专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4848022A Handle for a fishing rod 失效
标题翻译：处理钓鱼竿
公开(公告)号：US4848022A
公开(公告)日：1989-07-18
申请号：US275227
申请日：1988-11-22
申请人： Takafumi Ozeki , Kikuo Sakai , Noriyasu Fukushima
发明人： Takafumi Ozeki , Kikuo Sakai , Noriyasu Fukushima
IPC分类号： A01K97/08
CPC分类号： A01K97/08
摘要： The handle for a fishing rod according to the present invention can improve the sense of fit of the fingers with respect to a reel-attaching portion when said portion is taken hold of. The handle comprises a reel-depositing surface of the reel-attaching portion expanded in both right and left directions to form a bulgy portion which makes the width of said surface larger than that of a reel-foot. In accordance with the reel-depositing surface, the finger-placing surface of the reel-attaching portion is formed to have a large circular surface area which fits well with the dispositions and the bending angle of the fingers. This configulation is very advantageous in giving an improved sense of fit of the fingers with respect to the finger-placing surface of the reel-attaching portion and also a comfortable and safe gripping performance. Further, as the reel-attaching portion is formed thin enough for the lower surface of the outer periphery of the fishing rod to be exposed on the lower portion thereof, a firm and stable gripping performance can be obtained; and further the vibration of the rod can be sensed directly, so a user doesn't miss any chance to operate his rod and reel when fish hit and can have a better fishing result.
摘要翻译：根据本发明的钓竿手柄可以在保持所述部分时改善手指相对于卷轴安装部分的配合感。手柄包括卷轴安装部分的卷轴沉积表面，其在左右方向上扩展，以形成使得所述表面的宽度大于卷轴的宽度的凸起部分。根据卷轴沉积表面，卷轴安装部分的指状放置表面形成为具有与手指的配置和弯曲角度良好配合的大的圆形表面积。这种配置在提供手指相对于卷轴附接部分的手指放置表面的改进的配合感以及舒适和安全的抓握性能方面是非常有利的。此外，由于将钓竿外周的下表面形成为足够薄的卷轴安装部分露出在其下部，所以可以获得牢固和稳定的抓握性能; 并且进一步可以直接感测杆的振动，因此当鱼撞击并且可以具有更好的捕捞结果时，用户不会错过任何操作他的杆和卷轴的机会。

2. 发明申请

US20050260505A1 Preparation of photomask blank and photomask 有权
标题翻译：光掩模坯料和光掩模的制备
公开(公告)号：US20050260505A1
公开(公告)日：2005-11-24
申请号：US11130278
申请日：2005-05-17
申请人： Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko
发明人： Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko
IPC分类号： C23C14/00 , C23C14/06 , C25B9/00 , C25B11/00 , C25B13/00 , G03C5/00 , G03F1/32 , G03F1/54 , G03F1/68 , G03F9/00 , H01L21/027
CPC分类号： G03F1/32 , C23C14/0676
摘要： A photomask blank is prepared by forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp at an energy density of 3 to 40 J/cm2. A photomask is prepared by forming a resist pattern on the photomask blank by photolithography, etching away those portions of the light-absorbing film which are not covered with the resist pattern, and removing the resist.
摘要翻译：通过在透明基板上形成光吸收膜，并以3〜40J / cm 2的能量密度从闪光灯照射光吸收膜来制备光掩模坯料。通过光刻法在光掩模坯料上形成抗蚀剂图案，蚀刻除了未被抗蚀剂图案覆盖的光吸收膜的那些部分，并除去抗蚀剂来制备光掩模。

