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1. 发明申请

US20090133713A1 Multilayer structural body and method for cleaning the same 审中-公开
标题翻译：多层结构体及其清洗方法
公开(公告)号：US20090133713A1
公开(公告)日：2009-05-28
申请号：US11988648
申请日：2006-07-12
申请人： Tadahiro Ohmi , Akinobu Teramoto , Hitoshi Morinaga , Yukio Kishi , Hiromichi Ohtaki , Yoshihumi Tsutai
发明人： Tadahiro Ohmi , Akinobu Teramoto , Hitoshi Morinaga , Yukio Kishi , Hiromichi Ohtaki , Yoshihumi Tsutai
IPC分类号： B08B3/12 , B32B5/16
CPC分类号： C23C4/00 , B08B3/02 , B08B3/12 , B08B2203/0288 , C23C4/02 , C23C4/11 , C23C16/405 , C23C16/545 , C23C26/00 , C23C28/04 , Y10T428/25 , Y10T428/252
摘要： It has been difficult to provide a large-sized ceramic member quickly and economically. A multilayer structure is produced by forming a ceramic film on a base which is made of a material that can be shaped comparatively easily. The ceramic film is formed by a plasma spraying method, CVD method, PVD method, sol-gel method or the like. Alternatively, the ceramic film may be formed by a method combined with a spray deposit film.
摘要翻译：很难快速，经济地提供大型陶瓷件。通过在可以相对容易地成形的材料制成的基底上形成陶瓷膜来制造多层结构体。陶瓷膜通过等离子喷涂法，CVD法，PVD法，溶胶 - 凝胶法等形成。或者，陶瓷膜可以通过与喷雾沉积膜结合的方法形成。

2. 发明授权

US08124240B2 Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure 有权
标题翻译：金属构件的保护膜结构，采用保护膜结构的金属成分，以及使用保护膜结构制造半导体或平板显示器的设备
公开(公告)号：US08124240B2
公开(公告)日：2012-02-28
申请号：US11917633
申请日：2006-06-16
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
IPC分类号： B32B9/00
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second coating layer formed on the first coating layer and made of yttrium oxide by a plasma spraying method.
摘要翻译：一种用于半导体制造装置的金属构件的保护膜结构，所述保护膜结构包括由铝合金的基材金属的直接阳极氧化形成的无缺陷氧化铝的第一涂层; 以及通过等离子喷涂法形成在第一涂层上并由氧化钇制成的第二涂层。

3. 发明申请

US20090142588A1 Protective Film Structure of Metal Member, Metal Component Employing Protective Film Structure, and Equipment for Producing Semiconductor or Flat-Plate Display Employing Protective Film Structure 有权
标题翻译：金属部件的保护膜结构，使用保护膜结构的金属部件以及使用保护膜结构的半导体或平板显示器的生产设备
公开(公告)号：US20090142588A1
公开(公告)日：2009-06-04
申请号：US11917633
申请日：2006-06-16
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
IPC分类号： B32B15/00
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： Multifunction production equipment enabling a plurality of processes in which deposition of reaction products on the inner wall of the processing chamber of equipment for producing a semiconductor or a flat-plate display, metal contamination due to corrosion of the inner wall, or the like, and fluctuation of the process due to discharged gas are suppressed, and a protective film structure for use therein. On the surface of a metal material, a first coating layer having an oxide coating of 1μ thick or less formed as an underlying layer by direct oxidation of a parent material, and a second coating layer of about 200 μm thick are formed. With such an arrangement, corrosion resistance against irradiation with ions or radicals can be imparted to a second layer protective film, and the effect of a protective layer for preventing corrosion of the surface of parent metal caused by diffusing molecules or ions into the second layer protective film can be imparted to the first layer oxide film. Consequently, contamination of the substrate with metals generated from each metal member and the inner surface of the process chamber is reduced, and stripping of the second layer protective film due to lowering in adhesion of the second layer protective film due to corrosion of the interface between the parent material and the second layer protective film can be suppressed.
摘要翻译：多功能生产设备能够实现多个工艺，其中在用于制造半导体或平板显示器的设备的处理室的内壁上沉积反应产物，由于内壁的腐蚀而引起的金属污染等，以及排出气体的处理的波动被抑制，以及用于其中的保护膜结构。在金属材料的表面上，形成通过母材直接氧化形成作为下层的1μm厚以下的氧化物被膜的第1被覆层和200μm厚的第2被覆层。通过这样的布置，可以对第二层保护膜赋予对离子或自由基的照射的耐腐蚀性，以及用于防止母体金属表面由于扩散分子或离子而导致的第二层保护层的腐蚀的保护层的效果可以将膜施加到第一层氧化物膜。因此，由金属构件和处理室的内表面产生的金属对衬底的污染减少，并且由于第二层保护膜的粘附性的降低而导致的第二层保护膜的剥离可以抑制母材和第二层保护膜。

