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1. 发明授权

US07425399B2 Composition for forming anti-reflective coating for use in lithography 有权
标题翻译：用于形成用于光刻的抗反射涂层的组合物
公开(公告)号：US07425399B2
公开(公告)日：2008-09-16
申请号：US10530349
申请日：2003-10-08
申请人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
发明人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
IPC分类号： G03C1/825 , C07D251/30 , C07D251/72
CPC分类号： H01L21/0276 , G03F7/038 , G03F7/091 , Y10S430/106
摘要： There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
摘要翻译：提供了一种用于形成用于抗反射涂层的抗反射涂层的组合物，其在用于制造半导体器件的波长处具有良好的吸收，其对光反射具有高保护效果，其具有高的干蚀刻速率与光致抗蚀剂层相比。具体地，用于形成抗反射涂层的组合物含有在氮原子上具有羟烷基结构作为取代基的三嗪三酮化合物，低聚物化合物或高分子化合物。

2. 发明授权

US07846638B2 Composition for forming anti-reflective coating for use in lithography 有权
标题翻译：用于形成用于光刻的抗反射涂层的组合物
公开(公告)号：US07846638B2
公开(公告)日：2010-12-07
申请号：US11979448
申请日：2007-11-02
申请人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
发明人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
IPC分类号： G03C1/825 , G03F7/09 , G03F7/20 , G03F7/30
CPC分类号： H01L21/0276 , G03F7/038 , G03F7/091 , Y10S430/106
摘要： There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
摘要翻译：提供了一种用于形成用于抗反射涂层的抗反射涂层的组合物，其在用于制造半导体器件的波长处具有良好的吸收，其对光反射施加高的保护效果，其具有高的干蚀刻速率与光致抗蚀剂层相比。具体地，用于形成抗反射涂层的组合物含有在氮原子上具有羟烷基结构作为取代基的三嗪三酮化合物，低聚物化合物或高分子化合物。

3. 发明申请

US20080206680A1 Composition for forming anti-reflective coating for use in lithography 有权
公开(公告)号：US20080206680A1
公开(公告)日：2008-08-28
申请号：US11979448
申请日：2007-11-02
申请人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
发明人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
IPC分类号： G03F7/26 , B05D3/02 , G03F7/00
CPC分类号： H01L21/0276 , G03F7/038 , G03F7/091 , Y10S430/106
摘要： There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.

4. 发明申请

US20060290429A1 Composition form forming anti-reflective coating for use in lithography 有权
标题翻译：用于光刻的组合物形成抗反射涂层
公开(公告)号：US20060290429A1
公开(公告)日：2006-12-28
申请号：US10530349
申请日：2003-10-08
申请人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Kanayama , Yasuo Kawamura
发明人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Kanayama , Yasuo Kawamura
IPC分类号： H03F1/14
CPC分类号： H01L21/0276 , G03F7/038 , G03F7/091 , Y10S430/106
摘要： There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
摘要翻译：提供了一种用于形成用于抗反射涂层的抗反射涂层的组合物，其在用于制造半导体器件的波长处具有良好的吸收，其对光反射具有高保护效果，其具有高的干蚀刻速率与光致抗蚀剂层相比。具体地，用于形成抗反射涂层的组合物含有在氮原子上具有羟烷基结构作为取代基的三嗪三酮化合物，低聚物化合物或高分子化合物。

