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    • 8. 发明申请
    • METHOD OF FORMING A PHOTORESIST LAYER
    • 形成光电层的方法
    • US20150243500A1
    • 2015-08-27
    • US14707387
    • 2015-05-08
    • Taiwan Semiconductor Manufacturing Company, Ltd.
    • Chun-Wei ChangChih-Chien WangWang-Pen MoHung-Chang Hsieh
    • H01L21/02H01L21/027
    • H01L21/02282B05D1/005G03F7/091G03F7/162H01L21/0271H01L21/0276H01L21/6715
    • A method for forming a photoresist layer on a semiconductor device is disclosed. An exemplary includes providing a wafer. The method further includes spinning the wafer during a first cycle at a first speed, while a pre-wet material is dispensed over the wafer and spinning the wafer during the first cycle at a second speed, while the pre-wet material continues to be dispensed over the wafer. The method further includes spinning the wafer during a second cycle at the first speed, while the pre-wet material continues to be dispensed over the wafer and spinning the wafer during the second cycle at the second speed, while the pre-wet material continues to be dispensed over the wafer. The method further includes spinning the wafer at a third speed, while a photoresist material is dispensed over the wafer including the pre-wet material.
    • 公开了一种在半导体器件上形成光致抗蚀剂层的方法。 示例性的包括提供晶片。 该方法还包括在第一次循环期间以第一速度旋转晶片,同时将预湿材料分配在晶片上并以第二速度在第一周期期间旋转晶片,同时预湿材料继续被分配 在晶圆上。 该方法还包括在第一速度的第二循环期间旋转晶片,同时预湿材料继续分配在晶片上,并且在第二次循环期间以第二速度旋转晶片,同时预湿材料继续 分配在晶片上。 该方法还包括以三速旋转晶片,同时将光致抗蚀剂材料分配在包括预湿材料的晶片上。