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1. 发明授权

US08606243B2 Mobile network system and guidance message providing method 有权
标题翻译：移动网络系统和指导消息提供方法
公开(公告)号：US08606243B2
公开(公告)日：2013-12-10
申请号：US12638130
申请日：2009-12-15
申请人： Kazuyuki Ohtsu , Yuji Tajima , Takashi Mitsuhashi , Kohji Inokawa , Yumi Eguchi
发明人： Kazuyuki Ohtsu , Yuji Tajima , Takashi Mitsuhashi , Kohji Inokawa , Yumi Eguchi
IPC分类号： H04M3/42 , H04W40/00 , H04W4/00 , G01R31/08 , H04L1/00 , H04J3/26 , G06F15/177 , G06F15/16
CPC分类号： H04L65/1016 , H04L65/1046
摘要： A mobile network system includes a guidance message control server, a call control server and a plurality of access gateways. The call control server includes a gateway management section that determines an access gateway as a subject of call restriction, a first instructing section that transmits a message transmission instruction to the guidance message control server and a second instructing section that transmits a call restriction instruction to the access gateway. The guidance message control server includes a receiving section that receives the message transmission instruction, an acquisition section that acquires a guidance message data and a transmission section that transmits the guidance message data to a specified multicast group. Each of the access gateways includes a processing section that performs multicast group participation processing for participating in the specified multicast group and a guidance transmission section that transmits the guidance message data to a mobile terminal.
摘要翻译：移动网络系统包括引导消息控制服务器，呼叫控制服务器和多个接入网关。呼叫控制服务器包括：网关管理部，其将接入网关判定为呼叫限制的对象;向所述引导消息控制服务器发送消息发送指示的第一指示部;以及向所述引导消息控制服务器发送呼叫限制指令的第二指示部，接入网关引导消息控制服务器包括接收消息传输指令的接收部分，获取引导消息数据的获取部分和将指导消息数据发送到指定的多播组的发送部分。每个访问网关包括执行用于参与所指定的多播组的多播组参与处理的处理部分和将指导消息数据发送到移动终端的引导传输部分。

2. 发明授权

US08525135B2 System and method of electron beam writing 有权
标题翻译：电子束写入系统和方法
公开(公告)号：US08525135B2
公开(公告)日：2013-09-03
申请号：US12857388
申请日：2010-08-16
申请人： Dmitri Lanpanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
发明人： Dmitri Lanpanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
IPC分类号： G03F1/16 , G03F17/50 , G03F1/00 , G06F17/50
CPC分类号： G03F1/16 , B82Y10/00 , B82Y40/00 , G03F1/78 , G06F17/50 , H01J37/3026 , H01J37/3174 , H01J2237/31762 , H01J2237/31788
摘要： A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.
摘要翻译：一种能够考虑设计意图，设备能力和设计要求的改进电子束写入的系统和方法。该系统和方法至少部分地基于所接收的信息来确定最佳写入模式。

3. 发明授权

US07914954B2 Stencil, stencil design system and method for cell projection particle beam lithography 有权
标题翻译：模板，模板设计系统和用于单元投影粒子束光刻的方法
公开(公告)号：US07914954B2
公开(公告)日：2011-03-29
申请号：US12207342
申请日：2008-09-09
申请人： Akira Fujimura , Takashi Mitsuhashi , Katsuo Komuro
发明人： Akira Fujimura , Takashi Mitsuhashi , Katsuo Komuro
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/20 , Y10S430/143
摘要： Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them allows for more accurately writing images by reducing various chemical and physical effects, particularly Coulomb and proximity effects. Particle current reaching a surface is reduced by introducing shield areas, which preserve the shape and fidelity of the written image. The shape of the written image is further corrected by systematically adjusting the shape of the character or mask.
摘要翻译：公开了用于粒子束光刻的模版掩模，粒子束光刻特征及其设计方法。用于设计它们的掩模，字符和方法允许通过减少各种化学和物理效应，特别是库仑和邻近效应来更准确地写入图像。通过引入屏蔽区域来减小到达表面的粒子电流，这保护了书写图像的形状和保真度。通过系统地调整字符或掩模的形状来进一步校正书写图像的形状。

