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1. 发明申请

US20110141195A1 Nozzle plate and method of manufacturing the same 有权
标题翻译：喷嘴板及其制造方法
公开(公告)号：US20110141195A1
公开(公告)日：2011-06-16
申请号：US12801616
申请日：2010-06-17
申请人： Sung-gyu Kang , Jae-Woo Chung , Young-Ki Hong
发明人： Sung-gyu Kang , Jae-Woo Chung , Young-Ki Hong
IPC分类号： B41J2/14 , C23F1/00
CPC分类号： B41J2/1642 , B41J2/1433 , B41J2/162 , B41J2/1628 , B41J2/1629 , B41J2/1631
摘要： Provided is a nozzle plate and methods of manufacturing the nozzle plate. The nozzle plate may include a substrate having a nozzle. The nozzle plate may also include a permittivity reducing area in an upper portion of the substrate around the nozzle, wherein the permittivity reducing area includes a plurality of porosities and a plurality of walls between the plurality of porosities. Additionally, the nozzle plate may include a protection layer on the substrate, wherein the protection layer covers the plurality of porosities and the plurality of walls.
摘要翻译：提供喷嘴板和制造喷嘴板的方法。喷嘴板可以包括具有喷嘴的基板。喷嘴板还可以包括在喷嘴周围的基板的上部中的介电常数降低区域，其中介电常数降低区域包括多个孔隙和多个孔隙之间的多个壁。此外，喷嘴板可以在基板上包括保护层，其中保护层覆盖多个孔隙和多个壁。

2. 发明申请

US20110049095A1 METHOD OF FORMING HYDROPHOBIC COATING LAYER ON SURFACE OF NOZZLE PLATE OF INKJET PRINTHEAD 审中-公开
标题翻译：在喷嘴喷嘴板表面形成疏水涂层的方法
公开(公告)号：US20110049095A1
公开(公告)日：2011-03-03
申请号：US12941218
申请日：2010-11-08
申请人： Sung-gyu Kang , Kae-dong Back , Seung-mo Lim , Jae-Woo Chung
发明人： Sung-gyu Kang , Kae-dong Back , Seung-mo Lim , Jae-Woo Chung
IPC分类号： B05D3/10 , B05D1/02 , B05D3/00
CPC分类号： B41J2/1433 , B41J2/1606 , B41J2/162 , B41J2/1628 , B41J2/1631 , B41J2/1643 , Y10T29/49401
摘要： A method of forming a hydrophobic coating layer on a surface of a nozzle plate of an inkjet printhead includes forming a plurality of nozzles in the nozzle plate, each of the nozzles having an exit, stacking a film on the surface of the nozzle plate to cover the exit of each of the nozzles, forming a predetermined metal layer on an inner wall of each of the nozzles and an inner surface of the film covering the exit of each of the nozzles using a plating method, removing the film from the surface of the nozzle plate, forming a hydrophobic coating layer on the surface of the nozzle plate to cover the metal layer exposed through the exit of each of the nozzles, and removing the metal layer formed on the inner wall of each of the nozzles and the hydrophobic coating layer formed on the surface of the metal layer.
摘要翻译：在喷墨打印头的喷嘴板的表面上形成疏水涂层的方法包括在喷嘴板中形成多个喷嘴，每个喷嘴具有出口，在喷嘴板的表面上堆叠膜以覆盖每个喷嘴的出口，在每个喷嘴的内壁上形成预定的金属层，并且使用电镀方法将膜的内表面覆盖每个喷嘴的出口，从该表面移除该膜喷嘴板，在喷嘴板的表面上形成疏水涂层，以覆盖通过每个喷嘴的出口暴露的金属层，并且去除形成在每个喷嘴的内壁上的金属层和疏水涂层形成在金属层的表面上。

