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1. 发明授权

US08174678B2 Lithographic apparatus with adjusted exposure slit shape enabling reduction of focus errors due to substrate topology and device manufacturing method 有权
标题翻译：具有调节曝光狭缝形状的平版印刷设备，其能够减少由于衬底拓扑和器件制造方法引起的焦点误差
公开(公告)号：US08174678B2
公开(公告)日：2012-05-08
申请号：US12329076
申请日：2008-12-05
申请人： Sven Gunnar Krister Magnusson , Martin Jules Marie-Emile De Nivelle , Frank Staals , Wim Tjibbo Tel
发明人： Sven Gunnar Krister Magnusson , Martin Jules Marie-Emile De Nivelle , Frank Staals , Wim Tjibbo Tel
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70066
摘要： A lithographic apparatus includes an illumination system to condition a radiation beam; a patterning device support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, and a projection system to project the patterned radiation beam in a scanning exposure along a scanning direction onto a target portion of the substrate. The illumination system is configured to form in a plane of the patterning device a slit shaped image. The slit shaped image has a curved shape with a slit curvature in the scanning direction, with a length in the scanning direction and a width perpendicular to the scanning direction. The slit shaped image is configured to create a curved pattern image portion of the patterned radiation beam in an image plane of the projection system.
摘要翻译：光刻设备包括用于调节辐射束的照明系统; 图案形成装置支撑件以支撑图案形成装置，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底的衬底台，以及投影系统，用于沿着扫描方向将图案化的辐射束沿扫描曝光投影到衬底的目标部分上。照明系统构造成在图案形成装置的平面中形成狭缝形图像。狭缝形状的图像具有在扫描方向上具有狭缝曲率的弯曲形状，扫描方向上的长度和垂直于扫描方向的宽度。狭缝形状的图像被配置为在投影系统的图像平面中产生图案化的辐射束的弯曲图案图像部分。

2. 发明申请

US20090153821A1 LITHOGRAPHIC APPARATUS WITH ADJUSTED EXPOSURE SLIT SHAPE ENABLING REDUCTION OF FOCUS ERRORS DUE TO SUBSTRATE TOPOLOGY AND DEVICE MANUFACTURING METHOD 有权
标题翻译：具有调整的曝光片形状的平版印刷设备使得基底拓扑和器件制造方法能够减少焦点错误
公开(公告)号：US20090153821A1
公开(公告)日：2009-06-18
申请号：US12329076
申请日：2008-12-05
申请人： Sven Gunnar Krister Magnusson , Martin Jules Marie-Emile De Nivelle , Frank Staals , Wim Tjibbo Tel
发明人： Sven Gunnar Krister Magnusson , Martin Jules Marie-Emile De Nivelle , Frank Staals , Wim Tjibbo Tel
IPC分类号： G03B27/42
CPC分类号： G03F7/70066
摘要： A lithographic apparatus includes an illumination system to condition a radiation beam; a patterning device support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, and a projection system to project the patterned radiation beam in a scanning exposure along a scanning direction onto a target portion of the substrate. The illumination system is configured to form in a plane of the patterning device a slit shaped image. The slit shaped image has a curved shape with a slit curvature in the scanning direction, with a length in the scanning direction and a width perpendicular to the scanning direction. The slit shaped image is configured to create a curved pattern image portion of the patterned radiation beam in an image plane of the projection system.
摘要翻译：光刻设备包括用于调节辐射束的照明系统; 图案形成装置支撑件以支撑图案形成装置，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底的衬底台，以及投影系统，用于沿着扫描方向将图案化的辐射束沿扫描曝光投影到衬底的目标部分上。照明系统构造成在图案形成装置的平面中形成狭缝形图像。狭缝形状的图像具有在扫描方向上具有狭缝曲率的弯曲形状，扫描方向上的长度和垂直于扫描方向的宽度。狭缝形状的图像被配置为在投影系统的图像平面中产生图案化的辐射束的弯曲图案图像部分。

3. 发明授权

US08975599B2 Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus 有权
标题翻译：图像传感器，包括图像传感器的光刻设备和光刻设备中的图像传感器的使用
公开(公告)号：US08975599B2
公开(公告)日：2015-03-10
申请号：US11797505
申请日：2007-05-03
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G01J1/04 , G21K5/10 , G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.
摘要翻译：本发明涉及一种用于检测由光刻投影设备中的辐射束形成的空间图像的图像传感器，用于通过基板保持器将图案曝光在保持在基板平面中的基板上。图像传感器具有图像检测器和透镜。透镜布置成将至少一部分空间图像投影到图像检测器上。图像传感器被定位在衬底保持器内，透镜位于衬底平面附近。

4. 发明申请

US20100195071A1 Image Sensor, Method for Image Detection and Computer Program Product 有权
标题翻译：图像传感器，图像检测方法和计算机程序产品
公开(公告)号：US20100195071A1
公开(公告)日：2010-08-05
申请号：US12598377
申请日：2008-04-29
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G03B27/52 , G01B11/14
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.
摘要翻译：本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。图像传感器包括布置成形成天线图案的检测图像的透镜（5）和布置成测量检测图像中的多个位置中的辐射强度的图像检测器（6）。

5. 发明授权

US09329500B2 Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor 有权
标题翻译：所述平版印刷装置被配置为重构天线图案并且将所述重建的天线图案与由图像传感器检测到的天线图案进行比较
公开(公告)号：US09329500B2
公开(公告)日：2016-05-03
申请号：US12598377
申请日：2008-04-29
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G03F7/09 , G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.
摘要翻译：本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。图像传感器包括布置成形成天线图案的检测图像的透镜（5）和布置成测量检测图像中的多个位置中的辐射强度的图像检测器（6）。