3. 发明申请

US20080090159A1 PHOTOMASK BLANK, PHOTOMASK, AND METHOD OF MANUFACTURE 有权
标题翻译： PHOTOMASK BLANK，PHOTOMASK和制造方法
公开(公告)号：US20080090159A1
公开(公告)日：2008-04-17
申请号：US11952283
申请日：2007-12-07
申请人： Hiroki Yoshikawa , Yukio Inazuki , Noriyasu Fukushima , Hideo Kaneko , Satoshi Okazaki
发明人： Hiroki Yoshikawa , Yukio Inazuki , Noriyasu Fukushima , Hideo Kaneko , Satoshi Okazaki
IPC分类号： G03F1/00
CPC分类号： C23C14/3492 , C23C14/0084 , C23C14/048 , C23C14/0676 , C23C14/0682 , C23C14/3464 , G03F1/32 , Y10T428/31616
摘要： A photomask blank comprising a multilayer film including at least four layers of different compositions, wherein the interface between the layers is moderately graded in composition; a phase shift mask blank comprising a phase shift film of at least two layers including a surface layer of a composition based on a zirconium silicide compound and a substrate adjacent layer of a composition based on a molybdenum silicide compound, and a further layer between one layer and another layer of a different composition, the further layer having a composition moderately graded from that of the one layer to that of the other layer; a phase shift mask blank comprising a phase shift film including a plurality of layers containing a metal and silicon in different compositional ratios which are stacked in such order that a layer having a higher etching rate is on the substrate side and a layer having a lower etching rate is on the surface side. The invention provides a photomask blank, typically a phase shift mask blank, which satisfies optical properties such as transmittance, reflectance and refractive index at an exposure wavelength of interest, and has an etched pattern with a minimal line edge roughness, and a photomask, typically a phase shift mask obtained therefrom.
摘要翻译：一种光掩模坯料，其包括包含至少四层不同组成的多层膜，其中所述层之间的界面在组成上适度地分级; 相移掩模坯料，其包括至少两层的相移膜，所述相移膜包括基于硅化锆化合物的组合物的表面层和基于硅化钼化合物的组合物的基底相邻层，以及在层之间的另一层和另一层不同的组成，所述另一层具有从所述一层到另一层的组成适度分级的组成; 相移掩模坯料，其包括相移膜，所述相移膜包括多个层，所述多个层包含不同组成比的金属和硅，所述多个层按照使得具有较高蚀刻速率的层位于基板侧上的顺序层叠，并且具有较低蚀刻速率在表面。本发明提供了一种光掩模坯料，通常是相移掩模坯料，其满足感兴趣的曝光波长下的透光率，反射率和折射率等光学特性，并且具有最小线边缘粗糙度的蚀刻图案，以及光掩模从其获得的相移掩模。

4. 发明授权

US07767368B2 Method of fabricating photomask blank 有权
标题翻译：制造光掩模坯料的方法
公开(公告)号：US07767368B2
公开(公告)日：2010-08-03
申请号：US11882729
申请日：2007-08-03
申请人： Noriyasu Fukushima , Hiroki Yoshikawa
发明人： Noriyasu Fukushima , Hiroki Yoshikawa
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/50
摘要： An opaque area is formed in a sidewall portion of a susceptor by stacking a material that is transparent to flash light and a material that is opaque to the flash light to form the sidewall portion or coating a surface of the opaque material with the transparent material. A top surface of the opaque area in the sidewall portion of the susceptor is designed to have a predetermined positional relationship with a top surface of a substrate; the top surface of the opaque area is set at the same position as that of the top surface of the substrate or higher than the top surface of the substrate by a predetermined height. Thus, obliquely incident flash light is absorbed or irregularly reflected by the opaque quartz portion, surrounding an excavated portion of the susceptor.
摘要翻译：通过堆叠对闪光透明的材料和对闪光不透明的材料以形成侧壁部分或用透明材料涂覆不透明材料的表面，在基座的侧壁部分中形成不透明区域。基座的侧壁部分中的不透明区域的顶表面被设计成与基板的顶表面具有预定的位置关系; 不透明区域的顶表面设置在与基板的顶表面相同的位置或高于基板的顶表面预定高度。因此，倾斜入射的闪光被不透明的石英部分吸收或不规则地反射，围绕基座的挖掘部分。

5. 发明授权

US4674699A Backlash preventing device for fishing reel 失效
标题翻译：钓鱼卷轴防撬装置
公开(公告)号：US4674699A
公开(公告)日：1987-06-23
申请号：US771263
申请日：1985-08-30
申请人： Noriyasu Fukushima , Takashi Higashimoto
发明人： Noriyasu Fukushima , Takashi Higashimoto
IPC分类号： A01K89/0155 , A01K89/02
CPC分类号： A01K89/01555
摘要： A backlash preventing device for a fishing reel which comprises a spool, a non-magnetic component provided with said spool, magnets for applying magnetic fluxes of a predetermined strength to said non-magnetic component for generating a braking torque at the initiation of the reel usage; there being an adjustor for controlling the strength of the magnetic flux to be exerted. A clutch mechanism is provided for the spool and with there being a timing control element for maintaining said braking force in spool rotational restraining condition for a period determined adequate to prevent backlashing.
摘要翻译：一种用于钓鱼卷轴的防弹装置，其包括卷轴，设置有所述卷轴的非磁性部件，用于向所述非磁性部件施加预定强度的磁通量的磁体，用于在卷轴使用开始时产生制动转矩 ; 存在用于控制要施加的磁通量的强度的调节器。为阀芯设置离合器机构，并且具有定时控制元件，用于将所述制动力保持在阀芯旋转抑制条件中，持续时间确定足以防止反冲。

