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    • 2. 发明专利
    • Method for producing ceramic circuit board
    • 生产陶瓷电路板的方法
    • JP2006199584A
    • 2006-08-03
    • JP2006040322
    • 2006-02-17
    • Toshiba Corp株式会社東芝
    • KOMORIDA YUTAKANAKAYAMA NORIO
    • C04B35/111H01L23/12H01L23/15H05K1/03H05K3/20H05K3/38
    • PROBLEM TO BE SOLVED: To provide a method for producing a reliable ceramic circuit board which has high withstand voltage characteristics and excellent resistance to the heat cycle as well as a high bending strength (deflective strength), and which rarely causes fractures or dielectric breakdowns even if a high bending load is applied. SOLUTION: The method for producing the ceramic circuit board 1 is characterized in that a raw material mixture comprising a high purity alumina powder of 99.5-99.9% purity to which a sintering aid of less than 0.5 wt.% and an organic binder are added is molded, an alumina substrate 2 containing alumina (Al 2 O 3 ) of 99.5% or more and having a void rate of 5 vol.% or less is prepared by sintering the molded product at a temperature of 1,200-1,700°C for 10-48 hours at normal atmospheric pressure, and metal circuit boards 3, 4 of a predetermined shape are joined onto the resultant alumina substrate 2. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种具有高耐压特性和优异的耐热循环性以及高弯曲强度(偏转强度)的可靠的陶瓷电路板的制造方法,很少导致断裂或 即使施加高的弯曲载荷,绝缘击穿。 < P>解决方案:陶瓷电路板1的制造方法的特征在于,包含纯度为99.5-99.9%的高纯度氧化铝粉末的原料混合物,烧结助剂小于0.5重量%,有机粘合剂 ,制备含有99.5%以上且空隙率为5体积%以下的氧化铝的氧化铝基体2(Al 2 SB 3 O 3,SB 3),其空隙率为5体积%以下 通过在正常大气压下在1,200-1,700℃的温度下烧结成型制品10-48小时,并将所形成的金属电路板3,4接合到所得的氧化铝基板2上。(版权所有: C)2006,JPO&NCIPI
    • 3. 发明专利
    • Ceramic circuit substrate
    • 陶瓷电路基板
    • JP2005268824A
    • 2005-09-29
    • JP2005157913
    • 2005-05-30
    • Toshiba Corp株式会社東芝
    • KOMORIDA YUTAKANAKAYAMA NORIOIYOGI YASUSHINABA TAKAYUKI
    • H01L23/12H01L23/36H01L23/40
    • H01L2224/27013H01L2224/32225
    • PROBLEM TO BE SOLVED: To provide a high-quality ceramic circuit substrate and to improve its production efficiency by preventing the misregistration of a semiconductor pallet caused due to solder flow at the time of soldering and poor pressure withstanding caused by a solder bridge and by implementing a good solder bonding. SOLUTION: For the manufacture of the ceramic circuit substrate with a metallic circuit plate 2a joined on a ceramic substrate 1, and a semiconductor pallet 3 soldered to the metallic circuit plate, a solder resist layer 7 is formed on an unsoldered part of the semiconductor pallet mounting surface of the metallic circuit plate whereby a thickness is the same as or greater than that of a solder layer, and the thickness of the solder resist layer 7 is set to be 5 to 100 μm. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了提供高质量的陶瓷电路基板,并且通过防止由于焊接时的焊料流动导致的半导体托盘的重合不良以及焊接桥引起的耐压差而提高其生产效率 并通过实现良好的焊接。 解决方案:为了制造具有连接在陶瓷基板1上的金属电路板2a和焊接到金属电路板的半导体托盘3的陶瓷电路基板,在未焊接的部分上形成阻焊层7 金属电路板的半导体托盘安装面,其厚度与焊料层的厚度相同或更大,阻焊层7的厚度设定为5〜100μm。 版权所有(C)2005,JPO&NCIPI
    • 4. 发明专利
    • Ceramic circuit board and method for manufacturing the same
    • 陶瓷电路板及其制造方法
    • JP2005101415A
    • 2005-04-14
    • JP2003334939
    • 2003-09-26
    • Toshiba Corp株式会社東芝
    • NAKAYAMA NORIOSHIRAI TAKAOYAMAGUCHI HARUHIKO
    • H05K1/09H05K1/02H05K1/03
    • PROBLEM TO BE SOLVED: To provide a small-size ceramic circuit board provided with both ultrafine dimensionally precise wiring and high current-carrying circuit wiring, wherein a high-power semiconductor element is mounted and circuit layer wiring density is enhanced, and to provide a method for manufacturing the circuit board.
