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1. 发明授权

US07855819B2 Swing member device, and optical deflector and image-forming apparatus employing the swing member device 有权
标题翻译：摆动构件装置以及使用摆动构件装置的光学偏转器和图像形成装置
公开(公告)号：US07855819B2
公开(公告)日：2010-12-21
申请号：US12198848
申请日：2008-08-26
申请人： Takahisa Kato , Takahiro Akiyama , Kazutoshi Torashima , Suguru Miyagawa , Kazunari Fujii , Shinichiro Watanabe
发明人： Takahisa Kato , Takahiro Akiyama , Kazutoshi Torashima , Suguru Miyagawa , Kazunari Fujii , Shinichiro Watanabe
IPC分类号： G02B26/08
CPC分类号： G02B26/0866
摘要： A swing member device comprises a swingable part supported by a supporting part to be swingable around a torsional axis on a supporting base in at least one intrinsic oscillation mode: the swing member device having a temperature-raising unit for raising the temperature of ambient atmosphere in the region of swing motion of the swingable part, the temperature-raising unit raising the temperature of the ambient atmosphere to enable decrease of an influence of an unsteady dragging force caused by the ambient atmosphere.
摘要翻译：摆动构件装置包括由支撑部支撑的可摆动部分，以在至少一个本征振荡模式中在支撑基座上绕扭转轴线摆动：摆动构件装置具有用于将环境气氛的温度升高的升温单元可摆动部分的摆动区域，升温单元提高环境大气的温度，能够降低由环境气氛引起的不稳定拖曳力的影响。

2. 发明申请

US20090067019A1 SWING MEMBER DEVICE, AND OPTICAL DEFLECTOR AND IMAGE-FORMING APPARATUS EMPLOYING THE SWING MEMBER DEVICE 有权
标题翻译：摆动构件装置，以及使用摆动构件装置的光学偏移器和成像装置
公开(公告)号：US20090067019A1
公开(公告)日：2009-03-12
申请号：US12198848
申请日：2008-08-26
申请人： Takahisa Kato , Takahiro Akiyama , Kazutoshi Torashima , Suguru Miyagawa , Kazunari Fujii , Shinichiro Watanabe
发明人： Takahisa Kato , Takahiro Akiyama , Kazutoshi Torashima , Suguru Miyagawa , Kazunari Fujii , Shinichiro Watanabe
IPC分类号： G02B26/08
CPC分类号： G02B26/0866
摘要： A swing member device comprises a swingable part supported by a supporting part to be swingable around a torsional axis on a supporting base in at least one intrinsic oscillation mode: the swing member device having a temperature-raising unit for raising the temperature of ambient atmosphere in the region of swing motion of the swingable part, the temperature-raising unit raising the temperature of the ambient atmosphere to enable decrease of an influence of an unsteady dragging force caused by the ambient atmosphere.
摘要翻译：摆动构件装置包括由支撑部支撑的可摆动部分，以在至少一个本征振荡模式中在支撑基座上绕扭转轴线摆动：摆动构件装置具有用于将环境气氛的温度升高的升温单元可摆动部分的摆动区域，升温单元提高环境大气的温度，能够降低由环境气氛引起的不稳定拖曳力的影响。

