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1. 发明授权

US06459534B1 Projection optical system and projection exposure apparatus with the same, and device manufacturing method 失效
标题翻译：投影光学系统和投影曝光装置相同，以及装置制造方法
公开(公告)号：US06459534B1
公开(公告)日：2002-10-01
申请号：US09591218
申请日：2000-06-12
申请人： Takashi Kato , Chiaki Terasawa , Hiroyuki Ishii
发明人： Takashi Kato , Chiaki Terasawa , Hiroyuki Ishii
IPC分类号： G02B300
CPC分类号： G03F7/70241 , G02B13/14 , G02B13/18
摘要： A projection optical system for projecting a pattern of a mask onto a wafer, includes at least one aspherical surface lens having an aspherical surface on one side and a flat surface on the other side, the spherical surface satisfying a relation |&Dgr;ASPH/L|>1×10−6 where &Dgr;ASPH is the aspherical amount of the aspherical surface and L is an object-to-image distance of the projection optical system.
摘要翻译：一种用于将掩模图案投影到晶片上的投影光学系统包括至少一个非球面透镜，其具有一侧的非球面和另一侧的平坦表面，该球面满足关系| DELTAASPH / L |> 1×10-6其中DELTAASPH是非球面的非球面量，L是投影光学系统的物体到图像的距离。

2. 发明申请

US20060238883A1 Projection optical system and projection exposure apparatus 有权
公开(公告)号：US20060238883A1
公开(公告)日：2006-10-26
申请号：US11473128
申请日：2006-06-23
申请人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
发明人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
IPC分类号： G02B3/00
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/24 , G02B17/0621 , G02B17/0812 , G02B17/0844 , G02B17/0852 , G02B17/0856 , G03F7/70225 , G03F7/70275
摘要： Disclosed is a projection optical system for projecting an image of an object onto an image plane, which includes a first imaging optical system for forming an image of the object, a second imaging optical system for re-imaging the image upon the image plane, wherein the first and second imaging optical systems are disposed in an order from the object side and are disposed along a common straight optical axis, wherein the first imaging optical system includes a first mirror for reflecting and collecting abaxial light from the object, wherein one of the first and second imaging optical systems includes a second mirror for reflecting light from the first mirror to the image plane side, and wherein, with the second mirror, the abaxial light is caused to pass an outside of an effective diameter of the first mirror.

3. 发明授权

US07075726B2 Projection optical system and projection exposure apparatus 失效
标题翻译：投影光学系统和投影曝光装置
公开(公告)号：US07075726B2
公开(公告)日：2006-07-11
申请号：US09784021
申请日：2001-02-16
申请人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
发明人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
IPC分类号： G02B3/00 , G02B9/00
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/24 , G02B17/0621 , G02B17/0812 , G02B17/0844 , G02B17/0852 , G02B17/0856 , G03F7/70225 , G03F7/70275
摘要： A projection optical system projects an image of an object onto an image plane, and includes a first imaging optical system for forming an image of the object, and a second imaging optical system for re-imaging the image upon the image plane, wherein the first and second imaging optical systems are disposed in an order from the object side and are disposed along a common straight optical axis. The first imaging optical system includes a first mirror for reflecting and collecting abaxial light from the object, wherein one of the first and second imaging optical systems includes a second mirror for reflecting light from the first mirror to the image plane side, and wherein, with the second mirror, the abaxial light is caused to pass an outside of an effective diameter of the first mirror.
摘要翻译：投影光学系统将物体的图像投影到像平面上，并且包括用于形成物体的图像的第一成像光学系统和用于在图像平面上对图像重新成像的第二成像光学系统，其中第一并且第二成像光学系统以物体侧的顺序设置并且沿着共同的直线光轴设置。第一成像光学系统包括用于反射和收集来自物体的远轴光的第一反射镜，其中第一和第二成像光学系统中的一个包括用于将来自第一反射镜的光反射到图像平面侧的第二反射镜，并且其中，第二反射镜，使远轴光通过第一反射镜的有效直径的外侧。

4. 发明申请

US20060061879A1 Projection optical system and projection exposure apparatus 有权
标题翻译：投影光学系统和投影曝光装置
公开(公告)号：US20060061879A1
公开(公告)日：2006-03-23
申请号：US11268640
申请日：2005-11-08
申请人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
发明人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/24 , G02B17/0621 , G02B17/0812 , G02B17/0844 , G02B17/0852 , G02B17/0856 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection optical system for projecting an image of an object onto an image plane through two intermediate image formations. The catadioptric projection optical system includes a first optical system, for receiving light from the object, including a plurality of lenses, a second optical system, for forming the image of the object on the image plane, including a plurality of lenses, and a third optical system disposed optically between the first optical system and the second optical system. The third optical system includes a first concave mirror and a second concave mirror. The light is reflected by the first concave mirror then by the second concave mirror to be directed to the second optical system along a z-shaped optical path, and the first, second and third optical systems have a common straight optical axis.
摘要翻译：一种反折射投影光学系统，用于通过两个中间图像形成将物体的图像投影到图像平面上。反射折射投影光学系统包括：第一光学系统，用于接收来自物体的光，包括多个透镜;第二光学系统，用于在包括多个透镜的图像平面上形成物体的图像;以及第三光学系统光学系统光学地布置在第一光学系统和第二光学系统之间。第三光学系统包括第一凹面镜和第二凹面镜。第一凹面镜被第二凹面反射镜反射，第二凹面镜沿Z形光路被引导到第二光学系统，第一，第二和第三光学系统具有共同的直线光轴。