5. 发明授权

US4910201A 3(2H)-pyridazinone derivatives, and their uses in insecticidal compositions 失效
标题翻译： 3（2H） - 哒嗪酮衍生物及其在杀虫组合物中的用途
公开(公告)号：US4910201A
公开(公告)日：1990-03-20
申请号：US075725
申请日：1987-07-20
申请人： Yasuo Kawamura , Tomoyuki Ogura , Yasuo Kawamura , Masayoshi Hirose , Kiminori Hirata , Masaki Kudo , Toshiro Miyake
发明人： Yasuo Kawamura , Tomoyuki Ogura , Yasuo Kawamura , Masayoshi Hirose , Kiminori Hirata , Masaki Kudo , Toshiro Miyake
IPC分类号： A01N25/08 , A01N43/58 , C07D237/16 , C07D401/04 , C07D401/12 , C07D403/12 , C07D405/12 , C07D409/12
CPC分类号： C07D401/04 , A01N43/58 , C07D237/16 , C07D401/12 , C07D403/12 , C07D405/12 , C07D409/12
摘要： Novel 3(2H)-pyridazinone derivatives of the formula (I): ##STR1## wherein, X represents a halogen, an alkyl, a haloalkyl, a haloalkoxy atoms, NO.sub.2, an alkoxy or ##STR2## (wherein, R represents an alkyl); n is 1 to 4;A represents hydrogen, a halogen, an alkyl or an alkoxy;B represents CX.sub.1 (wherein, X.sub.1 represents H or a halogen) or N;R.sup.1 and R.sup.2 represent each independently H or an alkyl;E represents H, a halogen, an alkoxy or --OH; andQ represents: ##STR3## (wherein, Y represents a halogen, an alkyl, an alkoxy, a haloalkyl, a haloalkoxy, CN, ##STR4## (wherein, Z represents a halogen, an alkyl, an alkoxy or a haloalkyl atoms, and l is 0, 1 to 5, said Z being the same or different when l is 2 to 5); and m is 1 to 5, said Y being the same or different when n is 2 to 4. A process for preparation of said derivatives is also provided. These derivatives are useful as an active ingredient of insecticidal composition.
摘要翻译：式（I）的新型3（2H） - 哒嗪酮衍生物：其中X表示卤素，烷基，卤代烷基，卤代烷氧基，NO 2，烷氧基或（其中，R 表示烷基）; n为1〜4; A表示氢，卤素，烷基或烷氧基; B表示CX1（其中，X1表示H或卤素）或N; R 1和R 2各自独立地表示氢或烷基; E表示H，卤素，烷氧基或-OH; 和Q表示：其中Y表示卤素，烷基，烷氧基，卤代烷基，卤代烷氧基，CN，其中Z表示卤素，烷基，烷氧基或卤代烷基，l为0,1至5，当l为2至5时所述Z相同或不同）; m为1至5，所述Y为相同或 n为2〜4时不同。还提供了制备所述衍生物的方法，这些衍生物可用作杀虫组合物的活性成分。

6. 发明申请

US20110135930A1 PROCESS FOR CONTINUOUS MODIFICATION OF DIHYDRATE GYPSUM AND MODIFIED DIHYDRATE GYPSUM OBTAINED BY THE PROCESS 有权
标题翻译：连续改性二羟乙酸钙和改性二羟乙酸酯工艺的方法
公开(公告)号：US20110135930A1
公开(公告)日：2011-06-09
申请号：US13055891
申请日：2009-07-31
申请人： Itaru Yokoyama , Kouji Katsumoto , Yasuo Kawamura
发明人： Itaru Yokoyama , Kouji Katsumoto , Yasuo Kawamura
IPC分类号： C01F11/46
CPC分类号： C01F11/46 , C01F11/466 , C01P2004/03 , C01P2004/61 , C01P2006/11 , C04B11/007 , Y10T428/2982
摘要： Disclosed is a process for the continuous modification of dihydrate gypsum. The process includes a hemihydration step of calcining the dihydrate gypsum as a raw material into hemihydrate gypsum and a recrystallization step of hydrating and recrystallizing the hemihydrate gypsum in an aqueous slurry to convert the hemihydrate gypsum into modified dihydrate gypsum of a crystalline form different from the dihydrate gypsum as the raw material. In the recrystallization step, the aqueous slurry in a recrystallization reaction tank is maintained at a constant temperature under stirring such that the aqueous slurry becomes uniform, and a feed rate of the hemihydrate gypsum to the recrystallization reaction tank and a discharge rate of the recrystallized and modified dihydrate gypsum from the recrystallization reaction tank are controlled such that the feed rate and the discharge rate become substantially equal to each other, whereby the feeding of the hemihydrate gypsum and the discharging of the recrystallized and modified dihydrate gypsum are conducted continuously or intermittently. According to the process, dihydrate gypsum as a starting raw material can be converted into high-purity, modified dihydrate gypsum of large crystals by recrystallizing the starting dihydrate gypsum after it is once calcined into hemihydrate gypsum although such modified dihydrate gypsum is not available in general.
摘要翻译：公开了连续改性二水石膏的方法。该方法包括将二水石膏作为原料煅烧成半水石膏的半水合步骤和将水泥浆中的半水石膏水合和重结晶以将半水合石膏转化成不同于二水合物的结晶形式的改性二水石膏的重结晶步骤石膏为原料。在再结晶步骤中，将再结晶反应槽中的含水浆料在搅拌下保持在恒定温度，使得水性浆液变得均匀，并且半水石膏对再结晶反应槽的进料速率和再结晶和控制来自再结晶反应槽的改性二水石膏使得进料速率和排出速率基本上彼此相等，从而连续地或间歇地进行半石膏的供给和再结晶和改性的二水合石膏的排出。根据该方法，作为起始原料的二水石膏可以在一次煅烧成半水石膏之后，将起始二水石膏重结晶，可以转化为大晶体的高纯度，改性二水石膏，尽管这种改性二水石膏一般不可用。