6. 发明授权

US07736824B2 Photomask blank, photomask, and method of manufacture 有权
标题翻译：光掩模坯料，光掩模和制造方法
公开(公告)号：US07736824B2
公开(公告)日：2010-06-15
申请号：US11952283
申请日：2007-12-07
申请人： Hiroki Yoshikawa , Yukio Inazuki , Noriyasu Fukushima , Hideo Kaneko , Satoshi Okazaki
发明人： Hiroki Yoshikawa , Yukio Inazuki , Noriyasu Fukushima , Hideo Kaneko , Satoshi Okazaki
IPC分类号： G03F1/00 , B32B17/10
CPC分类号： C23C14/3492 , C23C14/0084 , C23C14/048 , C23C14/0676 , C23C14/0682 , C23C14/3464 , G03F1/32 , Y10T428/31616
摘要： A photomask blank comprising a multilayer film including at least four layers of different compositions, wherein the interface between the layers is moderately graded in composition; a phase shift mask blank comprising a phase shift film of at least two layers including a surface layer of a composition based on a zirconium silicide compound and a substrate adjacent layer of a composition based on a molybdenum silicide compound, and a further layer between one layer and another layer of a different composition, the further layer having a composition moderately graded from that of the one layer to that of the other layer; a phase shift mask blank comprising a phase shift film including a plurality of layers containing a metal and silicon in different compositional ratios which are stacked in such order that a layer having a higher etching rate is on the substrate side and a layer having a lower etching rate is on the surface side. The invention provides a photomask blank, typically a phase shift mask blank, which satisfies optical properties such as transmittance, reflectance and refractive index at an exposure wavelength of interest, and has an etched pattern with a minimal line edge roughness, and a photomask, typically a phase shift mask obtained therefrom.
摘要翻译：一种光掩模坯料，其包括包含至少四层不同组成的多层膜，其中所述层之间的界面在组成上适度地分级; 相移掩模坯料，其包括至少两层的相移膜，所述相移膜包括基于硅化锆化合物的组合物的表面层和基于硅化钼化合物的组合物的基底相邻层，以及在层之间的另一层和另一层不同的组成，所述另一层具有从所述一层到另一层的组成适度分级的组成; 相移掩模坯料，其包括相移膜，所述相移膜包括多个层，所述多个层包含不同组成比的金属和硅，所述多个层按照使得具有较高蚀刻速率的层位于基板侧上的顺序层叠，并且具有较低蚀刻速率在表面。本发明提供了一种光掩模坯料，通常是相移掩模坯料，其满足感兴趣的曝光波长下的透光率，反射率和折射率等光学特性，并且具有最小线边缘粗糙度的蚀刻图案，以及光掩模从其获得的相移掩模。

7. 发明授权

US07344806B2 Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask 有权
标题翻译：产生相移掩模空白的方法，产生相移掩模的方法，相移掩模空白和相移掩模
公开(公告)号：US07344806B2
公开(公告)日：2008-03-18
申请号：US10806202
申请日：2004-03-23
申请人： Hiroki Yoshikawa , Yukio Inazuki , Noriyasu Fukushima , Hideo Kaneko , Satoshi Okazaki
发明人： Hiroki Yoshikawa , Yukio Inazuki , Noriyasu Fukushima , Hideo Kaneko , Satoshi Okazaki
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , C23C14/06 , C23C14/3464 , G03F1/54 , G03F1/68
摘要： There is disclosed a method of producing a phase shift mask blank wherein the method includes at least a step of forming one or more layers of phase shift films on a substrate by a sputtering method, and in the step, the phase shift films are formed by the sputtering method while simultaneously discharging plural targets having different compositions. Thereby, a phase shift mask blank having a desired composition and quality, in particular, having a phase shift film with few defects can be easily produced.
摘要翻译：公开了一种制造相移掩模板的方法，其中该方法至少包括通过溅射法在衬底上形成一层或多层相移膜的步骤，并且在该步骤中，相移膜由同时排出具有不同组成的多个靶的溅射方法。由此，可以容易地制造具有期望的组成和质量的相移掩模坯料，特别是具有少量缺陷的相移膜。