5. 发明授权

US06829099B2 Projection optical system and projection exposure apparatus 失效
标题翻译：投影光学系统和投影曝光装置
公开(公告)号：US06829099B2
公开(公告)日：2004-12-07
申请号：US09820710
申请日：2001-03-30
申请人： Takashi Kato , Chiaki Terasawa , Hiroyuki Ishii
发明人： Takashi Kato , Chiaki Terasawa , Hiroyuki Ishii
IPC分类号： G02B300
CPC分类号： G03F7/70225 , G03B21/00 , G03F7/70275
摘要： A projection optical system includes at least one lens, at least one concave mirror, at least one diffractive optical element, a first imaging optical system that includes the at least one lens and the at least one concave mirror, for imaging an intermediate image of an object, a second imaging optical system, having the at least one lens and the at least one diffractive optical element, for projecting the intermediate image onto an image plane, and a field optical system disposed between the first and second imaging optical systems.
摘要翻译：投影光学系统包括至少一个透镜，至少一个凹面镜，至少一个衍射光学元件，包括该至少一个透镜和该至少一个凹面镜的第一成像光学系统，用于对物体，具有至少一个透镜和至少一个衍射光学元件的第二成像光学系统，用于将中间图像投影到图像平面上，以及设置在第一和第二成像光学系统之间的场光学系统。

6. 发明授权

US06621555B1 Projection optical system and projection exposure apparatus with the same, and device manufacturing method 失效
标题翻译：投影光学系统和投影曝光装置相同，以及装置制造方法
公开(公告)号：US06621555B1
公开(公告)日：2003-09-16
申请号：US09592582
申请日：2000-06-12
申请人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
发明人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
IPC分类号： G03B2742
CPC分类号： G03F7/70241 , G02B13/14 , G02B13/18 , G02B13/22
摘要： A projection exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a photosensitive substrate. The projection optical system includes at least three lens units, including a lens unit of a positive refractive power and a lens unit of a negative refractive power, and an aspherical lens having aspherical surfaces formed on both sides thereof, in which a relation |Lxø0|>17 is satisfied, where L is a conjugate distance of the projection optical system and ø0 is the total power of the negative lens unit or of negative lens units of the projection optical system. Each aspherical surface of said aspherical surface lens is disposed at a position satisfying a relation |hb/h|>0.36 where h is a height of an axial marginal light ray, and hb is a height of a most abaxial chief ray, and each aspherical surface of the aspherical surface lens satisfies a relation |&Dgr;ASPH/L|>1.0×10−6 where &Dgr;ASPH is an aspherical amount of the aspherical surface.
摘要翻译：投影曝光装置包括用于将光罩的图案投影到感光基板上的投影光学系统。投影光学系统包括至少三个透镜单元，包括正屈光力透镜单元和负折光力透镜单元，以及具有形成在其两侧的非球面的非球面透镜，其中关系|Lxø0| > 17，其中L是投影光学系统的共轭距离，ø0是投影光学系统的负透镜单元或负透镜单元的总功率。所述非球面透镜的每个非球面设置在满足关系| hb / h |> 0.36的位置，其中h是轴向边缘光线的高度，并且hb是最下面的主光线的高度，并且每个非球面非球面透镜的表面满足关系| DELTAASPH / L |> 1.0×10 -6，其中DELTAASPH是非球面的非球面数量。

7. 发明授权

US07239453B2 Projection optical system and projection exposure apparatus 有权
标题翻译：投影光学系统和投影曝光装置
公开(公告)号：US07239453B2
公开(公告)日：2007-07-03
申请号：US11473128
申请日：2006-06-23
申请人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
发明人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
IPC分类号： G02B3/00 , G02B9/00 , G02B17/00
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/24 , G02B17/0621 , G02B17/0812 , G02B17/0844 , G02B17/0852 , G02B17/0856 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection optical system includes a first optical system, for receiving light from an object, a second optical system, for forming an image of the object on an image plane, and a third optical system disposed optically between the first optical system and the second optical system. The first, second and third optical systems have a common straight optical axis. The image of the object is projected onto the image plane through a plurality of real intermediate image formations, and a pupil plane of the catadioptric projection optical system is free of a void area.
摘要翻译：反射折射投影光学系统包括用于从物体接收光的第一光学系统，用于在像平面上形成物体的图像的第二光学系统，以及光学地设置在第一光学系统和第二光学系统之间的第三光学系统光学系统。第一，第二和第三光学系统具有共同的直线光轴。物体的图像通过多个真实中间图像形成投影到图像平面上，并且反射折射投影光学系统的光瞳面没有空隙区域。

