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1. 发明申请

US20060193796A1 Method for refining ultraviolet absorbent, ultraviolet absorbent and cosmetic material 审中-公开
标题翻译：紫外线吸收剂，紫外线吸收剂和化妆品的精制方法
公开(公告)号：US20060193796A1
公开(公告)日：2006-08-31
申请号：US10548496
申请日：2004-03-09
申请人： Takanori Mizuoka , Yoshiaki Iwamoto , Yoshiaki Takagi , Keiji Ashitaka , Kazunori Nobuhara
发明人： Takanori Mizuoka , Yoshiaki Iwamoto , Yoshiaki Takagi , Keiji Ashitaka , Kazunori Nobuhara
IPC分类号： A61K8/36 , C07C69/88
CPC分类号： A61K8/02 , A61K8/37 , A61Q1/06 , A61Q17/04 , C09C1/28 , C09C3/08 , C09C3/12
摘要： The process for purifying an ultraviolet absorber of the present invention is characterized by including an adsorbent treatment step of bringing the ultraviolet absorber into contact with an absorbent. According to the process, an ultraviolet absorber having a reduced odor, an improved hue and less skin irritation can be obtained.
摘要翻译：本发明的紫外线吸收剂的净化方法的特征在于包括使紫外线吸收剂与吸收剂接触的吸附处理工序。根据该方法，可以获得具有减少的气味，改善的色调和较少的皮肤刺激性的紫外线吸收剂。

2. 发明授权

US09028574B2 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US09028574B2
公开(公告)日：2015-05-12
申请号：US13878362
申请日：2011-10-06
申请人： Keiji Ashitaka , Hitoshi Morinaga , Akihito Yasui
发明人： Keiji Ashitaka , Hitoshi Morinaga , Akihito Yasui
IPC分类号： C09K3/14 , C09G1/02 , H01L21/3105
CPC分类号： C09K3/1409 , C09G1/02 , C09K3/1463 , H01L21/31053
摘要： A polishing composition contains colloidal silica particles having protrusions on the surfaces thereof. The average of values respectively obtained by dividing the height of a protrusion on the surface of each particle belonging to the part of the colloidal silica particles that has larger particle diameters than the volume average particle diameter of the colloidal silica particles by the width of a base portion of the same protrusion is no less than 0.245. Preferably, the part of the colloidal silica particles that has larger particle diameter than the volume average particle diameter of the colloidal silica particles has an average aspect ratio of no less than 1.15. Preferably, the protrusions on the surfaces of particles belonging to the part of the colloidal silica particles that has larger particle diameters than the volume average particle diameter of the colloidal silica particles have an average height of no less than 3.5 nm.
摘要翻译：抛光组合物包含其表面上具有突起的胶体二氧化硅颗粒。分别通过将属于粒径比胶体二氧化硅粒子的体积平均粒径大的胶体二氧化硅粒子的一部分的粒子的表面上的突起的高度除以碱的宽度而得到的值的平均值相同突起的部分不小于0.245。优选地，粒径比胶体二氧化硅粒子的体积平均粒径大的胶态二氧化硅粒子的平均长径比优选为1.15以上。优选地，粒径比胶态二氧化硅粒子的体积平均粒径大的胶体二氧化硅粒子的粒子的表面上的突起的平均高度优选为3.5nm以上。

