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1. 发明专利

DE3433384A1 未知
公开(公告)号：DE3433384A1
公开(公告)日：1985-03-28
申请号：DE3433384
申请日：1984-09-12
申请人： TOYO BOSEKI
发明人： TAMAOKI NOBUYUKI , KATOH YOSHIO , OSAKO AKITADA , KAJIMA TOSHIHIKO , TANAKA SHINICHI
IPC分类号： G03F7/26 , G03C1/00 , G03C5/00 , G03F7/09 , G03F7/11 , G03F7/02 , G03C11/08
摘要： An image reproducing material which comprises a support and at least a photosensitive resin layer and scratch resistance layer borne on the support, said scratch resistance layer containing a compound represented by AmBn, wherein A is mono- or divalent, straight or branched C11-20 aliphatic hydrocarbon; B is hydrogen, hydroxyl, amino, nitrile, aldehyde, carboxyl, or alkylamide, alkylester, ammonium salt or a periodic table group I-IV metal salt of a carboxylic acid; m is an integer of 1 to 3; and n is 1 or 2. A process for preparing the image reproducing material as well as a process for preparing an image reproduced material by using the image reproducing material are also described.

2. 发明专利

JPS6095430A IMAGE REPRODUCING MATERIAL 失效
公开(公告)号：JPS6095430A
公开(公告)日：1985-05-28
申请号：JP20349983
申请日：1983-10-29
申请人： TOYO BOSEKI
发明人： KATOU YOSHIO , TAMAOKI NOBUYUKI , OYOKU AKITADA , KAJIMA TOSHIHIKO , TANAKA SHINICHI
IPC分类号： G03C1/00 , G03F7/09 , G03F7/11
摘要： PURPOSE:To improve simply the scratch resistance of the surface of an image reproducing material by forming a thin film of a polymer contg. cationic and nonionic surfactants in a specified weight ratio on the photosensitive resin layer formed on the support. CONSTITUTION:A cationic surfactant such as stearylamine acetate is mixed with a nonionic surfactant such as polyethylene glycol nonyl phenyl ether in 1:10-5:1 weight ratio, and 0.5-10wt% of the mixture is added to a polymer such as polyvinyl alcohol or polyacrylic acid. A thin film of the polymer is formed as a protective layer on a photosensitive resin layer formed on a support to obtain the desired image reproducing material. The scratch resistance of the material can be further improved by interposing a scratch resistant layer of stearic acid or the like between the photosensitive resin layer and the protective layer.

3. 发明专利

JPH0469936B2 失效
公开(公告)号：JPH0469936B2
公开(公告)日：1992-11-09
申请号：JP11246485
申请日：1985-05-24
申请人： TOYO BOSEKI
发明人： TAMAOKI NOBUYUKI , IMAHASHI SATOSHI
IPC分类号： G03C1/00 , C08F2/50 , G03F7/004 , G03F7/027 , G03F7/028 , G03F7/031 , H01L21/027

4. 发明专利

JPS62180359A PHOTOPOLYMERIZABLE COMPOSITION 失效
公开(公告)号：JPS62180359A
公开(公告)日：1987-08-07
申请号：JP2244786
申请日：1986-02-04
申请人： TOYO BOSEKI
发明人： TAMAOKI NOBUYUKI , IMAHASHI SATOSHI
IPC分类号： C08F2/50 , G03F7/027 , G03F7/028 , G03F7/029 , G03F7/031 , H01L21/027 , H05K3/06
摘要： PURPOSE:To improve the sensitivity in the visible region and to expand the range of the visible region of a photopolymerizable compsn. by incorporating at least one kind of ethylenic unsatd. compd. which is non-gaseous at ordinary temp., a specified s-triazine deriv., and a specified 1,1-dicyano-4-(p- dialkylaminophenyl)-1,3-butadiene. CONSTITUTION:The compsn. contains (a) at least one kind of ethylenic unsatd. compd. which is non-gaseous at ordinary temp., (b) a s-triazine deriv. expressed by the formula, and (c) 1,1-dicyano-4-(p-dialkylaminophenyl)-1,3-butadiene expressed by the formula II. The ethylenic unsatd. compd. to be used is a monomer suitable for the chain growth addition reaction initiated by the free radical. The second component (b) is a s-triazine deriv. expressed by the formula I where at least one mono-, di-, or trihalogen-substituted methyl group is bonded to a S-triazine ring. The third component (c) is a 1,1'-dicyano-4-(p- dialkylaminophenyl)-1,3-butadiene compd. expressed by the formula II which can be synthesized from malononitrile and a corresponding aldehyde.