3. 发明授权

US08305674B2 Method of manufacturing oscillator device, and optical deflector and optical instrument with oscillator device based on it 有权
标题翻译：制造振荡器装置的方法，以及基于此的振荡器装置的光偏转器和光学仪器
公开(公告)号：US08305674B2
公开(公告)日：2012-11-06
申请号：US12673694
申请日：2008-10-28
申请人： Suguru Miyagawa , Takahiro Akiyama , Kazutoshi Torashima , Takahisa Kato , Kazunari Fujii
发明人： Suguru Miyagawa , Takahiro Akiyama , Kazutoshi Torashima , Takahisa Kato , Kazunari Fujii
IPC分类号： G02B26/10
CPC分类号： G02B26/105 , G02B26/085 , H04N1/1135 , Y10T29/49774
摘要： A method of manufacturing an oscillator device having an oscillator supported relative to a fixed member by a torsion spring for oscillation around a torsion axis and arranged to be driven at a resonance frequency, which method includes a first step for determining an assumed value of an inertia moment weight of the oscillator, a second step for measuring the resonance frequency, a third step for calculating a spring constant of the torsion spring, from the assumed value of the inertia moment weight and the measured resonance frequency obtained at said first and second steps, a fourth step for calculating an adjustment amount for the inertia moment of the oscillator or for the spring constant of the torsion spring, based on the spring constant calculated at said third step and a target resonance frequency determined with respect to the resonance frequency of the oscillator, so as to adjust the resonance frequency to the target resonance frequency, and a fifth step for adjusting the resonance frequency of the oscillator to the target resonance frequency based on the calculated adjustment amount.
摘要翻译：一种制造振荡器装置的方法，该振荡器装置具有通过用于围绕扭转轴线摆动并被以共振频率驱动的扭转弹簧相对于固定构件支撑的振荡器的方法，该方法包括用于确定惯性的假定值的第一步骤振荡器的力矩，用于测量共振频率的第二步骤，用于计算扭簧的弹簧常数的第三步骤，根据在所述第一和第二步骤获得的惯性力矩的假定值和测得的共振频率，基于在所述第三步骤计算的弹簧常数和相对于振荡器的共振频率确定的目标共振频率，计算用于振荡器的惯性矩或扭簧的弹簧常数的调节量的第四步骤，以便将谐振频率调节到目标谐振频率，以及用于调整res的第五步骤基于计算出的调整量，振荡器的频率与目标谐振频率成正比。

4. 发明申请

US20110019256A1 METHOD OF MANUFACTURING OSCILLATOR DEVICE, AND OPTICAL DEFLECTOR AND OPTICAL INSTRUMENT WITH OSCILLATOR DEVICE BASED ON IT 有权
标题翻译：振荡器器件的制造方法以及基于IT的振荡器器件的光学偏置器和光学仪器
公开(公告)号：US20110019256A1
公开(公告)日：2011-01-27
申请号：US12673694
申请日：2008-10-28
申请人： Suguru Miyagawa , Takahiro Akiyama , Kazutoshi Torashima , Takahisa Kato , Kazunari Fujii
发明人： Suguru Miyagawa , Takahiro Akiyama , Kazutoshi Torashima , Takahisa Kato , Kazunari Fujii
IPC分类号： G02B26/08 , B23Q17/00
CPC分类号： G02B26/105 , G02B26/085 , H04N1/1135 , Y10T29/49774
摘要： A method of manufacturing an oscillator device having an oscillator supported relative to a fixed member by a torsion spring for oscillation around a torsion axis and arranged to be driven at a resonance frequency, which method includes a first step for determining an assumed value of an inertia moment weight of the oscillator, a second step for measuring the resonance frequency, a third step for calculating a spring constant of the torsion spring, from the assumed value of the inertia moment weight and the measured resonance frequency obtained at said first and second steps, a fourth step for calculating an adjustment amount for the inertia moment of the oscillator or for the spring constant of the torsion spring, based on the spring constant calculated at said third step and a target resonance frequency determined with respect to the resonance frequency of the oscillator, so as to adjust the resonance frequency to the target resonance frequency, and a fifth step for adjusting the resonance frequency of the oscillator to the target resonance frequency based on the calculated adjustment amount.
摘要翻译：一种制造振荡器装置的方法，该振荡器装置具有通过用于围绕扭转轴线摆动并被以共振频率驱动的扭转弹簧相对于固定构件支撑的振荡器的方法，该方法包括用于确定惯性的假定值的第一步骤振荡器的力矩，用于测量共振频率的第二步骤，用于计算扭簧的弹簧常数的第三步骤，根据在所述第一和第二步骤获得的惯性力矩的假定值和测得的共振频率，基于在所述第三步骤计算的弹簧常数和相对于振荡器的共振频率确定的目标共振频率，计算用于振荡器的惯性矩或扭簧的弹簧常数的调节量的第四步骤，以便将谐振频率调节到目标谐振频率，以及用于调整res的第五步骤基于计算出的调整量，振荡器的频率与目标谐振频率成正比。