3. 发明申请

US20060170735A1 Piezoelectric inkjet printhead having temperature sensor and method of making the same 有权
标题翻译：具有温度传感器的压电喷墨打印头及其制造方法
公开(公告)号：US20060170735A1
公开(公告)日：2006-08-03
申请号：US11341364
申请日：2006-01-30
申请人： Young-Ki Hong , Tae-Gyun Kim , Jae-Woo Chung
发明人： Young-Ki Hong , Tae-Gyun Kim , Jae-Woo Chung
IPC分类号： B41J2/045
CPC分类号： B41J2/14233 , B41J2002/14491 , Y10T29/49401
摘要： A piezoelectric inkjet printhead having a channel forming plate including an ink channel having a pressure chamber coupled to a nozzle, a piezoelectric actuator including a lower electrode on the channel forming plate, a piezoelectric element on the lower electrode, and an upper electrode on the piezoelectric element, the piezoelectric actuator corresponding to the pressure chamber, an insulation element on the lower electrode and spaced apart from the piezoelectric element, a first electrode on the insulation element, and a temperature sensor on the first electrode, and a method of making the same.
摘要翻译：一种具有通道形成板的压电喷墨打印头，该通道形成板包括具有连接到喷嘴的压力室的墨水通道，在通道形成板上包括下部电极的压电致动器，下部电极上的压电元件和压电元件元件，对应于压力室的压电致动器，下电极上的绝缘元件并与压电元件间隔开，绝缘元件上的第一电极和第一电极上的温度传感器及其制造方法。

4. 发明授权

US07496422B2 Method for controlling a semiconductor processing apparatus 有权
标题翻译：用于控制半导体处理装置的方法
公开(公告)号：US07496422B2
公开(公告)日：2009-02-24
申请号：US11284813
申请日：2005-11-23
申请人： Jae-Woo Chung , Jun Jung
发明人： Jae-Woo Chung , Jun Jung
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B23/0286 , Y02P90/20 , Y02P90/22 , Y10S707/99953 , Y10S707/99954
摘要： A method for controlling a batch-type semiconductor processing apparatus is provided. The method checks whether a recipe set based on basic process information is within a recipe group stored in the semiconductor processing apparatus. The method also checks whether the quantity of wafers read through lot mapping is correlated to the quantity of wafers indicated by the basic process information. During the semiconductor fabrication process, the method also checks whether a current recipe of the semiconductor processing apparatus is correlated to the set recipe.
摘要翻译：提供了一种用于控制间歇式半导体处理装置的方法。该方法检查基于基本处理信息的食谱是否在存储在半导体处理装置中的食谱组内。该方法还检查通过批次映射读取的晶片数量是否与由基本处理信息指示的晶片数量相关。在半导体制造过程中，该方法还检查半导体处理装置的当前配方是否与设定的配方相关。

5. 发明申请

US20060178768A1 Control system for semiconductor processing apparatus 有权
标题翻译：半导体处理装置的控制系统
公开(公告)号：US20060178768A1
公开(公告)日：2006-08-10
申请号：US11199219
申请日：2005-08-09
申请人： Jae-Woo Chung , Jong-Hwan Weon , Hyo-Sang Jung , Myung-Kill Kim , Tae-Ha Jeon , Kyung-Bo Sim
发明人： Jae-Woo Chung , Jong-Hwan Weon , Hyo-Sang Jung , Myung-Kill Kim , Tae-Ha Jeon , Kyung-Bo Sim
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G05B2219/32097 , G05B2219/35285 , G05B2219/45031 , Y02P90/18 , Y02P90/20
摘要： A control system for a semiconductor processing apparatus comprises a control server connected to a semiconductor processing apparatus, a verification server connected to the control server, and a database connected to the verification server. The verification server evaluates input parameter values stored in the semiconductor processing apparatus against verification data stored in the database. The results of the evaluation are used to determine whether a process will be performed by the semiconductor processing apparatus.
摘要翻译：半导体处理装置的控制系统包括连接到半导体处理装置的控制服务器，连接到控制服务器的验证服务器和连接到验证服务器的数据库。验证服务器针对存储在数据库中的验证数据来评估存储在半导体处理装置中的输入参数值。评估结果用于确定半导体处理装置是否执行处理。