7. 发明授权

US4874861A Pyridazinone derivatives, preparation thereof, and insecticidal, acaricidal, nematicidal, fungicidal compositions 失效
标题翻译：哒嗪酮衍生物，其制备方法和杀虫，杀螨，杀线虫剂，杀真菌剂组合物
公开(公告)号：US4874861A
公开(公告)日：1989-10-17
申请号：US127518
申请日：1987-11-30
申请人： Tomoyuki Ogura , Yasuo Kawamura , Shigeru Ishii , Masatoshi Baba , Masakazu Taniguchi , Masayoshi Hirose , Kiminori Hirata , Yoshinori Ochiai
发明人： Tomoyuki Ogura , Yasuo Kawamura , Shigeru Ishii , Masatoshi Baba , Masakazu Taniguchi , Masayoshi Hirose , Kiminori Hirata , Yoshinori Ochiai
IPC分类号： A01N43/58 , A01N55/00 , C07D237/14 , C07D237/16 , C07D237/18 , C07D401/12 , C07D403/12 , C07F7/08
CPC分类号： C07D401/12 , A01N43/58 , A01N55/00 , C07D237/14 , C07D237/16 , C07D237/18 , C07D403/12 , C07F7/0812
摘要： Novel 3(2H)-pyridazinone derivatives having the general formula (I): ##STR1## wherein, R denotes a straight or branched C.sub.1 to C.sub.6 alkyl; A denotes a straight or branched C.sub.1 to C.sub.6 alkyl or a halogen; X denotes oxygen or sulfur atom; Q denotes a group; ##STR2## when A is a straight or branched C.sub.1 to C.sub.6 alkyl, and Q denotes a group: ##STR3## when A is a halogen atom; R.sup.1 and R.sup.2 denote each independently hydrogen, a lower alkyl, a lower haloalkyl, or 4-tert-butylphenyl; B denotes --CR.sup.6 .dbd.CR.sup.7 --, --CR.sup.6 R.sup.7 O--, or ##STR4## (wherein, R.sup.6 and R.sup.7 denote various specific organic radicals. A process for preparation of said derivatives is also provided. These derivatives are useful as an active ingredient of insecticidal, acaricidal, nematicidal and/or fungicidal compositions for agricultural and horticultural uses as well as of expellent compositions for ticks parasitic on animals.
摘要翻译：具有通式（I）的新型3（2H） - 哒嗪酮衍生物：其中R表示直链或支链C 1至C 6烷基; A表示直链或支链C1至C6烷基或卤素; X表示氧或硫原子; Q表示一组; 当A为直链或支链C 1至C 6烷基时，并且Q表示基团：当A为卤素原子时： R 1和R 2各自独立地表示氢，低级烷基，低级卤代烷基或4-叔丁基苯基; B表示-CR6 = CR7-，-CR6R7O-或（其中，R6和R7表示各种特定的有机基团，也提供了所述衍生物的制备方法，这些衍生物可用作杀虫，用于农业和园艺用途的杀螨，杀线虫和/或杀真菌组合物以及寄生在动物上的蜱的驱虫剂组合物。

