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1. 发明授权

US5795401A Method for scrubbing substrate 失效
标题翻译：洗涤基材的方法
公开(公告)号：US5795401A
公开(公告)日：1998-08-18
申请号：US729077
申请日：1996-10-10
申请人： Takashi Itoh , Hiroyuki Saitoh , Haruyuki Kinami , Toshinori Konaka , Tsuyoshi Murai
发明人： Takashi Itoh , Hiroyuki Saitoh , Haruyuki Kinami , Toshinori Konaka , Tsuyoshi Murai
IPC分类号： B08B1/04 , B08B11/02 , B24B29/02 , B24B37/04 , B24B41/06 , H01L21/00 , H01L21/304 , H01L21/687 , B08B3/02
CPC分类号： H01L21/68728 , B08B1/04 , B08B11/02 , B24B29/02 , B24B37/04 , B24B37/30 , B24B41/06 , H01L21/02043 , H01L21/02057 , H01L21/0209 , H01L21/02096 , H01L21/67034 , H01L21/67046 , H01L21/67051 , H01L21/68735 , H01L21/68785
摘要： An improved method for scrubbing a substrate, the method including the step of scrubbing one face of the substrate with a cylindrical rotary brush while applying back pressure to the substrate by jetting a fluid for generating back pressure against the other face of the substrate.
摘要翻译：一种用于洗涤衬底的改进方法，所述方法包括以圆柱形旋转刷洗涤衬底的一面，同时通过喷射用于产生相对于衬底的另一面的背压的流体向衬底施加背压。

2. 发明授权

US5465447A Apparatus for scrubbing substrate 失效
标题翻译：洗涤基材的设备
公开(公告)号：US5465447A
公开(公告)日：1995-11-14
申请号：US301562
申请日：1994-09-07
申请人： Takashi Itoh , Hiroyuki Saitoh , Haruyuki Kinami , Toshinori Konaka , Tsuyoshi Murai
发明人： Takashi Itoh , Hiroyuki Saitoh , Haruyuki Kinami , Toshinori Konaka , Tsuyoshi Murai
IPC分类号： B08B1/04 , B08B11/02 , B24B29/02 , B24B37/04 , B24B41/06 , H01L21/00 , H01L21/304 , H01L21/687 , B08B3/02
CPC分类号： H01L21/68728 , B08B1/04 , B08B11/02 , B24B29/02 , B24B37/04 , B24B37/30 , B24B41/06 , H01L21/02043 , H01L21/02057 , H01L21/0209 , H01L21/02096 , H01L21/67034 , H01L21/67046 , H01L21/67051 , H01L21/68735 , H01L21/68785
摘要： Improved method and apparatus for scrubbing a substrate are provided, the method including the step of scrubbing one face of the substrate with a cylindrical rotary brush while applying back pressure to the substrate by jetting a fluid for generating back pressure against the other face of the substrate.
摘要翻译：提供了用于洗涤衬底的改进的方法和设备，该方法包括以下步骤：用圆柱形旋转刷擦洗衬底的一面，同时通过喷射用于产生相对于衬底的另一面的背压的流体向衬底施加背压。

3. 发明申请

US20090274596A1 METHOD AND APPARATUS FOR PROCESSING SILICON PARTICLES 审中-公开
标题翻译：加工硅颗粒的方法和装置
公开(公告)号：US20090274596A1
公开(公告)日：2009-11-05
申请号：US12280169
申请日：2006-04-25
申请人： Katsumi Takahashi , Masaya Tanaka , Hiroyuki Saito , Haruyuki Kinami , Takeshi Sasaki
发明人： Katsumi Takahashi , Masaya Tanaka , Hiroyuki Saito , Haruyuki Kinami , Takeshi Sasaki
IPC分类号： B01D15/00 , C01B33/02
CPC分类号： C01B33/037 , C01B33/02 , C30B29/06
摘要： Silicon particles in waste liquid can be highly efficiently separated with inexpensive equipment to be reused as raw material for production of a single-crystal silicon ingot.Provided are a recovery unit 12 for recovering the silicon particles from silicon-particle-containing waste liquid from a silicon ingot processing unit; a liquid mixture tank 1 for storing dissolved liquid mixture in which impurities is dissolved by mixing of the silicon particles unit with an acid; a filter-cloth-type filter 2 connected to the liquid mixture tank 1 through supply and return channels 8 and 10 for formation of cake of the silicon particles on the filter cloth for filtration; pure-water supply means 49 for supplying pure water to the liquid mixture tank 1; and pressurized air supply means 34 capable of switching between an operation for supplying pressurized air to a filtering surface side of the filter cloth to dehydrate the cake of the silicon particles and an operation for supplying the pressurized air to a side opposite to the filtering surface side of the filter cloth to drop and take out the dehydrated cake. Thus, single-crystal silicon particles free from the impurities are separated and recovered highly efficiently.
摘要翻译：废液中的硅颗粒可以用廉价的设备高效地分离，作为用于生产单晶硅锭的原料被再利用。设置有用于从含硅颗粒的废液从硅锭处理单元回收硅颗粒的回收单元12; 用于储存溶解的液体混合物的液体混合罐1，其中硅颗粒单元与酸混合使杂质溶解; 过滤布式过滤器2，通过供给和返回通道8和10连接到液体混合罐1，用于在滤布上形成硅颗粒的滤饼用于过滤; 用于向液体混合罐1供给纯水的纯水供给装置49; 以及加压空气供给单元34，能够切换向滤布的过滤面侧供给加压空气的动作，使硅粒子的饼干脱水，以及将加压空气供给到与过滤面侧相反的一侧的动作的滤布滴下并取出脱水饼。因此，不含杂质的单晶硅颗粒被高效地分离和回收。

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