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1. 发明申请

US20050241412A1 Slotted flow restrictor for a mass flow meter 有权
标题翻译：用于质量流量计的开槽流量限制器
公开(公告)号：US20050241412A1
公开(公告)日：2005-11-03
申请号：US10515328
申请日：2003-05-23
申请人： Stuart Tison , Guanghua Wu , Tracy Gill , Vincent Lopez
发明人： Stuart Tison , Guanghua Wu , Tracy Gill , Vincent Lopez
IPC分类号： G01F1/00 , F15D1/02 , G01F1/22 , G01F1/40 , G01F1/42 , G01F1/48
CPC分类号： G01F1/42 , G01F1/40
摘要： A flow restrictor (30) for a mass flow metering device formed of a solid material and slots (32) originating from an outer surface towards inward.
摘要翻译：一种用于由固体材料形成的质量流量计量装置的限流器（30）和从外表面朝向内部的槽（32）。

2. 发明申请

US20080097657A1 Method and System for Wafer Temperature Control 审中-公开
标题翻译：晶圆温度控制方法与系统
公开(公告)号：US20080097657A1
公开(公告)日：2008-04-24
申请号：US11664550
申请日：2005-10-13
申请人： Kenneth Tinsley , Stuart Tison
发明人： Kenneth Tinsley , Stuart Tison
IPC分类号： G05D23/00
CPC分类号： H01L21/67248
摘要： Systems and methods for controlling the temperature of a wafer are disclosed. These systems and methods may employ a back side wafer pressure control system (BSWPC) that includes subsystems and a controller operable in tandem to control the temperature of wafers in one or more process chambers. The subsystems may include mechanical components for controlling a flow of gas to the backside of a wafer while the controller may be utilized to control these mechanical components in order to control wafer temperature in a process chamber. Furthermore, embodiments of these systems and methods may also use a chiller in combination with the controller to provide both coarse and fine temperature control.
摘要翻译：公开了用于控制晶片温度的系统和方法。这些系统和方法可以采用背面晶片压力控制系统（BSWPC），其包括子系统和可串行操作以控制一个或多个处理室中的晶片的温度的控制器。子系统可以包括用于控制气体流到晶片背面的机械部件，而控制器可用于控制这些机械部件以便控制处理室中的晶片温度。此外，这些系统和方法的实施例还可以使用与控制器组合的冷却器来提供粗略和精细的温度控制。

3. 发明申请

US20070181703A1 System and method for producing and delivering vapor 有权
标题翻译：用于生产和输送蒸汽的系统和方法
公开(公告)号：US20070181703A1
公开(公告)日：2007-08-09
申请号：US11349068
申请日：2006-02-07
申请人： Daryl Buchanan , Faisal Tariq , Hai Mei , Stuart Tison
发明人： Daryl Buchanan , Faisal Tariq , Hai Mei , Stuart Tison
IPC分类号： F24D3/00
CPC分类号： F22B35/005 , F22B35/00
摘要： Systems and methods for producing and delivering vapor are disclosed. A vaporizer tank containing a liquid may be heated such that liquid within the tank is heated and vapor generated. The flow of this vapor to a destination may then be regulated. Embodiments of the present invention may control the temperature of this liquid such that a saturated vapor condition is substantially maintained in the vaporizer tank. The vaporizer tank is coupled to a mass flow controller which regulates the delivery of the vapor to downstream components. By substantially maintaining the saturated vapor condition within the vaporizer tank the pressure of vapor at the mass flow controller can be substantially maintained and a stable and consistent flow rate of vapor achieved.
摘要翻译：公开了用于生产和输送蒸气的系统和方法。容纳液体的蒸发器罐可以被加热，使得罐内的液体被加热并产生蒸气。然后可以调节该蒸气到目的地的流动。本发明的实施例可以控制该液体的温度，使得蒸发器罐中基本上保持饱和蒸气条件。蒸发器罐耦合到质量流量控制器，其调节蒸汽向下游部件的输送。通过基本上保持蒸发器罐内的饱和蒸汽状态，可以基本上保持质量流量控制器处的蒸汽压力，并且获得稳定且一致的蒸汽流量。