4. 发明授权

US07759026B2 Method and system for manufacturing a reticle using character projection particle beam lithography 有权
标题翻译：使用字符投影粒子束光刻制作掩模版的方法和系统
公开(公告)号：US07759026B2
公开(公告)日：2010-07-20
申请号：US12202364
申请日：2008-09-01
申请人： Akira Fujimura , Lance Glasser , Takashi Mitsuhashi , Kazuyuki Hagiwara
发明人： Akira Fujimura , Lance Glasser , Takashi Mitsuhashi , Kazuyuki Hagiwara
IPC分类号： G03C5/00 , G03F9/00
CPC分类号： G03B27/42 , B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3174 , Y10S430/143
摘要： A method for manufacturing a surface, the surface having a multiplicity of slightly different patterns, is disclosed with the method comprising the steps of designing a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying technique. A system for manufacturing a surface is also disclosed.
摘要翻译：公开了一种用于制造表面的方法，该表面具有多个稍微不同的图案，该方法包括以下步骤：设计具有用于在表面上形成图案的一组字符的模版掩模，并减少镜头数量或总写入时间通过使用字符变化技术。还公开了一种用于制造表面的系统。

5. 发明申请

US20100115107A1 COMMUNICATION DEVICE 审中-公开
标题翻译：通信设备
公开(公告)号：US20100115107A1
公开(公告)日：2010-05-06
申请号：US12688069
申请日：2010-01-15
申请人： Takashi Mitsuhashi , Takashi Kitano , Kazuo Ohshima , Yuji Tajima
发明人： Takashi Mitsuhashi , Takashi Kitano , Kazuo Ohshima , Yuji Tajima
IPC分类号： G06F15/16
CPC分类号： H04L65/105 , H04L65/1006 , H04L65/1069 , H04M7/006
摘要： When a communication route is established between SIP servers #1 and #3, an SIP server #2 performing a relay between the servers #1 and #3 receives an INVITE signal from the SIP server #1, not describing track information about the SIP server #2 in a Via header and a Record-Route header of the INVITE signal, but transferring the signal to the SIP server #3. Thus, after the transferred INVITE signal, the signal transmitted and received by the SIP servers #1 and #3, does not include the track information about the SIP server #2, thereby transmitting the signal without passing through the SIP server #2.
摘要翻译：当在SIP服务器＃1和＃3之间建立通信路由时，执行服务器＃1和＃3之间的中继的SIP服务器＃2从SIP服务器＃1接收到INVITE信号，而不是描述关于SIP服务器的跟踪信息＃2在INVITE信号的Via头和Record-Route头，但将信号传送到SIP服务器＃3。因此，在转移的INVITE信号之后，由SIP服务器＃1和＃3发送和接收的信号不包括关于SIP服务器＃2的轨道信息，从而在不通过SIP服务器＃2的情况下发送信号。

6. 发明申请

US20100058281A1 METHOD FOR OPTICAL PROXIMITY CORRECTION OF A RETICLE TO BE MANUFACTURED USING CHARACTER PROJECTION LITHOGRAPHY 有权
标题翻译：用于使用特征投影算术制造的反应物的光学近似校正方法
公开(公告)号：US20100058281A1
公开(公告)日：2010-03-04
申请号：US12202365
申请日：2008-09-01
申请人： Akira Fujimura , Lance Glasser , Takashi Mitsuhashi , Kazuyuki Hagiwara
发明人： Akira Fujimura , Lance Glasser , Takashi Mitsuhashi , Kazuyuki Hagiwara
IPC分类号： G06F17/50 , G03F1/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/36 , G03F1/50 , G03F1/78 , G06F2217/12 , Y02P90/265
摘要： A method for optical proximity correction of a design of a pattern on a surface is disclosed with the method comprising the steps of inputting desired patterns for the substrate and inputting a set of characters some of which are complex characters that may be used for forming the patterns on the surface. A method of creating glyphs is also disclosed.
摘要翻译：公开了一种用于表面上的图案设计的光学邻近校正的方法，方法包括以下步骤：输入用于衬底的期望图案并输入一组字符，其中一些字符是可用于形成图案的复杂字符在表面上。还公开了一种创建字形的方法。