3. 发明授权

US09157011B2 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US09157011B2
公开(公告)日：2015-10-13
申请号：US13818554
申请日：2011-08-25
申请人： Keiji Ashitaka , Hitoshi Morinaga , Muneaki Tahara
发明人： Keiji Ashitaka , Hitoshi Morinaga , Muneaki Tahara
IPC分类号： C09G1/00 , C09G1/02 , C09K3/14 , H01L21/02 , H01L21/3105 , B24D3/02 , C09C1/68
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/02024 , H01L21/31053
摘要： A polishing composition contains colloidal silica. The colloidal silica satisfies the expression A×D×E×F≧350,000 where “A” denotes the average aspect ratio (dimensionless) of the colloidal silica, “D” denotes the average particle diameter (units: nm) of the colloidal silica, “E” denotes the standard deviation of the particle size (units: nm) of the colloidal silica, and “F” denotes the volume fraction (units: %) of particles having a diameter of 1 to 300 nm in the colloidal silica. The volume fraction of particles having a diameter of 1 to 300 nm in the colloidal silica is 90% or greater.
摘要翻译：抛光组合物含有胶体二氧化硅。胶体二氧化硅满足A×D×E×F≥350,000的表达式，其中“A”表示胶体二氧化硅的平均纵横比（无量纲），“D”表示胶体二氧化硅的平均粒径（单位：nm） “E”表示胶体二氧化硅的粒径（单位：nm）的标准偏差，“F”表示胶体二氧化硅中直径为1〜300nm的粒子的体积分数（单位：％）。胶体二氧化硅中直径为1〜300nm的粒子的体积分率为90％以上。

4. 发明申请

US20130205682A1 POLISHING COMPOSITION 有权
标题翻译：抛光组合物
公开(公告)号：US20130205682A1
公开(公告)日：2013-08-15
申请号：US13818554
申请日：2011-08-25
申请人： Keiji Ashitaka , Hitoshi Morinaga , Muneaki Tahara
发明人： Keiji Ashitaka , Hitoshi Morinaga , Muneaki Tahara
IPC分类号： C09G1/02
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/02024 , H01L21/31053
摘要： A polishing composition contains colloidal silica. The colloidal silica satisfies the expression A×D×E×F≧350,000 where “A” denotes the average aspect ratio (dimensionless) of the colloidal silica, “D” denotes the average particle diameter (units: nm) of the colloidal silica, “E” denotes the standard deviation of the particle size (units: nm) of the colloidal silica, and “F” denotes the volume fraction (units: %) of particles having a diameter of 1 to 300 nm in the colloidal silica. The volume fraction of particles having a diameter of 1 to 300 nm in the colloidal silica is 90% or greater.
摘要翻译：抛光组合物含有胶体二氧化硅。胶体二氧化硅满足A×D×E×F> = 350,000的表达式，其中“A”表示胶态二氧化硅的平均纵横比（无量纲），“D”表示胶体二氧化硅的平均粒径（单位：nm），“E”表示胶体二氧化硅的粒径（单位：nm）的标准偏差，“F”表示胶体二氧化硅中直径为1〜300nm的粒子的体积分数（单位：％）。胶体二氧化硅中直径为1〜300nm的粒子的体积分率为90％以上。

5. 发明申请

US20130199106A1 POLISHING COMPOSITION 有权
标题翻译：抛光组合物
公开(公告)号：US20130199106A1
公开(公告)日：2013-08-08
申请号：US13878362
申请日：2011-10-06
申请人： Keiji Ashitaka , Hitoshi Morinaga , Akihito Yasui
发明人： Keiji Ashitaka , Hitoshi Morinaga , Akihito Yasui
IPC分类号： C09K3/14
CPC分类号： C09K3/1409 , C09G1/02 , C09K3/1463 , H01L21/31053
摘要： A polishing composition contains colloidal silica particles having protrusions on the surfaces thereof. The average of values respectively obtained by dividing the height of a protrusion on the surface of each particle belonging to the part of the colloidal silica particles that has larger particle diameters than the volume average particle diameter of the colloidal silica particles by the width of a base portion of the same protrusion is no less than 0.245. Preferably, the part of the colloidal silica particles that has larger particle diameter than the volume average particle diameter of the colloidal silica particles has an average aspect ratio of no less than 1.15. Preferably, the protrusions on the surfaces of particles belonging to the part of the colloidal silica particles that has larger particle diameters than the volume average particle diameter of the colloidal silica particles have an average height of no less than 3.5 nm.
摘要翻译：抛光组合物包含其表面上具有突起的胶体二氧化硅颗粒。分别通过将属于粒径比胶体二氧化硅粒子的体积平均粒径大的胶体二氧化硅粒子的一部分的粒子的表面上的突起的高度除以碱的宽度而得到的值的平均值相同突起的部分不小于0.245。优选地，粒径比胶体二氧化硅粒子的体积平均粒径大的胶态二氧化硅粒子的平均长径比优选为1.15以上。优选地，粒径比胶态二氧化硅粒子的体积平均粒径大的胶体二氧化硅粒子的粒子的表面上的突起的平均高度优选为3.5nm以上。