4. 发明申请

US20090169854A1 Porous Member 审中-公开
标题翻译：多孔会员
公开(公告)号：US20090169854A1
公开(公告)日：2009-07-02
申请号：US12225696
申请日：2007-03-29
申请人： Tadahiro Ohmi , Yukio Kishi , Mabito Iguchi , Yoshitaka Ichikawa , Yusuke Komatsu
发明人： Tadahiro Ohmi , Yukio Kishi , Mabito Iguchi , Yoshitaka Ichikawa , Yusuke Komatsu
IPC分类号： C04B35/01 , C04B33/02
CPC分类号： C04B38/0058 , C04B35/111 , C04B35/505 , C04B35/6316 , C04B2235/3418 , C04B2235/36 , C04B2235/5427 , C04B2235/5436 , C04B2235/5445 , C04B2235/656 , C04B2235/72 , C04B2235/77 , Y10T428/249921 , C04B35/00 , C04B38/0054
摘要： To provide a porous member that can suppress energy loss in a microwave band and can evenly disperse gas when used in a field requiring a high level of cleanness. The porous member is formed of porous ceramics and has a dielectric loss tangent of not more than 1×10−3 in a microwave band. A ceramic member has sintered ceramics including the porous member at a part thereof.
摘要翻译：提供能够抑制微波带中的能量损失的多孔构件，并且当在需要高清洁度的场中使用时可以均匀地分散气体。多孔构件由多孔陶瓷形成，并且在微波带中具有不大于1×10 -3的介电损耗角正切。陶瓷构件的一部分具有包括多孔构件的烧结陶瓷。

5. 发明授权

US5731251A Oxide ceramic sintered bodies 失效
标题翻译：氧化陶瓷烧结体
公开(公告)号：US5731251A
公开(公告)日：1998-03-24
申请号：US753603
申请日：1996-11-27
申请人： Yukio Kishi
发明人： Yukio Kishi
IPC分类号： C04B35/46 , C04B35/645
CPC分类号： C04B35/6455 , C04B35/46
摘要： A titania ceramic body consists of a surface thereof not exceeding 35 pores per square millimeter. The titania ceramic body is made by preparing a titania powder having a purity of at least 99.8 wt % titania and an average particle diameter of 0.5 .mu.m, compacting the powder, sintering a compact at a temperature in the range for 1000.degree. to 1300.degree. C. in air or in a non-air surrounding gas under ordinary pressure to produce a sintered body, hot isostatic pressing treating the sintered body in argon at a temperature of from 800.degree. C. to below temperature carried out in above sintering step under pressure of at least 500 kg/cm2, and then grinding and polishing the hot isostatic pressing treated body.
摘要翻译：二氧化钛陶瓷体由其每平方毫米不超过35个孔的表面组成。二氧化钛陶瓷体通过制备纯度为至少99.8重量％的二氧化钛和平均粒径为0.5微米的二氧化钛粉末，压实粉末，在1000-1300℃的温度下烧结成型体在空气中或在常压下的非空气环境中生产烧结体，在压力下在800℃以上的烧结步骤中在氩气中将烧结体进行热等静压处理至少500kg / cm2，然后研磨和抛光热等静压处理体。