5. 发明申请

US20100214636A1 Method of Manufacturing Oscillator Device, and Optical Deflector and Image Forming Apparatus 审中-公开
标题翻译：制造振荡器装置的方法，以及光学偏转器和图像形成装置
公开(公告)号：US20100214636A1
公开(公告)日：2010-08-26
申请号：US12680813
申请日：2008-12-10
申请人： Suguru Miyagawa , Kazunari Fujii , Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
发明人： Suguru Miyagawa , Kazunari Fujii , Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
IPC分类号： G02B26/08 , B23P11/00 , B23K26/38
CPC分类号： G02B26/085 , G02B26/101 , Y10T29/49826
摘要： A method of manufacturing an oscillator device having a fixed member and an oscillation plate supported by the fixed member through a supporting member for oscillation around a torsion axis, the oscillation plate being driven at a resonance frequency around the torsion axis, includes a frequency regulating step based on an extension member for adjustment of a mass of the oscillation plate, for forming the extension member on the oscillation plate and for adjusting the mass of the oscillation plate by cutting a portion of the extension member with the irradiation of a laser beam, an oscillator assembling step for fixing the fixed member to a fixed base, and a driving member assembling step for fixing a driving member for driving the oscillation plate to the fixed base, wherein at least the driving member assembling step is carried out after the frequency regulating step based on the extension member is performed.
摘要翻译：一种振荡器装置的制造方法，其特征在于，具有固定部件和由所述固定部件支撑的摆动板，通过绕所述扭转轴摆动的支撑部件，所述振动板以扭转轴为中心的共振频率被驱动，基于用于调整振动板的质量的延伸构件，用于在振动板上形成延伸构件并且通过用激光束的照射切割延伸构件的一部分来调节振动板的质量，用于将固定构件固定到固定基座的振荡器组装步骤以及用于将用于驱动振荡板的驱动构件固定到固定基座的驱动构件组装步骤，其中至少在频率调节步骤之后执行驱动构件组装步骤基于扩展成员进行。

6. 发明授权

US07643197B2 Method of manufacturing oscillator device, and optical deflector and optical instrument having oscillator device 失效
标题翻译：制造振荡器装置的方法，以及具有振荡器装置的光偏转器和光学仪器
公开(公告)号：US07643197B2
公开(公告)日：2010-01-05
申请号：US12267803
申请日：2008-11-10
申请人： Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
发明人： Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
IPC分类号： G02B26/08
CPC分类号： G02B26/105 , Y10S359/90
摘要： A method of manufacturing an oscillator based on etching a monocrystal silicon substrate, the method including a mask forming step for forming, on the monocrystal silicon substrate, an etching mask having a pattern with a repetition shape comprised of a plurality of mutually coupled oscillators each including a torsion spring between a supporting base plate and a movable member, an etching step for etching the monocrystal silicon substrate while using the etching mask as a mask, to form on the monocrystal silicon substrate a repetition shape comprised of a plurality of corresponding mutually coupled oscillators, and a dicing step for determining a width of the movable member and the supporting base plate of each of the oscillators in the repetition shape, which width is effective to determine a resonance frequency of the individual oscillators required when these are used as oscillators, and for cutting by dicing the movable member and the supporting base plate between adjoining oscillators, at the determined width.
摘要翻译：一种制造基于蚀刻单晶硅衬底的振荡器的方法，所述方法包括掩模形成步骤，用于在单晶硅衬底上形成具有由多个相互耦合的振荡器组成的重复形状的图案的蚀刻掩模，每个包括在支撑基板和可动部件之间的扭转弹簧，在使用蚀刻掩模作为掩模的同时蚀刻单晶硅基板的蚀刻步骤，在单晶硅基板上形成由多个对应的相互耦合的振荡器以及切割步骤，用于确定每个振荡器的可移动部件和支撑基板的重复形状的宽度，该宽度有效地确定当这些振荡器用作振荡器时所需的各个振荡器的谐振频率，以及用于通过在相邻振荡之间切割可移动部件和支撑基板进行切割 ator，以确定的宽度。

