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1. 发明申请

US20090047600A1 POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD 有权
标题翻译：积极抵抗组合和阻力图形成方法
公开(公告)号：US20090047600A1
公开(公告)日：2009-02-19
申请号：US11813765
申请日：2005-12-14
申请人： Takako Hirosaki , Tomoyuki Ando , Takuma Hojo
发明人： Takako Hirosaki , Tomoyuki Ando , Takuma Hojo
IPC分类号： G03C1/73 , G03F7/20
CPC分类号： G03F7/0397 , C08F212/14 , C08F220/24 , C08F220/26 , C08F220/28 , C08F257/00 , C08K5/17 , C09D125/18 , Y10S430/108 , Y10S430/111 , C08F2/04 , C08F216/12
摘要： Disclosed is a positive resist composition which can provide a positive resist composition and a resist pattern forming method, capable of forming a high resolution pattern with reduce LER, the positive resist composition comprising a resin component (A) which has acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under the action of an acid, and an acid generator component (B) which generates an acid under exposure, wherein the resin component (A) contains a polymer compound (A1) having a structural unit (a1) derived from hydroxystyrene and a structural unit (a2) derived from an acrylate ester having acid dissociable, dissolution inhibiting groups, a fluorine atom or a fluorinated lower alkyl group being bonded at the α-position.
摘要翻译：公开了能够提供能够形成具有降低LER的高分辨率图案的正型抗蚀剂组合物和抗蚀剂图案形成方法的正性抗蚀剂组合物，正性抗蚀剂组合物包含具有酸解离性，溶解抑制基团的树脂组分（A）并且在酸的作用下表现出增加的碱溶解性，以及产生暴露酸的酸产生剂组分（B），其中树脂组分（A）含有具有衍生自下述结构单元（a1）的高分子化合物（A1）羟基苯乙烯和由具有酸解离性，溶解抑制基团，氟原子或氟化低级烷基在α-位上结合的丙烯酸酯衍生的结构单元（a2）。

2. 发明申请

US20090075177A1 POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD 有权
标题翻译：积极抵抗组合和阻力图形成方法
公开(公告)号：US20090075177A1
公开(公告)日：2009-03-19
申请号：US11719179
申请日：2005-11-28
申请人： Tomoyuki Ando , Takako Hirosaki
发明人： Tomoyuki Ando , Takako Hirosaki
IPC分类号： G03F7/004 , G03F7/20 , G03F1/00
CPC分类号： G03F7/0397 , G03F7/0392 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition having excellent size controllability, and a resist pattern forming method are provided. This positive resist composition contains a resin component (A) comprising an alkali soluble constituent unit (a1) which comprises a constituent unit (a11) derived from (α-methyl)hydroxystyrene, and a constituent unit (a2) which has an acid dissociable dissolution inhibiting group including an acid dissociable dissolution inhibiting group (II) represented by the following general formula (II) and/or a specific chain acid dissociable dissolution inhibiting group (III); an acid generator component (B) which generates an acid upon exposure; and preferably contains an aromatic amine (C).
摘要翻译：提供具有优异的尺寸控制性的正型抗蚀剂组合物和抗蚀剂图案形成方法。该正性抗蚀剂组合物含有包含由（α-甲基）羟基苯乙烯衍生的构成单元（a11）的碱溶性结构单元（a1）和具有酸解离溶解性的结构单元（a2）的树脂成分（A）包括由以下通式（II）表示的酸解离溶解抑制基团（II）和/或特定链酸解离溶解抑制基团（III）的组合物。酸性发生剂组分（B），其在暴露时产生酸; 优选含有芳香族胺（C）。

3. 发明授权

US08062825B2 Positive resist composition and resist pattern forming method 有权
标题翻译：正抗蚀剂组合物和抗蚀剂图案形成方法
公开(公告)号：US08062825B2
公开(公告)日：2011-11-22
申请号：US11719179
申请日：2005-11-28
申请人： Tomoyuki Ando , Takako Hirosaki
发明人： Tomoyuki Ando , Takako Hirosaki
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0392 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition having excellent size controllability, and a resist pattern forming method are provided. This positive resist composition contains a resin component (A) comprising an alkali soluble constituent unit (a1) which comprises a constituent unit (a11) derived from (α-methyl)hydroxystyrene, and a constituent unit (a2) which has an acid dissociable dissolution inhibiting group including an acid dissociable dissolution inhibiting group (II) represented by the following general formula (II) and/or a specific chain acid dissociable dissolution inhibiting group (III); an acid generator component (B) which generates an acid upon exposure; and preferably contains an aromatic amine (C).
摘要翻译：提供具有优异的尺寸控制性的正型抗蚀剂组合物和抗蚀剂图案形成方法。该正性抗蚀剂组合物含有包含碱可溶性结构单元（a1）的树脂组分（A），其包含衍生自（α-甲基）羟基苯乙烯的构成单元（a11）和具有酸解离溶解性的构成单元（a2）包括由以下通式（II）表示的酸解离溶解抑制基团（II）和/或特定链酸解离溶解抑制基团（III）的组合物。酸性发生剂组分（B），其在暴露时产生酸; 优选含有芳香族胺（C）。

