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    • 3. 发明申请
    • ULTRAVIOLET ABSORBING POLYMER FOR HIGH LIGHT RESISTANT RECORDING MATERIALS
    • 用于高光记录材料的紫外线吸收聚合物
    • WO2006090917A3
    • 2006-10-19
    • PCT/JP2006304181
    • 2006-02-27
    • NIPPON CATALYTIC CHEM INDNODA NOBUHISAMATSUMOTO TAKESHI
    • NODA NOBUHISAMATSUMOTO TAKESHI
    • C07D249/18B41M5/00
    • B41M5/502C07D249/20
    • An ultraviolet absorbing polymer for high light resistant recording materials, which is used for forming an ultraviolet absorbing layer on a recording material, wherein the polymer is synthesized from a monomer mixture including a benzotriazole type ultraviolet absorbing monomer of the following formula (1): wherein R 1 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a cyano group, or a nitro group; R 2 is a group having an atom which can form a hydrogen bond to R 2 ; R 3 is a hydrogen atom or a methyl group; and R 4 is a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms; and a high light resistant recording material including an ultraviolet absorbing layer containing the above ultraviolet absorbing polymer.
    • 一种用于高耐光性记录材料的紫外线吸收性聚合物,其用于在记录材料上形成紫外线吸收层,其中所述聚合物由包含下式(1)的苯并三唑类紫外线吸收性单体的单体混合物合成:其中 R 1是氢原子,具有1至8个碳原子的烷基,具有1至4个碳原子的烷氧基,氰基或硝基; R 2是具有能够与R 2 SUP形成氢键的原子的基团; R 3是氢原子或甲基; 并且R 4是氢原子或具有1至12个碳原子的烃基; 以及包含含有上述紫外线吸收性聚合物的紫外线吸收层的高耐光性记录材料。