译：准分子激光装置
公开(公告)号：US06490304B1
公开(公告)日：2002-12-03
申请号：US09517619
申请日：2000-03-03
申请人： Yuuji Yada
发明人： Yuuji Yada
IPC分类号： H01S322
CPC分类号： H01S3/225 , H01S3/036 , H01S3/041
摘要： When an excimer laser device is stopped from operating, an alternating current is applied to a coil of an electromagnet of a magnetic bearing for a fan so as to erase a residual magnetic field and thus weaken the adhesiveness of dust to the electromagnet. A dust sucking unit sucks to remove the dust attaching to the electromagnet together with a gas introduced into a chamber. In this way, accumulation of the dust on the magnetic bearing for the fan can be prevented.
摘要翻译：当准分子激光装置停止工作时，交流电被施加到用于风扇的磁性轴承的电磁体的线圈上，以便消除残留的磁场，从而削弱灰尘对电磁体的粘合性。吸尘装置吸入除去引入到室内的气体附着到电磁体上的灰尘。以这种方式，可以防止粉尘积聚在风扇的磁轴承上。

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