6. 发明授权

US5834106A Ceramic substrate and producing process thereof, and a suction carrier for wafers using a ceramic wafer-chucking substrate 失效
标题翻译：陶瓷基板及其制造方法以及使用陶瓷晶片夹持基板的晶片的吸引载体
公开(公告)号：US5834106A
公开(公告)日：1998-11-10
申请号：US343464
申请日：1994-11-28
申请人： Hideto Kamiaka , Yukio Kishi
发明人： Hideto Kamiaka , Yukio Kishi
IPC分类号： C04B35/111 , C04B35/46 , C04B35/645 , G11B5/73 , G11B5/84 , H01G4/06 , H01G4/08 , H01L21/48 , H01L23/15 , H05K1/03 , B32B3/26 , B21F41/00 , C04B35/48
CPC分类号： G11B5/7315 , C04B35/111 , C04B35/46 , C04B35/6455 , G11B5/8404 , H01G4/06 , H01G4/08 , H01L21/4807 , H01L23/15 , H01L2924/0002 , H01L2924/09701 , H05K1/0306 , Y10T29/41 , Y10T428/249953 , Y10T428/249967 , Y10T428/249978
摘要： A ceramic substrate for a hard disc, a thin film chip capacitor, and hybrid ICs, and a suction carrier for a substrate is constituted by using a titanium oxide or aluminum oxide substrate having an extremely small number of pores having diameters of 3 .mu.m or more on the substrate surface. The substrate is produced by baking highly purified titanium oxide fine powder or highly purified aluminum oxide fine powder in the air, an inert atmosphere or a reducing atmosphere (at 1,100.degree. C. to 1,300.degree. C. for the former and at 1,200.degree. to 1,400.degree. C. for the latter) and HIP treating the baked material.
摘要翻译： PCT No.PCT / JP93 / 00120 Sec。 371日期：1994年11月28日 102（e）日期1994年11月28日PCT提交1993年2月2日PCT公布。公开号WO93 / 24925 日期：1993年12月9日，用于硬盘，薄膜片状电容器和混合IC的陶瓷衬底和用于衬底的吸引载体通过使用具有极小数目的具有直径的孔的氧化钛或氧化铝衬底在基板表面上为3μm以上。基材是通过在空气中，惰性气氛或还原气氛（在1,100℃至1300℃，前者为1200至1400℃下烘烤高纯度的氧化钛细粉或高纯度氧化铝细粉而制备的 ℃）和HIP处理烘焙材料。

7. 发明授权

US5492872A Ceramic mirrors and method of manufacturing same 失效
标题翻译：陶瓷镜及其制造方法
公开(公告)号：US5492872A
公开(公告)日：1996-02-20
申请号：US283666
申请日：1994-08-01
申请人： Yukio Kishi
发明人： Yukio Kishi
IPC分类号： G02B5/08 , C04B35/46 , B29D11/00
CPC分类号： G02B5/08
摘要： A ceramic mirror having a maximum surface flatness of 1 .mu.m and/or a maximum centerline average height of 1 nm as measured by the laser interference method, and a method of manufacturing a ceramic mirror by compacting a titanium oxide powder having an average particle diameter no greater than 1 .mu.m and a purity of at least 99% and then sintering the compact in an ordinary, inert, vacuum, or reducing atmosphere at a temperature between 1000.degree. and 1300.degree. C. The sintering pressure may be a minimum of 50 kg/cm.sup.2. After sintering, the product may be further treated by hot isostatic pressing (HIP) in an Ar atmosphere at 1000.degree. C. and a pressure of 1800 kg/cm.sup.2. The sintered bodies are then surface ground or lapped to produce ceramic mirrors having the above characteristics for use in laser and X-ray apparatuses, cameras, and other precision optical instruments.
摘要翻译： PCT No.PCT / JP92 / 01268 Sec。 371日期：1993年5月20日 102（e）日期1993年5月20日PCT提交1992年10月1日PCT公布。公开号WO93 / 07516 日期：1993年04月15日。一种通过激光干涉法测量的最大表面平坦度为1μm和/或最大中心线平均高度为1nm的陶瓷镜，以及通过压制钛制成陶瓷镜的方法平均粒径不大于1μm，纯度至少为99％的氧化物粉末，然后在普通的惰性，真空或还原性气氛中在1000-1300℃的温度下烧结。压力可以至少为50kg / cm2。烧结后，可以在Ar气氛中，在1000℃，压力为1800kg / cm2下，通过热等静压（HIP）进一步处理该产品。然后对烧结体进行表面研磨或研磨以制备具有上述特性的陶瓷镜，用于激光和X射线装置，照相机和其他精密光学仪器。

8. 发明授权

US09238703B2 Curable composition, cured product and laminate 有权
标题翻译：可固化组合物，固化产品和层压材料
公开(公告)号：US09238703B2
公开(公告)日：2016-01-19
申请号：US12527588
申请日：2008-12-02
申请人： Masato Saito , Yukio Kishi , Masuo Koyama
发明人： Masato Saito , Yukio Kishi , Masuo Koyama
IPC分类号： C08F290/06 , C08K5/10 , C08K5/06 , C08G18/38 , G02B1/10 , C09D4/00
CPC分类号： C08F290/06 , C08G18/3853 , C08K5/06 , C08K5/10 , C09D4/00 , G02B1/105 , G02B1/14 , Y10T428/264 , Y10T428/265
摘要： A hard coat layer on which adhered fingerprints are inconspicuous is provided. The hard coat layer 1 consists of a cured product. The cured product is formed by curing a curable composition by irradiating it with an ultraviolet ray. The curable composition contains a curable resin. The curable resin contains reactive monomers. The reactive monomers contain an isocyanuric acid derivative. The isocyanuric acid derivative is preferably tri(meth)acrylate of an ethylene oxide and ε-caprolactone adduct of isocyanuric acid.
摘要翻译：提供粘附指纹不显眼的硬涂层。硬涂层1由固化产物组成。固化产物通过用紫外线照射固化可固化组合物而形成。可固化组合物含有可固化树脂。可固化树脂含有反应性单体。反应性单体含有异氰脲酸衍生物。异氰脲酸衍生物优选为环氧乙烷的三（甲基）丙烯酸酯和异氰尿酸的ε-己内酯加合物。