7. 发明申请

US20080128637A1 Method and system for logic design for cell projection particle beam lithography 失效
标题翻译：用于单元投影粒子束光刻的逻辑设计方法和系统
公开(公告)号：US20080128637A1
公开(公告)日：2008-06-05
申请号：US11607305
申请日：2006-12-01
申请人： Kenji Yoshida , Takashi Mitsuhashi , Shohei Matsushita , Akira Fujimura
发明人： Kenji Yoshida , Takashi Mitsuhashi , Shohei Matsushita , Akira Fujimura
IPC分类号： G21K5/04
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/20
摘要： A method for particle beam lithography, such as electron beam (EB) lithography, includes predefining a stencil design having a plurality of cell patterns with information from a cell library, fabricating the stencil design, synthesizing a functional description into a logic circuit design after predefining the stencil design so that one or more characteristics of the stencil design are considered during synthesizing of the functional description into the logic circuit design, optimizing the logic circuit design, generating a layout design from the optimized logic circuit design, and forming the logic circuit on a substrate according to the stencil design and the layout design.
摘要翻译：用于粒子束光刻的方法，例如电子束（EB）光刻，包括预定义具有多个单元图案的模板设计，其具有来自单元库的信息，制造模板设计，在预定义之后将功能描述合成为逻辑电路设计模板设计使得在将逻辑电路设计中的功能描述合成期间考虑模板设计的一个或多个特性，优化逻辑电路设计，从优化的逻辑电路设计生成布局设计，并且形成逻辑电路根据模板设计和布局设计的基材。

8. 发明申请

US20080118852A1 Method and System for Lithography Simulation and Measurement of Critical Dimensions with Improved CD Marker Generation and Placement 有权
标题翻译：使用改进的CD标记生成和放置的光刻模拟和关键尺寸测量的方法和系统
公开(公告)号：US20080118852A1
公开(公告)日：2008-05-22
申请号：US11678530
申请日：2007-02-23
申请人： Takashi Mitsuhashi
发明人： Takashi Mitsuhashi
IPC分类号： G03C5/00
CPC分类号： G03F7/2061 , G03F1/36 , G03F1/68
摘要： A method and system for lithography simulation and measurement of critical dimensions with improved CD marker generation and placement is disclosed. The method and system specify a position for measuring a difference between a lithography image and a target pattern, generate one or more CD marker candidates, and select at least one CD marker from the one or more CD marker candidates.
摘要翻译：公开了一种用于光刻模拟和关键尺寸测量的方法和系统，其具有改进的CD标记生成和放置。该方法和系统指定用于测量光刻图像和目标图案之间的差异的位置，生成一个或多个CD标记候选，并从该一个或多个CD标记候选中选择至少一个CD标记。

9. 发明申请

US20070125967A1 System and method pf electron beam writing 有权
标题翻译：系统和方法pf电子束写入
公开(公告)号：US20070125967A1
公开(公告)日：2007-06-07
申请号：US11607753
申请日：2006-11-30
申请人： Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
发明人： Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
IPC分类号： G21K5/10
CPC分类号： G03F1/16 , B82Y10/00 , B82Y40/00 , G03F1/78 , G06F17/50 , H01J37/3026 , H01J37/3174 , H01J2237/31762 , H01J2237/31788
摘要： A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.
摘要翻译：一种能够考虑设计意图，设备能力和设计要求的改进电子束写入的系统和方法。该系统和方法至少部分地基于所接收的信息来确定最佳写入模式。

10. 发明申请

US20110265049A1 METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITING 审中-公开
标题翻译：用于粒子束写入的方法和系统
公开(公告)号：US20110265049A1
公开(公告)日：2011-10-27
申请号：US13174830
申请日：2011-07-01
申请人： Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
发明人： Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F1/36 , G03F1/78 , H01J37/3174
摘要： Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.
摘要翻译：本发明的各种实施例涉及粒子束写入以在晶片上制造集成电路。在各种实施例中，以数据结构的形式存储单元投影（CP）单元库信息。随后，CP单元库信息由书写系统引用。根据参考的CP单元库，将图案写在晶片上。

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