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    • 1. 发明授权
    • Plasma processing apparatus
    • 等离子体处理装置
    • US5647912A
    • 1997-07-15
    • US617731
    • 1996-04-01
    • Takahiro KaminishizonoTakeshi Akimoto
    • Takahiro KaminishizonoTakeshi Akimoto
    • C23F4/00H01J37/32H01L21/302H01L21/3065C23C16/00
    • H01J37/32009H01J37/32082H01J37/3244H01J37/32541
    • A permeable container having a plurality of holes whose diameters are equal to or less than two times the sheath length is provided in a vacuum container. provided at the bottom of this permeable container is an electrode on which an object to be processed is to be placed. A high-frequency power supply is connected to this electrode, and the permeable container is grounded. The permeable container and the electrode are insulated from each other by an insulator. When a process gas supplied into the vacuum container is guided into the permeable container through its holes and a high-frequency voltage is applied to the electrode, plasma is produced in the permeable container. Because the diameters of the holes are equal to or less than two times the sheath length, plasma is trapped inside the permeable container, thus improving the stability and density of plasma. This invention can therefore prevent plasma from becoming non-uniform and unstable and having a lower density, which, if occurred, raise a problem in the plasma process in a low-pressure area, and can efficiently trap plasma, thus ensuring uniform and high-density plasma on the to-be-processed object.
    • 具有多个孔的可渗透容器设置在真空容器中,所述多个孔的直径等于或小于护套长度的两倍。 设置在该可渗透容器的底部的是要放置待加工物体的电极。 高频电源与该电极连接,可渗透容器接地。 可渗透容器和电极通过绝缘体彼此绝缘。 当供给到真空容器的工艺气体通过其孔被引导到可渗透容器中并且向电极施加高频电压时,在可渗透容器中产生等离子体。 由于孔的直径等于或小于护套长度的两倍,等离子体被捕获在可渗透容器的内部,从而提高了等离子体的稳定性和密度。 因此,本发明可以防止等离子体变得不均匀和不稳定,并且具有较低的密度(如果发生的话)在低压区域中引起等离子体处理的问题,并且可以有效地捕获等离子体, 待处理物体上的密度等离子体。