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1. 发明申请

US20060103829A1 Exposure apparatus and exposure method 失效
标题翻译：曝光装置和曝光方法
公开(公告)号：US20060103829A1
公开(公告)日：2006-05-18
申请号：US11274963
申请日：2005-11-15
申请人： Takahiro Inoue , Hiroaki Samizu
发明人： Takahiro Inoue , Hiroaki Samizu
IPC分类号： G03B27/72
CPC分类号： G03F7/70558 , G03F7/70291 , G03F7/70475
摘要： An exposure apparatus for performing direct exposure on a relatively moving exposure target substrate comprises: a plurality of exposure heads arranged so that an overlapping exposed area occurs between exposed areas formed on the exposure target substrate as a result of exposure by the exposure heads; and light adjusting means for adjusting the amount of light to be projected from two adjacent exposure heads onto the overlapping exposed area so that the amount of the projected light becomes equal to the amount of light that a single exposure head would project onto an exposure area if the exposure area were to be exposed through the same pattern by the single exposure head alone.
摘要翻译：用于在相对移动的曝光目标基板上进行直接曝光的曝光装置包括：多个曝光头，其布置成使得由于曝光头的曝光而在形成在曝光目标基板上的曝光区域之间发生重叠的曝光区域; 以及调光装置，用于将从两个相邻的曝光头投影的光量调整到重叠的曝光区域上，使得投影光的量变得等于单个曝光头投射到曝光区域上的光量，如果曝光区域仅通过单个曝光头通过相同的图案曝光。

2. 发明申请

US20060114440A1 Direct exposure apparatus and direct exposure method 有权
公开(公告)号：US20060114440A1
公开(公告)日：2006-06-01
申请号：US11291658
申请日：2005-11-30
申请人： Kazunari Sekigawa , Hiroaki Samizu , Takahiro Inoue
发明人： Kazunari Sekigawa , Hiroaki Samizu , Takahiro Inoue
IPC分类号： G03B27/72
CPC分类号： G03F7/70666 , G03F7/70141
摘要： A direct exposure apparatus having a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate, comprises: measuring means for measuring the illuminance distribution of light on an area corresponding to the exposure surface of the exposure target substrate; and control means for controlling, based on the measurement result supplied from the measuring means, the light source so that the intended illuminance distribution can be obtained.

3. 发明授权

US07508492B2 Surface light source control apparatus and surface light source control method 有权
标题翻译：表面光源控制装置及表面光源控制方法
公开(公告)号：US07508492B2
公开(公告)日：2009-03-24
申请号：US11449352
申请日：2006-06-08
申请人： Kazunari Sekigawa , Hiroaki Samizu , Takahiro Inoue
发明人： Kazunari Sekigawa , Hiroaki Samizu , Takahiro Inoue
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03B27/72
摘要： A surface light source control apparatus for a direct exposure apparatus comprises a light-emission level determining means for determining the light-emission level of each point light source for each of a plurality of groups so that a uniform illuminance distribution is achieved at a position corresponding to an exposure surface of an exposure target when a projection device is set so as to reflect all light rays incident thereon toward the exposure surface, the plurality of groups being formed in advance by grouping the point light sources based on similarity in tendency in terms of illuminance distribution characteristics that the point light sources have at the position corresponding to the exposure surface, wherein the light-emission level determining means determines the light-emission level so that all the point light sources belonging to the same group have the same light-emission level.
摘要翻译：一种用于直接曝光装置的表面光源控制装置包括：发光电平确定装置，用于确定多个组中的每一个的每个点光源的发光电平，使得在对应的位置处实现均匀的照度分布当投影装置被设置成将入射到其上的所有光线反射到曝光表面时，将曝光对象的曝光表面设置到曝光对象的曝光表面，所述多个组通过基于相对于点光源在与曝光面对应的位置处的照度分布特性，其中发光电平确定装置确定发光电平，使得属于同一组的所有点光源具有相同的发光水平。

4. 发明授权

US07486383B2 Direct exposure apparatus and direct exposure method 有权
标题翻译：直接曝光装置和直接曝光方法
公开(公告)号：US07486383B2
公开(公告)日：2009-02-03
申请号：US11291658
申请日：2005-11-30
申请人： Kazunari Sekigawa , Hiroaki Samizu , Takahiro Inoue
发明人： Kazunari Sekigawa , Hiroaki Samizu , Takahiro Inoue
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03F7/70666 , G03F7/70141
摘要： A direct exposure apparatus having a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate, comprises: measuring means for measuring the illuminance distribution of light on an area corresponding to the exposure surface of the exposure target substrate; and control means for controlling, based on the measurement result supplied from the measuring means, the light source so that the intended illuminance distribution can be obtained.
摘要翻译：具有用于将光投射到曝光对象物上的光源的直接曝光装置，更具体而言，是曝光对象基板，包括：测量装置，用于测量与曝光对象基板的曝光面对应的面积上的光的照度分布; 以及控制装置，用于基于从测量装置提供的测量结果控制光源，从而可以获得预期的照度分布。

5. 发明授权

US07397537B2 Exposure apparatus and exposure method 失效
标题翻译：曝光装置和曝光方法
公开(公告)号：US07397537B2
公开(公告)日：2008-07-08
申请号：US11274963
申请日：2005-11-15
申请人： Takahiro Inoue , Hiroaki Samizu
发明人： Takahiro Inoue , Hiroaki Samizu
IPC分类号： G03B27/54
CPC分类号： G03F7/70558 , G03F7/70291 , G03F7/70475
摘要： An exposure apparatus for performing direct exposure on a relatively moving exposure target substrate comprises: a plurality of exposure heads arranged so that an overlapping exposed area occurs between exposed areas formed on the exposure target substrate as a result of exposure by the exposure heads; and light adjusting means for adjusting the amount of light to be projected from two adjacent exposure heads onto the overlapping exposed area so that the amount of the projected light becomes equal to the amount of light that a single exposure head would project onto an exposure area if the exposure area were to be exposed through the same pattern by the single exposure head alone.
摘要翻译：用于在相对移动的曝光目标基板上进行直接曝光的曝光装置包括：多个曝光头，其布置成使得由于曝光头的曝光而在形成在曝光目标基板上的曝光区域之间发生重叠的曝光区域; 以及调光装置，用于将从两个相邻的曝光头投影的光量调整到重叠的曝光区域上，使得投影光的量变得等于单个曝光头投射到曝光区域上的光量，如果曝光区域仅通过单个曝光头通过相同的图案曝光。

6. 发明申请

US20060279720A1 Surface light source control apparatus and surface light source control method 有权
公开(公告)号：US20060279720A1
公开(公告)日：2006-12-14
申请号：US11449352
申请日：2006-06-08
申请人： Kazunari Sekigawa , Hiroaki Samizu , Takahiro Inoue
发明人： Kazunari Sekigawa , Hiroaki Samizu , Takahiro Inoue
IPC分类号： G03B27/72
CPC分类号： G03B27/72
摘要： A surface light source control apparatus for a direct exposure apparatus comprises a light-emission level determining means for determining the light-emission level of each point light source for each of a plurality of groups so that a uniform illuminance distribution is achieved at a position corresponding to an exposure surface of an exposure target when a projection device is set so as to reflect all light rays incident thereon toward the exposure surface, the plurality of groups being formed in advance by grouping the point light sources based on similarity in tendency in terms of illuminance distribution characteristics that the point light sources have at the position corresponding to the exposure surface, wherein the light-emission level determining means determines the light-emission level so that all the point light sources belonging to the same group have the same light-emission level.

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