8. 发明申请

US20070092807A1 Fabrication method of photomask-blank 有权
标题翻译：光掩模坯料的制造方法
公开(公告)号：US20070092807A1
公开(公告)日：2007-04-26
申请号：US11545451
申请日：2006-10-11
申请人： Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko , Yukio Inazuki
发明人： Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko , Yukio Inazuki
IPC分类号： B32B9/00 , B32B17/10 , G03F1/00 , B32B17/06
CPC分类号： G03F1/32 , Y10T428/31616
摘要： A susceptor having the most basic structure has a three-layer structure including a first and a second transparent quartz part and an opaque quartz part sandwiched therebetween. For example, the opaque quartz part is made of “foamed quartz”. In addition, the opacity of the opaque quartz part to flash light is determined to fall within an appropriate range based on the material or thickness of the opaque quartz part, taking into consideration the composition or thickness of a thin film formed on the substrate and various conditions concerning the energy of the irradiation light during flash light irradiation or the like. The stack structure may be composed of a stack of a plurality of opaque quartz layers having different opacities.
摘要翻译：具有最基本结构的感受体具有包括第一和第二透明石英部分和夹在其间的不透明石英部分的三层结构。例如，不透明石英部分由“发泡石英”制成。此外，考虑到在基板上形成的薄膜的组成或厚度以及各种不同的形状，不透明石英部分对闪光的不透明度被确定为基于不透明石英部分的材料或厚度在适当范围内关于闪光照射等期间的照射光的能量的条件。堆叠结构可以由具有不同不透明度的多个不透明石英层的堆叠构成。

9. 发明授权

US07632609B2 Fabrication method of photomask-blank 有权
标题翻译：光掩模坯料的制造方法
公开(公告)号：US07632609B2
公开(公告)日：2009-12-15
申请号：US11545451
申请日：2006-10-11
申请人： Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko , Yukio Inazuki
发明人： Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko , Yukio Inazuki
IPC分类号： G03F1/14
CPC分类号： G03F1/32 , Y10T428/31616
摘要： A susceptor having the most basic structure has a three-layer structure including a first and a second transparent quartz part and an opaque quartz part sandwiched therebetween. For example, the opaque quartz part is made of “foamed quartz”. In addition, the opacity of the opaque quartz part to flash light is determined to fall within an appropriate range based on the material or thickness of the opaque quartz part, taking into consideration the composition or thickness of a thin film formed on the substrate and various conditions concerning the energy of the irradiation light during flash light irradiation or the like. The stack structure may be composed of a stack of a plurality of opaque quartz layers having different opacities.
摘要翻译：具有最基本结构的感受体具有包括第一和第二透明石英部分和夹在其间的不透明石英部分的三层结构。例如，不透明石英部分由“发泡石英”制成。此外，考虑到在基板上形成的薄膜的组成或厚度以及各种不同的形状，不透明石英部分对闪光的不透明度被确定为基于不透明石英部分的材料或厚度在适当范围内关于闪光照射等期间的照射光的能量的条件。堆叠结构可以由具有不同不透明度的多个不透明石英层的堆叠构成。

10. 发明授权

US07514185B2 Preparation of photomask blank and photomask 有权
标题翻译：光掩模坯料和光掩模的制备
公开(公告)号：US07514185B2
公开(公告)日：2009-04-07
申请号：US11130278
申请日：2005-05-17
申请人： Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko
发明人： Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , C23C14/0676
摘要： A photomask blank is prepared by forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp at an energy density of 3 to 40 J/cm2. A photomask is prepared by forming a resist pattern on the photomask blank by photolithography, etching away those portions of the light-absorbing film which are not covered with the resist pattern, and removing the resist.
摘要翻译：通过在透明基板上形成光吸收膜，并以3〜40J / cm 2的能量密度从闪光灯照射光吸收膜来制备光掩模坯料。通过光刻法在光掩模坯料上形成抗蚀剂图案，蚀刻除了未被抗蚀剂图案覆盖的光吸收膜的那些部分，并除去抗蚀剂来制备光掩模。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式