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    • 2. 发明申请
    • Composition for selectively polishing silicon nitride layer and polishing method employing it
    • 用于选择性抛光氮化硅层的组合物和使用它的抛光方法
    • US20060084270A1
    • 2006-04-20
    • US11251880
    • 2005-10-18
    • Ai HiramitsuTakashi ItoTetsuji Hori
    • Ai HiramitsuTakashi ItoTetsuji Hori
    • H01L21/302
    • C09G1/02H01L21/31053
    • To provide a polishing composition whereby the stock removal rate of a silicon nitride layer is higher than the stock removal rate of a silicon oxide layer, there is substantially no adverse effect against polishing planarization, and a sufficient stock removal rate of a silicon nitride layer is obtainable, and a polishing method employing such a composition. A polishing composition which comprises silicon oxide abrasive grains, an acidic additive and water, wherein the acidic additive is such that when it is formed into a 85 wt % aqueous solution, the chemical etching rate of the silicon nitride layer is at most 0.1 nm/hr in an atmosphere of 80° C. Particularly preferred is one wherein the silicon oxide abrasive grains have an average particle size of from 1 to 50 nm, and the pH of the composition is from 3.5 to 6.5.
    • 为了提供一种抛光组合物,其中氮化硅层的原料去除率高于氧化硅层的原料去除率,对抛光平面化基本上没有不利影响,并且氮化硅层的充分的除屑率为 以及使用这种组合物的抛光方法。 一种抛光组合物,其包含氧化硅磨粒,酸性添加剂和水,其中所述酸性添加剂使得当其形成为85重量%的水溶液时,所述氮化硅层的化学蚀刻速率为至多0.1nm / hr。特别优选的是其中氧化硅磨粒的平均粒度为1〜50nm,组合物的pH为3.5〜6.5。
    • 3. 发明授权
    • Composition for selectively polishing silicon nitride layer and polishing method employing it
    • 用于选择性抛光氮化硅层的组合物和使用它的抛光方法
    • US07217989B2
    • 2007-05-15
    • US11251880
    • 2005-10-18
    • Ai HiramitsuTakashi ItoTetsuji Hori
    • Ai HiramitsuTakashi ItoTetsuji Hori
    • H01L23/58
    • C09G1/02H01L21/31053
    • To provide a polishing composition whereby the stock removal rate of a silicon nitride layer is higher than the stock removal rate of a silicon oxide layer, there is substantially no adverse effect against polishing planarization, and a sufficient stock removal rate of a silicon nitride layer is obtainable, and a polishing method employing such a composition. A polishing composition which has silicon oxide abrasive grains, an acidic additive and water, wherein the acidic additive is such that when it is formed into a 85 wt % aqueous solution, the chemical etching rate of the silicon nitride layer is at most 0.1 nm/hr in an atmosphere of 80° C. Particularly preferred is one wherein the silicon oxide abrasive grains have an average particle size of from 1 to 50 nm, and the pH of the composition is from 3.5 to 6.5.
    • 为了提供一种抛光组合物,其中氮化硅层的原料去除率高于氧化硅层的原料去除率,对抛光平面化基本上没有不利影响,并且氮化硅层的充分的除屑率为 以及使用这种组合物的抛光方法。 一种具有氧化硅磨粒,酸性添加剂和水的抛光组合物,其中所述酸性添加剂使得当其形成为85重量%的水溶液时,所述氮化硅层的化学蚀刻速率为至多0.1nm / hr。特别优选的是其中氧化硅磨粒的平均粒度为1〜50nm,组合物的pH为3.5〜6.5。
    • 6. 发明授权
    • Search system, search method of search system, and information processing device
    • 搜索系统,搜索系统的搜索方法和信息处理设备
    • US09418238B2
    • 2016-08-16
    • US14001028
    • 2012-02-20
    • Takashi ItoMitsuhiro HattoriNori MatsudaKazuo OtaYusuke Sakai
    • Takashi ItoMitsuhiro HattoriNori MatsudaKazuo OtaYusuke Sakai
    • G06F21/62H04L9/00H04L9/08G06F21/60
    • G06F21/6218G06F21/6227G06F2221/2123H04L9/002H04L9/0894
    • A searchable encryption resistant to frequency analysis. A conversion rule management device generates a conversion rule table associating a search keyword with a conversion keyword group. Based on the conversion rule table, a data registration device generates registration data associating encrypted data with an encrypted keyword, and registers the registration data in a server device. An information processing device obtains from the conversion rule table a conversion keyword group associated with a specified search keyword, generates an encrypted keyword group, and requests a data search by specifying the encrypted keyword group. Using as a search key an encrypted keyword included in the encrypted keyword group, the server device searches for encrypted data associated with the search key, and returns searched encrypted data. The information processing device decrypts the searched encrypted data, and outputs as a search result search data obtained by decryption.
    • 可搜索的加密功能可抵抗频率分析。 转换规则管理装置生成将搜索关键字与转换关键字组关联的转换规则表。 基于转换规则表,数据登记装置生成将加密数据与加密关键词相关联的登记数据,并将注册数据登记在服务器装置中。 信息处理装置从转换规则表获得与指定搜索关键字相关联的转换关键字组,生成加密关键字组,并通过指定加密的关键字组来请求数据搜索。 使用包括在加密关键字组中的加密关键字作为搜索关键字,服务器设备搜索与搜索关键字相关联的加密数据,并返回搜索到的加密数据。 信息处理装置对所搜索的加密数据进行解密,并输出作为通过解密得到的搜索结果的搜索结果。
    • 9. 发明授权
    • Life estimation device and life estimation method for rolling bearing
    • 滚动轴承寿命估计装置及寿命估算方法
    • US09329100B2
    • 2016-05-03
    • US13979784
    • 2012-01-12
    • Takashi ItoTakumi Fujita
    • Takashi ItoTakumi Fujita
    • G01M13/04
    • G01M13/04G01M13/045
    • A lifetime estimation device to estimate a lifetime of a rolling bearing assembly comprising inner and outer rings includes a buildup height estimation unit to estimate in accordance with a predetermined rule a buildup height of the indentation based on the inputted depth of the indentation or the inputted indentation size; and a lifetime estimation unit to estimate the lifetime of the rolling bearing assembly, the lifetime estimation unit being configured to determine a preliminary estimate of the lifetime of the rolling bearing assembly based on a dynamic equivalent load, determine a rate of reduction in a rolling fatigue life based on the buildup height of the indentation, and apply the determined rate of reduction in a rolling fatigue life to the preliminary estimate of the lifetime of the rolling bearing assembly to determine an estimate of the lifetime of the rolling bearing assembly.
    • 用于估计包括内环和外环的滚动轴承组件的寿命的寿命估计装置包括累积高度估计单元,其基于所输入的压痕深度或输入的凹痕根据预定规则估计压痕的累积高度 尺寸; 以及寿命估计单元,其估计所述滚动轴承组件的寿命,所述寿命估计单元被配置为基于动态等效载荷来确定所述滚动轴承组件的寿命的初步估计,确定滚动疲劳减少率 基于压痕的积聚高度的寿命,并将确定的滚动疲劳寿命的降低速率应用于滚动轴承组件的寿命的初步估计,以确定滚动轴承组件的寿命的估计。