6. 发明授权

US08008375B2 Poly(vinyl chloride) product containing cyclodextrin derivatives with suppression of the migration of plasticizer and manufacturing method thereof 有权
标题翻译：含有环糊精衍生物的聚（氯乙烯）产物抑制增塑剂的迁移及其制备方法
公开(公告)号：US08008375B2
公开(公告)日：2011-08-30
申请号：US11989798
申请日：2007-05-23
申请人： Seung-Yeop Kwak , Sang-Jae Jung , Jae-Woo Chung
发明人： Seung-Yeop Kwak , Sang-Jae Jung , Jae-Woo Chung
IPC分类号： C08B37/00 , C08L3/02 , C08L5/16 , C08L5/00 , A61K8/73 , C08F251/02
CPC分类号： C08F14/06 , C08F2/20
摘要： The present invention relates to a PVC product containing cyclodextrin derivative particles and capable of suppressing migration of a plasticizer and a method for manufacturing the same, which includes (S1) preparing cyclodextrin derivative particles, in which a hydroxyl functional group is replaced by a predetermined compound; (S2) inputting the cyclodextrin derivative particles, a water-based dispersion medium and a vinyl chloride monomer into a high-pressure reactor and performing polymerization to obtain cyclodextrin derivative particles-capsulated PVC particles, in which a plurality of the cyclodextrin derivative particles are dispersedly capsulated in PVC particles; and (S3) mixing the cyclodextrin derivative particles-capsulated PVC particles with a low molecular weight liquid plasticizer and molding the mixture in a predetermined shape using heat.
摘要翻译：本发明涉及含有环糊精衍生物颗粒并能够抑制增塑剂迁移的PVC产品及其制造方法，其包括（S1）制备环糊精衍生物颗粒，其中羟基官能团被预定的化合物 ; （S2）将环糊精衍生物颗粒，水性分散介质和氯乙烯单体输入到高压反应器中并进行聚合，得到分散有多个环糊精衍生物颗粒的环糊精衍生物颗粒包封的PVC颗粒封装在PVC颗粒中; 和（S3）将环糊精衍生物颗粒包覆的PVC颗粒与低分子量液体增塑剂混合，并使用热量将该混合物成型为预定形状。

7. 发明申请

US20100092376A1 Manufacturing method of porous titanium dioxide using cyclodextrin 审中-公开
标题翻译：使用环糊精的多孔二氧化钛的制备方法
公开(公告)号：US20100092376A1
公开(公告)日：2010-04-15
申请号：US11989631
申请日：2007-05-29
申请人： Seung-Yeop Kwak , Jae-Woo Chung
发明人： Seung-Yeop Kwak , Jae-Woo Chung
IPC分类号： C01G23/053
CPC分类号： C01G23/047 , C01P2002/72 , C01P2004/03 , C01P2004/04 , C01P2006/14 , C01P2006/16 , C01P2006/17
摘要： A method is provided for manufacturing porous titanium dioxide with uniform pore sizes within several nanometers by means of a template and a titanium precursor. In this method, a cyclodextrin or cyclodextrin derivative is used as a template for forming pores, and the cyclodextrin or then derivative reacts with the titanium precursor in a sulfuric acid solution. The manufacturing method according to the present invention allows the control of pore size and morphology using various kinds of cyclodextrin or cyclodextrin derivatives, supports a facile removal of the cyclodextrin used as the template, and is capable of manufacturing anatase type porous titanium dioxide with excellent photoactivity without a separate sintering process.
摘要翻译：提供了一种通过模板和钛前体制造在几纳米内具有均匀孔径的多孔二氧化钛的方法。在该方法中，使用环糊精或环糊精衍生物作为形成孔的模板，并且环糊精或其衍生物与硫酸溶液中的钛前体反应。根据本发明的制造方法允许使用各种环糊精或环糊精衍生物控制孔径和形态，支持轻松去除用作模板的环糊精，并且能够制备具有优异光活性的锐钛矿型多孔二氧化钛没有单独的烧结过程。

8. 发明授权

US07225039B2 Control system for semiconductor processing apparatus 有权
标题翻译：半导体处理装置的控制系统
公开(公告)号：US07225039B2
公开(公告)日：2007-05-29
申请号：US11199219
申请日：2005-08-09
申请人： Jae-Woo Chung , Jong-Hwan Weon , Hyo-Sang Jung , Myung-Kill Kim , Tae-Ha Jeon , Kyung-Bo Sim
发明人： Jae-Woo Chung , Jong-Hwan Weon , Hyo-Sang Jung , Myung-Kill Kim , Tae-Ha Jeon , Kyung-Bo Sim
IPC分类号： G06F19/00 , G06F11/30
CPC分类号： G05B19/41865 , G05B2219/32097 , G05B2219/35285 , G05B2219/45031 , Y02P90/18 , Y02P90/20
摘要： A control system for a semiconductor processing apparatus comprises a control server connected to a semiconductor processing apparatus, a verification server connected to the control server, and a database connected to the verification server. The verification server evaluates input parameter values stored in the semiconductor processing apparatus against verification data stored in the database. The results of the evaluation are used to determine whether a process will be performed by the semiconductor processing apparatus.
摘要翻译：半导体处理装置的控制系统包括连接到半导体处理装置的控制服务器，连接到控制服务器的验证服务器和连接到验证服务器的数据库。验证服务器针对存储在数据库中的验证数据来评估存储在半导体处理装置中的输入参数值。评估结果用于确定半导体处理装置是否执行处理。