4. 发明申请

US20060123921A1 System and method for measuring flow 有权
标题翻译：测量流量的系统和方法
公开(公告)号：US20060123921A1
公开(公告)日：2006-06-15
申请号：US11341826
申请日：2006-01-27
申请人： Stuart Tison , Shiliang Lu
发明人： Stuart Tison , Shiliang Lu
IPC分类号： G01F1/00
CPC分类号： G01F7/005
摘要： One embodiment of the present invention can comprise a primary flow measurement system, a secondary flow measurement system in fluid communication with the primary flow measurement system and a control coupled to the primary flow measurement system and the secondary flow measurement system. The controller can comprise a processor and a memory accessible by the processor. The processor can execute computer instructions stored on the memory to calculate a flow rate using the primary flow measurement system, in a first mode of operation, and calculate the flow rate using the secondary flow measurement system, in a second mode of operation. The computer instructions can be further executable to switch between the first mode of operation and the second mode of operation based on a predefined parameter.
摘要翻译：本发明的一个实施例可以包括主流量测量系统，与主流量测量系统流体连通的二次流量测量系统以及耦合到初级流量测量系统和二次流量测量系统的控制。控制器可以包括处理器和由处理器可访问的存储器。处理器可以执行存储在存储器上的计算机指令，以第一操作模式使用主流量测量系统计算流量，并且在第二操作模式中使用二次流测量系统计算流量。计算机指令可以进一步执行，以便基于预定参数在第一操作模式和第二操作模式之间切换。

5. 发明授权

US07680399B2 System and method for producing and delivering vapor 有权
标题翻译：用于生产和输送蒸汽的系统和方法
公开(公告)号：US07680399B2
公开(公告)日：2010-03-16
申请号：US11349068
申请日：2006-02-07
申请人： Daryl Buchanan , Faisal Tariq , Hai Mei , Stuart Tison
发明人： Daryl Buchanan , Faisal Tariq , Hai Mei , Stuart Tison
IPC分类号： A01G13/06
CPC分类号： F22B35/005 , F22B35/00
摘要： Systems and methods for producing and delivering vapor are disclosed. A vaporizer tank containing a liquid may be heated such that liquid within the tank is heated and vapor generated. The flow of this vapor to a destination may then be regulated. Embodiments of the present invention may control the temperature of this liquid such that a saturated vapor condition is substantially maintained in the vaporizer tank. The vaporizer tank is coupled to a mass flow controller which regulates the delivery of the vapor to downstream components. By substantially maintaining the saturated vapor condition within the vaporizer tank the pressure of vapor at the mass flow controller can be substantially maintained and a stable and consistent flow rate of vapor achieved.
摘要翻译：公开了用于生产和输送蒸气的系统和方法。容纳液体的蒸发器罐可以被加热，使得罐内的液体被加热并产生蒸气。然后可以调节该蒸气到目的地的流动。本发明的实施例可以控制该液体的温度，使得蒸发器罐中基本上保持饱和蒸气条件。蒸发器罐耦合到质量流量控制器，其调节蒸汽向下游部件的输送。通过基本上保持蒸发器罐内的饱和蒸汽状态，可以基本上保持质量流量控制器处的蒸汽压力，并且获得稳定且一致的蒸汽流量。

6. 发明申请

US20060011237A1 Method and system for flow measurement and validation of a mass flow controller 有权
标题翻译：质量流量控制器的流量测量和验证方法和系统
公开(公告)号：US20060011237A1
公开(公告)日：2006-01-19
申请号：US10946031
申请日：2004-09-21
申请人： Stuart Tison , Sandeep Sukumaran , James Barker
发明人： Stuart Tison , Sandeep Sukumaran , James Barker
IPC分类号： F16K31/36
CPC分类号： G01F25/0038 , G01F25/0053 , Y10T137/0324 , Y10T137/0379 , Y10T137/7759 , Y10T137/7761
摘要： Systems and methods for flow verification and validation of mass flow controllers are disclosed. A mass flow controller may be commanded to a specified flow and flow measurement commenced. During an interval, gas is accumulated in a first volume and measurements taken within this volume. The various measurements taken during the interval may then be used to calculate the flow rate. The flow rate, in turn, may be used to determine the accuracy of the mass flow controller relative to a setpoint.
摘要翻译：公开了用于流量验证和质量流量控制器验证的系统和方法。可以命令质量流量控制器进行指定的流量和流量测量。在间隔期间，气体积聚在第一个体积中，并在该体积内进行测量。然后可以使用间隔期间进行的各种测量来计算流量。流量又可用于确定质量流量控制器相对于设定点的精度。

