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1. 发明授权

US07580111B2 Liquid for immersion exposure and immersion exposure method 有权
标题翻译：液体浸渍曝光和浸渍曝光方法
公开(公告)号：US07580111B2
公开(公告)日：2009-08-25
申请号：US10588263
申请日：2005-05-19
申请人： Takashi Miyamatsu , Hiroaki Nemoto , Yong Wang
发明人： Takashi Miyamatsu , Hiroaki Nemoto , Yong Wang
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/2041
摘要： An immersion exposure liquid which exhibits a high refractive index, prevents elution and dissolution of a photoresist film or its upper layer film component, and reduces defects during formation of a resist pattern when used in an immersion exposure method, and an immersion exposure method using the immersion exposure liquid. The immersion exposure liquid is used for an immersion exposure device or an immersion exposure method in which a substrate is exposed through a liquid provided between a lens of a projection optical system and the substrate, the immersion exposure liquid being liquid in an operating temperature range of the immersion exposure device and including an alicyclic hydrocarbon compound or a cyclic hydrocarbon compound containing a silicon atom in the ring structure.
摘要翻译：表现出高折射率的浸渍曝光液体，防止光刻胶膜或其上层膜成分的溶出和溶解，并且在浸渍曝光方法中使用时减少形成抗蚀剂图案时的缺陷，以及使用浸渍曝光液体。浸渍曝光液体用于浸没曝光装置或浸渍曝光方法，其中通过设置在投影光学系统的透镜和基板之间的液体曝光基板，浸没曝光液体在液晶的工作温度范围内浸渍曝光装置，并且在环结构中包含脂环族烃化合物或含有硅原子的环状烃化合物。

2. 发明申请

US20070164261A1 Liquid for immersion exposure and immersion exposure method 有权
标题翻译：液体浸渍曝光和浸渍曝光方法
公开(公告)号：US20070164261A1
公开(公告)日：2007-07-19
申请号：US10588263
申请日：2005-05-19
申请人： Takashi Miyamatsu , Hiroaki Nemoto , Yong Wang
发明人： Takashi Miyamatsu , Hiroaki Nemoto , Yong Wang
IPC分类号： G02B5/00 , G03B27/52
CPC分类号： G03F7/2041
摘要： An immersion exposure liquid which exhibits a high refractive index, prevents elution and dissolution of a photoresist film or its upper layer film component, and reduces defects during formation of a resist pattern when used in an immersion exposure method, and an immersion exposure method using the immersion exposure liquid. The immersion exposure liquid is used for an immersion exposure device or an immersion exposure method in which a substrate is exposed through a liquid provided between a lens of a projection optical system and the substrate, the immersion exposure liquid being liquid in an operating temperature range of the immersion exposure device and including an alicyclic hydrocarbon compound or a cyclic hydrocarbon compound containing a silicon atom in the ring structure.
摘要翻译：表现出高折射率的浸渍曝光液体，防止光刻胶膜或其上层膜成分的溶出和溶解，并且在浸渍曝光方法中使用时减少形成抗蚀剂图案时的缺陷，以及使用浸渍曝光液体。浸渍曝光液体用于浸没曝光装置或浸渍曝光方法，其中通过设置在投影光学系统的透镜和基板之间的液体曝光基板，浸没曝光液体在液晶的工作温度范围内浸渍曝光装置，并且在环结构中包含脂环族烃化合物或含有硅原子的环状烃化合物。

3. 发明申请

US20060141383A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions 有权
标题翻译：锍盐，辐射敏感酸产生剂和阳离子敏感树脂组合物
公开(公告)号：US20060141383A1
公开(公告)日：2006-06-29
申请号：US10543092
申请日：2004-01-09
申请人： Takashi Miyamatsu , Hirokazu Niwata , Satoshi Ebata , Yong Wang
发明人： Takashi Miyamatsu , Hirokazu Niwata , Satoshi Ebata , Yong Wang
IPC分类号： G03C1/76
CPC分类号： C07D333/72 , C07D333/46 , C07D333/78 , G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/123
摘要： A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X− indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.
摘要翻译：对于220nm以下的波长的紫外线的透明性优异的锍盐化合物，当用作光致酸产生剂，光致酸发生剂时，具有良好的平衡性，例如灵敏度，分辨率，图案形式，LER和储存稳定性包含锍盐化合物和含有光酸产生剂的正色散辐射敏感性树脂组合物。锍盐化合物由下式（I）表示，其中R 1表示卤素原子，烷基，一价脂环族烃基，烷氧基或-OR 3 其中R 3是一价脂环族烃基，R 2表示（取代的） - 烷基或两个或更多个R 2， / SUP>基团形成环状结构，p为0-7，q为0-6，n为0-3，X为 - 表示磺酸阴离子。正色辐射敏感性树脂组合物包含（A）锍盐化合物的光酸产生剂和（B）含酸解离基团的树脂。

4. 发明授权

US07371503B2 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition 有权
标题翻译：锍盐化合物，光酸产生剂和正色散辐射敏感树脂组合物
公开(公告)号：US07371503B2
公开(公告)日：2008-05-13
申请号：US10543092
申请日：2004-01-09
申请人： Takashi Miyamatsu , Hirokazu Niwata , Satoshi Ebata , Yong Wang
发明人： Takashi Miyamatsu , Hirokazu Niwata , Satoshi Ebata , Yong Wang
IPC分类号： G03F7/004 , C07D331/04 , C07D333/46 , C07D335/04
CPC分类号： C07D333/72 , C07D333/46 , C07D333/78 , G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/123
摘要： A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator.The sulfonium salt compound is shown by the following formula (I), wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X− indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.
摘要翻译：对于220nm以下的波长的紫外线的透明性优异的锍盐化合物，当用作光致酸产生剂，光致酸产生剂，具有良好平衡的优异性能，例如灵敏度，分辨率，图案形式，LER和储存稳定性包含锍盐化合物和含有光酸产生剂的正色散辐射敏感性树脂组合物。锍盐化合物由下式（I）表示，其中R 1表示卤素原子，烷基，一价脂环族烃基，烷氧基或-OR 3 其中R 3是一价脂环族烃基，R 2表示（取代的） - 烷基或两个或更多个R 2， / SUP>基团形成环状结构，p为0-7，q为0-6，n为0-3，X为 - 表示磺酸阴离子。正色辐射敏感性树脂组合物包含（A）锍盐化合物的光酸产生剂和（B）含酸解离基团的树脂。

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