8. 发明授权

US5977027A Pyrimidone isobutyric acid and herbicides containing the same 失效
标题翻译：嘧啶酮异丁酸和含有相同的除草剂
公开(公告)号：US5977027A
公开(公告)日：1999-11-02
申请号：US148457
申请日：1998-09-04
申请人： Yasuo Kawamura , Eiichi Oya , Kaoru Itoh, deceased , Hiroshi Kita , Hisashi Nakata , Kanji Sawada , Yoshitake Tamada , Tsutomu Nawamaki , Kimihiro Ishikawa , Kenichi Shiojima , Chiaki Kawaguchi , Kunimitsu Nakahira
发明人： Yasuo Kawamura , Eiichi Oya , Kaoru Itoh, deceased , Hiroshi Kita , Hisashi Nakata , Kanji Sawada , Yoshitake Tamada , Tsutomu Nawamaki , Kimihiro Ishikawa , Kenichi Shiojima , Chiaki Kawaguchi , Kunimitsu Nakahira
IPC分类号： C07D249/12 , A01N43/36 , A01N43/40 , A01N43/42 , A01N43/50 , A01N43/54 , A01N43/56 , A01N43/60 , A01N43/70 , A01N43/707 , A01N43/78 , A01N43/80 , A01N43/82 , A01N43/86 , A01N43/88 , A01N47/12 , C07D207/27 , C07D207/38 , C07D211/76 , C07D211/86 , C07D233/32 , C07D233/70 , C07D239/10 , C07D239/22 , C07D239/42 , C07D239/56 , C07D241/08 , C07D241/10 , C07D251/08 , C07D251/10 , C07D253/06 , C07D263/18 , C07D265/06 , C07D273/04 , C07D277/14 , C07D285/34 , C07D401/12 , C07D403/12 , C07D409/04 , C07D409/14 , C07D413/04 , C07D413/12 , C07D413/14 , C07D417/04 , C07D417/12 , C07D417/14 , C07D239/08
CPC分类号： C07D239/10 , A01N43/36 , A01N43/40 , A01N43/50 , A01N43/54 , A01N43/56 , A01N43/60 , A01N43/78 , A01N43/80 , A01N43/82 , A01N47/12 , C07D211/86 , C07D233/32 , C07D239/42 , C07D277/14 , C07D401/12 , C07D403/12 , C07D409/04 , C07D413/12 , C07D417/12
摘要： The present invention provides a nitrogen-containing cyclic compound represented by the formula (1): ##STR1## wherein R.sup.1 represents an alkyl group; R represents a hydrogen atom or an alkyl group; X represents an oxygen or sulfur atom or NR.sup.3 ; Q.sup.1 represents a hydrogen atom, or an alkyl, cycloalkyl, alkenyl or alkynyl group or a phenyl, naphthyl or heterocyclic group etc.; Q.sup.2 represents an alkyl, cycloalkyl or alkenyl group, or a phenyl or thienyl group etc.; A.sup.1 represents a carbon or nitrogen atom; A.sup.2 represents CR.sup.2 or NR.sup.2, or an oxygen or sulfur atom, or SO or SO.sub.2 ; A.sup.3 represents a single bond, or an oxygen or sulfur atom, or CR.sup.5 or NR.sup.5) and a herbicide comprising the same, which herbicide exhibits very high herbicidal activity at very low application rate and has selectivity against crops.
摘要翻译：本发明提供由式（1）表示的含氮环状化合物：其中R1表示烷基; R表示氢原子或烷基; X表示氧或硫原子或NR 3; Q1表示氢原子或烷基，环烷基，烯基或炔基或苯基，萘基或杂环基等; Q2表示烷基，环烷基或烯基，或苯基或噻吩基等; A1表示碳原子或氮原子; A2表示CR2或NR2，或氧或硫原子，或SO或SO2; A3代表单键，或氧或硫原子，或CR5或NR5）和含有该除草剂的除草剂，该除草剂在非常低的施用率下具有非常高的除草活性并对作物具有选择性。