      SOLUTION: In the ceramic circuit board 1a wherein a circuit layer is integratedly bonded to at least one of surfaces of a ceramic board 2, the circuit layer is constituted of a first circuit layer 6 comprising a braze material and a second circuit layer 7 comprising a metal circuit board 4 bonded to the surface of the ceramic board 2 with the braze material between.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了提供一种设置有超细尺寸精密布线和大电流承载电路布线的小尺寸陶瓷电路板,其中安装了大功率半导体元件并提高了电路层布线密度,并且 以提供一种制造电路板的方法。 解决方案:在电路层与陶瓷板2的至少一个表面整体结合的陶瓷电路板1a中,电路层由包括钎焊材料的第一电路层6和第二电路层 7包括金属电路板4,金属电路板4与陶瓷板2的表面结合,钎焊材料在其间。 版权所有(C)2005,JPO&NCIPI
    • 6. 发明专利
    • SEMICONDUCTOR PACKAGE
    • JPH10275882A
    • 1998-10-13
    • JP7814997
    • 1997-03-28
    • TOSHIBA CORP
    • MONMA JUNNAKAYAMA NORIO
    • H01L23/28H01L23/08H05K3/34
    • PROBLEM TO BE SOLVED: To provide a semiconductor package of high reliability, so as not to generate damages such as cut, etc., at a bonding portion between a ceramic package and a mounting board by relaxing thermal stresses concentrating on the bonding portion. SOLUTION: A multiplayer ceramic substrate 2 is overlaid on a resin substrate 10 in a form that ball terminals 5 formed on a major surface of the multilayer ceramic substrate 2 as input/output terminals are inserted into through-holes 11 formed in a resin substrate 10. The ball terminals 5 are electrically connected to ball terminals 13, bonded to the mounting surface of the resin substrate 10 through conductive layers 12 in the through-holes 11, and the ball terminals 13 are connected to a wiring on a mounting board with solder. Optimum selection of thermal expansion coefficient of the resin substrate 10 allows the difference in the thermal expansion coefficients between the multilayer ceramic substrate 2 and the mounting board to be relaxed at the resin substrate 10, thus enabling decrease in thermal stresses concentrating on a bonding portion of each ball terminal.
    • 7. 发明专利
    • LIQUID CRYSTAL DISPLAY DEVICE AND ITS PRODUCTION
    • JPH1020332A
    • 1998-01-23
    • JP17524196
    • 1996-07-04
    • TOSHIBA CORP
    • NAKAYAMA NORIO
    • G02F1/136G02F1/1368
    • PROBLEM TO BE SOLVED: To provide a liquid crystal display device which minimizes the stages to be added, has stable characteristics and does not induce deterioration in grade, such as crosstalks, in image quality. SOLUTION: The channel regions of an amorphous silicon layer 37 have high resistance as well when a source electrode 34 and a drain electrode 36 are held insulated from each other. A region where first and second gate insulating layers 42, 43 and a gate electrode 44 are laminated in the upper part beyond the end of this amorphous silicon layer 37 is connected with the high resistance to two lowresistance regions 39, 40 electrically connected to the source electrode 34 or the drain electrode 35. The degradation of the insulation characteristic between the source electrode 34 and drain electrode 35 of a thin-film transistor(TFT) 46 itself does not arise and leak currents, etc., are not generated. When the source electrode 34 and the drain electrode 35 are held conducting, the channel regions of the amorphous silicon layer 37 turn to the low resistance but since the characteristic itself of the TFT 46 is conducting, thereby the generation of the leak currents are of no problem.
    • 9. 发明专利
    • DIODE FOR DETECTING INFRARED RAY
    • JPH01245566A
    • 1989-09-29
    • JP7189588
    • 1988-03-28
    • TOSHIBA CORP
    • NARUSE YUJIROSHIGENAKA KEITARONAKAYAMA NORIO
    • G01J1/02H01L31/0264H01L31/103
    • PURPOSE:To obtain a high infrared ray detecting efficiency by a method wherein the title diode is provided with a semiconductor substrate for transmitting infrared rays, an epitaxially grown layer formed on this semiconductor substrate in such a way that the carrier density in the thickness direction of the layer becomes high at its central part and becomes low on both sides of the density and a signal electrode and an earth electrode, which are formed on this epitaxially grown layer. CONSTITUTION:A signal electrode 4 and an earth electrode 5 are formed on a CMT layer 1 formed on a semiconductor substrate 6. Moreover, in case the P-type CdHgTe (CMT) epitaxially grown layer 1 is continuously formed on the substrate 6, the layer 1 is formed in such a way that the carrier density in the thickness direction of the carrier density layer becomes high at its central part and becomes low on both sides of the carrier density. As this result, in the layer 1, an action to diffuse minority carriers formed by absorption of incident infrared rays in a P-N junction region at a high ratio is generated at the low-carrier density connecting region with the substrate 6, the formation of an ohmic earth electrode is suited at the high carrier density intermediate region and moreover, the formation of an n-type region 11, which is performed by an ion-implantation, is facilitated at the low-carrier density region in the vicinity of the surface. Thereby, a high infrared ray detecting efficiency is obtained.