4. 发明授权

US07727701B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07727701B2
公开(公告)日：2010-06-01
申请号：US10586694
申请日：2005-01-14
申请人： Takuma Hojo , Kiyoshi Ishikawa , Tomoyuki Ando
发明人： Takuma Hojo , Kiyoshi Ishikawa , Tomoyuki Ando
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0397 , G03F7/0392 , Y10S430/106 , Y10S430/122 , Y10S430/126
摘要： A positive resist composition that exhibits a large exposure margin, and excellent levels of resolution and dry etching resistance, as well as a method of forming a resist pattern that uses the positive resist composition. This resist composition includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and displays increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) contains a structural unit (a1) represented by a general formula (I) shown below, a structural unit (a2) in which a hydroxyl group within the above general formula (I) has been protected by substituting the hydrogen atom thereof with an acid dissociable, dissolution inhibiting group (II) represented by a general formula (II) shown below, and a structural unit (a3) in which a hydroxyl group within the above general formula (I) has been protected by substituting the hydrogen atom thereof with an acyclic acid dissociable, dissolution inhibiting group (III).
摘要翻译：显示出大的曝光裕度，优异的分辨率和耐干蚀刻性的阳性抗蚀剂组合物，以及形成使用正性抗蚀剂组合物的抗蚀剂图案的方法。该抗蚀剂组合物包括含有酸解离的溶解抑制基团并在酸的作用下显示增加的碱溶性的树脂组分（A）和在曝光时产生酸的酸产生剂组分（B），其中树脂组分）包含由下述通式（I）表示的结构单元（a1），其中通过用酸取代上述通式（I）中的羟基已被保护的结构单元（a2）由下述通式（II）表示的可离解的溶解抑制基团（II）和其中通式（I）中的羟基用其取代氢原子进行保护的结构单元（a3）无环酸解离，溶解抑制组（III）。

5. 发明申请

US20080241747A1 Positive Resist Composition and Method of Forming Resist Pattern 有权
标题翻译：正电阻组合物和形成抗蚀剂图案的方法
公开(公告)号：US20080241747A1
公开(公告)日：2008-10-02
申请号：US10586694
申请日：2005-01-14
申请人： Takuma Hojo , Kiyoshi Ishikawa , Tomoyuki Ando
发明人： Takuma Hojo , Kiyoshi Ishikawa , Tomoyuki Ando
IPC分类号： G03F7/004 , G03F7/26
CPC分类号： G03F7/0397 , G03F7/0392 , Y10S430/106 , Y10S430/122 , Y10S430/126
摘要： A positive resist composition that exhibits a large exposure margin, and excellent levels of resolution and dry etching resistance, as well as a method of forming a resist pattern that uses the positive resist composition. This resist composition includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and displays increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) contains a structural unit (a1) represented by a general formula (I) shown below, a structural unit (a2) in which a hydroxyl group within the above general formula (I) has been protected by substituting the hydrogen atom thereof with an acid dissociable, dissolution inhibiting group (II) represented by a general formula (II) shown below, and a structural unit (a3) in which a hydroxyl group within the above general formula (I) has been protected by substituting the hydrogen atom thereof with an acyclic acid dissociable, dissolution inhibiting group (III).
摘要翻译：显示出大的曝光裕度，优异的分辨率和耐干蚀刻性的阳性抗蚀剂组合物，以及形成使用正性抗蚀剂组合物的抗蚀剂图案的方法。该抗蚀剂组合物包括含有酸解离的溶解抑制基团并在酸的作用下显示增加的碱溶性的树脂组分（A）和在曝光时产生酸的酸产生剂组分（B），其中树脂组分）包含由下述通式（I）表示的结构单元（a1），其中通过用酸取代上述通式（I）中的羟基已被保护的结构单元（a2）由下述通式（II）表示的可离解的溶解抑制基团（II）和其中通式（I）中的羟基用其氢原子进行保护而被保护的结构单元（a3）无环酸解离，溶解抑制组（III）。

