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1. 发明授权

US07716811B2 Method for manufacturing a thin film magnetic head 有权
标题翻译：薄膜磁头制造方法
公开(公告)号：US07716811B2
公开(公告)日：2010-05-18
申请号：US11588866
申请日：2006-10-27
申请人： Takateru Seki , Akihiro Namba , Hideo Yamakura , Takahiro Noji
发明人： Takateru Seki , Akihiro Namba , Hideo Yamakura , Takahiro Noji
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3166 , G11B5/102 , G11B5/3169 , G11B5/3173 , Y10T29/49032 , Y10T29/49037 , Y10T29/49041 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T29/49798
摘要： Head elements are formed on a wafer to suppress deterioration in pinning strength of a pinned layer, which is caused by ESD generated during air bearing surface polishing of a thin film magnetic head. The wafer is cut into rovers in each of which are connected head elements. Rover air bearing surfaces are polished until an MR elements attain a predetermined height. A final polishing step finishes air bearing surfaces by applying an electroconductive polishing liquid to achieve a predetermined shape and surface roughness with high accuracy. A pinning defect occurrence rate is reduced by suppressing deterioration in pinning strength of a pinned layer of a read element. To achieve this, a specific resistance of the electroconductive polishing liquid is controlled to 5 GΩ·cm or less. A shallow rail and a deep rail are formed on the air bearing surfaces, and the rover is cut into thin film magnetic heads.
摘要翻译：头元件形成在晶片上以抑制由薄膜磁头的空气轴承表面抛光期间产生的ESD引起的被钉扎层的钉扎强度的劣化。将晶片切割成每个都连接的头元件的流动站。流动车空气轴承表面被抛光直到MR元件达到预定高度。最终的抛光步骤通过施加导电研磨液来完成空气轴承表面，以高精度实现预定的形状和表面粗糙度。通过抑制读取元件的被钉扎层的钉扎强度的劣化来降低钉扎缺陷发生率。为了达到这个目的，将导电研磨液的电阻值控制在5G＆OHgr·cm以下。在空气轴承表面上形成浅轨和深轨，并将流动车切成薄膜磁头。

2. 发明申请

US20070119046A1 Method for manufacturing a thin film magnetic head 有权
标题翻译：薄膜磁头制造方法
公开(公告)号：US20070119046A1
公开(公告)日：2007-05-31
申请号：US11588866
申请日：2006-10-27
申请人： Takateru Seki , Akihiro Namba , Hideo Yamakura , Takahiro Noji
发明人： Takateru Seki , Akihiro Namba , Hideo Yamakura , Takahiro Noji
IPC分类号： G11B5/127
CPC分类号： G11B5/3166 , G11B5/102 , G11B5/3169 , G11B5/3173 , Y10T29/49032 , Y10T29/49037 , Y10T29/49041 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T29/49798
摘要： Head elements are formed on a wafer in order to suppress deterioration in pinning strength of a pinned layer, which is caused by ESD generated during a thin film magnetic head production process, particularly in an air bearing surface polishing step. The wafer is cut line by line into rovers in each of which the head elements are connected; surfaces to be used as air bearing surfaces of the rover are polished until an MR element height reaches to a predetermined value. After this air bearing surface polishing, an electroconductive polishing liquid is used in a final bearing surface polishing step of finishing the air bearing surfaces to achieve a predetermined shape with high accuracy and a predetermined value of a surface roughness. In order to suppress a pinning defect occurrence rate by suppressing deterioration in pinning strength of a pinned layer of a read element, a specific resistance of the electroconductive polishing liquid is controlled to GΩ·cm or less, preferably 1 GΩ·cm or less. After that, a shallow rail and a deep rail are formed on the air bearing surfaces, and the rover is cut to accomplish thin film magnetic heads.
摘要翻译：头元件形成在晶片上，以便抑制在薄膜磁头制造过程中产生的ESD引起的钉扎层的钉扎强度的劣化，特别是在空气轴承表面抛光步骤中。每个头元件连接的晶片被逐行切割成流动站; 用作流动站的空气轴承表面的表面被抛光直到MR元件高度达到预定值。在这种空气轴承表面抛光之后，在最终的轴承表面抛光步骤中使用导电研磨液，以完成空气轴承表面，以高精度和预定的表面粗糙度值达到预定的形状。为了通过抑制读取元件的被钉扎层的钉扎强度的劣化来抑制钉扎缺陷发生率，导电研磨液的比电阻被控制在GOmea.cm以下，优选为1Ggga.cm以下。之后，在空气轴承表面上形成浅轨和深轨，并且切割流动站以实现薄膜磁头。

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