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    • 1. 发明授权
    • Ceramic susceptor and a method of cleaning the same
    • 陶瓷感受器及其清洗方法
    • US07261780B2
    • 2007-08-28
    • US11087094
    • 2005-03-22
    • Taiji KikuAkiyoshi Hattori
    • Taiji KikuAkiyoshi Hattori
    • B08B3/04
    • H05B3/143H01L21/67103H05B6/806Y10S134/902
    • An object of the present invention is to provide a ceramic susceptor for considerably reducing the count number of metal atoms on the surface of a semiconductor after the semiconductor is treated, specifically to 1×1010 atoms/cm2 or lower. It is provided a ceramic susceptor 2 having a face for mounting semiconductor 2a wherein each of metal elements other than metal element(s) constituting the ceramic material has a count number of 1×1011 atoms/cm2 or lower. It is further provided a method of cleaning a ceramic susceptor 2 having a face 2a for mounting semiconductor, wherein the susceptor is cleaned using a complexing agent capable of forming a complex with a metal element.
    • 本发明的一个目的是提供一种用于在半导体被处理之后,显着地减少半导体表面上的金属原子计数的陶瓷基座,特别是1×10 10原子/ 2 或更低。 提供了一种具有用于安装半导体2a的面的陶瓷基座2,其中除了构成陶瓷材料的金属元素之外的金属元素中的每一个具有1×10 11原子/ cm 2的计数 > 2 或更低。 还提供了一种清洁具有用于安装半导体的面2a的陶瓷基座2的方法,其中使用能够与金属元素形成络合物的络合剂清洁基座。
    • 4. 发明授权
    • Electrostatic chuck and manufacturing method thereof
    • 静电吸盘及其制造方法
    • US07633738B2
    • 2009-12-15
    • US11980007
    • 2007-10-30
    • Akiyoshi Hattori
    • Akiyoshi Hattori
    • H02N13/00H01T23/00
    • H01L21/6831
    • An electrostatic chuck includes a base, and includes an electrode embedded in the base in parallel to a substrate mounting surface of the base. A terminal loaded into a terminal hole drilled into a back surface of the base toward the electrode is bonded to the electrode having a protruded portion with a substantially conical trapezoidal shape, which is formed on a flat surface on the terminal side of the electrode toward the terminal hole. In the protruded portion, an angle made by the flat surface on the terminal side of the electrode and an inclined surface of the protruded portion is 40° or less, and a distance from the flat surface of the electrode to a terminal-bonding surface of the protruded portion is 0.01 to 0.8 mm.
    • 静电卡盘包括基座,并且包括平行于基座的基板安装表面嵌入基座中的电极。 将装载到基座朝向电极的后表面的端子孔的端子接合到具有大致圆锥形的突出部的电极,该突起形状形成在电极的端子侧的平坦表面上 端子孔。 在突出部中,由电极的端子侧的平坦面和突出部的倾斜面形成的角度为40°以下,从电极的平面到端子接合面的距离 突出部分为0.01〜0.8mm。
    • 5. 发明授权
    • Electrostatic chuck with heater and manufacturing method thereof
    • 带加热器的静电吸盘及其制造方法
    • US08136820B2
    • 2012-03-20
    • US11841172
    • 2007-08-20
    • Ikuhisa MoriokaKazuhiro NoboriTetsuya KawajiriAkiyoshi Hattori
    • Ikuhisa MoriokaKazuhiro NoboriTetsuya KawajiriAkiyoshi Hattori
    • B23B31/28H01L21/683
    • H01L21/6831Y10T279/23
    • An electrostatic chuck with a heater includes: a base formed of a sintered body containing alumina; an ESC electrode provided in an upper portion side in the base; and a resistance heating body embedded in a lower portion side in the base. The base is composed of a dielectric layer from the ESC electrode to an upper surface of the base, and of a support member from the ESC electrode to a lower surface of the base. In the support member, a carbon content differs between an ESC electrode neighborhood in contact with the dielectric layer and a lower region below the ESC electrode neighborhood, a carbon content in the dielectric layer is 100 wt ppm or less, the carbon content in the ESC electrode neighborhood is 0.13 wt % or less, the carbon content in the lower region is 0.03 wt % or more and 0.5 wt % or less, and the carbon content in the ESC electrode neighborhood is smaller than the carbon content in the lower region. The resistance heating body contains niobium or platinum.
    • 具有加热器的静电卡盘包括:由含有氧化铝的烧结体形成的基体; 设置在所述基座的上部侧的ESC电极; 以及嵌入基座的下部侧的电阻加热体。 基体由从ESC电极到基底的上表面的电介质层和从ESC电极到基底的下表面的支撑构件构成。 在支撑构件中,与电介质层接触的ESC电极附近和ESC电极附近的下部区域之间的碳含量不同,电介质层中的碳含量为100重量ppm以下,ESC中的碳含量 电极附近为0.13重量%以下,下部区域的碳含量为0.03重量%以上且0.5重量%以下,ESC电极附近的碳含量低于下部区域的碳含量。 电阻加热体包含铌或铂。