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    • 10. 发明申请
    • FLEXIBLE SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME
    • 柔性半导体器件及其制造方法
    • US20120181543A1
    • 2012-07-19
    • US13498700
    • 2011-04-14
    • Takashi IchiryuSeiichi NakataniKoichi Hirano
    • Takashi IchiryuSeiichi NakataniKoichi Hirano
    • H01L29/786H01L21/336H01L21/50H01L27/06
    • H01L29/7869H01L27/1225H01L27/124H01L27/1262H01L27/1292H01L27/3244H01L29/78603H01L2251/5338
    • Disclosed are a flexible semiconductor device and manufacturing method therefor whereby the capacitances of capacitor parts of semiconductor elements and the like can be increased while decreasing parasitic capacitances that arise between multilevel interconnections. The disclosed flexible semiconductor device is provided with an insulating film on which a semiconductor element is formed. The top and bottom surfaces of the insulating film have a top wiring pattern layer and a bottom wiring pattern layer, respectively. The semiconductor element comprises: a semiconductor layer formed on the top surface of the insulating film; a source electrode and a drain electrode formed on the top surface of the insulating film so as to contact the semiconductor layer; and a gate electrode formed on the bottom surface of the insulating film so as to be opposite the semiconductor layer. A first thickness, which is the thickness of the insulting film facing the source electrode, the drain electrode, the top wiring pattern layer, and the bottom wiring pattern layer, is greater than a second thickness, which is the thickness of the insulating film between the gate electrode and the semiconductor layer.
    • 公开了一种柔性半导体器件及其制造方法,由此可以增加半导体元件等的电容器部件的电容,同时减小在多层互连之间产生的寄生电容。 所公开的柔性半导体器件设置有形成有半导体元件的绝缘膜。 绝缘膜的顶表面和底表面分别具有顶部布线图案层和底部布线图案层。 半导体元件包括:形成在绝缘膜的顶表面上的半导体层; 源电极和漏电极,形成在绝缘膜的顶表面上以与半导体层接触; 以及形成在绝缘膜的底表面上以与半导体层相对的栅电极。 作为与源极电极,漏极电极,顶部布线图案层和底部布线图案层相对的绝缘膜的厚度的第一厚度大于第二厚度,其是绝缘膜的厚度 栅电极和半导体层。