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    • 2. 发明申请
    • AlInGaP LED HAVING REDUCED TEMPERATURE DEPENDENCE
    • AlInGaP LED具有降低的温度依赖性
    • US20090230381A1
    • 2009-09-17
    • US12433106
    • 2009-04-30
    • Michael R. KRAMESNathan F. GardnerFrank M. Steranka
    • Michael R. KRAMESNathan F. GardnerFrank M. Steranka
    • H01L33/00
    • H01L33/30H01L2224/13H01L2924/00011H01L2924/00014H01L2224/0401
    • To increase the lattice constant of AlInGaP LED layers to greater than the lattice constant of GaAs for reduced temperature sensitivity, an engineered growth layer is formed over a substrate, where the growth layer has a lattice constant equal to or approximately equal to that of the desired AlInGaP layers. In one embodiment, a graded InGaAs or InGaP layer is grown over a GaAs substrate. The amount of indium is increased during growth of the layer such that the final lattice constant is equal to that of the desired AlInGaP active layer. In another embodiment, a very thin InGaP, InGaAs, or AlInGaP layer is grown on a GaAs substrate, where the InGaP, InGaAs, or AlInGaP layer is strained (compressed). The InGaP, InGaAs, or AlInGaP thin layer is then delaminated from the GaAs and relaxed, causing the lattice constant of the thin layer to increase to the lattice constant of the desired overlying AlInGaP LED layers. The LED layers are then grown over the thin InGaP, InGaAs, or AlInGaP layer.
    • 为了将AlInGaP LED层的晶格常数提高到大于GaAs的晶格常数以降低温度敏感性,在衬底上形成工程化生长层,其中生长层具有等于或近似等于所需的晶格常数的晶格常数 AlInGaP层。 在一个实施例中,在GaAs衬底上生长渐变的InGaAs或InGaP层。 在层的生长期间铟的量增加,使得最终晶格常数等于所需的AlInGaP活性层的量。 在另一实施例中,在GaAs衬底上生长非常薄的InGaP,InGaAs或AlInGaP层,其中InGaP,InGaAs或AlInGaP层被应变(压缩)。 然后,InGaP,InGaAs或AlInGaP薄层从GaAs分层并且弛豫,导致薄层的晶格常数增加到期望的上覆AlInGaP LED层的晶格常数。 然后在薄的InGaP,InGaAs或AlInGaP层上生长LED层。