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1. 发明授权

US6062852A Substrate heat-treating apparatus 失效
标题翻译：基板热处理装置
公开(公告)号：US6062852A
公开(公告)日：2000-05-16
申请号：US60422
申请日：1998-04-14
申请人： Takanori Kawamoto , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Akihiko Morita
发明人： Takanori Kawamoto , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Akihiko Morita
IPC分类号： H01L21/683 , F27D5/00 , H01L21/027 , H01L21/68
CPC分类号： H01L21/67109 , H01L21/67178 , H01L21/68728 , H01L21/68742
摘要： A substrate heat-treating apparatus includes a heat-treating plate, and support pins extending through the heat-treating plate to be vertically movable relative thereto. The support pins support each substrate at a lower surface thereof such that edges of the substrate are at a higher level than a central region of the substrate. This construction facilitates air flows into and out of a space between the lower surface of the substrate and the upper surface of the heat-treating plate when the substrate is vertically moved.
摘要翻译：基板热处理装置包括热处理板和延伸穿过热处理板以相对于其垂直移动的支撑销。支撑销在其下表面处支撑每个基板，使得基板的边缘处于比基板的中心区域更高的水平。当基板垂直移动时，这种结构便于空气流入和流出基板的下表面和热处理板的上表面之间的空间。

2. 发明授权

US06051101A Substrate processing apparatus, substrate transport apparatus and substrate transfer apparatus 失效
标题翻译：基板处理装置，基板输送装置和基板输送装置
公开(公告)号：US06051101A
公开(公告)日：2000-04-18
申请号：US39824
申请日：1998-03-16
申请人： Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Takanori Kawamoto , Masaki Iwami , Joichi Nishimura , Akihiko Morita
发明人： Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Takanori Kawamoto , Masaki Iwami , Joichi Nishimura , Akihiko Morita
IPC分类号： B65G49/07 , H01L21/00 , H01L21/027 , H01L21/677 , B65H1/00
CPC分类号： H01L21/67161 , H01L21/67178 , H01L21/67742 , H01L21/67745
摘要： A unit arrangement part comprises a chemical cabinet on its lowermost part, while coating units for forming a resist film on a substrate and developing units for developing the substrate after exposure are arranged on four corners of an apparatus above the chemical cabinet. Further, multistage thermal processing units for thermal-processing the substrate are arranged on front and rear portions of the apparatus above these wet processing units. A cleaning unit for supplying a cleaning liquid such as pure water and cleaning the substrate is arranged on a front side of the apparatus between the coating units as a substrate processing unit. Thus provided is a substrate processing apparatus having excellent workability in maintenance with a high degree of freedom in arrangement of processing units.
摘要翻译：单元布置部分包括在其最下部分的化学柜，而在基板上形成抗蚀剂膜的涂布单元和曝光后用于显影基板的显影单元布置在化学柜上方的设备的四个角上。此外，用于热处理基板的多级热处理单元布置在这些湿处理单元上方的设备的前部和后部。在作为基板处理单元的涂布单元之间的设备的前侧设置有用于供应诸如纯水的清洁液体并清洁基板的清洁单元。因此，提供了一种具有优异的维护可加工性的基板处理装置，并且处理单元的布置自由度高。

3. 发明授权

US5846327A Substrate spin treating apparatus 失效
标题翻译：底物旋转处理装置
公开(公告)号：US5846327A
公开(公告)日：1998-12-08
申请号：US816555
申请日：1997-03-13
申请人： Takanori Kawamoto , Mitsuhiro Fujita
发明人： Takanori Kawamoto , Mitsuhiro Fujita
IPC分类号： G03F7/16 , B05C11/08 , G03F7/30 , H01L21/00 , H01L21/027 , H01L21/304 , B05B13/02 , B08B3/00
CPC分类号： H01L21/6715 , B05C11/08 , G03F7/162 , G03F7/30
摘要： A substrate spin treating apparatus includes a spin chuck for supporting a substrate in a horizontal posture and spinning the substrate about a vertical axis. A nozzle is provided for supplying a treating solution to the substrate supported by the spin chuck, and a scatter preventive cup in disposed to surround the substrate on the spin chuck and has an inclined surface extending around an entire inner circumference of the cup for downwardly guiding sprays of the treating solution and the like formed by a spinning of the substrate. The scatter preventive cup includes an inner skirt extending around an entire circumference adjacent an upper end of the inclined surface The inner skirt has a surface opposed to the inclined surface and bent away from a spin center of the substrate. This construction suppresses the treating solution from adhering to and accumulating on portions, adjacent the upper end of the inclined surface, of the surface of the inner skirt opposed to the inclined surface. During cup rinsing, a rinsing solution spreads well over that surface of the inner skirt.
摘要翻译：基片旋转处理装置包括：旋转卡盘，其用于以水平姿态支撑基板，并使基板围绕纵轴旋转。提供了一种用于将处理溶液供给到由旋转卡盘支撑的基板的喷嘴和设置成围绕旋转卡盘的基板设置的防散射杯，并且具有围绕杯的整个内周延伸的倾斜表面，用于向下引导通过基材的纺丝形成的处理液等的喷雾。散射防止杯包括围绕与倾斜表面的上端相邻的整个圆周延伸的内裙部。内裙部具有与倾斜表面相对的表面并且远离基底的旋转中心弯曲。这种结构抑制处理液粘附在与倾斜表面相对的内裙部的表面邻近倾斜表面的上部的部分上并积聚。在杯子冲洗期间，冲洗溶液在内裙的表面上很好地扩散。

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