9. 发明申请

US20080200592A1 Plasticizer composition containing cyclodextrin derivatives, flexible PVC composition with suppression of the migration of plasticizer containing the same, and manufacturing method thereof 审中-公开
标题翻译：含有环糊精衍生物的增塑剂组合物，抑制含有其的增塑剂迁移的柔性PVC组合物及其制造方法
公开(公告)号：US20080200592A1
公开(公告)日：2008-08-21
申请号：US12011837
申请日：2008-01-29
申请人： Seung-Yeop Kwak , Byong-Yong Yu , Jae-Woo Chung
发明人： Seung-Yeop Kwak , Byong-Yong Yu , Jae-Woo Chung
IPC分类号： C08L5/16
CPC分类号： C08L27/06 , C08K5/0016 , C08L5/16 , C08L2666/26
摘要： The present invention relates to a plasticizer composition containing cyclodextrin derivatives, a flexible PVC composition with suppression of the migration of plasticizer containing this plasticizer composition, and a manufacturing method of the PVC composition. The manufacturing method includes the steps of: (S1) preparing a cyclodextrin derivative, in which hydrogens of a cyclodextrin are substituted with a certain compound; (S2) mixing the cyclodextrin derivative, PVC and a low molecular weight liquid plasticizer to form a plastisol; and (S3) heating the plastisol into liquid and cooling the plastisol. This manufacturing method uses cyclodextrin derivatives, in which cyclodextrins are modified with certain compounds, and these derivatives form a complex with the low molecular weight liquid plasticizer to suppress plasticizer migration. Thus, this method thereby allows mass-production of the flexible PVC with suppressed plasticizer migration in a simple and economical manner without using a solvent.
摘要翻译：本发明涉及含有环糊精衍生物的增塑剂组合物，抑制含有该增塑剂组合物的增塑剂的迁移的柔性PVC组合物，以及PVC组合物的制造方法。制造方法包括以下步骤：（S1）制备环糊精衍生物，其中环糊精的氢被某种化合物取代; （S2）混合环糊精衍生物，PVC和低分子量液体增塑剂以形成增塑溶胶; 和（S3）将增塑溶胶加热成液体并冷却增塑溶胶。该制造方法使用环糊精衍生物，其中环糊精被某些化合物改性，并且这些衍生物与低分子量液体增塑剂形成复合物以抑制增塑剂迁移。因此，该方法可以在不使用溶剂的情况下以简单且经济的方式批量生产具有抑制的增塑剂迁移的柔性PVC。

10. 发明授权

US07353078B2 Semiconductor wafer processing apparatus and method for processing batch of wafers having variable number of wafer lots 有权
标题翻译：用于处理具有可变数量的晶片批次的批次晶片的半导体晶片处理装置和方法
公开(公告)号：US07353078B2
公开(公告)日：2008-04-01
申请号：US11474385
申请日：2006-06-26
申请人： Jae-Woo Chung , Jun Jung
发明人： Jae-Woo Chung , Jun Jung
IPC分类号： G06F19/00
CPC分类号： G03F7/7075 , G03F7/70525 , Y10S707/99931 , Y10S707/99945
摘要： Disclosed is a semiconductor processing apparatus for processing batches of wafers with variable numbers of wafer lots. The apparatus includes an operator interface server adapted to receive batch information for a track-in operation, an equipment management server adapted to store data used to process the batch of wafers, and a device interface server adapted to control a selected unit of processing equipment used to process the batch of wafers. The batch information is transmitted from the operator interface server to the device interface server, and the device interface server attempts to set a sub-recipe in the selected unit of processing equipment based on the batch information. After the sub-recipe is set in the selected unit of processing equipment, the device interface server then attempts to set a process recipe in the device interface server.
摘要翻译：公开了一种半导体处理装置，用于处理具有可变数量的晶片批次的批次的晶片。该设备包括适于接收用于进场操作的批次信息的操作员接口服务器，适于存储用于处理该批晶片的数据的设备管理服务器，以及适于控制所选择的处理设备单元的设备接口服务器以处理该批晶圆。批处理信息从操作员界面服务器发送到设备接口服务器，设备接口服务器尝试基于批处理信息在所选择的处理设备单元中设置子配方。在所选择的处理设备单元中设置子配方后，设备接口服务器将尝试在设备接口服务器中设置进程配方。

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