7. 发明申请

US20090135472A1 METHOD OF MANUFACTURING OSCILLATOR DEVICE, AND OPTICAL DEFLECTOR AND OPTICAL INSTRUMENT HAVING OSCILLATOR DEVICE 失效
标题翻译：振荡器装置的制造方法以及具有振荡器装置的光学偏转器和光学仪器
公开(公告)号：US20090135472A1
公开(公告)日：2009-05-28
申请号：US12267803
申请日：2008-11-10
申请人： Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
发明人： Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
IPC分类号： G02F1/29 , H01L21/302
CPC分类号： G02B26/105 , Y10S359/90
摘要： A method of manufacturing an oscillator based on etching a monocrystal silicon substrate, the method including a mask forming step for forming, on the monocrystal silicon substrate, an etching mask having a pattern with a repetition shape comprised of a plurality of mutually coupled oscillators each including a torsion spring between a supporting base plate and a movable member, an etching step for etching the monocrystal silicon substrate while using the etching mask as a mask, to form on the monocrystal silicon substrate a repetition shape comprised of a plurality of corresponding mutually coupled oscillators, and a dicing step for determining a width of the movable member and the supporting base plate of each of the oscillators in the repetition shape, which width is effective to determine a resonance frequency of the individual oscillators required when these are used as oscillators, and for cutting by dicing the movable member and the supporting base plate between adjoining oscillators, at the determined width.
摘要翻译：一种制造基于蚀刻单晶硅衬底的振荡器的方法，所述方法包括掩模形成步骤，用于在单晶硅衬底上形成具有由多个相互耦合的振荡器组成的重复形状的图案的蚀刻掩模，每个包括在支撑基板和可动部件之间的扭转弹簧，在使用蚀刻掩模作为掩模的同时蚀刻单晶硅基板的蚀刻步骤，在单晶硅基板上形成由多个对应的相互耦合的振荡器以及切割步骤，用于确定每个振荡器的可移动部件和支撑基板的重复形状的宽度，该宽度有效地确定当这些振荡器用作振荡器时所需的各个振荡器的谐振频率，以及用于通过在相邻振荡之间切割可移动部件和支撑基板进行切割 ator，以确定的宽度。

8. 发明授权

US08809200B2 Method of manufacturing a structure based on anisotropic etching, and silicon substrate with etching mask 有权
标题翻译：基于各向异性蚀刻的结构的制造方法和具有蚀刻掩模的硅衬底
公开(公告)号：US08809200B2
公开(公告)日：2014-08-19
申请号：US12271993
申请日：2008-11-17
申请人： Kazutoshi Torashima , Takahisa Kato , Takahiro Akiyama
发明人： Kazutoshi Torashima , Takahisa Kato , Takahiro Akiyama
IPC分类号： H01L21/302 , H01L21/461 , B81C1/00 , H01L21/308
CPC分类号： B81C1/0042 , B81C1/00626 , G02B26/0833 , H01L21/3086
摘要： A method of manufacturing a structure includes a first step of forming, on a monocrystal silicon substrate having a (100) surface as a principal surface, a basic etching mask corresponding to a target shape and having at least a first structure with a projecting corner and a second structure adjoining the first structure with an opening intervening therebetween, and a correction etching mask extending from the projecting corner of an etching mask of the first structure and connected to an etching mask of the second structure, and a second step of performing anisotropic etching of the monocrystal silicon substrate having the basic etching mask and the correction etching mask to form the target shape.
摘要翻译：一种制造结构的方法包括：在具有（100）表面作为主表面的单晶硅衬底上形成与目标形状对应的至少具有突出角的第一结构的基本蚀刻掩模的第一步骤，与第一结构邻接的第二结构，其间具有开口;以及校正蚀刻掩模，其从第一结构的蚀刻掩模的投影角延伸并连接到第二结构的蚀刻掩模，以及执行各向异性蚀刻的第二步骤具有基本蚀刻掩模和校正蚀刻掩模的单晶硅衬底以形成目标形状。