6. 发明申请

US20100040536A1 Method for producing boehmite particles and method for producing alumina particles 有权
标题翻译：勃姆石颗粒的制造方法和氧化铝粒子的制造方法
公开(公告)号：US20100040536A1
公开(公告)日：2010-02-18
申请号：US12542852
申请日：2009-08-18
申请人： Hitoshi Morinaga , Muneaki Tahara , Keiji Ashitaka
发明人： Hitoshi Morinaga , Muneaki Tahara , Keiji Ashitaka
IPC分类号： C01F7/38 , C01F7/02
CPC分类号： C01F7/448 , C01F7/02 , C01P2004/30 , C01P2004/38 , C01P2004/39 , C01P2004/54 , C01P2004/61 , C01P2004/62 , C09K3/1409
摘要： A method for producing boehmite particles includes subjecting powder of aluminum hydroxide to hydrothermal reaction together with a nucleation agent, thereby obtaining boehmite particles having an average primary particle size of 0.6 μm or less and including primary particles each having a hexahedral shape. A method for producing alumina particles includes: drying the boehmite particles produced by the above described method; calcining the boehmite particles, which have been dried, to obtain alumina particles; and disintegrating the obtained alumina particles.
摘要翻译：勃姆石粒子的制造方法包括将氢氧化铝粉末与成核剂一起进行水热反应，得到平均一次粒径为0.6μm以下的勃姆石粒子，并且包括各自具有六面体形状的一次粒子。一种生产氧化铝颗粒的方法包括：干燥由上述方法生产的勃姆石颗粒; 煅烧已经干燥的勃姆石颗粒，得到氧化铝颗粒; 并使得到的氧化铝颗粒分解。

7. 发明授权

US08226924B2 Method for producing boehmite particles and method for producing alumina particles 有权
标题翻译：勃姆石颗粒的制造方法和氧化铝粒子的制造方法
公开(公告)号：US08226924B2
公开(公告)日：2012-07-24
申请号：US12542852
申请日：2009-08-18
申请人： Hitoshi Morinaga , Muneaki Tahara , Keiji Ashitaka
发明人： Hitoshi Morinaga , Muneaki Tahara , Keiji Ashitaka
IPC分类号： C01F7/02
CPC分类号： C01F7/448 , C01F7/02 , C01P2004/30 , C01P2004/38 , C01P2004/39 , C01P2004/54 , C01P2004/61 , C01P2004/62 , C09K3/1409
摘要： A method for producing boehmite particles includes subjecting powder of aluminum hydroxide to hydrothermal reaction together with a nucleation agent, thereby obtaining boehmite particles having an average primary particle size of 0.6 μm or less and including primary particles each having a hexahedral shape. A method for producing alumina particles includes: drying the boehmite particles produced by the above described method; calcining the boehmite particles, which have been dried, to obtain alumina particles; and disintegrating the obtained alumina particles.
摘要翻译：勃姆石粒子的制造方法包括将氢氧化铝粉末与成核剂一起进行水热反应，得到平均一次粒径为0.6μm以下的勃姆石粒子，并且包含各自具有六面体形状的一次粒子。一种生产氧化铝颗粒的方法包括：干燥由上述方法生产的勃姆石颗粒; 煅烧已经干燥的勃姆石颗粒，得到氧化铝颗粒; 并使得到的氧化铝颗粒分解。

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