6. 发明申请

US20080273183A1 Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus 有权
标题翻译：图像传感器，包括图像传感器的光刻设备和光刻设备中的图像传感器的使用
公开(公告)号：US20080273183A1
公开(公告)日：2008-11-06
申请号：US11797505
申请日：2007-05-03
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G03B27/58 , G03B27/80
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.
摘要翻译：本发明涉及一种用于检测由光刻投影设备中的辐射束形成的空间图像的图像传感器，用于通过基板保持器将图案曝光在保持在基板平面中的基板上。图像传感器具有图像检测器和透镜。透镜布置成将至少一部分空间图像投影到图像检测器上。图像传感器被定位在衬底保持器内，透镜位于衬底平面附近。

7. 发明授权

US07262831B2 Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus 有权
标题翻译：平版印刷设备和使用这种光刻投影设备的设备制造方法
公开(公告)号：US07262831B2
公开(公告)日：2007-08-28
申请号：US11000507
申请日：2004-12-01
申请人： M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Andre Bernardus Jeunink , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt
发明人： M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Andre Bernardus Jeunink , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt
IPC分类号： G03B27/52 , G03B27/42 , G03B27/68
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/705 , G03F7/706
摘要： A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.
摘要翻译：光刻投影设备包括用于随时间测量投影系统像差的变化的测量系统，以及用于根据模型参数随时间预测投影系统像差的变化的预测控制系统，以及用于产生用于补偿时变的控制信号属性，例如投影系统的透镜的OVL值（XY调整）和FOC值（Z调整）。提供了一种在线模型识别系统，用于基于由预测控制系统提供的投影系统像差值和由测量系统提供的测量的投影系统像差值来估计模型参数误差，并且更新系统利用模型参数误差来更新预测控制系统的模型参数，以便将时变性能保持在可接受的性能标准内。

8. 发明授权

US07511799B2 Lithographic projection apparatus and a device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07511799B2
公开(公告)日：2009-03-31
申请号：US11340842
申请日：2006-01-27
申请人： Wim Tjibbo Tel , Johannes Wilhelmus De Klerk , Peter Hanzen Wardenier
发明人： Wim Tjibbo Tel , Johannes Wilhelmus De Klerk , Peter Hanzen Wardenier
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03B27/42 , G03B27/72 , G03F7/701 , G03F7/70308 , G03F7/706 , G03F7/70891
摘要： A lithographic apparatus wherein a dipole illumination mode used for printing a line pattern, is arranged to provide quadrupole illumination. Radiation emanating from the two additional poles and passing the mask pattern without being affected by diffraction is prevented from reaching the wafer by a radiation blocking aperture disposed in the projection system. Astigmatism aberration due to lens heating associated with the dipole illumination mode is reduced by lens heating associated with the additional poles of the quadrupole illumination mode.
摘要翻译：布置用于印刷线图案的偶极照明模式的光刻设备，以提供四极照明。通过设置在投影系统中的辐射阻挡孔，防止从两个附加极发出的辐射和通过掩模图案而不受衍射的影响而到达晶片。通过与四极照明模式的附加极相关联的透镜加热，减少了与偶极照明模式相关联的透镜加热引起的散光像差。

9. 发明申请

US20080252870A1 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus 有权
标题翻译：光刻投影装置和使用这种光刻投影装置的装置制造方法
公开(公告)号：US20080252870A1
公开(公告)日：2008-10-16
申请号：US12213150
申请日：2008-06-16
申请人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Amout Van De Stadt , Remco Marcel Van Dijk
发明人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Amout Van De Stadt , Remco Marcel Van Dijk
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70491 , G03F7/705 , G03F7/706 , G03F9/7046
摘要： A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.
摘要翻译：公开了一种光刻投影装置，其包括预测系统，该预测系统被配置为相对于测量的像差值预测投影系统像差随时间的变化，建模系统被配置为确定所述预测投影系统像差变化对至少一个像素的应用特定影响用于所选图案的图像的参数;控制系统，被配置为根据所述预测的投影系统像差变化及其对图像的至少一个参数的应用特定影响来生成特定于所选择的图案的控制信号，以及图像响应于控制信号调整系统，以补偿所述预测的投影系统像差变化对图像的应用特定效果。

10. 发明授权

US07436485B2 Lithographic apparatus, patterning assembly and contamination estimation method 有权
标题翻译：平版印刷设备，图案组装和污染估算方法
公开(公告)号：US07436485B2
公开(公告)日：2008-10-14
申请号：US11099686
申请日：2005-04-06
申请人： Wim Tjibbo Tel
发明人： Wim Tjibbo Tel
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70916 , G03F7/70783 , G03F9/7034
摘要： A lithographic apparatus includes a pattern support to support a patterning device, the patterning device to impart a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a position measurement system to perform a position measurement of a reference mark of the patterning device. Also, the lithographic apparatus includes a contamination monitor to estimate a contamination of at least one of the patterning device and the pattern support by performing first and second position measurements of at least one reference mark of the patterning device and estimating a contamination from a position difference between the first and second position measurements.
摘要翻译：光刻设备包括用于支撑图案形成装置的图案支撑件，所述图案形成装置在其横截面中赋予具有图案的辐射束以形成图案化的辐射束。光刻设备还包括位置测量系统，用于执行图案形成装置的基准标记的位置测量。此外，光刻设备包括污染监测器，通过执行图案形成装置的至少一个参考标记的第一和第二位置测量来估计图案形成装置和图案支架中的至少一个的污染，并估计位置差异的污染在第一和第二位置测量之间。

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