9. 发明授权

US08343368B2 Method of fabricating a structure by anisotropic etching, and silicon substrate with an etching mask 有权
标题翻译：通过各向异性蚀刻制造结构的方法和具有蚀刻掩模的硅衬底
公开(公告)号：US08343368B2
公开(公告)日：2013-01-01
申请号：US12553015
申请日：2009-09-02
申请人： Toshiyuki Ogawa , Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
发明人： Toshiyuki Ogawa , Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
IPC分类号： B44C1/22
CPC分类号： B81C1/00396 , B81B2201/047 , B81B2203/0118 , B81C1/0042 , B81C1/00626 , H01L21/3083
摘要： In a fabrication method of fabricating a structure, a basic etching mask corresponding a target shape with a convex corner, and a correction etching mask with a first portion, a second portion and an opening portion are formed on a single-crystal silicon substrate, and the silicon substrate with the basic etching mask and the correction etching mask formed thereon is subjected to an anisotropic etching to form the silicon substrate having the target shape. The first portion extends in a direction, respective ends of the first portion are connected to the basic etching mask. The second portion is connected to a side of the first portion extending in the direction.
摘要翻译：在制造结构的制造方法中，在单晶硅衬底上形成对应于具有凸角的目标形状的基本蚀刻掩模和具有第一部分，第二部分和开口部分的校正蚀刻掩模，以及对其上形成有基本蚀刻掩模的硅衬底和形成在其上的校正蚀刻掩模进行各向异性蚀刻以形成具有目标形状的硅衬底。第一部分沿<110>方向延伸，第一部分的相应端部连接到基本蚀刻掩模。第二部分连接到沿<110>方向延伸的第一部分的一侧。

10. 发明申请

US20100053716A1 METHOD OF FABRICATING A STRUCTURE BY ANISOTROPIC ETCHING, AND SILICON SUBSTRATE WITH AN ETCHING MASK 有权
标题翻译：通过非线性蚀刻制造结构的方法和具有蚀刻掩模的硅基板
公开(公告)号：US20100053716A1
公开(公告)日：2010-03-04
申请号：US12553015
申请日：2009-09-02
申请人： Toshiyuki Ogawa , Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
发明人： Toshiyuki Ogawa , Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
IPC分类号： G02B26/08 , H01L21/308 , H01L29/04
CPC分类号： B81C1/00396 , B81B2201/047 , B81B2203/0118 , B81C1/0042 , B81C1/00626 , H01L21/3083
摘要： In a fabrication method of fabricating a structure, a basic etching mask corresponding a target shape with a convex corner, and a correction etching mask with a first portion, a second portion and an opening portion are formed on a single-crystal silicon substrate with a (100) principal face, and the silicon substrate with the basic etching mask and the correction etching mask formed thereon is subjected to an anisotropic etching to form the silicon substrate having the target shape. The first portion extends in a direction, respective ends of the first portion are connected to the basic etching mask, and at least one end of the first portion is connected to the convex corner of the basic etching mask. The second portion is connected to a side of the first portion extending in the direction, the second portion includes at least one convex corner, and the opening portion extends straddling a boundary between the first portion and the second portion.
摘要翻译：在制造结构的制造方法中，将具有凸角的目标形状的基本蚀刻掩模和具有第一部分，第二部分和开口部分的校正蚀刻掩模形成在单晶硅衬底上，具有（100）主面，并且将具有基本蚀刻掩模的硅衬底和其上形成的校正蚀刻掩模进行各向异性蚀刻以形成具有目标形状的硅衬底。第一部分沿<110>方向延伸，第一部分的相应端部连接到基本蚀刻掩模，并且第一部分的至少一个端部连接到基本蚀刻掩模的凸角。第二部分连接到沿着<110>方向延伸的第一部分的一侧，第二部分包括至少一个凸形拐角，并且开口部分跨越第一部分和第二部分之间的边界延伸。

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