6. 发明授权

US07687221B2 Positive resist composition and resist pattern forming method 有权
标题翻译：正抗蚀剂组合物和抗蚀剂图案形成方法
公开(公告)号：US07687221B2
公开(公告)日：2010-03-30
申请号：US11813765
申请日：2005-12-14
申请人： Taako Hirosaki , Tomoyuki Ando , Takuma Hojo
发明人： Taako Hirosaki , Tomoyuki Ando , Takuma Hojo
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , C08F212/14 , C08F220/24 , C08F220/26 , C08F220/28 , C08F257/00 , C08K5/17 , C09D125/18 , Y10S430/108 , Y10S430/111 , C08F2/04 , C08F216/12
摘要： Disclosed is a positive resist composition which can provide a positive resist composition and a resist pattern forming method, capable of forming a high resolution pattern with reduce LER, the positive resist composition comprising a resin component (A) which has acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under the action of an acid, and an acid generator component (B) which generates an acid under exposure, wherein the resin component (A) contains a polymer compound (A1) having a structural unit (a1) derived from hydroxystyrene and a structural unit (a2) derived from an acrylate ester having acid dissociable, dissolution inhibiting groups, a fluorine atom or a fluorinated lower alkyl group being bonded at the α-position.
摘要翻译：公开了能够提供能够形成具有降低LER的高分辨率图案的正型抗蚀剂组合物和抗蚀剂图案形成方法的正性抗蚀剂组合物，正性抗蚀剂组合物包含具有酸解离性，溶解抑制基团的树脂组分（A）并且在酸的作用下表现出增加的碱溶解性，以及产生暴露酸的酸产生剂组分（B），其中树脂组分（A）含有具有衍生自下述结构单元（a1）的高分子化合物（A1）羟基苯乙烯和由具有酸解离性，溶解抑制基团，氟原子或氟代低级烷基在α-位键合的丙烯酸酯的结构单元（a2）。

7. 发明授权

US08026239B2 Cell differentiation inducer 有权
标题翻译：细胞分化诱导物
公开(公告)号：US08026239B2
公开(公告)日：2011-09-27
申请号：US12721843
申请日：2010-03-11
申请人： Tsuneji Suzuki , Tomoyuki Ando , Katsutoshi Tsuchiya , Osamu Nakanishi , Akiko Saito , Takashi Yamashita , Yoshinori Shiraishi , Eishi Tanaka
发明人： Tsuneji Suzuki , Tomoyuki Ando , Katsutoshi Tsuchiya , Osamu Nakanishi , Akiko Saito , Takashi Yamashita , Yoshinori Shiraishi , Eishi Tanaka
IPC分类号： A61K31/497 , A61K31/44 , A61K31/47 , A61K31/445 , C07D211/72 , C07D213/46 , C07D213/55
CPC分类号： C07D213/30 , C07C233/80 , C07C237/42 , C07C255/57 , C07C271/20 , C07C275/24 , C07C275/40 , C07C335/16 , C07C335/20 , C07D207/34 , C07D211/22 , C07D213/38 , C07D213/40 , C07D213/50 , C07D213/56 , C07D213/61 , C07D213/64 , C07D213/65 , C07D213/74 , C07D213/75 , C07D213/81 , C07D213/82 , C07D215/48 , C07D215/54 , C07D231/12 , C07D233/56 , C07D233/64 , C07D233/90 , C07D241/12 , C07D241/24 , C07D249/08 , C07D261/08 , C07D261/18 , C07D263/24 , C07D275/03 , C07D277/24 , C07D277/40 , C07D295/088 , C07D307/12 , C07D307/68 , C07D333/16 , C07D333/70 , C07D401/06 , C07D405/12 , C07D413/12 , C07D453/02 , C07D491/04
摘要： A method of treating a malignant tumor selected from the group consisting of leukemia, colorectal cancer, ovarian cancer, oral cancer, lung carcinoma, breast carcinoma, prostate carcinoma, and melanoma by administering to a patient in need thereof an effective amount of at least one compound represented by formula (1) wherein A, X, Q, R1-3, and n are defined herein.
摘要翻译：一种治疗选自白血病，结肠直肠癌，卵巢癌，口腔癌，肺癌，乳腺癌，前列腺癌和黑素瘤的恶性肿瘤的方法，通过向有需要的患者施用有效量的至少一种由式（1）表示的化合物，其中A，X，Q，R1-3和n如本文所定义。