9. 发明授权

US4837217A Pyridazinone derivatives, preparation thereof, and insecticidal, acaricidal, nematicidal, fungicidal compositions 失效
标题翻译：哒嗪酮衍生物，其制备方法和杀虫，杀螨，杀线虫剂，杀真菌剂组合物
公开(公告)号：US4837217A
公开(公告)日：1989-06-06
申请号：US850533
申请日：1986-04-11
申请人： Tomoyuki Ogura , Yasuo Kawamura , Masatoshi Baba , Shigeru Ishii , Kiminori Hirata , Masaki Kudo , Yoshinori Ochiai , Masayoshi Hirose
发明人： Tomoyuki Ogura , Yasuo Kawamura , Masatoshi Baba , Shigeru Ishii , Kiminori Hirata , Masaki Kudo , Yoshinori Ochiai , Masayoshi Hirose
IPC分类号： A01N43/58 , C07D237/16 , C07D237/18 , C07D401/12 , C07D403/12 , C07D405/12 , C07D409/12
CPC分类号： C07D401/12 , A01N43/58 , C07D237/16 , C07D237/18 , C07D403/12 , C07D405/12 , C07D409/12
摘要： A 3(2H)-pyridazinone derivative of the general formula (I): ##STR1## wherein R is a straight or branched C.sub.2 -C.sub.6 alkyl,A is a straight or branched C.sub.1 -C.sub.6 alkyl or a halogen atom,X is --O-- or --S--,R.sup.1 and R.sup.2 are each independently hydrogen atom or C.sub.1 -C.sub.3 alkyl,B is --CH.dbd.CH--, --N.dbd.CH--, --N.dbd.N--, --S--, --O-- or ##STR2## wherein R.sup.3 is hydrogen or C.sub.1 -C.sub.3 alkyl, Y is a halogen atom, a straight or branched C.sub.1 -C.sub.6 alkyl, a C.sub.3 -C.sub.6 cycloalkyl or cycloalkoxy, and other substituents,n is 0 or an integer of 1 to 3, and when n is 2 or 3, Y may be same or different, with the proviso that when B is --CH.dbd.CH--, n is an integer of 1 to 3 and at least one of Y is --O--W, as this term is defined in the specification.A process for the preparation of said derivatives is also provided. These derivatives are useful as an active ingredient of insecticidal, acaricidal, nematicidal and/or fungicidal compositions for agricultural and horticultural uses as well as of expellent compositions for ticks parasitic on animals.
摘要翻译：通式（I）的3（2H） - 哒嗪酮衍生物：其中R是直链或支链C 2 -C 6烷基，A是直链或支链C 1 -C 6烷基或卤素原子，X是-O - 或-S-，R1和R2各自独立地为氢原子或C1-C3烷基，B为-CH = CH-，-N = CH-，-N = N-，-S-，-O-或

10. 发明授权

US4629493A Heterocyclic ether type phenoxy fatty acid derivatives and herbicidal composition 失效
标题翻译：杂环醚型苯氧基脂肪酸衍生物和除草组合物
公开(公告)号：US4629493A
公开(公告)日：1986-12-16
申请号：US116381
申请日：1980-01-29
申请人： Yasukazu Ura , Gozyo Sakata , Kenzi Makino , Yasuo Kawamura , Yuzi Kawamura , Takasi Ikai , Tosihiko Oguti
发明人： Yasukazu Ura , Gozyo Sakata , Kenzi Makino , Yasuo Kawamura , Yuzi Kawamura , Takasi Ikai , Tosihiko Oguti
IPC分类号： A01N43/42 , A01N43/60 , A01P13/00 , C07D215/22 , C07D215/227 , C07D241/44
CPC分类号： C07D215/227 , A01N43/42 , A01N43/60 , C07D241/44
摘要： A herbicidal composition which comprises an adjuvant and an active ingredient of heterocyclic ether type phenoxy fatty acid derivative having the formula ##STR1## wherein A represents --CH-- or --N--; X represents a halogen atom; n is 0, 1 or 2; R.sup.1 represents a hydrogen atom; a lower alkyl group; R.sup.2 represents --OH; --O-alkyl group; --OM group (M is an inorganic or organic salt moiety); ##STR2## --O-lower alkenyl group; --O-benzyl group; --O-lower alkylalkoxy group; --O-phenyl; --O-cyclohexyl, --O-halogenoalkyl, --O-lower alkynyl and --O-cyanoalkyl; R.sup.3 and R.sup.4 respectively represent a hydrogen atom or a lower alkyl group.
摘要翻译：一种除草组合物，其包含佐剂和具有式（I）的杂环醚型苯氧基脂肪酸衍生物的活性成分，其中A表示-CH-或-N-; X表示卤原子; n为0,1或2; R1表示氢原子; 低级烷基; R2表示-OH; -O-烷基; -OM基团（M是无机或有机盐部分）; -O-低级烯基; -O-苄基; -O-低级烷基烷氧基; -O-苯基; -O-环己基，-O-卤代烷基，-O-低级炔基和-O-氰基烷基; R3和R4分别表示氢原子或低级烷基。

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