会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Phase masks for use in holographic data storage
    • 用于全息数据存储的相位掩模
    • US08107344B2
    • 2012-01-31
    • US12639821
    • 2009-12-16
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • G11B7/00
    • G02F1/292G02F1/13363G02F2001/133565G03H1/02G03H1/16G03H2001/0224G03H2223/13G11B7/0065G11B7/128G11B7/1369
    • A spatial light modulator (SLM) having a phase mask that is provided as an internal component thereof. The phase mask can be provided as a multilevel surface of relatively higher index of refraction material on an inner surface of a transmissive cover window or as a separate transmissive window between the cover window and the pixels of the SLM. If the phase mask is to be used with a liquid crystal SLM, then it may be desirable to planarize the surface of the cover window contacting the liquid crystal by providing a layer of relatively lower index of refraction material adjacent the multilevel surface. The phase mask can also be provided on the transmissive cover window by patterned ion deposition, exposing patterned light to a photopolymeric material, or in some other suitable fashion. Arranging for the pixel electrodes to be at one of multiple levels rather than lying in an exactly planar relationship can also effectively create the phase mask.
    • 具有作为其内部部件提供的相位掩模的空间光调制器(SLM)。 相位掩模可以被提供为在透射盖窗的内表面上的相对较高的折射率材料的多层表面,或者作为在窗口窗口和SLM的像素之间的单独透射窗口。 如果相位掩模与液晶SLM一起使用,则可能需要通过提供相邻较低折射率材料层与多层表面相邻来平坦化与液晶接触的盖窗的表面。 相位掩模也可以通过图案化离子沉积在透射覆盖窗口上提供,将图案化光曝光到光聚合物材料上,或以某种其它合适的方式。 将像素电极排列成多个电平中的一个而不是处于精确的平面关系,也可以有效地产生相位掩模。
    • 8. 发明申请
    • PHASE MASKS FOR USE IN HOLOGRAPHIC DATA STORAGE
    • 相位掩码用于全息数据存储
    • US20100091631A1
    • 2010-04-15
    • US12639821
    • 2009-12-16
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • G11B7/00
    • G02F1/292G02F1/13363G02F2001/133565G03H1/02G03H1/16G03H2001/0224G03H2223/13G11B7/0065G11B7/128G11B7/1369
    • A spatial light modulator (SLM) having a phase mask that is provided as an internal component thereof. The phase mask can be provided as a multilevel surface of relatively higher index of refraction material on an inner surface of a transmissive cover window or as a separate transmissive window between the cover window and the pixels of the SLM. If the phase mask is to be used with a liquid crystal SLM, then it may be desirable to planarize the surface of the cover window contacting the liquid crystal by providing a layer of relatively lower index of refraction material adjacent the multilevel surface. The phase mask can also be provided on the transmissive cover window by patterned ion deposition, exposing patterned light to a photopolymeric material, or in some other suitable fashion. Arranging for the pixel electrodes to be at one of multiple levels rather than lying in an exactly planar relationship can also effectively create the phase mask.
    • 具有作为其内部部件提供的相位掩模的空间光调制器(SLM)。 相位掩模可以被提供为在透射盖窗的内表面上的相对较高的折射率材料的多层表面,或者作为在窗口窗口和SLM的像素之间的单独透射窗口。 如果相位掩模与液晶SLM一起使用,则可能需要通过提供相邻较低折射率材料层与多层表面相邻来平坦化与液晶接触的盖窗的表面。 相位掩模也可以通过图案化离子沉积在透射覆盖窗口上提供,将图案化光曝光到光聚合物材料上,或以某种其它合适的方式。 将像素电极排列成多个电平中的一个而不是处于精确的平面关系,也可以有效地产生相位掩模。
    • 9. 发明授权
    • Phase masks for use in holographic data storage
    • 用于全息数据存储的相位掩模
    • US07656768B2
    • 2010-02-02
    • US11046197
    • 2005-01-27
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • G11B7/00
    • G02F1/292G02F1/13363G02F2001/133565G03H1/02G03H1/16G03H2001/0224G03H2223/13G11B7/0065G11B7/128G11B7/1369
    • A spatial light modulator (SLM) having a phase mask that is provided as an internal component thereof. The phase mask can be provided as a multilevel surface of relatively higher index of refraction material on an inner surface of a transmissive cover window or as a separate transmissive window between the cover window and the pixels of the SLM. If the phase mask is to be used with a liquid crystal SLM, then it may be desirable to planarize the surface of the cover window contacting the liquid crystal by providing a layer of relatively lower index of refraction material adjacent the multilevel surface. The phase mask can also be provided on the transmissive cover window by patterned ion deposition, exposing patterned light to a photopolymeric material, or in some other suitable fashion. Arranging for the pixel electrodes to be at one of multiple levels rather than lying in an exactly planar relationship can also effectively create the phase mask.
    • 具有作为其内部部件提供的相位掩模的空间光调制器(SLM)。 相位掩模可以被提供为在透射盖窗的内表面上的相对较高的折射率材料的多层表面,或者作为在窗口窗口和SLM的像素之间的单独透射窗口。 如果相位掩模与液晶SLM一起使用,则可能需要通过提供相邻较低折射率材料层与多层表面相邻来平坦化与液晶接触的盖窗的表面。 相位掩模也可以通过图案化离子沉积在透射覆盖窗口上提供,将图案化光曝光到光聚合物材料上,或以某种其它合适的方式。 将像素电极排列成多个电平中的一个而不是处于精确的平面关系,也可以有效地产生相位掩模。