5. 发明专利

JPS6355539A IMAGE FORMING MATERIAL AND IMAGE FORMING METHOD 失效
公开(公告)号：JPS6355539A
公开(公告)日：1988-03-10
申请号：JP12682386
申请日：1986-05-30
申请人： TOYO BOSEKI
发明人： TAMAOKI NOBUYUKI
IPC分类号： G03C1/00 , G03F7/004 , G03F7/105 , G03F7/20
摘要： PURPOSE:To enable the amplification of an image and to improve the sensitivity to visible laser light by using a photooxidizing agent, a leuco body, a photopolymn. initiator which generates a radical when combined with a dye from the leuco body and irradiated with rays of light having 500-700nm wavelength and an ethylenic unsatd. compd. which is not gas at ordinary temp. CONSTITUTION:This image forming material contains a photooxidizing agent (a) which is converted into an oxidizing agent when irradiated with visible laser light having 420-550nm wavelength, a leuco body (b) which reacts with the oxidizing agent to produce a dye, a photopolymn. initiator (c) which generates a radical when combined with the dye and irradiated with rays of light having 550-700nm wavelength, and at least one kind of ethylenic unsatd. compd. (d) which is not gas at ordinary temp. When the image forming material is used, an image can be amplified and satisfactory sensitivity can be obtd.

6. 发明专利

JPS6060640A IMAGE REPRODUCING MATERIAL AND ITS PRODUCTION 失效
公开(公告)号：JPS6060640A
公开(公告)日：1985-04-08
申请号：JP17048983
申请日：1983-09-13
申请人： TOYO BOSEKI
发明人： TAMAOKI NOBUYUKI , KATOU YOSHIO , OYOKU AKITADA , KAJIMA TOSHIHIKO , TANAKA SHINICHI
IPC分类号： G03F7/26 , G03C1/00 , G03C5/00 , G03F7/09 , G03F7/11
摘要： PURPOSE:To obtain an image reproducing material having excellent scratch resistance of an image by providing a photosensitive resin layer incorporated with a specific improving agent for scratch resistance on a base then migrating said improving agent to the surface of the photosensitive resin layer. CONSTITUTION:The improving agent for scratch resistance expressed by the formula Am-Bn (A is 11-20C monovalent or divalent aliphat. hydrocarbon; B is H, hydroxyl, amino, nitrile, aldehyde, carboxyl, etc.; m is 1-3; n is 1-2) is preliminarily compounded into a photosensitive resin compsn. and is coated on a base, thereby forming a photosensitive resin layer. The improving agent for scratch resistance is then migrated onto the surface of the photosensitive layer, by which the intended image reproducing material is obtd. The improving agent for scratch resistance is exemplified by steraric acid, palmitic acid glycol, vinyl stearate, dodecyl alcohol, etc.

7. 发明专利

JPS61270747A PHOTOPOLYMERIZABLE COMPOSITION 失效
公开(公告)号：JPS61270747A
公开(公告)日：1986-12-01
申请号：JP11246485
申请日：1985-05-24
申请人： TOYO BOSEKI
发明人： TAMAOKI NOBUYUKI , IMAHASHI SATOSHI
IPC分类号： G03C1/00 , C08F2/50 , G03F7/004 , G03F7/027 , G03F7/028 , G03F7/031 , H01L21/027
摘要： PURPOSE:To obtain a photopolymerizable composition high in sensitivity to laser beams, usable in the case of a low output light source, and also high in sensitivity in the visible region by incorporating a combination of a specified sensitizer, an ethylenically unsatd. compd. nongaseous at normal temperature, and a specified photpolymerizable initiator. CONSTITUTION:The photopolymerizable composition high in sensitivity in the visible region, suitable for manufacture of printing circuits, and the like, and effectively usable in the case of light sources considerably small in output can be obtained by preparing the photopolymerizable composition contg. a combination of the sensitizer represented by formula I [R1, R2 are each 1-4C alkyl; R3 is H or 1-3C alkyl; R4 is H, optionally substd. alkyl, or a group represented by formula II; (l) is 0-4; (n) is 0 or 1; and (m) is 0, 1, or 2], at least one of the ethylenically unsatd. compounds nongaseous at normal temperature, such as petaerythritol triacrylate or polyethylene glycol acrylate, and one of photopolymerization initiators of hexaarylbiimidazole, quinone, peroxy ester, and the like.

8. 发明专利

JPH063546B2 失效
公开(公告)号：JPH063546B2
公开(公告)日：1994-01-12
申请号：JP2244786
申请日：1986-02-04
申请人： TOYO BOSEKI
发明人： TAMAOKI NOBUYUKI , IMAHASHI SATOSHI
IPC分类号： C08F2/50 , G03F7/027 , G03F7/028 , G03F7/029 , G03F7/031 , H01L21/027 , H05K3/06

9. 发明专利

JPH0327107B2 失效
公开(公告)号：JPH0327107B2
公开(公告)日：1991-04-12
申请号：JP20349983
申请日：1983-10-29
申请人： TOYO BOSEKI
发明人： KATO YOSHIO , TAMAOKI NOBUYUKI , OYOKU AKITADA , KAJIMA TOSHIHIKO , TANAKA SHINICHI
IPC分类号： G03C1/00 , G03F7/09 , G03F7/11

10. 发明专利

JPH0326825B2 失效
公开(公告)号：JPH0326825B2
公开(公告)日：1991-04-12
申请号：JP17048983
申请日：1983-09-13
申请人： TOYO BOSEKI
发明人： TAMAOKI NOBUYUKI , KATO YOSHIO , OYOKU AKITADA , KAJIMA TOSHIHIKO , TANAKA SHINICHI
IPC分类号： G03F7/26 , G03C1/00 , G03C5/00 , G03F7/09 , G03F7/11

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