9. 发明授权

US5665663A Method for manufacturing oxide ceramic sintered bodies 失效
标题翻译：氧化陶瓷烧结体的制造方法
公开(公告)号：US5665663A
公开(公告)日：1997-09-09
申请号：US554098
申请日：1995-11-06
申请人： Yukio Kishi
发明人： Yukio Kishi
IPC分类号： C04B35/46 , C04B35/64 , C04B35/645
CPC分类号： C04B35/46 , C04B35/64 , C04B35/6455
摘要： An oxide ceramic sintered body of a single component having a purity of at least 99% by weight of titania and a surface with a plurality of pores therein not exceeding 100 pores per square millimeter. The sintered ceramic body is made by preparing a raw titania powder having a purity of at least 99% titania by weight and an average maximum particle diameter of 1 .mu.m, compacting the titania powder to produce a compact, sintering the compact at a temperature in the range of about 1000.degree. C. to about 1300.degree. under ordinary pressure in air, or an inert or reducing atmosphere. The sintered ceramic body may be hot isostatic pressure treated below the sintering temperature in an inert atmosphere under a pressure of at least 500 kg/cm.sup.2 to further reduce the number of pores in the surface. The number of pores in the surface is determined by pressing the sintered ceramic body in sliding contacting engagement with a polishing buff sprinkled with carbon black so that the carbon black is forced into the pores to produce black spots on the surface representing the pores, and thereafter counting the black spots by inspecting the surface under a microscope to determine the number of pores.
摘要翻译：具有至少99重量％的二氧化钛的纯度的单一成分的氧化物陶瓷烧结体以及其中具有多个孔的表面不超过100个每平方毫米的孔。烧结陶瓷体是通过制备纯度为至少99重量％的二氧化钛和平均最大粒径为1μm的原料二氧化钛粉末制成的，压制二氧化钛粉末以制备成型体，在压缩温度在常压下在空气中，或惰性或还原气氛中约1000℃至约1300℃的范围。烧结陶瓷体可以在惰性气氛中在至少500kg / cm 2的压力下在烧结温度以下进行热等静压处理，以进一步减少表面中的孔数。通过将烧结陶瓷体与喷洒有炭黑的抛光缓冲液滑动接触接合来确定表面中的孔数，使得炭黑被迫进入孔中，在表示孔的表面上产生黑点，之后通过在显微镜下检查表面来计算黑斑以确定毛孔的数量。

10. 发明申请

US20100040871A1 HARD COAT FILM AND LAYERED MATERIAL 审中-公开
标题翻译：硬涂膜和层状材料
公开(公告)号：US20100040871A1
公开(公告)日：2010-02-18
申请号：US12528532
申请日：2008-02-15
申请人： Masato Saito , Masuo Koyama , Yukio Kishi
发明人： Masato Saito , Masuo Koyama , Yukio Kishi
IPC分类号： B32B27/08 , C08G63/06 , C08G77/04 , C08F265/00
CPC分类号： G02B1/18 , C08J7/047 , C08J2367/02 , C08J2400/24 , G02B1/105 , G02B1/14 , Y10T428/264
摘要： The hard coat film 1 of the present invention shows a contact angle for water of 110 degrees or smaller and a contact angle for camellia oil of 50 degrees or smaller. According to the present invention, even if fingerprints are adhered to the hard coat film 1, these fingerprints are inconspicuous. The hard coat film 1 of the present invention preferably shows a contact angle for water of 50 degrees or larger and a wet tension of 27 to 45 mN/m. With these characteristics, in addition to inconspicuousness of fingerprints, wiping-off property for fingerprints is improved.
摘要翻译：本发明的硬涂膜1表现出110度以下的水接触角和50度以下的山茶油的接触角。根据本发明，即使指纹附着在硬涂膜1上，这些指纹也不明显。本发明的硬涂膜1优选显示50度以上的水的接触角和27〜45mN / m的湿张力。具有这些特征，除了指纹的不显眼之外，指纹的擦除性能得到改善。

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