8. 发明申请

US20110130516A1 COMPOUND, POLYMERIZABLE COMPOSITION, RESIN, AND USE OF THE COMPOSITION AND THE RESIN 有权
标题翻译：化合物，可聚合组合物，树脂和组合物和树脂的用途
公开(公告)号：US20110130516A1
公开(公告)日：2011-06-02
申请号：US13055280
申请日：2009-07-23
申请人： Masakazu Murakami , Tomoyuki Ando , Seiichi Kobayashi
发明人： Masakazu Murakami , Tomoyuki Ando , Seiichi Kobayashi
IPC分类号： C08G75/08 , C07F9/00 , C08L81/02
CPC分类号： C08G75/08 , C07F9/005 , C07F9/90 , C08G75/06
摘要： Disclosed is a compound represented by the following general formula (1), wherein, in the formula, M1 represents Sb or Bi; X1 and X2 each independently represent a sulfur atom or an oxygen atom; R1 represents a divalent organic group; Y1 represents a monovalent inorganic or organic group; a represents a number of 1 or 2; b represents a number of 0 or an integer of not less than 1; c represents an integer of not less than 1 and not more than d; d represents a valence of M1; when d−c is not less than 2, a plurality of Y1s each independently represent a monovalent inorganic or organic group and may be bonded to each other to form an M1-containing ring; and e represents a number of 0 or an integer of not less than 1.
摘要翻译：公开了由以下通式（1）表示的化合物，其中，在式中，M1表示Sb或Bi; X1和X2各自独立地表示硫原子或氧原子; R1表示二价有机基团; Y1表示一价无机或有机基团; a代表1或2的数字; b表示0或不小于1的整数; c表示不小于1且不大于d的整数; d表示M1的化合价; 当d-c不小于2时，多个Y1各自独立地表示一价无机或有机基团，并且可以彼此键合以形成含有M1的环; e表示0或1以上的整数。

9. 发明授权

US07749677B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US07749677B2
公开(公告)日：2010-07-06
申请号：US10593004
申请日：2005-03-11
申请人： Tomoyuki Ando
发明人： Tomoyuki Ando
IPC分类号： G03F7/038 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： C08G77/16 , G03F7/0045 , G03F7/0382 , G03F7/0757 , Y10S430/106 , Y10S430/12 , Y10S430/122 , Y10S430/143
摘要： The negative resist composition of the present invention comprises a silsesguioxane resin (A) comprising a constituent unit (a1) represented by the following general formula (I) and a constituent unit (a2) represented by the following general formula (II), an acid generator component (B) which generates an acid upon exposure, and a crosslinking agent component (C): wherein R1 represents a linear or branched alkylene group having 1 to 5 carbon atoms, and
摘要翻译：本发明的负型抗蚀剂组合物包含由以下通式（I）表示的构成单元（a1）和由以下通式（II）表示的构成单元（a2））的硅氧烷氧树脂（A），酸曝光时产生酸的发生剂组分（B）和交联剂组分（C）：其中R 1表示具有1至5个碳原子的直链或支链亚烷基，和

10. 发明申请

US20100035192A1 METHOD OF FORMING RESIST PATTERN 失效
标题翻译：形成电阻图案的方法
公开(公告)号：US20100035192A1
公开(公告)日：2010-02-11
申请号：US12533685
申请日：2009-07-31
申请人： Tomoyuki Ando , Sho Abe , Ryoji Watanabe , Komei Hirahara
发明人： Tomoyuki Ando , Sho Abe , Ryoji Watanabe , Komei Hirahara
IPC分类号： G03F7/20
CPC分类号： G03F7/2022 , G03F7/095
摘要： A method of forming a resist pattern including: forming a resist film on a substrate using a chemically amplified negative resist composition; forming a latent image of a first line and space pattern by subjecting the resist film to first exposure through a photomask; forming a latent image of a second line and space pattern so as to intersect with the latent image of the first line and space pattern by subjecting the resist film to second exposure through a photomask; and subjecting the resist film to developing to form a hole pattern in the resist film.
摘要翻译：一种形成抗蚀剂图案的方法，包括：使用化学放大型负性抗蚀剂组合物在基板上形成抗蚀剂膜; 通过使抗蚀剂膜首先通过光掩模曝光来形成第一线和空间图案的潜像; 通过使光刻胶膜通过光掩模进行第二曝光，形成与第一线和空间图案的潜像相交的第二线和空间图案的潜像; 并且使抗蚀剂膜显影以在抗蚀剂膜中形成孔图案。

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