7. 发明申请

US20060123920A1 SYSTEM AND METHOD FOR MEASURING FLOW 有权
标题翻译：用于测量流量的系统和方法
公开(公告)号：US20060123920A1
公开(公告)日：2006-06-15
申请号：US11012750
申请日：2004-12-15
申请人： Stuart Tison , Shiliang Lu
发明人： Stuart Tison , Shiliang Lu
IPC分类号： G01F1/00
CPC分类号： G01F7/005
摘要： One embodiment of the present invention can comprise a primary flow measurement system, a secondary flow measurement system in fluid communication with the primary flow measurement system and a control coupled to the primary flow measurement system and the secondary flow measurement system. The controller can comprise a processor and a memory accessible by the processor. The processor can execute computer instructions stored on the memory to calculate a flow rate using the primary flow measurement system, in a first mode of operation, and calculate the flow rate using the secondary flow measurement system, in a second mode of operation. The computer instructions can be further executable to switch between the first mode of operation and the second mode of operation based on a predefined parameter.
摘要翻译：本发明的一个实施例可以包括主流量测量系统，与主流量测量系统流体连通的二次流量测量系统以及耦合到初级流量测量系统和二次流量测量系统的控制。控制器可以包括处理器和由处理器可访问的存储器。处理器可以执行存储在存储器上的计算机指令，以第一操作模式使用主流量测量系统计算流量，并且在第二操作模式中使用二次流量测量系统计算流量。计算机指令可以进一步执行，以便基于预定参数在第一操作模式和第二操作模式之间切换。

8. 发明申请

US20060005882A1 Method and system for flow measurement and validation of a mass flow controller 有权
标题翻译：质量流量控制器的流量测量和验证方法和系统
公开(公告)号：US20060005882A1
公开(公告)日：2006-01-12
申请号：US10887591
申请日：2004-07-09
申请人： Stuart Tison , Sandeep Sukumaran , James Barker
发明人： Stuart Tison , Sandeep Sukumaran , James Barker
IPC分类号： G05D7/06
CPC分类号： G01F25/0038 , G01F25/0053 , Y10T137/0324 , Y10T137/0379 , Y10T137/7759 , Y10T137/7761
摘要： Systems and methods for flow verification and validation of mass flow controllers are disclosed. A mass flow controller may be commanded to a specified flow and flow measurement commenced. Gas is accumulated in a first volume and while measurements are taken within this volume. Gas may then flow into a second volume while measurements are taken. The various measurements taken during the two intervals may then be used to calculate the flow rate. The flow rate, in turn, may be used to determine the accuracy of the mass flow controller relative to a setpoint. Additionally, these systems and methods may utilize only one volume to perform flow verification by flowing gas into this volume, taking measurements, and calculating the flow rate based only upon this set of measurements.
摘要翻译：公开了用于流量验证和质量流量控制器验证的系统和方法。可以命令质量流量控制器进行指定的流量和流量测量。气体在第一卷中积累，并且在该体积内进行测量。然后在进行测量时，气体可以流入第二容积。然后可以使用在两个间隔期间进行的各种测量来计算流量。流量又可用于确定质量流量控制器相对于设定点的精度。此外，这些系统和方法可以仅利用一个体积来通过将气体流入该体积进行流动验证，进行测量，并且仅基于该组测量来计算流量。

9. 发明申请

US20050205774A1 System and method for mass flow detection device calibration 有权
标题翻译：用于质量流量检测装置校准的系统和方法
公开(公告)号：US20050205774A1
公开(公告)日：2005-09-22
申请号：US11129166
申请日：2005-05-13
申请人： Stuart Tison , Shiliang Lu
发明人： Stuart Tison , Shiliang Lu
IPC分类号： G01F1/00 , C01B17/22 , G01F1/12 , G01F1/48 , G01F1/50 , G01F1/68 , G01F1/684 , G01F1/696 , G01F5/00 , G01F25/00 , G01L27/00 , G06F19/00
CPC分类号： G01F1/684 , G01F1/6842 , G01F1/6965 , G01F5/00 , G01F25/0007 , Y10T137/7761
摘要： Systems and methods for correcting measurements of fluid flow using device- specific information to compensate for differences between individual devices of the same design. In one embodiment, a method comprises providing device-specific calibration data; sensing a fluid flow; computing a measured fluid flow based on the sensed fluid flow, and correcting the measured fluid flow based on the device-specific calibration data. More particularly, the fluid flow measurement is corrected using correction factors that compensate for the use of a gas that is different from the calibration gas (CF0 (1+aF+bF2+cF3)), for device variations in sensor sensitivity (1+αΔR), and for variations in the split flow of fluid through the flow meter (1−βΔADC(Sp/100)2). The sensor and split flow correction factors may be used independently of each other in some embodiments.
摘要翻译：使用设备特定信息来校正流体流动测量的系统和方法，以补偿相同设计的各个设备之间的差异。在一个实施例中，一种方法包括提供设备特定的校准数据; 感测流体流动; 基于所检测到的流体流计算测量的流体流量，以及基于所述设备特定的校准数据校正所测量的流体流动。更具体地，使用补偿使用与校准气体不同的气体的校正因子来校正流体流量测量（CF + N）（1 + aF + bF 2 O / 对于传感器灵敏度（1 +αDeltaR）中的设备变化，以及通过流量计的流体分流（1-βDeltaADC（Sp / 100）^{2 ）。在一些实施例中，传感器和分流校正因子可以彼此独立地使用。}

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