8. 发明授权

US06867922B1 Projection optical system and projection exposure apparatus using the same 有权
标题翻译：投影光学系统和使用其的投影曝光装置
公开(公告)号：US06867922B1
公开(公告)日：2005-03-15
申请号：US09593584
申请日：2000-06-12
申请人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
发明人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
IPC分类号： H01L21/027 , G02B13/14 , G02B13/24 , G03F7/20 , G02B9/00
CPC分类号： G03F7/7025 , G02B13/143 , G02B13/24 , G03F7/70241 , G03F7/70741
摘要： A projection optical system includes a plurality of positive lens groups having a positive refractive power, and at least one negative lens group having a negative refractive power, wherein, when L is a conjugate distance of the projection optical system and φ0 is the sum of powers of the or each negative lens group, a relation |L×φ0|>17 is satisfied, wherein, when h is a height of an axial marginal light ray and hb is a height of a most abaxial chief ray, at least two aspherical surfaces are formed on surfaces which satisfy a relation |hb/h|>0.35, wherein, when ΔASPH is an aspherical amount of each aspherical surface, a relation |ΔASPH/L|>1.0×10−6 is satisfied, and wherein the at least two aspherical surfaces include regions in which, from a central portion toward a peripheral portion of the surface, their local curvature powers change with mutually opposite signs.
摘要翻译：投影光学系统包括具有正折光力的多个正透镜组和具有负屈光力的至少一个负透镜组，其中，当L是投影光学系统的共轭距离时，phi0是功率之和或负的每个负透镜组，满足关系| Lxphi0 | 17，其中，当h是轴向边缘光线的高度，hb是最下面的主光线的高度时，形成至少两个非球面在满足关系| hb / h |> 0.35的表面上，其中，当DeltaASPH是每个非球面的非球面量时，满足关系|ΔASPH/ L |> 1.0×10 -6，并且其中，所述至少两个非球面包括从表面的中心部分朝向周边部分的局部曲率功率以相反的符号变化的区域。

9. 发明授权

US07092168B2 Projection optical system and projection exposure apparatus 有权
公开(公告)号：US07092168B2
公开(公告)日：2006-08-15
申请号：US11268640
申请日：2005-11-08
申请人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
发明人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
IPC分类号： G02B3/00 , G02B9/00
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/24 , G02B17/0621 , G02B17/0812 , G02B17/0844 , G02B17/0852 , G02B17/0856 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection optical system for projecting an image of an object onto an image plane through two intermediate image formations. The catadioptric projection optical system includes a first optical system, for receiving light from the object, including a plurality of lenses, a second optical system, for forming the image of the object on the image plane, including a plurality of lenses, and a third optical system disposed optically between the first optical system and the second optical system. The third optical system includes a first concave mirror and a second concave mirror. The light is reflected by the first concave mirror then by the second concave mirror to be directed to the second optical system along a z-shaped optical path, and the first, second and third optical systems have a common straight optical axis.

10. 发明授权

US06995918B2 Projection optical system and projection exposure apparatus 失效
标题翻译：投影光学系统和投影曝光装置
公开(公告)号：US06995918B2
公开(公告)日：2006-02-07
申请号：US10992853
申请日：2004-11-22
申请人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
发明人： Chiaki Terasawa , Hiroyuki Ishii , Takashi Kato
IPC分类号： G02B3/00 , G02B9/00
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/24 , G02B17/0621 , G02B17/0812 , G02B17/0844 , G02B17/0852 , G02B17/0856 , G03F7/70225 , G03F7/70275
摘要： A projection optical system for projecting an image of an object onto an image plane. The projection optical system includes a first imaging optical system for forming an image of the object in which the first imaging optical system includes a first mirror for reflecting and collecting abaxial light from the object, a second imaging optical system for re-imaging the image upon the image plane, a second mirror for reflecting light from the first mirror to the image plane side, whereby the abaxial light is caused to pass outside of an effective diameter of the first mirror, and a field optical system including three lenses each having a positive refractive power. The abaxial light passed through the outside of the effective diameter of the first mirror is refracted by the three lenses toward a direction nearing an optical axis of the three lenses. Light that has passed through the three lenses is directed to the second imaging optical system, and the first and second imaging optical systems are disposed along a common optical axis.
摘要翻译：一种用于将物体的图像投影到图像平面上的投影光学系统。投影光学系统包括用于形成物体的图像的第一成像光学系统，其中第一成像光学系统包括用于反射和收集来自物体的远轴光的第一反射镜，用于将图像重新成像的第二成像光学系统图像平面，用于将来自第一反射镜的光反射到图像平面侧的第二反射镜，由此使远轴光穿过第一反射镜的有效直径外部，并且包括三个透镜的场光学系统，每个透镜具有正屈光力。通过第一反射镜的有效直径的外侧的背光被三个透镜朝向接近三个透镜的光轴的方向折射。通过三个透镜的光被引导到第二成像光学系统，并且第一和第二成像光学系统沿着共同的光轴设置。

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